in-situ cleaning

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/02301in-situ cleaning

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Self-assembled monolayers as sacrificial capping layers
- Patent number 11,915,973
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Ainhoa Romo Negreira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, method of processing...
- Patent number 11,823,886
- Issue date Nov 21, 2023
- Kokusai Electric Corporation
- Kazuhiro Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fin Field-Effect Transistor device and method of forming the same
- Patent number 11,728,215
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shich-Chang Suen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selective deposition for forming fully self-aligned vias
- Patent number 11,658,068
- Issue date May 23, 2023
- Tokyo Electron Limited
- Kandabara Tapily
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for enhancing selectivity in SAM-based selective deposition
- Patent number 11,515,155
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Chang Ke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cyclical deposition method including treatment step and apparatus f...
- Patent number 11,251,040
- Issue date Feb 15, 2022
- ASM IP Holding B.V.
- SeungHwan Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gap fill deposition process
- Patent number 11,101,174
- Issue date Aug 24, 2021
- Applied Materials, Inc.
- Hao Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for a hybrid design for efficient and economical plasma...
- Patent number 11,087,959
- Issue date Aug 10, 2021
- Nano-Master, Inc.
- Birol Kuyel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ temperature measurement for inside of process chamber
- Patent number 11,069,547
- Issue date Jul 20, 2021
- Applied Materials, Inc.
- Xue Yang Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 11,043,377
- Issue date Jun 22, 2021
- Kokusai Electric Corporation
- Naofumi Ohashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fin field-effect transistor device and method of forming the same
- Patent number 11,024,540
- Issue date Jun 1, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shich-Chang Suen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for enhancing selectivity in SAM-based selective deposition
- Patent number 10,950,433
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Chang Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of reducing silicon consumption, methods of forming a semic...
- Patent number 10,886,121
- Issue date Jan 5, 2021
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition of GeO2
- Patent number 10,811,249
- Issue date Oct 20, 2020
- ASM IP Holding B.V.
- Raija H. Matero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Embedded sonos with triple gate oxide and manufacturing method of t...
- Patent number 10,784,356
- Issue date Sep 22, 2020
- LONGITUDE FLASH MEMORY SOLUTIONS LTD.
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating layer structure for semiconductor product, and preparati...
- Patent number 10,748,989
- Issue date Aug 18, 2020
- Shenyang Silicon Technology Co., Ltd.
- Wenlin Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selective film deposition for forming fully self-aligned...
- Patent number 10,586,734
- Issue date Mar 10, 2020
- Tokyo Electron Limited
- Kandabara Tapily
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple barrier layer encapsulation stack
- Patent number 10,580,638
- Issue date Mar 3, 2020
- Sage Electrochromics, Inc.
- Avanti M. Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition of GeO2
- Patent number 10,553,423
- Issue date Feb 4, 2020
- ASM IP Holding B.V.
- Raija H. Matero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-limiting and saturating chemical vapor deposition of a silicon...
- Patent number 10,553,425
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Jessica S. Kachian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
INP-based transistor fabrication
- Patent number 10,541,315
- Issue date Jan 21, 2020
- Purdue Research Foundation
- Peide Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin Field-Effect Transistor device and method of forming the same
- Patent number 10,504,782
- Issue date Dec 10, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shich-Chang Suen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning, passivation and functionalization of Si—Ge sem...
- Patent number 10,483,097
- Issue date Nov 19, 2019
- The Regents of the University of California
- Tobin Kaufman-Osborn
- B08 - CLEANING
Information Patent Grant
Method of ONO stack formation
- Patent number 10,418,373
- Issue date Sep 17, 2019
- LONGITUDE FLASH MEMORY SOLUTIONS LTD.
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 10,388,585
- Issue date Aug 20, 2019
- Mitsubishi Electric Corporation
- Takayuki Hisaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming a semiconductor structure and methods of forming...
- Patent number 10,381,218
- Issue date Aug 13, 2019
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for electromagnetic shielding and thermal management of acti...
- Patent number 10,249,572
- Issue date Apr 2, 2019
- Atotech Deutschland GmbH
- Kenichiroh Mukai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing system and method for forming a clean interface betwe...
- Patent number 10,236,181
- Issue date Mar 19, 2019
- BEST CHAMPION TECHNOLOGY CO., LTD.
- Chiu-Chuan Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite gate dielectric layer applied to group III-V substrate an...
- Patent number 10,192,963
- Issue date Jan 29, 2019
- Institute of Microelectronics, Chinese Academy of Sciences
- Shengkai Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adhesion of polymers on silicon substrates
- Patent number 10,170,301
- Issue date Jan 1, 2019
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEGMENTED FORMATION OF GATE INTERFACE
- Publication number 20240339318
