in non photosensitive layers or as additives

Industry

CPC
G03F7/0752

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0752in non photosensitive layers or as additives

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Silicon-containing resist underlayer film-forming composition inclu...
- Patent number 12,248,251
- Issue date Mar 11, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film-forming composition, silicon-containing film, and resist patte...
- Patent number 12,098,282
- Issue date Sep 24, 2024
- JSR Corporation
- Tomoaki Seko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aromatic underlayer
- Patent number 12,099,300
- Issue date Sep 24, 2024
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device production method employing silicon-containing...
- Patent number 11,966,164
- Issue date Apr 23, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating compositions and methods of forming electronic devices
- Patent number 11,940,732
- Issue date Mar 26, 2024
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist imaging and development for enhanced nozzle plate adhesion
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- Issue date Mar 12, 2024
- Funai Electric Co., Ltd.
- Sean T. Weaver
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Thermosetting iodine- and silicon-containing material, composition...
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- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
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Information Patent Grant
Manufacturing method of semiconductor chip, and kit
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- Issue date Feb 27, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Acetal-protected silanol group-containing polysiloxane composition
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- Issue date Jan 30, 2024
- NISSAN CHEMICAL CORPORATION
- Yuki Endo
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Information Patent Grant
Composition for forming silicon-containing resist underlayer film r...
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- Issue date Nov 14, 2023
- Nissan Chemical Industries, Ltd.
- Hiroyuki Wakayama
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Information Patent Grant
Underlayer material for photoresist
- Patent number 11,796,918
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-containing underlayers
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- Issue date Aug 22, 2023
- Rohm and Haas Electronic Materials LLC
- Charlotte A. Cutler
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Material for forming organic film, patterning process, and polymer
- Patent number 11,680,133
- Issue date Jun 20, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Imprinting composition and method of forming a patterned layer usin...
- Patent number 11,644,749
- Issue date May 9, 2023
- Koninklijke Philips N.V.
- Marcus Antonius Vershuuren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring distance of diffusion of curing catalyst
- Patent number 11,592,287
- Issue date Feb 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for measuring distance of diffusion of curing catalyst
- Patent number 11,555,697
- Issue date Jan 17, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method using silicon-containing underlayers
- Patent number 11,506,979
- Issue date Nov 22, 2022
- Rohm and Haas Electronic Materials LLC
- Li Cui
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Thermosetting silicon-containing compound, composition for forming...
- Patent number 11,485,824
- Issue date Nov 1, 2022
- Shin-Etsu Chemical Co., Ltd.
- Toshiharu Yano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device using silicon-contain...
- Patent number 11,488,824
- Issue date Nov 1, 2022
- Nissan Chemical Industries, Ltd.
- Satoshi Takeda
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Information Patent Grant
Film forming composition containing fluorine-containing surfactant
- Patent number 11,479,627
- Issue date Oct 25, 2022
- Nissan Chemical Industries, Ltd.
- Makiko Umezaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Film forming composition containing fluorine-containing surfactant
- Patent number 11,459,414
- Issue date Oct 4, 2022
- Nissan Chemical Industries, Ltd.
- Makiko Umezaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition containing silicone havi...
- Patent number 11,392,037
- Issue date Jul 19, 2022
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 11,385,544
- Issue date Jul 12, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon-containing underlayers
- Patent number 11,360,387
- Issue date Jun 14, 2022
- Rohm and Haas Electronic Materials LLC
- Li Cui
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dry film formulation
- Patent number 11,340,529
- Issue date May 24, 2022
- FUNAI ELECTRIC CO. LTD
- Sean T. Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Underlayer material for photoresist
- Patent number 11,269,256
- Issue date Mar 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard-mask forming composition and method for manufacturing electron...
- Patent number 11,248,086
- Issue date Feb 15, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Plasma treatment method to enhance surface adhesion for lithography
- Patent number 11,243,465
- Issue date Feb 8, 2022
- Tokyo Electron Limited
- Wanjae Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming metal-containing film, method of producing...
- Patent number 11,209,735
- Issue date Dec 28, 2021
- Mitsui Chemicals, Inc.
- Yasuhisa Kayaba
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

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POST DEVELOPMENT TREATMENT FOR METAL-OXIDE PHOTORESISTS
- Publication number 20250053086
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- Applied Materials, Inc.
- MADHUR SACHAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN
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- Publication date Nov 21, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20240345483
- Publication date Oct 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION, UNDERLAYER FILM...
- Publication number 20240319600
- Publication date Sep 26, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE
- Publication number 20240321803
- Publication date Sep 26, 2024
- SUMITOMO BAKELITE CO., LTD.
- Akihiko Otoguro
- H01 - BASIC ELECTRIC ELEMENTS
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COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDU...
- Publication number 20240302744
- Publication date Sep 12, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20240295815
- Publication date Sep 5, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND COMPOSITION
- Publication number 20240288773
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- JSR Corporation
- Masato DOBASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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LEVELING AGENT BEING SILICONE CHAIN-CONTAINING POLYMER, COATING COM...
- Publication number 20240263025
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- DIC CORPORATION
- Masaki HATASE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION, CURED FILM, STRUCTURAL BODY, OPTICAL FILTER, SOLID-STA...
- Publication number 20240199854
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- FUJIFLIM CORPORATION
- Keiji YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE
- Publication number 20240162086
- Publication date May 16, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED W...
- Publication number 20240160103
- Publication date May 16, 2024
- Resonac Corporation
- Shuji NOMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT
- Publication number 20240152055
- Publication date May 9, 2024
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
- Publication number 20240153768
- Publication date May 9, 2024
- JSR Corporation
- Hiroki NAKATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Adhesive Film, Patterning Process, And Meth...
- Publication number 20240103370
- Publication date Mar 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING MIXED WETTABILITY SURFACES
- Publication number 20230408919
- Publication date Dec 21, 2023
- Saudi Arabian Oil Company
- Dong Kyu Cha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dry Developing Metal-Free Photoresists
- Publication number 20230350303
- Publication date Nov 2, 2023
- TOKYO ELECTRON LIMITED
- Charlotte Cutler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...
- Publication number 20230333472
- Publication date Oct 19, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST MIXTURE
- Publication number 20230324799
- Publication date Oct 12, 2023
- FaradaIC Sensors GmbH
- Ryan GUTERMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
- Publication number 20230280655
- Publication date Sep 7, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATED UNDERLAYER FOR OVERCOATED PHOTORESIST
- Publication number 20230057401
- Publication date Feb 23, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Anton Chavez
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Dry Resist System and Method of Using
- Publication number 20220404713
- Publication date Dec 22, 2022
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist Imaging and Development for Enhanced Nozzle Plate Adhesion
- Publication number 20220281224
- Publication date Sep 8, 2022
- Funai Electric Co., Ltd.
- Sean T. WEAVER
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Underlayer Material for Photoresist
- Publication number 20220187711
- Publication date Jun 16, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM FORMING COMPOSITION
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- Publication date Mar 31, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C07 - ORGANIC CHEMISTRY
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RESIST UNDERLAYER SURFACE MODIFICATION
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- Jing Guo
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SILICON-CONTAINING UNDERLAYERS
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- Rohm and Haas Electronic Materials L.L.C.
- Charlotte A Cutler
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COATING COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES
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- Sheng Liu
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Information Patent Application
A PHOTORESIST COMPOSITION, A METHOD FOR MANUFACTURING A PHOTORESIST...
- Publication number 20210263414
- Publication date Aug 26, 2021
- Shunji KAWATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINTING COMPOSITION AND METHOD OF FORMING A PATTERNED LAYER USIN...
- Publication number 20210247690
- Publication date Aug 12, 2021
- Koninklijke Philips N.V.
- MARCUS ANTONIUS VERSHUUREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

in non photosensitive layers or as additives

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Silicon-containing resist underlayer film-forming composition inclu...

Pattern formation methods

Film-forming composition, silicon-containing film, and resist patte...

Aromatic underlayer

Semiconductor device production method employing silicon-containing...

Coating compositions and methods of forming electronic devices

Photoresist imaging and development for enhanced nozzle plate adhesion

Thermosetting iodine- and silicon-containing material, composition...

Manufacturing method of semiconductor chip, and kit

Acetal-protected silanol group-containing polysiloxane composition

Composition for forming silicon-containing resist underlayer film r...

Underlayer material for photoresist

Silicon-containing underlayers

Material for forming organic film, patterning process, and polymer

Imprinting composition and method of forming a patterned layer usin...

Method for measuring distance of diffusion of curing catalyst

Method for measuring distance of diffusion of curing catalyst

Method using silicon-containing underlayers

Thermosetting silicon-containing compound, composition for forming...

Method for manufacturing semiconductor device using silicon-contain...

Film forming composition containing fluorine-containing surfactant

Film forming composition containing fluorine-containing surfactant

Resist underlayer film forming composition containing silicone havi...

Composition for forming silicon-containing resist underlayer film a...

Silicon-containing underlayers

Dry film formulation

Underlayer material for photoresist

Hard-mask forming composition and method for manufacturing electron...

Plasma treatment method to enhance surface adhesion for lithography

Composition for forming metal-containing film, method of producing...

Patents Applicationslast 30 patents

POST DEVELOPMENT TREATMENT FOR METAL-OXIDE PHOTORESISTS

PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN

Method For Forming Resist Underlayer Film And Patterning Process

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION, UNDERLAYER FILM...

PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE

COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDU...

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND COMPOSITION

LEVELING AGENT BEING SILICONE CHAIN-CONTAINING POLYMER, COATING COM...

COMPOSITION, CURED FILM, STRUCTURAL BODY, OPTICAL FILTER, SOLID-STA...

SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED W...

MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION

Composition For Forming Adhesive Film, Patterning Process, And Meth...

MANUFACTURING MIXED WETTABILITY SURFACES

Dry Developing Metal-Free Photoresists

THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...

RESIST MIXTURE

COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND

COATED UNDERLAYER FOR OVERCOATED PHOTORESIST

Dry Resist System and Method of Using

Photoresist Imaging and Development for Enhanced Nozzle Plate Adhesion

Underlayer Material for Photoresist

FILM FORMING COMPOSITION

RESIST UNDERLAYER SURFACE MODIFICATION

SILICON-CONTAINING UNDERLAYERS

COATING COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES

A PHOTORESIST COMPOSITION, A METHOD FOR MANUFACTURING A PHOTORESIST...

IMPRINTING COMPOSITION AND METHOD OF FORMING A PATTERNED LAYER USIN...