in the presence of a plasma [PECVD]

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H01L21/02274

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/02274in the presence of a plasma [PECVD]

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Mask encapsulation to prevent degradation during fabrication of hig...
- Patent number 12,266,535
- Issue date Apr 1, 2025
- Lam Researh Corporation
- Kapu Sirish Reddy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for adjusting the gap between a wafer and a top p...
- Patent number 12,266,579
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chan Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,266,522
- Issue date Apr 1, 2025
- Kokusai Electric Corporation
- Kazuyuki Okuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,266,541
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sung-En Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gapfill of variable aspect ratio features with a composite PEALD an...
- Patent number 12,261,038
- Issue date Mar 25, 2025
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,025
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunability of dopant concentration in thin hafnium oxide films
- Patent number 12,261,037
- Issue date Mar 25, 2025
- Applied Materials, Inc.
- Golnaz Karbasian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of linearized film oxidation growth
- Patent number 12,261,039
- Issue date Mar 25, 2025
- Applied Materials, Inc.
- Christopher S. Olsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer line structure
- Patent number 12,255,145
- Issue date Mar 18, 2025
- Dai Nippon Printing Co., Ltd.
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Topology selective and sacrificial silicon nitride layer for genera...
- Patent number 12,255,240
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yang Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure
- Patent number 12,249,607
- Issue date Mar 11, 2025
- United Microelectronics Corp.
- Sheng Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing a substrate
- Patent number 12,243,742
- Issue date Mar 4, 2025
- ASM IP Holding B.V.
- SeungHyun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for wafer bonding
- Patent number 12,234,145
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Wei Chang
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Organoaminosilane precursors and methods for depositing films compr...
- Patent number 12,230,496
- Issue date Feb 18, 2025
- VERSUM MATERIALS US, LLC
- Mark Leonard O'Neill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate supporting apparatus, substrate processing apparatus incl...
- Patent number 12,230,531
- Issue date Feb 18, 2025
- ASM IP Holding B.V.
- Seung Woo Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming a topographically selective silicon oxide film...
- Patent number 12,230,497
- Issue date Feb 18, 2025
- ASM IP Holding B.V.
- Aurélie Kuroda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air gap spacer formation for nano-scale semiconductor devices
- Patent number 12,224,203
- Issue date Feb 11, 2025
- Adeia Semiconductor Solutions LLC
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices with backside air gap dielectric
- Patent number 12,224,212
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Yuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching features using a targeted deposition for selecti...
- Patent number 12,217,955
- Issue date Feb 4, 2025
- Lam Research Corporation
- Wenchi Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flowable chemical vapor deposition of metal oxides
- Patent number 12,211,736
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Hurshvardhan Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor deposition precursor compounds and process of use
- Patent number 12,209,105
- Issue date Jan 28, 2025
- Entegris, Inc.
- Philip S. H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing chamber deposition confinement
- Patent number 12,211,673
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultra-high modulus and etch selectivity boron-carbon hardmask films
- Patent number 12,211,694
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Prashant Kumar Kulshreshtha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electronic devices comprising a compressive dielectric material, an...
- Patent number 12,205,900
- Issue date Jan 21, 2025
- Micron Technology, Inc.
- Jivaan Kishore Jhothiraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing film and film deposition system
- Patent number 12,205,817
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radio frequency power generator having multiple output ports
- Patent number 12,205,796
- Issue date Jan 21, 2025
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and a manufacturing method thereof
- Patent number 12,199,014
- Issue date Jan 14, 2025
- Samsung Electronics Co., Ltd.
- Kyeong Bin Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of processing substrate, met...
- Patent number 12,195,854
- Issue date Jan 14, 2025
- Kokusai Electric Corporation
- Teruo Yoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing semiconductor device
- Patent number 12,199,186
- Issue date Jan 14, 2025
- Semiconductor Energy Laboratory Co., Ltd.
- Kenichi Okazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carbon gap fill processes
- Patent number 12,198,928
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Abhijeet S. Bagal
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
THIN FILM GROWTH MODULATION USING WAFER BOW
- Publication number 20250112040
- Publication date Apr 3, 2025
- LAM RESEARCH CORPORATION
- Xin Meng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH REDUCED DIELECT...
- Publication number 20250112038
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Shanshan Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAM-FREE SINGLE OPERATION AMORPHOUS SILICON GAP FILL
- Publication number 20250112039
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- John Bae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
- Publication number 20250095999
- Publication date Mar 20, 2025
- Kabushiki Kaisha Toshiba
- Takeyuki SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20250095985
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Tomohiro NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND METHOD THEREOF
- Publication number 20250087480
- Publication date Mar 13, 2025
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Haifeng QIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250087454
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250087455
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING SILICON NITRIDE FILMS
- Publication number 20250087477
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Joseph AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250084530
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Yohei MATSUYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250084535
- Publication date Mar 13, 2025
- Kokusai Electric Corporation
- Kazuyuki OKUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INCREASING DEPOSITION RATES OF OXIDE FILMS
- Publication number 20250087481
- Publication date Mar 13, 2025
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20250087482
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Yi CHOU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE FABRICATION METHOD USING A DEPOSITION APPARATU...
- Publication number 20250087525
- Publication date Mar 13, 2025
- WESTERN DIGITAL TECHNOLOGIES, INC.,
- Makoto TSUTSUE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FILLING GAP
- Publication number 20250087529
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Hsien CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRESS AND WARPAGE MODULATING STRUCTURE FOR MULTI-STACKED WAFER AND...
- Publication number 20250079336
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sung-Hsin YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND STRUCTURES FOR HIGH STRENGTH ASYMMETRIC DIELECTRIC IN H...
- Publication number 20250079357
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Tyler Sherwood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND MATERIAL SYSTEM FOR HIGH STRENGTH SELECTIVE DIELECTRIC I...
- Publication number 20250079356
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Tyler Sherwood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME
- Publication number 20250081492
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuei-Lin CHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM OF DETERMINING LEAKAGE OF SEMICONDUCTOR MANUFACTURING TOOL A...
- Publication number 20250079200
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- MING-YING PEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF IMPROVING METAL OXIDE DEPOSITION WITH NITROGEN OXIDE AND...
- Publication number 20250079157
- Publication date Mar 6, 2025
- Entegris, Inc.
- Rong Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL
- Publication number 20250066913
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Supriya Ghosh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE-CHAMBER REACTOR FOR SELECTIVE DEPOSITION OF SILICON NITRID...
- Publication number 20250066921
- Publication date Feb 27, 2025
- ASM IP HOLDING B.V.
- Ranjit Rohidas Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH REDUCED DIELECT...
- Publication number 20250062117
- Publication date Feb 20, 2025
- Applied Materials, Inc.
- Shanshan Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING IN SEMICONDUCTOR PROCESSING
- Publication number 20250062131
- Publication date Feb 20, 2025
- Applied Materials, Inc.
- Hanbyul Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Implant Hard Mask for Substrates
- Publication number 20250062122
- Publication date Feb 20, 2025
- Applied Materials, Inc.
- Jun FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO SMOOTH SIDEWALL ROUGHNESS AND MAINTAIN REENTRANT STRUCTUR...
- Publication number 20250054752
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Dustin Zachary Austin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS
- Publication number 20250054748
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Guangyan Zhong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF PULSING ASSISTED LOW-K FILM DEPOSITION WITH HIGH MECHANICAL STRE...
- Publication number 20250054749
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Kent Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20250054750
- Publication date Feb 13, 2025
- NANYA TECHNOLOGY CORPORATION
- Kai Hung LIN
- H01 - BASIC ELECTRIC ELEMENTS