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Steven C. H. HUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INHIBITOR FOR SELECTIVELY DEPOSITING THIN FILM AND METHOD FOR SELEC...
- Publication number 20240243010
- Publication date Jul 18, 2024
- ADEKA CORPORATION
- JIHYUN LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PASSIVATING CLEAVED SEMICONDUCTOR STRUCTURE
- Publication number 20240194477
- Publication date Jun 13, 2024
- Comptek Solutions Oy
- Jaakko Mäkelä
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTOR AND METHOD FOR FABRICATING THE SAME
- Publication number 20230361175
- Publication date Nov 9, 2023
- BEIJING HUA TAN YUAN XIN ELECTRONICS TECHNOLOGY CO., LTD
- Haitao XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAM FORMULATIONS AND CLEANING TO PROMOTE QUICK DEPOSITIONS
- Publication number 20230178370
- Publication date Jun 8, 2023
- International Business Machines Corporation
- Rudy J. Wojtecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING THERMAL OXIDE FILM ON SEMICONDUCTOR SUBSTRATE
- Publication number 20230170208
- Publication date Jun 1, 2023
- Shin-Etsu Handotai Co., Ltd.
- Tsuyoshi OHTSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20220367182
- Publication date Nov 17, 2022
- United Microelectronics Corp.
- Yu Cheng Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...
- Publication number 20210398794
- Publication date Dec 23, 2021
- Kokusai Electric Corporation
- Kazuhiro HARADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Fin Field-Effect Transistor Device and Method of Forming the Same
- Publication number 20210296173
- Publication date Sep 23, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shich-Chang Suen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Techniques for a hybrid design for efficient and economical plasma...
- Publication number 20210217584
- Publication date Jul 15, 2021
- Nano-Master, Inc.
- Birol Kuyel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Manufacturing Semiconductor Device
- Publication number 20210217616
- Publication date Jul 15, 2021
- Kokusai Electric Corporation
- Naofumi OHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Enhancing Selectivity In Sam-Based Selective Deposition
- Publication number 20210217615
- Publication date Jul 15, 2021
- Applied Materials, Inc.
- Chang Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ASSEMBLED MONOLAYERS AS SACRIFICIAL CAPPING LAYERS
- Publication number 20210175118
- Publication date Jun 10, 2021
- TOKYO ELECTRON LIMITED
- Ainhoa Romo Negreira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAP FILL DEPOSITION PROCESS
- Publication number 20210111067
- Publication date Apr 15, 2021
- Applied Materials, Inc.
- Hao JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL METHOD FOR GATE INTERFACE ENGINEERING
- Publication number 20210104401
- Publication date Apr 8, 2021
- Applied Materials, Inc.
- Steven C. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SELECTIVE DEPOSITION FOR FORMING FULLY SELF-ALIGNED VIAS
- Publication number 20210074584
- Publication date Mar 11, 2021
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EMBEDDED SONOS WITH TRIPLE GATE OXIDE AND MANUFACTURING METHOD OF T...
- Publication number 20210074821
- Publication date Mar 11, 2021
- LONGITUDE FLASH MEMORY SOLUTIONS LTD.
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU ATOMIC LAYER DEPOSITION PROCESS
- Publication number 20200373149
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Sang Wook PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED IN-SITU DRY SURFACE PREPARATION AND AREA SELECTIVE FILM...
- Publication number 20200328078
- Publication date Oct 15, 2020
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION OF GeO2
- Publication number 20200266053
- Publication date Aug 20, 2020
- ASM IP HOLDING B.V.
- Raija H. Matero
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLICAL DEPOSITION METHOD INCLUDING TREATMENT STEP AND APPARATUS F...
- Publication number 20200266057
- Publication date Aug 20, 2020
- ASM IP HOLDING B.V.
- SeungHwan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of ONO Stack Formation
- Publication number 20200111805
- Publication date Apr 9, 2020
- LONGITUDE FLASH MEMORY SOLUTIONS LTD.
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fin Field-Effect Transistor Device and Method of Forming the Same
- Publication number 20200105599
- Publication date Apr 2, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shich-Chang Suen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF REDUCING SILICON CONSUMPTION, METHODS OF FORMING A SEMIC...
- Publication number 20190355578
- Publication date Nov 21, 2019
- Micro Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SELECTIVE FILM DEPOSITION FOR FORMING FULLY SELF-ALIGNED...
- Publication number 20190157149
- Publication date May 23, 2019
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of ONO Stack Formation
- Publication number 20190157286
- Publication date May 23, 2019
- CYPRESS SEMICONDUCTOR CORPORATION
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Enhancing Selectivity in SAM-Based Selective Deposition
- Publication number 20190157079
- Publication date May 23, 2019
- Applied Materials, Inc.
- Chang Ke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FIN FIELD-EFFECT TRANSISTOR DEVICE AND METHOD OF FORMING THE SAME
- Publication number 20190103312
- Publication date Apr 4, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shich-Chang Suen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMBEDDED SONOS WITH TRIPLE GATE OXIDE AND MANUFACTURING METHOD OF T...
- Publication number 20190088487
- Publication date Mar 21, 2019
- CYPRESS SEMICONDUCTOR CORPORATION
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING SYSTEM AND METHOD FOR FORMING A CLEAN INTERFACE BETWE...
- Publication number 20190043720
- Publication date Feb 7, 2019
- BEST CHAMPION TECHNOLOGY CO., LTD.
- CHIU-CHUAN LIAO
- H01 - BASIC ELECTRIC ELEMENTS

in-situ cleaning

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Self-assembled monolayers as sacrificial capping layers

Method of manufacturing semiconductor device, method of processing...

Fin Field-Effect Transistor device and method of forming the same

Method of selective deposition for forming fully self-aligned vias

Methods for enhancing selectivity in SAM-based selective deposition

Cyclical deposition method including treatment step and apparatus f...

Gap fill deposition process

Techniques for a hybrid design for efficient and economical plasma...

In-situ temperature measurement for inside of process chamber

Method of manufacturing semiconductor device

Fin field-effect transistor device and method of forming the same

Methods for enhancing selectivity in SAM-based selective deposition

Methods of reducing silicon consumption, methods of forming a semic...

Atomic layer deposition of GeO2

Embedded sonos with triple gate oxide and manufacturing method of t...

Insulating layer structure for semiconductor product, and preparati...

Method of selective film deposition for forming fully self-aligned...

Multiple barrier layer encapsulation stack

Atomic layer deposition of GeO2

Self-limiting and saturating chemical vapor deposition of a silicon...

INP-based transistor fabrication

Fin Field-Effect Transistor device and method of forming the same

Method for cleaning, passivation and functionalization of Si—Ge sem...

Method of ONO stack formation

Semiconductor device and method of manufacturing the same

Methods of forming a semiconductor structure and methods of forming...

Method for electromagnetic shielding and thermal management of acti...

Manufacturing system and method for forming a clean interface betwe...

Composite gate dielectric layer applied to group III-V substrate an...

Adhesion of polymers on silicon substrates

Patents Applicationslast 30 patents

SEGMENTED FORMATION OF GATE INTERFACE

INHIBITOR FOR SELECTIVELY DEPOSITING THIN FILM AND METHOD FOR SELEC...

METHOD OF PASSIVATING CLEAVED SEMICONDUCTOR STRUCTURE

TRANSISTOR AND METHOD FOR FABRICATING THE SAME

SAM FORMULATIONS AND CLEANING TO PROMOTE QUICK DEPOSITIONS

METHOD FOR FORMING THERMAL OXIDE FILM ON SEMICONDUCTOR SUBSTRATE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...

Fin Field-Effect Transistor Device and Method of Forming the Same

Techniques for a hybrid design for efficient and economical plasma...

Method of Manufacturing Semiconductor Device

Methods For Enhancing Selectivity In Sam-Based Selective Deposition

SELF-ASSEMBLED MONOLAYERS AS SACRIFICIAL CAPPING LAYERS

GAP FILL DEPOSITION PROCESS

NOVEL METHOD FOR GATE INTERFACE ENGINEERING

METHOD OF SELECTIVE DEPOSITION FOR FORMING FULLY SELF-ALIGNED VIAS

EMBEDDED SONOS WITH TRIPLE GATE OXIDE AND MANUFACTURING METHOD OF T...

IN-SITU ATOMIC LAYER DEPOSITION PROCESS

INTEGRATED IN-SITU DRY SURFACE PREPARATION AND AREA SELECTIVE FILM...

ATOMIC LAYER DEPOSITION OF GeO2

CYCLICAL DEPOSITION METHOD INCLUDING TREATMENT STEP AND APPARATUS F...

Method of ONO Stack Formation

Fin Field-Effect Transistor Device and Method of Forming the Same

METHODS OF REDUCING SILICON CONSUMPTION, METHODS OF FORMING A SEMIC...

METHOD OF SELECTIVE FILM DEPOSITION FOR FORMING FULLY SELF-ALIGNED...

Method of ONO Stack Formation

Methods for Enhancing Selectivity in SAM-Based Selective Deposition

FIN FIELD-EFFECT TRANSISTOR DEVICE AND METHOD OF FORMING THE SAME

EMBEDDED SONOS WITH TRIPLE GATE OXIDE AND MANUFACTURING METHOD OF T...

MANUFACTURING SYSTEM AND METHOD FOR FORMING A CLEAN INTERFACE BETWE...