introduction of nitrogen

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CPC
H01L21/02329

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02329introduction of nitrogen

Industries

Patents Grantslast 30 patents

Information Patent Grant
Incorporating nitrogen in dipole engineering for multi-threshold vo...
- Patent number 12,040,365
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei Ying Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective passivation layer for magnetic tunnel junctions
- Patent number 11,758,820
- Issue date Sep 12, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jodi Mari Iwata
- G11 - INFORMATION STORAGE
Information Patent Grant
Method of manufacturing an etch stop layer and an inter-layer diele...
- Patent number 11,522,062
- Issue date Dec 6, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of silicon boron nitride films
- Patent number 11,515,145
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Chuanxi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device
- Patent number 11,342,221
- Issue date May 24, 2022
- Samsung Electronics Co., Ltd.
- Jaewon Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sequential deposition and high frequency plasma treatment of deposi...
- Patent number 11,217,443
- Issue date Jan 4, 2022
- Applied Materials, Inc.
- Vinayak Veer Vats
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming metal gates with multiple threshold voltages
- Patent number 11,201,094
- Issue date Dec 14, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Lung-Kun Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic flowable deposition and high-density plasma treatment proces...
- Patent number 11,152,248
- Issue date Oct 19, 2021
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for fabricating shallow trench isolation
- Patent number 11,114,331
- Issue date Sep 7, 2021
- United Microelectronics Corp.
- Hao-Hsuan Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective passivation layer for magnetic tunnel junctions
- Patent number 11,024,798
- Issue date Jun 1, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jodi Mari Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation and in-situ treatment processes for gap fill layers
- Patent number 10,937,686
- Issue date Mar 2, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jian-Shiou Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 10,910,214
- Issue date Feb 2, 2021
- Kokusai Electric Corporation
- Yoshitomo Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatments to enhance material structures
- Patent number 10,872,763
- Issue date Dec 22, 2020
- Applied Materials, Inc.
- David Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric gap-fill material deposition
- Patent number 10,811,251
- Issue date Oct 20, 2020
- Intel Corporation
- Jeanne L. Luce
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Techniques for forming low stress etch-resistant mask using implant...
- Patent number 10,811,257
- Issue date Oct 20, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a stop layer filling in a space between spacers
- Patent number 10,790,289
- Issue date Sep 29, 2020
- United Microelectronics Corp.
- Chih-Chien Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film-forming method and film-forming apparatus
- Patent number 10,781,515
- Issue date Sep 22, 2020
- Tokyo Electron Limited
- Kyungseok Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic flowable deposition and high-density plasma treatment proces...
- Patent number 10,707,116
- Issue date Jul 7, 2020
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High durability extreme ultraviolet photomask
- Patent number 10,642,148
- Issue date May 5, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hao Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low dielectric constant oxide and low resistance OP stack for 3D NA...
- Patent number 10,553,427
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Xinhai Han
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structure with a conductive line and fabricating meth...
- Patent number 10,468,417
- Issue date Nov 5, 2019
- United Microelectronics Corp.
- Chih-Chien Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective film forming method
- Patent number 10,431,452
- Issue date Oct 1, 2019
- Tokyo Electron Limited
- Yutaka Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Advanced metal insulator metal capacitor
- Patent number 10,381,432
- Issue date Aug 13, 2019
- International Business Machines Corporation
- Chih-Chao Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation and in-situ treatment processes for gap fill layers
- Patent number 10,361,113
- Issue date Jul 23, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jian-Shiou Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and electrical device
- Patent number 10,243,058
- Issue date Mar 26, 2019
- Kabushiki Kaisha Toshiba
- Toshiya Yonehara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed plasma for film deposition
- Patent number 10,096,466
- Issue date Oct 9, 2018
- Applied Materials, Inc.
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High durability extreme ultraviolet photomask
- Patent number 10,061,191
- Issue date Aug 28, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hao Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for heat-treating high dielectric constant film
- Patent number 9,966,254
- Issue date May 8, 2018
- SCREEN Holdings Co., Ltd.
- Hikaru Kawarazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for heat-treating high dielectric constant film
- Patent number 9,837,266
- Issue date Dec 5, 2017
- SCREEN Holdings Co., Ltd.
- Hikaru Kawarazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 9,818,838
- Issue date Nov 14, 2017
- Sumitomo Electric Device Innovations, Inc.
- Tsutomu Komatani
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Incorporating Nitrogen in Dipole Engineering for Multi-Threshold Vo...
- Publication number 20240347606
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei Ying Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH NITRIDED INNER SPACERS AND METHOD FOR...
- Publication number 20240136427
- Publication date Apr 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Man-Nung SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE PASSIVATION LAYER FOR MAGNETIC TUNNEL JUNCTIONS
- Publication number 20230371395
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jodi Mari Iwata
- G11 - INFORMATION STORAGE
Information Patent Application
Inter-Layer Dielectrics and Etch Stop Layers for Transistor Source/...
- Publication number 20220384593
- Publication date Dec 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CURING DIELECTRIC MATERIAL
- Publication number 20220351969
- Publication date Nov 3, 2022
- Applied Materials, Inc.
- Bhargav Sridhar CITLA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of Silicon Boron Nitride Films
- Publication number 20220084809
- Publication date Mar 17, 2022
- Applied Materials, Inc.
- Chuanxi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20210066123
- Publication date Mar 4, 2021
- Samsung Electronics Co., Ltd.
- Jaewon Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SHALLOW TRENCHISOLATION
- Publication number 20200350199
- Publication date Nov 5, 2020
- UNITED MICROELECTRONICS CORP.
- Hao-Hsuan Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20200350157
- Publication date Nov 5, 2020
- Applied Materials, Inc.
- David Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLIC FLOWABLE DEPOSITION AND HIGH-DENSITY PLASMA TREATMENT PROCES...
- Publication number 20200286773
- Publication date Sep 10, 2020
- Applied Materials, Inc.
- Jingmei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEQUENTIAL DEPOSITION AND HIGH FREQUENCY PLASMA TREATMENT OF DEPOSI...
- Publication number 20200176241
- Publication date Jun 4, 2020
- Applied Materials, Inc.
- Vinayak Veer Vats
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW DIELECTRIC CONSTANT OXIDE AND LOW RESISTANCE OP STACK FOR 3D NA...
- Publication number 20200126784
- Publication date Apr 23, 2020
- Applied Materials, Inc.
- Xinhai HAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Forming Metal Gates with Multiple Threshold Voltages
- Publication number 20200058558
- Publication date Feb 20, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Lung-Kun Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH A CONDUCTIVE LINE AND FABRICATING METH...
- Publication number 20200020693
- Publication date Jan 16, 2020
- UNITED MICROELECTRONICS CORP.
- Chih-Chien Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION AND IN-SITU TREATMENT PROCESSES FOR GAP FILL LAYERS
- Publication number 20190341294
- Publication date Nov 7, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jian-Shiou Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR FORMING LOW STRESS ETCH-RESISTANT MASK USING IMPLANT...
- Publication number 20190304783
- Publication date Oct 3, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH A CONDUCTIVE LINE AND FABRICATING METH...
- Publication number 20190287976
- Publication date Sep 19, 2019
- UNITED MICROELECTRONICS CORP.
- Chih-Chien Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film-Forming Method and Film-Forming Apparatus
- Publication number 20190271074
- Publication date Sep 5, 2019
- TOKYO ELECTRON LIMITED
- Kyungseok KO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Durability Extreme Ultraviolet Photomask
- Publication number 20180373138
- Publication date Dec 27, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- CHIA-HAO YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROTECTIVE FILM FORMING METHOD
- Publication number 20180204716
- Publication date Jul 19, 2018
- TOKYO ELECTRON LIMITED
- Yutaka TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR HEAT-TREATING HIGH DIELECTRIC CONSTANT FILM
- Publication number 20180068847
- Publication date Mar 8, 2018
- SCREEN Holdings Co., Ltd.
- Hikaru KAWARAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Durability Extreme Ultraviolet Photomask
- Publication number 20170351169
- Publication date Dec 7, 2017
- Taiwan Semiconductor Manufacturing Co., LTD
- CHIA-HAO YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20170278717
- Publication date Sep 28, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Juing-Yi WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR OXIDIZING PLASMA POST-TREATMENT FOR REDUCING PHOTOLIT...
- Publication number 20170278700
- Publication date Sep 28, 2017
- John D. Brooks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR HEAT-TREATING HIGH DIELECTRIC CONSTANT FILM
- Publication number 20170098543
- Publication date Apr 6, 2017
- SCREEN Holdings Co., Ltd.
- Hikaru KAWARAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Forming High-K Dielectric Materials with Tunable Proper...
- Publication number 20170084680
- Publication date Mar 23, 2017
- Intermolecular, Inc.
- Howard Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DE...
- Publication number 20170053992
- Publication date Feb 23, 2017
- Toyota Jidosha Kabushiki Kaisha
- Masakazu Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO REDUCE TRAP-INDUCED CAPACITANCE IN INTERCONNECT DIELECTRI...
- Publication number 20170005041
- Publication date Jan 5, 2017
- Applied Materials, Inc.
- He REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING GATE DIELECTRIC LAYER FOR MOS TRANSISTOR
- Publication number 20160196971
- Publication date Jul 7, 2016
- UNITED MICROELECTRONICS CORP.
- Han-Lin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20160148799
- Publication date May 26, 2016
- Institute of Microelectronics, Chinese Academy of Sciences
- Guilei WANG
- H01 - BASIC ELECTRIC ELEMENTS