in the presence of a plasma [PECVD]

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mask encapsulation to prevent degradation during fabrication of hig...

Method and system for adjusting the gap between a wafer and a top p...

Substrate processing apparatus, method of manufacturing semiconduct...

Semiconductor device and method

Gapfill of variable aspect ratio features with a composite PEALD an...

Plasma processing apparatus

Tunability of dopant concentration in thin hafnium oxide films

Method of linearized film oxidation growth

Multi-layer line structure

Topology selective and sacrificial silicon nitride layer for genera...

Semiconductor structure

Method for processing a substrate

Methods for wafer bonding

Organoaminosilane precursors and methods for depositing films compr...

Substrate supporting apparatus, substrate processing apparatus incl...

Methods for forming a topographically selective silicon oxide film...

Air gap spacer formation for nano-scale semiconductor devices

Semiconductor devices with backside air gap dielectric

Method for etching features using a targeted deposition for selecti...

Flowable chemical vapor deposition of metal oxides

Vapor deposition precursor compounds and process of use

Processing chamber deposition confinement

Ultra-high modulus and etch selectivity boron-carbon hardmask films

Electronic devices comprising a compressive dielectric material, an...

Method for depositing film and film deposition system

Radio frequency power generator having multiple output ports

Semiconductor device and a manufacturing method thereof

Substrate processing apparatus, method of processing substrate, met...

Semiconductor device and method for manufacturing semiconductor device

Carbon gap fill processes

Patents Applicationslast 30 patents

THIN FILM GROWTH MODULATION USING WAFER BOW

METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH REDUCED DIELECT...

SEAM-FREE SINGLE OPERATION AMORPHOUS SILICON GAP FILL

MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE

FILM FORMING METHOD AND FILM FORMING APPARATUS

PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND METHOD THEREOF

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

METHODS OF FORMING SILICON NITRIDE FILMS

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

INCREASING DEPOSITION RATES OF OXIDE FILMS

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR DEVICE FABRICATION METHOD USING A DEPOSITION APPARATU...

METHOD FOR FILLING GAP

STRESS AND WARPAGE MODULATING STRUCTURE FOR MULTI-STACKED WAFER AND...

METHODS AND STRUCTURES FOR HIGH STRENGTH ASYMMETRIC DIELECTRIC IN H...

METHOD AND MATERIAL SYSTEM FOR HIGH STRENGTH SELECTIVE DIELECTRIC I...

SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME

SYSTEM OF DETERMINING LEAKAGE OF SEMICONDUCTOR MANUFACTURING TOOL A...

METHODS OF IMPROVING METAL OXIDE DEPOSITION WITH NITROGEN OXIDE AND...

SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL

MULTIPLE-CHAMBER REACTOR FOR SELECTIVE DEPOSITION OF SILICON NITRID...

METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH REDUCED DIELECT...

PLASMA ETCHING IN SEMICONDUCTOR PROCESSING

Implant Hard Mask for Substrates

METHOD TO SMOOTH SIDEWALL ROUGHNESS AND MAINTAIN REENTRANT STRUCTUR...

ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS

RF PULSING ASSISTED LOW-K FILM DEPOSITION WITH HIGH MECHANICAL STRE...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME