Information management, control, testing, and wafer monitoring

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G03F7/70483

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70483Information management, control, testing, and wafer monitoring

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Inspection tool for an extreme ultraviolet radiation source to obse...
- Patent number 12,066,761
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chiao-Hua Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a lithographic apparatus and associated appa...
- Patent number 12,050,406
- Issue date Jul 30, 2024
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV wafer defect improvement and method of collecting nonconductive...
- Patent number 12,032,303
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tao-Hsin Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gas monitoring system
- Patent number 11,988,966
- Issue date May 21, 2024
- Cymer, LLC
- Andrei Dorobantu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices
- Patent number 11,923,317
- Issue date Mar 5, 2024
- Samsung Electronics Co., Ltd.
- Changjoon Yoon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System of measuring image of pattern in scanning type EUV mask
- Patent number 11,914,282
- Issue date Feb 27, 2024
- Samsung Electronics Co., Ltd.
- Donggun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus lithographic apparatus measurement method
- Patent number 11,914,307
- Issue date Feb 27, 2024
- ASML Netherlands B.V.
- Bas Johannes Petrus Roset
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a lithographic apparatus
- Patent number 11,809,088
- Issue date Nov 7, 2023
- ASML Netherlands B.V.
- Hadi Yagubizade
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compensation of creep effects in an imaging device
- Patent number 11,703,770
- Issue date Jul 18, 2023
- Carl Zeiss SMT GmbH
- Eylem Bektas Knauf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process-induced displacement characterization during semiconductor...
- Patent number 11,682,570
- Issue date Jun 20, 2023
- KLA Corporation
- Pradeep Vukkadala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single current source with local fine tuning for multi beam laser i...
- Patent number 11,567,412
- Issue date Jan 31, 2023
- Xerox Corporation
- Franciscus Gerardus Johannes Claassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a lithographic apparatus and associated appa...
- Patent number 11,487,209
- Issue date Nov 1, 2022
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Online navigational drift correction for metrology measurements
- Patent number 11,481,922
- Issue date Oct 25, 2022
- KLA Corporation
- Stefan Eyring
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Planarized layer forming apparatus, and method of manufacturing art...
- Patent number 11,442,360
- Issue date Sep 13, 2022
- Canon Kabushiki Kaisha
- Hiro Norikane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography method and apparatus
- Patent number 11,429,027
- Issue date Aug 30, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system and method for measuring diagonal diffraction-base...
- Patent number 11,353,321
- Issue date Jun 7, 2022
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Grant
Resist removing method and resist removing apparatus
- Patent number 11,342,162
- Issue date May 24, 2022
- SCREEN Holdings Co., Ltd.
- Kota Sotoku
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure device
- Patent number 11,281,108
- Issue date Mar 22, 2022
- SCREEN Holdings Co., Ltd.
- You Arisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV light source and apparatus for lithography
- Patent number 11,226,564
- Issue date Jan 18, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jhan-Hong Yeh
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Imprint device and method for manufacturing article
- Patent number 11,209,731
- Issue date Dec 28, 2021
- Canon Kabushiki Kaisha
- Hirotoshi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Molding apparatus for molding composition on substrate with mold, a...
- Patent number 11,194,249
- Issue date Dec 7, 2021
- Canon Kabushiki Kaisha
- Atsushi Kimura
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Process-induced displacement characterization during semiconductor...
- Patent number 11,164,768
- Issue date Nov 2, 2021
- KLA Corporation
- Pradeep Vukkadala
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and device for determining the heating state of a mirror in...
- Patent number 11,156,922
- Issue date Oct 26, 2021
- Carl Zeiss SMT GmbH
- Willem Michiel De Rapper
- G02 - OPTICS
Information Patent Grant
Positioning system for a lithographic apparatus
- Patent number 11,156,925
- Issue date Oct 26, 2021
- ASML Netherlands B.V.
- Maarten Hartger Kimman
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Method and apparatus for collecting information used in image-error...
- Patent number 11,150,561
- Issue date Oct 19, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Wen Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
EUV wafer defect improvement and method of collecting nonconductive...
- Patent number 11,150,564
- Issue date Oct 19, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tao-Hsin Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,139,189
- Issue date Oct 5, 2021
- Tokyo Electron Limited
- Kenichirou Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure system and lithography system
- Patent number 11,106,145
- Issue date Aug 31, 2021
- Nikon Corporation
- Kenichiro Murata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing devices
- Patent number 11,087,065
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Sunit Sondhi Mahajan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure method, exposure apparatus, and device manufacturing method
- Patent number 11,067,894
- Issue date Jul 20, 2021
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
NOVEL DESIGN OF AN INSPECTION TOOL FOR AN EXTREME ULTRAVIOLET RADIA...
- Publication number 20240361701
