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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/2041in the presence of a fluid

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Patents Grantslast 30 patents

Information Patent Grant
Lithography film stack and lithography method
- Patent number 12,204,247
- Issue date Jan 21, 2025
- United Semiconductor (Xiamen) Co., Ltd.
- Ching-Shu Lo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,174,541
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,085,857
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Lithography process monitoring method
- Patent number 12,085,867
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Jie Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Near-field lithography immersion system, immersion unit and interfa...
- Patent number 12,078,937
- Issue date Sep 3, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang Luo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,072,627
- Issue date Aug 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluid handling system and lithographic apparatus
- Patent number 12,072,636
- Issue date Aug 27, 2024
- ASML Netherlands B.V.
- Theodorus Wilhelmus Polet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Carboxylate, quencher, resist composition and method for producing...
- Patent number 12,060,316
- Issue date Aug 13, 2024
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Directly photo-patternable, stretchable, electrically conductive po...
- Patent number 12,019,372
- Issue date Jun 25, 2024
- The Board of Trustees of the Leland Stanford Junior University
- Zhenan Bao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Substrate holder and methods of use
- Patent number 12,009,246
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Chi Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of operating semiconductor apparatus
- Patent number 11,994,805
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,977,330
- Issue date May 7, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takaaki Kaiho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 11,940,731
- Issue date Mar 26, 2024
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treating method
- Patent number 11,927,886
- Issue date Mar 12, 2024
- Semes Co., Ltd.
- Doo Young Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 11,852,972
- Issue date Dec 26, 2023
- Rohm and Haas Electronic Materials LLC
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Topcoat compositions and photolithographic methods
- Patent number 11,846,885
- Issue date Dec 19, 2023
- Rohm and Haas Electronic Materials, LLC
- Cong Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist compositions and methods
- Patent number 11,829,069
- Issue date Nov 28, 2023
- Rohm and Haas Electronic Materials LLC
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method and apparatus to develop lithographically defined high aspec...
- Patent number 11,822,249
- Issue date Nov 21, 2023
- Intel Corporation
- Pooya Tadayon
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Underlayer material for photoresist
- Patent number 11,796,918
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,789,365
- Issue date Oct 17, 2023
- Kioxia Corporation
- Ryu Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography process monitoring method
- Patent number 11,782,352
- Issue date Oct 10, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Jie Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 11,782,342
- Issue date Oct 10, 2023
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 11,747,725
- Issue date Sep 5, 2023
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,693,314
- Issue date Jul 4, 2023
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium compound, chemically amplified resist composition, and pa...
- Patent number 11,687,000
- Issue date Jun 27, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative resist pattern-forming method, and composition for upper l...
- Patent number 11,687,003
- Issue date Jun 27, 2023
- JSR Corporation
- Taiichi Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 11,681,222
- Issue date Jun 20, 2023
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for pitch split patterning using sidewall image transfer
- Patent number 11,676,817
- Issue date Jun 13, 2023
- Tokyo Electron Limited
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming organic film, patterning process, and polymer
- Patent number 11,675,268
- Issue date Jun 13, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist and method of formation and use
- Patent number 11,650,500
- Issue date May 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Keng-Chu Lin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH RESOLUTION PHOTOLITHOGRAPHY
- Publication number 20240411229
- Publication date Dec 12, 2024
- TERA-PRINT LLC
- Andrey IVANKIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR PRODUCING ULTRAPURE WATER FOR SEMICONDUCTOR...
- Publication number 20240383789
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- En Tian Lin
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Application
LITHOGRAPHY PROCESS MONITORING METHOD
- Publication number 20240385545
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Jie Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDER AND METHODS OF USE
- Publication number 20240304488
- Publication date Sep 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Chi TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OPERATING SEMICONDUCTOR APPARATUS
- Publication number 20240280910
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEAR-FIELD LITHOGRAPHY IMMERSION SYSTEM, IMMERSION UNIT AND INTERFA...
- Publication number 20240272558
- Publication date Aug 15, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang LUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION LIQUID SUPPLY SYSTEM AND IMMERSION LIQUID FLOW FIELD REMO...
- Publication number 20240219841
- Publication date Jul 4, 2024
- ZHEJIANG CHEER TECHNOLOGY CO., LTD.
- XIN FU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY FILM STACK AND LITHOGRAPHY METHOD
- Publication number 20240201598
- Publication date Jun 20, 2024
- United Semiconductor (Xiamen) Co., Ltd.
- Ching-Shu Lo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS
- Publication number 20240192607
- Publication date Jun 13, 2024
- ASML NETHERLANDS B.V.
- Theodorus Wilhelmus POLET
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRINTING PLATE EXPOSURE METHOD AND APPARATUS WITH REDUCED THERMAL P...
- Publication number 20240118624
- Publication date Apr 11, 2024
- ESKO-GRAPHICS IMAGING GMBH
- Jörg Wolterink
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING A SEMICONDUCTOR WORKPIECE
- Publication number 20240085795
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Jodi Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSION FLUID RECOVERY SYSTEM AND IMMERSION FLUID RECOVERY METHOD...
- Publication number 20230400774
- Publication date Dec 14, 2023
- ZHEJIANG CHEER TECHNOLOGY CO., LTD.
- XIN FU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20230341772
- Publication date Oct 26, 2023
- JSR Corporation
- Ken MARUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
LIQUID CHEMICAL SUPPLY APPARATUS AND LIQUID CHEMICAL SUPPLY SYSTEM
- Publication number 20230314951
- Publication date Oct 5, 2023
- SEMES CO., LTD.
- Young Jun SON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT METHOD, STORAGE MEDIUM, AND SUBSTRATE TREATMENT...
- Publication number 20230305389
- Publication date Sep 28, 2023
- TOKYO ELECTRON LIMITED
- Takashi YAMAUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR PRODUCING ULTRAPURE WATER FOR SEMICONDUCTOR...
- Publication number 20230295027
- Publication date Sep 21, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- En Tian Lin
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Application
Photoresist and Method of Formation and Use
- Publication number 20230251571
- Publication date Aug 10, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Keng-Chu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20230205091
- Publication date Jun 29, 2023
- SEMES CO., LTD.
- Hyun YOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BUFFER UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME
- Publication number 20230195001
- Publication date Jun 22, 2023
- SEMES CO., LTD.
- Jong Kook Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHAMBER AND METHODS OF COOLING A SUBSTRATE AFTER BAKING
- Publication number 20230161260
- Publication date May 25, 2023
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OPERATING SEMICONDUCTOR APPARATUS
- Publication number 20230152710
- Publication date May 18, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...
- Publication number 20230135117
- Publication date May 4, 2023
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT OF AN OPTICAL SYSTEM
- Publication number 20230023575
- Publication date Jan 26, 2023
- Carl Zeiss SMT GMBH
- Matthias Kestel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHODS FOR VERIFICATION AND RE-USE OF PROCESS FLUIDS
- Publication number 20220317579
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Mangesh Ashok BANGAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDER AND METHODS OF USE
- Publication number 20220310432
- Publication date Sep 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Chi TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Underlayer Material for Photoresist
- Publication number 20220187711
- Publication date Jun 16, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT SYSTEM, SUBSTRATE PROCESSING SYSTEM, AND DEVICE MANUFAC...
- Publication number 20220155062
- Publication date May 19, 2022
- Nikon Corporation
- Go ICHINOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20220137508
- Publication date May 5, 2022
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220137506
- Publication date May 5, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID HANDLING STRUCTURE AND LITHOGRAPHIC APPARATUS
- Publication number 20220137519
- Publication date May 5, 2022
- ASML NETHERLANDS B.V.
- Erik Henricus Egidius Catharina EUMMELEN
- H01 - BASIC ELECTRIC ELEMENTS

in the presence of a fluid

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Lithography film stack and lithography method

Composition for forming silicon-containing resist underlayer film a...

Composition for forming silicon-containing resist underlayer film a...

Lithography process monitoring method

Near-field lithography immersion system, immersion unit and interfa...

Resist composition and patterning process

Fluid handling system and lithographic apparatus

Carboxylate, quencher, resist composition and method for producing...

Directly photo-patternable, stretchable, electrically conductive po...

Substrate holder and methods of use

Method of operating semiconductor apparatus

Resist composition and method of forming resist pattern

Photoresist topcoat compositions and methods of processing photores...

Substrate treating method

Photoresist compositions and pattern formation methods

Topcoat compositions and photolithographic methods

Photoresist compositions and methods

Method and apparatus to develop lithographically defined high aspec...

Underlayer material for photoresist

Substrate processing method and substrate processing apparatus

Lithography process monitoring method

Salt and photoresist composition containing the same

Radiation-sensitive resin composition and method for forming resist...

Resist composition and patterning process

Sulfonium compound, chemically amplified resist composition, and pa...

Negative resist pattern-forming method, and composition for upper l...

Fluorine-containing polymer, purification method, and radiation-sen...

Method for pitch split patterning using sidewall image transfer

Composition for forming organic film, patterning process, and polymer

Photoresist and method of formation and use

Patents Applicationslast 30 patents

HIGH RESOLUTION PHOTOLITHOGRAPHY

SYSTEMS AND METHODS FOR PRODUCING ULTRAPURE WATER FOR SEMICONDUCTOR...

LITHOGRAPHY PROCESS MONITORING METHOD

SUBSTRATE HOLDER AND METHODS OF USE

METHOD OF OPERATING SEMICONDUCTOR APPARATUS

NEAR-FIELD LITHOGRAPHY IMMERSION SYSTEM, IMMERSION UNIT AND INTERFA...

IMMERSION LIQUID SUPPLY SYSTEM AND IMMERSION LIQUID FLOW FIELD REMO...

LITHOGRAPHY FILM STACK AND LITHOGRAPHY METHOD

FLUID HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS

PRINTING PLATE EXPOSURE METHOD AND APPARATUS WITH REDUCED THERMAL P...

PATTERNING A SEMICONDUCTOR WORKPIECE

IMMERSION FLUID RECOVERY SYSTEM AND IMMERSION FLUID RECOVERY METHOD...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...

LIQUID CHEMICAL SUPPLY APPARATUS AND LIQUID CHEMICAL SUPPLY SYSTEM

SUBSTRATE TREATMENT METHOD, STORAGE MEDIUM, AND SUBSTRATE TREATMENT...

SYSTEMS AND METHODS FOR PRODUCING ULTRAPURE WATER FOR SEMICONDUCTOR...

Photoresist and Method of Formation and Use

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

BUFFER UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

CHAMBER AND METHODS OF COOLING A SUBSTRATE AFTER BAKING

METHOD OF OPERATING SEMICONDUCTOR APPARATUS

SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...

COMPONENT OF AN OPTICAL SYSTEM

APPARATUS AND METHODS FOR VERIFICATION AND RE-USE OF PROCESS FLUIDS

SUBSTRATE HOLDER AND METHODS OF USE

Underlayer Material for Photoresist

MEASUREMENT SYSTEM, SUBSTRATE PROCESSING SYSTEM, AND DEVICE MANUFAC...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

FLUID HANDLING STRUCTURE AND LITHOGRAPHIC APPARATUS