Immersion lens

Industry

CPC
H01J2237/1035

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/1035Immersion lens

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Magnetic field free sample plane for charged particle microscope
- Patent number 11,450,505
- Issue date Sep 20, 2022
- FEI Company
- Alexander Henstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope with composite detection system and sp...
- Patent number 11,145,487
- Issue date Oct 12, 2021
- Focus-eBeam Technology (Beijing) Co., Ltd.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Swing objective lens
- Patent number 9,583,306
- Issue date Feb 28, 2017
- Hermes Microvision Inc.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of using a compound particle-optical lens
- Patent number 9,490,100
- Issue date Nov 8, 2016
- FEI Company
- Petr Sytar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Configurable charged-particle apparatus
- Patent number 8,829,470
- Issue date Sep 9, 2014
- FEI Company
- Lubomir Tuma
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multi-axis magnetic lens for focusing a plurality of charged partic...
- Patent number 8,791,425
- Issue date Jul 29, 2014
- Hermes-Microvision, Inc.
- Weiming Ren
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Objective lens with deflector plates immersed in electrostatic lens...
- Patent number 8,698,093
- Issue date Apr 15, 2014
- KLA-Tencor Corporation
- Alexander J. Gubbens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam column and methods of using same
- Patent number 8,461,526
- Issue date Jun 11, 2013
- KLA-Tencor Corporation
- Marian Mankos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged particle beams with multi-axis magnetic...
- Patent number 8,445,862
- Issue date May 21, 2013
- Hermes-Microvision, Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun with magnetic immersion double condenser lenses
- Patent number 8,314,401
- Issue date Nov 20, 2012
- Hermes-Microvision, Inc.
- Xu Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun with magnetic immersion double condenser lenses
- Patent number 7,893,406
- Issue date Feb 22, 2011
- Hermes-Microvision, Inc.
- Xu Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus
- Patent number 7,759,653
- Issue date Jul 20, 2010
- Hermes-Microvision, Inc.
- Zhong-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronically-variable immersion electrostatic lens
- Patent number 7,446,320
- Issue date Nov 4, 2008
- KLA-Tencor Technologies Corproation
- Mark A. McCord
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Swinging objective retarding immersion lens electron optics focusin...
- Patent number 6,960,766
- Issue date Nov 1, 2005
- Hermes-Microvision, Inc.
- Zhong-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of exposing a target to a charged particle beam
- Patent number 6,924,494
- Issue date Aug 2, 2005
- Applied Materials, Inc.
- Lee H. Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lens for a scanning electron microscope
- Patent number 6,906,335
- Issue date Jun 14, 2005
- National University of Singapore
- Anjam Khursheed
- G01 - MEASURING TESTING
Information Patent Grant
Immersion objective lens for e-beam inspection
- Patent number 6,858,843
- Issue date Feb 22, 2005
- KLA-Tencor Technologies Corporation
- Marian Mankos
- G01 - MEASURING TESTING
Information Patent Grant
Immersion lens with magnetic shield for charged particle beam system
- Patent number 6,768,117
- Issue date Jul 27, 2004
- Applied Materials, Inc.
- Lee H. Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic immersion lense with detection arrangement
- Patent number 6,664,544
- Issue date Dec 16, 2003
- Shimadzu Research Laboratory (Europe) Ltd.
- Takao Marui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Swinging objective retarding immersion lens electron optics focusin...
- Patent number 6,605,805
- Issue date Aug 12, 2003
- Hermes-Microvision, Inc.
- Zhong-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam emitting device
- Patent number 6,580,074
- Issue date Jun 17, 2003
- Hitachi, Ltd.
- Mitsugu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic lens apparatus for use in high-resolution scanning electro...
- Patent number 6,410,923
- Issue date Jun 25, 2002
- Arch Development Corporation
- Albert V. Crewe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Swinging objective retarding immersion lens electron optics focusin...
- Patent number 6,392,231
- Issue date May 21, 2002
- Hermes-Microvision, Inc.
- Zhong-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Immersion lens and electron beam projection system using the same
- Patent number 6,307,312
- Issue date Oct 23, 2001
- Advantest Corporation
- Hitoshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic lens apparatus for use in high-resolution scanning electro...
- Patent number 6,051,839
- Issue date Apr 18, 2000
- Arch Development Corporation
- Albert V. Crewe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam device
- Patent number 6,037,589
- Issue date Mar 14, 2000
- Seiko Instruments Inc.
- Akira Yonezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Objective lens and charged particle beam system
- Patent number 5,736,742
- Issue date Apr 7, 1998
- NEC Corporation
- Yukinori Ochiai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic lens apparatus for a low-voltage high-resolution electron...
- Patent number 5,563,415
- Issue date Oct 8, 1996
- Arch Development Corporation
- Albert V. Crewe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron beam microscope with high resolution at low accel...
- Patent number 5,241,176
- Issue date Aug 31, 1993
- Seiko Instruments Inc.
- Akira Yonezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam writing method and system using large range deflectio...
- Patent number 4,818,885
- Issue date Apr 4, 1989
- International Business Machines Corporation
- Donald E. Davis
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
MAGNETIC LENSES, CHARGED PARTICLE MICROSCOPE SYSTEMS INCLUDING THE...
- Publication number 20250006453
- Publication date Jan 2, 2025
- FEI Company
- Jan Stopka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE PARTICLE BEAM SYSTEM WITH A CONTRAST CORRECTION LENS SYSTEM
- Publication number 20230207251
- Publication date Jun 29, 2023
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC FIELD FREE SAMPLE PLANE FOR CHARGED PARTICLE MICROSCOPE
- Publication number 20220199353
- Publication date Jun 23, 2022
- FEI Company
- Alexander Henstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE WITH COMPOSITE DETECTION SYSTEM AND SP...
- Publication number 20210066031
- Publication date Mar 4, 2021
- Focus-eBeam Technology (Beijing) Co., Ltd.
- Shuai LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Swing Objective Lens
- Publication number 20160172150
- Publication date Jun 16, 2016
- HERMES MICROVISION INC.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Configurable Charged-Particle Apparatus
- Publication number 20140110597
- Publication date Apr 24, 2014
- FEI Company
- Lubomir Tuma
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Method of Using a Compound Particle-Optical Lens
- Publication number 20140070098
- Publication date Mar 13, 2014
- FEI Company
- Petr Sytar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-axis Magnetic Lens for Focusing a Plurality of Charged Partic...
- Publication number 20130248730
- Publication date Sep 26, 2013
- HERMES MICROVISION, INC.
- Weiming Ren
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multi-axis Magnetic Lens for Focusing a Plurality of Charged Partic...
- Publication number 20130153782
- Publication date Jun 20, 2013
- HERMES MICROVISION, INC.
- Weiming Ren
- B82 - NANO-TECHNOLOGY
Information Patent Application
ELECTRON MICROSCOPE
- Publication number 20130087703
- Publication date Apr 11, 2013
- Takashi Onishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vector Potential Photoelectron Microscope
- Publication number 20120298861
- Publication date Nov 29, 2012
- Raymond Browning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED PARTICLE BEAMS WITH MULTI-AXIS MAGNETIC...
- Publication number 20120145917
- Publication date Jun 14, 2012
- Hermes Microvision, Inc.
- ZHONGWEI CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM COLUMN AND METHODS OF USING SAME
- Publication number 20120138791
- Publication date Jun 7, 2012
- Marian MANKOS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON GUN WITH MAGNETIC IMMERSION DOUBLE CONDENSER LENSES
- Publication number 20110018470
- Publication date Jan 27, 2011
- Hermes-Microvision, Inc.
- Xu Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM APPARATUS
- Publication number 20090294664
- Publication date Dec 3, 2009
- Hermes-Microvision, Inc.
- Zhong-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of exposing a target to a charged particle beam
- Publication number 20040217304
- Publication date Nov 4, 2004
- Lee H. Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lens for a scanning electron microscope
- Publication number 20040084620
- Publication date May 6, 2004
- Anjam Khursheed
- G01 - MEASURING TESTING
Information Patent Application
Swinging objective retarding immersion lens electron optics focusin...
- Publication number 20040046125
- Publication date Mar 11, 2004
- Zhong-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Swinging objective retarding immersion lens electron optics focusin...
- Publication number 20020104969
- Publication date Aug 8, 2002
- Zhong-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS

Immersion lens

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Magnetic field free sample plane for charged particle microscope

Scanning electron microscope with composite detection system and sp...

Swing objective lens

Method of using a compound particle-optical lens

Configurable charged-particle apparatus

Multi-axis magnetic lens for focusing a plurality of charged partic...

Objective lens with deflector plates immersed in electrostatic lens...

Electron beam column and methods of using same

Apparatus of plural charged particle beams with multi-axis magnetic...

Electron gun with magnetic immersion double condenser lenses

Electron gun with magnetic immersion double condenser lenses

Electron beam apparatus

Electronically-variable immersion electrostatic lens

Swinging objective retarding immersion lens electron optics focusin...

Method of exposing a target to a charged particle beam

Lens for a scanning electron microscope

Immersion objective lens for e-beam inspection

Immersion lens with magnetic shield for charged particle beam system

Magnetic immersion lense with detection arrangement

Swinging objective retarding immersion lens electron optics focusin...

Charged particle beam emitting device

Magnetic lens apparatus for use in high-resolution scanning electro...

Swinging objective retarding immersion lens electron optics focusin...

Immersion lens and electron beam projection system using the same

Magnetic lens apparatus for use in high-resolution scanning electro...

Electron beam device

Objective lens and charged particle beam system

Magnetic lens apparatus for a low-voltage high-resolution electron...

Scanning electron beam microscope with high resolution at low accel...

Electron beam writing method and system using large range deflectio...

Patents Applicationslast 30 patents

MAGNETIC LENSES, CHARGED PARTICLE MICROSCOPE SYSTEMS INCLUDING THE...

MULTIPLE PARTICLE BEAM SYSTEM WITH A CONTRAST CORRECTION LENS SYSTEM

MAGNETIC FIELD FREE SAMPLE PLANE FOR CHARGED PARTICLE MICROSCOPE

SCANNING ELECTRON MICROSCOPE WITH COMPOSITE DETECTION SYSTEM AND SP...

Swing Objective Lens

Configurable Charged-Particle Apparatus

Method of Using a Compound Particle-Optical Lens

Multi-axis Magnetic Lens for Focusing a Plurality of Charged Partic...

Multi-axis Magnetic Lens for Focusing a Plurality of Charged Partic...

ELECTRON MICROSCOPE

Vector Potential Photoelectron Microscope

APPARATUS OF PLURAL CHARGED PARTICLE BEAMS WITH MULTI-AXIS MAGNETIC...

ELECTRON BEAM COLUMN AND METHODS OF USING SAME

ELECTRON GUN WITH MAGNETIC IMMERSION DOUBLE CONDENSER LENSES

ELECTRON BEAM APPARATUS

Method of exposing a target to a charged particle beam

Lens for a scanning electron microscope

Swinging objective retarding immersion lens electron optics focusin...

Swinging objective retarding immersion lens electron optics focusin...