into a nitride layer

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CPC
H01L21/02326

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02326into a nitride layer

Industries

Patents Grantslast 30 patents

Information Patent Grant
Mechanism for finFET well doping
- Patent number 12,112,975
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structures in transistor devices and methods of forming same
- Patent number 12,087,775
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ting-Gang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,087,598
- Issue date Sep 10, 2024
- Kokusai Electric Corporation
- Hideto Tateno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compositions and methods using same for deposition of silicon-conta...
- Patent number 12,049,695
- Issue date Jul 30, 2024
- VERSUM MATERIALS US, LLC
- Raymond Nicholas Vrtis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of dielectric material fill and treatment
- Patent number 12,046,508
- Issue date Jul 23, 2024
- Applied Materials, Inc.
- Shi You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for deposition of low-k films
- Patent number 11,990,332
- Issue date May 21, 2024
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,955,333
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Jethro Tannos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Steam oxidation initiation for high aspect ratio conformal radical...
- Patent number 11,948,791
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Christopher S. Olsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modifying ferroelectric properties of hafnium oxide with hafnium ni...
- Patent number 11,923,404
- Issue date Mar 5, 2024
- Lam Research Corporation
- Hyungsuk Alexander Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor memory device and method for manufacturing the same
- Patent number 11,917,827
- Issue date Feb 27, 2024
- Kioxia Corporation
- Naoki Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transistor isolation structures
- Patent number 11,908,921
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 11,901,437
- Issue date Feb 13, 2024
- Marlin Semiconductor Limited
- Te-Chang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 11,876,126
- Issue date Jan 16, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method and non...
- Patent number 11,869,764
- Issue date Jan 9, 2024
- Kokusai Electric Corporation
- Akinori Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device, manufacturing method thereof, display device,...
- Patent number 11,842,901
- Issue date Dec 12, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Masami Jintyou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, method of processing...
- Patent number 11,823,886
- Issue date Nov 21, 2023
- Kokusai Electric Corporation
- Kazuhiro Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming insulating film, apparatus for processing substr...
- Patent number 11,823,897
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Makoto Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing substrate, method of manufacturing semiconduct...
- Patent number 11,817,314
- Issue date Nov 14, 2023
- Kokusai Electric Corporation
- Katsuyoshi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for manufacturing isolation layers in stacked transistor st...
- Patent number 11,798,985
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Mrunal Abhijith Khaderbad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 11,757,028
- Issue date Sep 12, 2023
- Kabushiki Kaisha Toshiba
- Yosuke Kajiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and methods using same for carbon doped silicon contain...
- Patent number 11,742,200
- Issue date Aug 29, 2023
- VERSUM MATERIALS US, LLC
- Haripin Chandra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mechanism for FinFET well doping
- Patent number 11,742,237
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Company
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming substrate surfaces with exposed cr...
- Patent number 11,735,432
- Issue date Aug 22, 2023
- Exogenesis Corporation
- Sean R. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of dielectric material fill and treatment
- Patent number 11,615,984
- Issue date Mar 28, 2023
- Applied Materials, Inc.
- Shi You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon rich nitride layer between a plurality of semiconductor layers
- Patent number 11,515,411
- Issue date Nov 29, 2022
- Kabushiki Kaisha Toshiba
- Yosuke Kajiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,476,112
- Issue date Oct 18, 2022
- Kokusai Electric Corporation
- Akinori Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,417,514
- Issue date Aug 16, 2022
- Tokyo Electron Limited
- Yuichiro Wagatsuma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicous film forming composition comprising block copolymer and me...
- Patent number 11,401,384
- Issue date Aug 2, 2022
- Merck Patent GmbH
- Takashi Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, manufacturing method thereof, display device,...
- Patent number 11,404,285
- Issue date Aug 2, 2022
- Semiconductor Energy Laboratory Co., Ltd.
- Masami Jintyou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for manufacturing a transistor gate by non-directional impl...
- Patent number 11,398,384
- Issue date Jul 26, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Jiun Peng
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICES
- Publication number 20240379364
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Jiun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DIELECTRIC MATERIAL FILL AND TREATMENT
- Publication number 20240379420
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Shi YOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20240379349
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Steven C. H. HUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GATE STRUCTURES IN TRANSISTOR DEVICES AND METHODS OF FORMING SAME
- Publication number 20240371875
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ting-Gang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAIN...
- Publication number 20240304438
- Publication date Sep 12, 2024
- VERSUM MATERIALS US, LLC
- Haripin Chandra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRI...
- Publication number 20240249934
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Naomi Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240213356
- Publication date Jun 27, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION OF SILICON DIELECTRIC FILM
- Publication number 20240170283
- Publication date May 23, 2024
- VERSUM MATERIALS US, LLC
- HARIPIN CHANDRA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20240154026
- Publication date May 9, 2024
- Marlin Semiconductor Limited
- Te-Chang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITO...
- Publication number 20240096615
- Publication date Mar 21, 2024
- Kokusai Electric Corporation
- Akinori TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240063014
- Publication date Feb 22, 2024
- ASM IP HOLDING B.V.
- SangHeon Yong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240038530
- Publication date Feb 1, 2024
- Kokusai Electric Corporation
- Katsuyoshi HARADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF REMOVING A BY-PRODUCT FROM A COMPONENT OF A SEMICONDUCTOR...
- Publication number 20240014029
- Publication date Jan 11, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- REN-GUAN DUAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ISOLATION LAYERS FOR STACKED TRANSISTOR STRUCTURES
- Publication number 20230378257
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufactoring Co., Ltd.
- Mrunal Abhijith KHADERBAD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAIN...
- Publication number 20230377874
- Publication date Nov 23, 2023
- VERSUM MATERIALS US, LLC
- Haripin Chandra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mechanism for FinFET Well Doping
- Publication number 20230343634
- Publication date Oct 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DIELECTRIC MATERIAL FILL AND TREATMENT
- Publication number 20230187276
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- Shi YOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR MEMORY DEV...
- Publication number 20230187203
- Publication date Jun 15, 2023
- KIOXIA Corporation
- Tsunehiro Ino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON...
- Publication number 20230077197
- Publication date Mar 9, 2023
- Kokusai Electric Corporation
- Akinori TANAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GATE STRUCTURES IN TRANSISTOR DEVICES AND METHODS OF FORMING SAME
- Publication number 20230008494
- Publication date Jan 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ting-Gang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20220351975
- Publication date Nov 3, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Jiun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF, DISPLAY DEVICE,...
- Publication number 20220319866
- Publication date Oct 6, 2022
- Semiconductor Energy Laboratory Co., Ltd.
- Masami JINTYOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20220301851
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- Takafumi NITTA
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METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220301867
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- Applied Materials, Inc.
- Jethro TANNOS
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SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20220278225
- Publication date Sep 1, 2022
- Marlin Semiconductor Limited
- Te-Chang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING INSULATING FILM, APPARATUS FOR PROCESSING SUBSTR...
- Publication number 20220208547
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- TOKYO ELECTRON LIMITED
- Makoto Muramatsu
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Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20220149054
- Publication date May 12, 2022
- KIOXIA Corporation
- Naoki YASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20220115529
- Publication date Apr 14, 2022
- KABUSHIKI KAISHA TOSHIBA
- Yosuke KAJIWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER TREATMENT PROCESS USING METASTABLE ACTIVATED RADICAL S...
- Publication number 20220093365
- Publication date Mar 24, 2022
- LAM RESEARCH CORPORATION
- Xinyu BAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STEAM OXIDATION INITIATION FOR HIGH ASPECT RATIO CONFORMAL RADICAL...
- Publication number 20220051890
- Publication date Feb 17, 2022
- Applied Materials, Inc.
- Christopher S. OLSEN
- H01 - BASIC ELECTRIC ELEMENTS

into a nitride layer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mechanism for finFET well doping

Gate structures in transistor devices and methods of forming same

Substrate processing apparatus

Compositions and methods using same for deposition of silicon-conta...

Method of dielectric material fill and treatment

Methods and apparatus for deposition of low-k films

Methods and apparatus for processing a substrate

Steam oxidation initiation for high aspect ratio conformal radical...

Modifying ferroelectric properties of hafnium oxide with hafnium ni...

Semiconductor memory device and method for manufacturing the same

Transistor isolation structures

Semiconductor device and method for fabricating the same

Method for manufacturing semiconductor device

Substrate processing apparatus, substrate processing method and non...

Semiconductor device, manufacturing method thereof, display device,...

Method of manufacturing semiconductor device, method of processing...

Method for forming insulating film, apparatus for processing substr...

Method of processing substrate, method of manufacturing semiconduct...

Methods for manufacturing isolation layers in stacked transistor st...

Semiconductor device and method for manufacturing the same

Composition and methods using same for carbon doped silicon contain...

Mechanism for FinFET well doping

Method and apparatus for forming substrate surfaces with exposed cr...

Method of dielectric material fill and treatment

Silicon rich nitride layer between a plurality of semiconductor layers

Substrate processing apparatus

Film forming method and film forming apparatus

Silicous film forming composition comprising block copolymer and me...

Semiconductor device, manufacturing method thereof, display device,...

Methods for manufacturing a transistor gate by non-directional impl...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICES

METHOD OF DIELECTRIC MATERIAL FILL AND TREATMENT

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

GATE STRUCTURES IN TRANSISTOR DEVICES AND METHODS OF FORMING SAME

COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAIN...

INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRI...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

SELECTIVE DEPOSITION OF SILICON DIELECTRIC FILM

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITO...

SUBSTRATE PROCESSING METHOD

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD OF REMOVING A BY-PRODUCT FROM A COMPONENT OF A SEMICONDUCTOR...

ISOLATION LAYERS FOR STACKED TRANSISTOR STRUCTURES

COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAIN...

Mechanism for FinFET Well Doping

METHOD OF DIELECTRIC MATERIAL FILL AND TREATMENT

SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR MEMORY DEV...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON...

GATE STRUCTURES IN TRANSISTOR DEVICES AND METHODS OF FORMING SAME

Semiconductor Device and Method

SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF, DISPLAY DEVICE,...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

METHOD FOR FORMING INSULATING FILM, APPARATUS FOR PROCESSING SUBSTR...

SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

ATOMIC LAYER TREATMENT PROCESS USING METASTABLE ACTIVATED RADICAL S...

STEAM OXIDATION INITIATION FOR HIGH ASPECT RATIO CONFORMAL RADICAL...