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chiao-Hua CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV WAFER DEFECT IMPROVEMENT AND METHOD OF COLLECTING NONCONDUCTIVE...
- Publication number 20230375951
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tao-Hsin CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MONITORING AN EXTREME ULTRAVIOLET RADIATIO...
- Publication number 20230345610
- Publication date Oct 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Kuang SUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cooling system in exposure machine and the operation method thereof
- Publication number 20230266679
- Publication date Aug 24, 2023
- United Semiconductor (Xiamen) Co., Ltd.
- YiBin Zhou
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
IN-SITU LITHOGRAPHY PATTERN ENHANCEMENT WITH LOCALIZED STRESS TREAT...
- Publication number 20230251584
- Publication date Aug 10, 2023
- TOKYO ELECTRON LIMITED
- Daniel J. FULFORD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO ENHANCE LITHOGRAPHY PATTERN CREATION USING SEMICONDUCTOR...
- Publication number 20230251574
- Publication date Aug 10, 2023
- TOKYO ELECTRON LIMITED
- Anthony R. SCHEPIS
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING ONE OR MORE DIMENSIONS OF ONE OR...
- Publication number 20230205095
- Publication date Jun 29, 2023
- TERANOVA B.V.
- Mohammad RAMEZANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM OF MEASURING IMAGE OF PATTERN IN SCANNING TYPE EUV MASK
- Publication number 20230131024
- Publication date Apr 27, 2023
- Samsung Electronics Co., Ltd.
- Donggun LEE
- G01 - MEASURING TESTING
Information Patent Application
TEMPERATURE CONTROL APPARATUS AND TEMPERATURE CONTROL METHOD
- Publication number 20230061927
- Publication date Mar 2, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Enhao CHEN
- G05 - CONTROLLING REGULATING
Information Patent Application
NOVEL DESIGN OF AN INSPECTION TOOL FOR AN EXTREME ULTRAVIOLET RADIA...
- Publication number 20230067967
- Publication date Mar 2, 2023
- Chiao-Hua CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CONTROLLING A LITHOGRAPHIC APPARATUS AND ASSOCIATED APPA...
- Publication number 20230021079
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Frank STAALS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SINGLE CURRENT SOURCE WITH LOCAL FINE TUNING FOR MULTI BEAM LASER I...
- Publication number 20220397831
- Publication date Dec 15, 2022
- Xerox Corporation
- Franciscus Gerardus Johannes Claassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND APPARATUS
- Publication number 20220365438
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CONTROLLING A LITHOGRAPHIC APPARATUS
- Publication number 20220334500
- Publication date Oct 20, 2022
- ASML NETHERLANDS B.V.
- Hadi YAGUBIZADE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION APPARATUS LITHOGRAPHIC APPARATUS MEASUREMENT METHOD
- Publication number 20220187719
- Publication date Jun 16, 2022
- ASML NETHERLANDS B.V.
- Bas Johannes Petrus ROSET
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV WAFER DEFECT IMPROVEMENT AND METHOD OF COLLECTING NONCONDUCTIVE...
- Publication number 20220100105
- Publication date Mar 31, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tao-Hsin CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICES
- Publication number 20220077073
- Publication date Mar 10, 2022
- Samsung Electronics Co., Ltd.
- Changjoon YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process-Induced Displacement Characterization During Semiconductor...
- Publication number 20220005714
- Publication date Jan 6, 2022
- KLA Corporation
- Pradeep Vukkadala
- G05 - CONTROLLING REGULATING
Information Patent Application
COMPENSATION OF CREEP EFFECTS IN AN IMAGING DEVICE
- Publication number 20210405358
- Publication date Dec 30, 2021
- Carl Zeiss SMT GMBH
- Eylem Bektas Knauf
- G02 - OPTICS
Information Patent Application
COMPENSATION OF CREEP EFFECTS IN AN IMAGING DEVICE
- Publication number 20210405359
- Publication date Dec 30, 2021
- Carl Zeiss SMT GMBH
- Eylem Bektas Knauf
- G02 - OPTICS
Information Patent Application
ONLINE NAVIGATIONAL DRIFT CORRECTION FOR METROLOGY MEASUREMENTS
- Publication number 20210312656
- Publication date Oct 7, 2021
- KLA Corporation
- Stefan Eyring
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS AND METHOD FOR MEASURING PHASE OF EXTREME ULTRAVIOLET (EU...
- Publication number 20210293701
- Publication date Sep 23, 2021
- Samsung Electronics Co., Ltd.
- Jongju Park
- G01 - MEASURING TESTING
Information Patent Application
GAS MONITORING SYSTEM
- Publication number 20210226407
- Publication date Jul 22, 2021
- CYMER, LLC
- Andrei Dorobantu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE DEVICE
- Publication number 20210088911
- Publication date Mar 25, 2021
- SCREEN Holdings Co., Ltd.
- You Arisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR DETERMINING THE HEATING STATE OF A MIRROR IN...
- Publication number 20210041790
- Publication date Feb 11, 2021
- Carl Zeiss SMT GMBH
- Willem Michiel De Rapper
- G02 - OPTICS
Information Patent Application
Positioning System for a Lithographic Apparatus
- Publication number 20210041793
- Publication date Feb 11, 2021
- ASML NETHERLANDS B.V.
- Maarten Hartger KIMMAN
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
METHOD FOR CONTROLLING A LITHOGRAPHIC APPARATUS AND ASSOCIATED APPA...
- Publication number 20200348603
- Publication date Nov 5, 2020
- ASML NETHERLANDS B.V.
- Frank STAALS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST REMOVING METHOD AND RESIST REMOVING APPARATUS
- Publication number 20200272057
- Publication date Aug 27, 2020
- SCREEN Holdings Co., Ltd.
- Kota SOTOKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A DEVICE MANUFACTURING METHOD AND A COMPUTER PROGRAM PRODUCT
- Publication number 20200159128
- Publication date May 21, 2020
- ASML NETHERLANDS B.V.
- Victor Emanuel CALADO
- G01 - MEASURING TESTING
Information Patent Application
SUPERSTRATE AND A METHOD OF USING THE SAME
- Publication number 20200142300
- Publication date May 7, 2020
- Canon Kabushiki Kaisha
- Dwayne L. LaBrake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Information management, control, testing, and wafer monitoring

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Inspection tool for an extreme ultraviolet radiation source to obse...

Method for controlling a lithographic apparatus and associated appa...

EUV wafer defect improvement and method of collecting nonconductive...

Gas monitoring system

Semiconductor devices

System of measuring image of pattern in scanning type EUV mask

Inspection apparatus lithographic apparatus measurement method

Method for controlling a lithographic apparatus

Compensation of creep effects in an imaging device

Process-induced displacement characterization during semiconductor...

Single current source with local fine tuning for multi beam laser i...

Method for controlling a lithographic apparatus and associated appa...

Online navigational drift correction for metrology measurements

Planarized layer forming apparatus, and method of manufacturing art...

Photolithography method and apparatus

Metrology system and method for measuring diagonal diffraction-base...

Resist removing method and resist removing apparatus

Exposure device

EUV light source and apparatus for lithography

Imprint device and method for manufacturing article

Molding apparatus for molding composition on substrate with mold, a...

Process-induced displacement characterization during semiconductor...

Method and device for determining the heating state of a mirror in...

Positioning system for a lithographic apparatus

Method and apparatus for collecting information used in image-error...

EUV wafer defect improvement and method of collecting nonconductive...

Substrate processing apparatus and substrate processing method

Exposure system and lithography system

Method of manufacturing devices

Exposure method, exposure apparatus, and device manufacturing method

Patents Applicationslast 30 patents

NOVEL DESIGN OF AN INSPECTION TOOL FOR AN EXTREME ULTRAVIOLET RADIA...

EUV WAFER DEFECT IMPROVEMENT AND METHOD OF COLLECTING NONCONDUCTIVE...

METHOD AND APPARATUS FOR MONITORING AN EXTREME ULTRAVIOLET RADIATIO...

Cooling system in exposure machine and the operation method thereof

IN-SITU LITHOGRAPHY PATTERN ENHANCEMENT WITH LOCALIZED STRESS TREAT...

METHOD TO ENHANCE LITHOGRAPHY PATTERN CREATION USING SEMICONDUCTOR...

METHOD AND SYSTEM FOR DETERMINING ONE OR MORE DIMENSIONS OF ONE OR...

SYSTEM OF MEASURING IMAGE OF PATTERN IN SCANNING TYPE EUV MASK

TEMPERATURE CONTROL APPARATUS AND TEMPERATURE CONTROL METHOD

NOVEL DESIGN OF AN INSPECTION TOOL FOR AN EXTREME ULTRAVIOLET RADIA...

METHOD FOR CONTROLLING A LITHOGRAPHIC APPARATUS AND ASSOCIATED APPA...

SINGLE CURRENT SOURCE WITH LOCAL FINE TUNING FOR MULTI BEAM LASER I...

PHOTOLITHOGRAPHY METHOD AND APPARATUS

METHOD FOR CONTROLLING A LITHOGRAPHIC APPARATUS

INSPECTION APPARATUS LITHOGRAPHIC APPARATUS MEASUREMENT METHOD

EUV WAFER DEFECT IMPROVEMENT AND METHOD OF COLLECTING NONCONDUCTIVE...

SEMICONDUCTOR DEVICES

Process-Induced Displacement Characterization During Semiconductor...

COMPENSATION OF CREEP EFFECTS IN AN IMAGING DEVICE

COMPENSATION OF CREEP EFFECTS IN AN IMAGING DEVICE

ONLINE NAVIGATIONAL DRIFT CORRECTION FOR METROLOGY MEASUREMENTS

APPARATUS AND METHOD FOR MEASURING PHASE OF EXTREME ULTRAVIOLET (EU...

GAS MONITORING SYSTEM

EXPOSURE DEVICE

METHOD AND DEVICE FOR DETERMINING THE HEATING STATE OF A MIRROR IN...

Positioning System for a Lithographic Apparatus

METHOD FOR CONTROLLING A LITHOGRAPHIC APPARATUS AND ASSOCIATED APPA...

RESIST REMOVING METHOD AND RESIST REMOVING APPARATUS

A DEVICE MANUFACTURING METHOD AND A COMPUTER PROGRAM PRODUCT

SUPERSTRATE AND A METHOD OF USING THE SAME