Imaging strategies

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G03F7/70425

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70425Imaging strategies

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for controlling a lithographic system
- Patent number 12,099,306
- Issue date Sep 24, 2024
- ASML Netherlands B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement apparatus and a method for determining a substrate grid
- Patent number 11,966,166
- Issue date Apr 23, 2024
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Processing apparatus for forming a coating film on a substrate havi...
- Patent number 11,791,162
- Issue date Oct 17, 2023
- Tokyo Electron Limited
- Yasuaki Noda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography process method for defining sidewall morphology of lith...
- Patent number 11,726,400
- Issue date Aug 15, 2023
- Shanghai Huahong Grace Semiconductor Manufacturing Corporation
- Hui Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compensating deposition non-uniformities in circuit elements
- Patent number 11,662,664
- Issue date May 30, 2023
- Google LLC
- Brian James Burkett
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic process and apparatus and inspection process and appar...
- Patent number 11,599,027
- Issue date Mar 7, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compensating deposition non-uniformities in circuit elements
- Patent number 11,378,890
- Issue date Jul 5, 2022
- Google LLC
- Brian James Burkett
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic process and apparatus and inspection process and appar...
- Patent number 11,199,782
- Issue date Dec 14, 2021
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement apparatus and a method for determining a substrate grid
- Patent number 11,079,684
- Issue date Aug 3, 2021
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dynamic cooling control for thermal stabilization for lithography s...
- Patent number 11,009,801
- Issue date May 18, 2021
- Applied Materials, Inc.
- Benjamin M. Johnston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compensating deposition non-uniformities in circuit elements
- Patent number 10,990,017
- Issue date Apr 27, 2021
- Google LLC
- Brian James Burkett
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization of assist features and source
- Patent number 10,955,755
- Issue date Mar 23, 2021
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus to correct for patterning process error
- Patent number 10,915,689
- Issue date Feb 9, 2021
- ASML Netherlands B.V.
- Peter Ten Berge
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Constructing colorable wiring layouts with wide wires and sandwich...
- Patent number 10,810,348
- Issue date Oct 20, 2020
- International Business Machines Corporation
- Laura R. Darden
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dynamic cooling control for thermal stabilization for lithography s...
- Patent number 10,788,762
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Benjamin M. Johnston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hybrid double patterning method for semiconductor manufacture
- Patent number 10,770,304
- Issue date Sep 8, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ken-Hsien Hsieh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Spatial light modulator, method of driving same, and exposure metho...
- Patent number 10,761,431
- Issue date Sep 1, 2020
- Nikon Corporation
- Yoji Watanabe
- G02 - OPTICS
Information Patent Grant
Method and apparatus for exposing a structure on a substrate
- Patent number 10,670,972
- Issue date Jun 2, 2020
- Infineon Technologies AG
- Rudolf Zelsacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source and mask optimization by changing intensity and shape of the...
- Patent number 10,657,641
- Issue date May 19, 2020
- ASML Netherlands B.V.
- Robert Socha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Etch-assist features
- Patent number 10,627,722
- Issue date Apr 21, 2020
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and device for inspecting spatial light modulator, and expos...
- Patent number 10,598,606
- Issue date Mar 24, 2020
- Nikon Corporation
- Tomoharu Fujiwara
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and device for inspecting spatial light modulator, and expos...
- Patent number 10,557,801
- Issue date Feb 11, 2020
- Nikon Corporation
- Tomoharu Fujiwara
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Evaluation method, exposure method, and method for manufacturing an...
- Patent number 10,545,413
- Issue date Jan 28, 2020
- Canon Kabushiki Kaisha
- Bunsuke Takeshita
- G02 - OPTICS
Information Patent Grant
Manufacturing method of diffractive optical elements
- Patent number 10,520,808
- Issue date Dec 31, 2019
- DOCOMO Incorporated
- Fusao Ishii
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,466,595
- Issue date Nov 5, 2019
- ASML Netherlands B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spin torque MRAM fabrication using negative tone lithography and io...
- Patent number 10,388,857
- Issue date Aug 20, 2019
- International Business Machines Corporation
- Anthony J. Annunziata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask manufacturing method
- Patent number 10,373,841
- Issue date Aug 6, 2019
- Semiconductor Manufacturing International (Beijing) Corporation
- Hai Yang Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus, and method of manufacturing article
- Patent number 10,359,696
- Issue date Jul 23, 2019
- Canon Kabushiki Kaisha
- Yosuke Murakami
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Spatial light modulator, method of driving same, and exposure metho...
- Patent number 10,338,479
- Issue date Jul 2, 2019
- Nikon Corporation
- Yoji Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for inspecting spatial light modulator, and expos...
- Patent number 10,317,346
- Issue date Jun 11, 2019
- Nikon Corporation
- Tomoharu Fujiwara
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...
- Publication number 20250004388
- Publication date Jan 2, 2025
- Canon Kabushiki Kaisha
- HIRONOBU FUJISHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURI...
- Publication number 20240255855
- Publication date Aug 1, 2024
- Nikon Corporation
- Masaki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROXIMITY CORRECTION METHOD USING NEURAL JACOBIAN MATRIX AN...
- Publication number 20240045321
- Publication date Feb 8, 2024
- Samsung Electronics Co., Ltd.
- Moojoon Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING...
- Publication number 20240027921
- Publication date Jan 25, 2024
- Canon Kabushiki Kaisha
- TOSHIKI IWAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESSING APPARATUS FOR FORMING A COATING FILM ON A SUBSTRATE HAVI...
- Publication number 20230395380
- Publication date Dec 7, 2023
- TOKYO ELECTRON LIMITED
- Yasuaki NODA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD
- Publication number 20230359126
- Publication date Nov 9, 2023
- V TECHNOLOGY CO., LTD.
- Yoshiyuki ENOMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semi-Additive Process for Printed Circuit Boards
- Publication number 20230247774
- Publication date Aug 3, 2023
- CATLAM, LLC
- Kenneth S. BAHL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Three-Dimensional Micro-Nano Morphological Structure Manufactured b...
- Publication number 20230213869
- Publication date Jul 6, 2023
- SVG TECH GROUP CO., LTD
- Linsen CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPENSATING DEPOSITION NON-UNIFORMITIES IN CIRCUIT ELEMENTS
- Publication number 20230119165
- Publication date Apr 20, 2023
- Google LLC
- Brian James Burkett
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICES, SYSTEMS, AND METHODS FOR THE TRANSFORMATION AND CROPPING O...
- Publication number 20230033557
- Publication date Feb 2, 2023
- Canon Kabushiki Kaisha
- Tom H. Rafferty
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for Controlling a Lithographic System
- Publication number 20220163895
- Publication date May 26, 2022
- ASML Netherlands B,V.
- Oscar Franciscus Jozephus NOORDMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PROCESS & APPARATUS AND INSPECTION PROCESS AND APPARATUS
- Publication number 20220057719
- Publication date Feb 24, 2022
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID
- Publication number 20210341846
- Publication date Nov 4, 2021
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPENSATING DEPOSITION NON-UNIFORMITIES IN CIRCUIT ELEMENTS
- Publication number 20210208509
- Publication date Jul 8, 2021
- Google LLC
- Brian James Burkett
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PROCESS & APPARATUS AND INSPECTION PROCESS AND APPARATUS
- Publication number 20210208511
- Publication date Jul 8, 2021
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE REFRACTION IMAGING LITHOGRAPHIC METHOD AND EQUIPMENT
- Publication number 20210200079
- Publication date Jul 1, 2021
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang LUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY PROCESS METHOD FOR DEFINING SIDEWALL MORPHOLOGY OF LITH...
- Publication number 20210048742
- Publication date Feb 18, 2021
- Shanghai Huahong Grace Semiconductor Manufacturing Corporation
- Hui WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DYNAMIC COOLING CONTROL FOR THERMAL STABILIZATION FOR LITHOGRAPHY S...
- Publication number 20210011390
- Publication date Jan 14, 2021
- Applied Materials, Inc.
- Benjamin M. JOHNSTON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEPARATED AXIS LITHOGRAPHIC TOOL
- Publication number 20200333713
- Publication date Oct 22, 2020
- Onto Innovation, Inc.
- J. Casey DONAHER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hybrid Double Patterning Method for Semiconductor Manufacture
- Publication number 20200083058
- Publication date Mar 12, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Ken-Hsien Hsieh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND DEVICE FOR INSPECTING SPATIAL LIGHT MODULATOR, AND EXPOS...
- Publication number 20190293568
- Publication date Sep 26, 2019
- NIKON CORPORATION
- Tomoharu FUJIWARA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZATION OF ASSIST FEATURES AND SOURCE
- Publication number 20190285991
- Publication date Sep 19, 2019
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SPATIAL LIGHT MODULATOR, METHOD OF DRIVING SAME, AND EXPOSURE METHO...
- Publication number 20190271917
- Publication date Sep 5, 2019
- Nikon Corporation
- Yoji WATANABE
- G02 - OPTICS
Information Patent Application
MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID
- Publication number 20190235391
- Publication date Aug 1, 2019
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPENSATING DEPOSITION NON-UNIFORMITIES IN CIRCUIT ELEMENTS
- Publication number 20190204753
- Publication date Jul 4, 2019
- Google LLC
- Brian James Burkett
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF DIFFRACTIVE OPTICAL ELEMENTS
- Publication number 20190079395
- Publication date Mar 14, 2019
- Fusao Ishii
- G02 - OPTICS
Information Patent Application
SPATIAL LIGHT MODULATOR, METHOD OF DRIVING SAME, AND EXPOSURE METHO...
- Publication number 20190049857
- Publication date Feb 14, 2019
- Nikon Corporation
- Yoji WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR
- Publication number 20180307135
- Publication date Oct 25, 2018
- ASML NETHERLANDS B.V.
- Peter TEN BERGE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process Robust Overlay Metrology Based On Optical Scatterometry
- Publication number 20180252514
- Publication date Sep 6, 2018
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXPOSING METHOD, EXPOSING SYSTEM AND LASER DIRECT IMAGING SYSTEM
- Publication number 20180196355
- Publication date Jul 12, 2018
- Industrial Technology Research Institute
- Ka-Yi Yeh
- G02 - OPTICS

Imaging strategies

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for controlling a lithographic system

Measurement apparatus and a method for determining a substrate grid

Processing apparatus for forming a coating film on a substrate havi...

Lithography process method for defining sidewall morphology of lith...

Compensating deposition non-uniformities in circuit elements

Lithographic process and apparatus and inspection process and appar...

Compensating deposition non-uniformities in circuit elements

Lithographic process and apparatus and inspection process and appar...

Measurement apparatus and a method for determining a substrate grid

Dynamic cooling control for thermal stabilization for lithography s...

Compensating deposition non-uniformities in circuit elements

Optimization of assist features and source

Method and apparatus to correct for patterning process error

Constructing colorable wiring layouts with wide wires and sandwich...

Dynamic cooling control for thermal stabilization for lithography s...

Hybrid double patterning method for semiconductor manufacture

Spatial light modulator, method of driving same, and exposure metho...

Method and apparatus for exposing a structure on a substrate

Source and mask optimization by changing intensity and shape of the...

Etch-assist features

Method and device for inspecting spatial light modulator, and expos...

Method and device for inspecting spatial light modulator, and expos...

Evaluation method, exposure method, and method for manufacturing an...

Manufacturing method of diffractive optical elements

Lithographic apparatus and device manufacturing method

Spin torque MRAM fabrication using negative tone lithography and io...

Photomask manufacturing method

Imprint apparatus, and method of manufacturing article

Spatial light modulator, method of driving same, and exposure metho...

Method and device for inspecting spatial light modulator, and expos...

Patents Applicationslast 30 patents

EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...

PATTERN EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURI...

OPTICAL PROXIMITY CORRECTION METHOD USING NEURAL JACOBIAN MATRIX AN...

DETECTION DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING...

PROCESSING APPARATUS FOR FORMING A COATING FILM ON A SUBSTRATE HAVI...

PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD

Semi-Additive Process for Printed Circuit Boards

Three-Dimensional Micro-Nano Morphological Structure Manufactured b...

COMPENSATING DEPOSITION NON-UNIFORMITIES IN CIRCUIT ELEMENTS

DEVICES, SYSTEMS, AND METHODS FOR THE TRANSFORMATION AND CROPPING O...

Method for Controlling a Lithographic System

LITHOGRAPHIC PROCESS & APPARATUS AND INSPECTION PROCESS AND APPARATUS

MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID

COMPENSATING DEPOSITION NON-UNIFORMITIES IN CIRCUIT ELEMENTS

LITHOGRAPHIC PROCESS & APPARATUS AND INSPECTION PROCESS AND APPARATUS

NEGATIVE REFRACTION IMAGING LITHOGRAPHIC METHOD AND EQUIPMENT

LITHOGRAPHY PROCESS METHOD FOR DEFINING SIDEWALL MORPHOLOGY OF LITH...

DYNAMIC COOLING CONTROL FOR THERMAL STABILIZATION FOR LITHOGRAPHY S...

SEPARATED AXIS LITHOGRAPHIC TOOL

Hybrid Double Patterning Method for Semiconductor Manufacture

METHOD AND DEVICE FOR INSPECTING SPATIAL LIGHT MODULATOR, AND EXPOS...

OPTIMIZATION OF ASSIST FEATURES AND SOURCE

SPATIAL LIGHT MODULATOR, METHOD OF DRIVING SAME, AND EXPOSURE METHO...

MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID

COMPENSATING DEPOSITION NON-UNIFORMITIES IN CIRCUIT ELEMENTS

MANUFACTURING METHOD OF DIFFRACTIVE OPTICAL ELEMENTS

SPATIAL LIGHT MODULATOR, METHOD OF DRIVING SAME, AND EXPOSURE METHO...

METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR

Process Robust Overlay Metrology Based On Optical Scatterometry

EXPOSING METHOD, EXPOSING SYSTEM AND LASER DIRECT IMAGING SYSTEM