introduction of nitrogen

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Incorporating nitrogen in dipole engineering for multi-threshold vo...

Protective passivation layer for magnetic tunnel junctions

Method of manufacturing an etch stop layer and an inter-layer diele...

Deposition of silicon boron nitride films

Semiconductor device

Sequential deposition and high frequency plasma treatment of deposi...

Forming metal gates with multiple threshold voltages

Cyclic flowable deposition and high-density plasma treatment proces...

Method for fabricating shallow trench isolation

Protective passivation layer for magnetic tunnel junctions

Formation and in-situ treatment processes for gap fill layers

Method of manufacturing semiconductor device, substrate processing...

Treatments to enhance material structures

Dielectric gap-fill material deposition

Techniques for forming low stress etch-resistant mask using implant...

Method of forming a stop layer filling in a space between spacers

Film-forming method and film-forming apparatus

Cyclic flowable deposition and high-density plasma treatment proces...

High durability extreme ultraviolet photomask

Low dielectric constant oxide and low resistance OP stack for 3D NA...

Semiconductor structure with a conductive line and fabricating meth...

Protective film forming method

Advanced metal insulator metal capacitor

Formation and in-situ treatment processes for gap fill layers

Semiconductor device and electrical device

Pulsed plasma for film deposition

High durability extreme ultraviolet photomask

Method and apparatus for heat-treating high dielectric constant film

Method and apparatus for heat-treating high dielectric constant film

Semiconductor device

Patents Applicationslast 30 patents

Incorporating Nitrogen in Dipole Engineering for Multi-Threshold Vo...

SEMICONDUCTOR STRUCTURE WITH NITRIDED INNER SPACERS AND METHOD FOR...

PROTECTIVE PASSIVATION LAYER FOR MAGNETIC TUNNEL JUNCTIONS

Inter-Layer Dielectrics and Etch Stop Layers for Transistor Source/...

METHODS AND APPARATUS FOR CURING DIELECTRIC MATERIAL

Deposition of Silicon Boron Nitride Films

SEMICONDUCTOR DEVICE

METHOD FOR FABRICATING SHALLOW TRENCHISOLATION

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

CYCLIC FLOWABLE DEPOSITION AND HIGH-DENSITY PLASMA TREATMENT PROCES...

SEQUENTIAL DEPOSITION AND HIGH FREQUENCY PLASMA TREATMENT OF DEPOSI...

LOW DIELECTRIC CONSTANT OXIDE AND LOW RESISTANCE OP STACK FOR 3D NA...

Forming Metal Gates with Multiple Threshold Voltages

SEMICONDUCTOR STRUCTURE WITH A CONDUCTIVE LINE AND FABRICATING METH...

FORMATION AND IN-SITU TREATMENT PROCESSES FOR GAP FILL LAYERS

TECHNIQUES FOR FORMING LOW STRESS ETCH-RESISTANT MASK USING IMPLANT...

SEMICONDUCTOR STRUCTURE WITH A CONDUCTIVE LINE AND FABRICATING METH...

Film-Forming Method and Film-Forming Apparatus

High Durability Extreme Ultraviolet Photomask

PROTECTIVE FILM FORMING METHOD

METHOD AND APPARATUS FOR HEAT-TREATING HIGH DIELECTRIC CONSTANT FILM

High Durability Extreme Ultraviolet Photomask

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

TECHNIQUE FOR OXIDIZING PLASMA POST-TREATMENT FOR REDUCING PHOTOLIT...

METHOD AND APPARATUS FOR HEAT-TREATING HIGH DIELECTRIC CONSTANT FILM

Methods for Forming High-K Dielectric Materials with Tunable Proper...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DE...

METHOD TO REDUCE TRAP-INDUCED CAPACITANCE IN INTERCONNECT DIELECTRI...

METHOD OF FORMING GATE DIELECTRIC LAYER FOR MOS TRANSISTOR

METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES