Ionlithographic processes

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H01L21/0279

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/0279Ionlithographic processes

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Forming contact holes with controlled local critical dimension unif...
- Patent number 11,978,631
- Issue date May 7, 2024
- Tokyo Electron Limited
- Junling Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for forming organic film, method for forming organic film,...
- Patent number 11,822,247
- Issue date Nov 21, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi Nakahara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fabrication of high-aspect ratio nanostructures by localized nanosp...
- Patent number 11,703,764
- Issue date Jul 18, 2023
- Khalifa University of Science and Technology
- Raquel Flores
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method
- Patent number 10,366,888
- Issue date Jul 30, 2019
- Tokyo Electron Limited
- Kazuki Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple patterning approach using ion implantation
- Patent number 10,310,379
- Issue date Jun 4, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Tristan Y. Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Continuous writing of pattern
- Patent number 9,960,013
- Issue date May 1, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compounders for enhancing generation of chemical species
- Patent number 9,952,508
- Issue date Apr 24, 2018
- Toyo Gosei Co., Ltd.
- Satoshi Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sequential infiltration synthesis for advanced lithography
- Patent number 9,786,511
- Issue date Oct 10, 2017
- UChicago Argonne, LLC
- Seth B. Darling
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Projection patterning with exposure mask
- Patent number 9,570,301
- Issue date Feb 14, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuen-Yu Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple exposure treatment for processing a patterning feature
- Patent number 9,512,517
- Issue date Dec 6, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Tristan Y. Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photo resist (PR) profile control
- Patent number 8,993,218
- Issue date Mar 31, 2015
- Taiwan Semiconductor Manufacturing Company Limited
- Li Huai Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern forming method and method for manufacturing semiconductor d...
- Patent number 7,026,099
- Issue date Apr 11, 2006
- Kabushiki Kaisha Toshiba
- Hirokazu Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 6,774,043
- Issue date Aug 10, 2004
- Renesas Technology Corp.
- Atsumi Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Printing sublithographic images using a shadow mandrel and off-axis...
- Patent number 6,194,268
- Issue date Feb 27, 2001
- International Business Machines Corporation
- Toshiharu Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Block mask and charged particle beam exposure method and apparatus...
- Patent number 6,175,121
- Issue date Jan 16, 2001
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for forming pillar memory cells and device formed thereby
- Patent number 6,096,598
- Issue date Aug 1, 2000
- International Business Machines Corporation
- Toshiharu Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Block mask and charged particle beam exposure method and apparatus...
- Patent number 5,849,436
- Issue date Dec 15, 1998
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography mask and fabrication method thereof
- Patent number 5,770,336
- Issue date Jun 23, 1998
- Lg Semicon Co., Ltd.
- Yong-Kyoo Choi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Production method of a MESFET semiconductor device
- Patent number 5,387,529
- Issue date Feb 7, 1995
- Mitsubishi Denki Kabushiki Kaisha
- Tomoki Oku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Production method of an HEMT semiconductor device
- Patent number 5,300,445
- Issue date Apr 5, 1994
- Mitsubishi Denki Kabushiki Kaisha
- Tomoki Oku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fine pattern forming process
- Patent number 5,102,688
- Issue date Apr 7, 1992
- Matsushita Electric Industrial Co., Ltd.
- Kazuhiko Hashimoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of manufacturing a semiconductor device by ion implantation...
- Patent number 5,037,767
- Issue date Aug 6, 1991
- U.S. Philips Corporation
- Peter J. Daniel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for photoresist pretreatment prior to charged particle beam...
- Patent number 4,851,691
- Issue date Jul 25, 1989
- Varian Associates, Inc.
- Peter R. Hanley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Accelerated particle lithographic processing and articles so produced
- Patent number 4,383,026
- Issue date May 10, 1983
- Bell Telephone Laboratories, Incorporated
- Thomas M. Hall
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ION BEAM LITHOGRAPHY AND NANOENGINEERING
- Publication number 20240222073
- Publication date Jul 4, 2024
- Intel Corporation
- Shida Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATION OF HIGH-ASPECT RATIO NANOSTRUCTURES BY LOCALIZED NANOSP...
- Publication number 20220100093
- Publication date Mar 31, 2022
- Khalifa University of Science and Technology
- Raquel FLORES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM,...
- Publication number 20210286266
- Publication date Sep 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi NAKAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nonlinear Scattering Lithography
- Publication number 20210240083
- Publication date Aug 5, 2021
- Vathys, Inc.
- Tapabrata GHOSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE PATTERNING APPROACH USING ION IMPLANTATION
- Publication number 20180204719
- Publication date Jul 19, 2018
- Tristan Y. Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO TUNE CONTACT CD AND REDUCE MASK COUNT BY TILTED ION BEAM
- Publication number 20180047564
- Publication date Feb 15, 2018
- GLOBALFOUNDRIES, Inc.
- Chanro Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Continuous Writing of Pattern
- Publication number 20170200584
- Publication date Jul 13, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Ming Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Spin-On Layer for Directed Self Assembly with Tunable Neutrality
- Publication number 20160276149
- Publication date Sep 22, 2016
- TOKYO ELECTRON LIMITED
- Jeffrey Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND FOR ENHANCING GENERATION OF CHEMICAL SPECIES
- Publication number 20160225611
- Publication date Aug 4, 2016
- Toyo Gosei Co., Ltd.
- Satoshi Enomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE EXPOSURE TREATMENT FOR PROCESSING A PATTERNING FEATURE
- Publication number 20160215385
- Publication date Jul 28, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Tristan Y. Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Projection Patterning With Exposure Mask
- Publication number 20150348775
- Publication date Dec 3, 2015
- National Taiwan University
- Kuen-Yu Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sequential Infiltration Synthesis for Advanced Lithography
- Publication number 20150255298
- Publication date Sep 10, 2015
- UChicago Argonne LLC
- Seth B. Darling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTO RESIST (PR) PROFILE CONTROL
- Publication number 20140234772
- Publication date Aug 21, 2014
- Taiwan Semiconductor Manufacturing Company Limited
- Li Huai YANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEQUENTIAL INFILTRATION SYNTHESIS FOR ADVANCED LITHOGRAPHY
- Publication number 20120241411
- Publication date Sep 27, 2012
- UChicago Argonne LLC
- Seth B. Darling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multibeam System
- Publication number 20110163068
- Publication date Jul 7, 2011
- Mark Utlaut
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for aligning patterns on a substrate based on optical prope...
- Publication number 20060079067
- Publication date Apr 13, 2006
- SAMSUNG ELECTRONICS CO., LTD.
- Jang-Ho Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming fine pattern
- Publication number 20040234899
- Publication date Nov 25, 2004
- Minoru Toriumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method and method for manufacturing semiconductor d...
- Publication number 20030215749
- Publication date Nov 20, 2003
- Hirokazu Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Patterning of GaN crystal films with ion beams and subsequent wet e...
- Publication number 20020096496
- Publication date Jul 25, 2002
- Bela Molnar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20020013055
- Publication date Jan 31, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Atsumi Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS

Ionlithographic processes

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Forming contact holes with controlled local critical dimension unif...

Material for forming organic film, method for forming organic film,...

Fabrication of high-aspect ratio nanostructures by localized nanosp...

Pattern forming method

Multiple patterning approach using ion implantation

Continuous writing of pattern

Compounders for enhancing generation of chemical species

Sequential infiltration synthesis for advanced lithography

Projection patterning with exposure mask

Multiple exposure treatment for processing a patterning feature

Photo resist (PR) profile control

Pattern forming method and method for manufacturing semiconductor d...

Method of manufacturing semiconductor device

Printing sublithographic images using a shadow mandrel and off-axis...

Block mask and charged particle beam exposure method and apparatus...

Method for forming pillar memory cells and device formed thereby

Block mask and charged particle beam exposure method and apparatus...

Lithography mask and fabrication method thereof

Production method of a MESFET semiconductor device

Production method of an HEMT semiconductor device

Fine pattern forming process

Method of manufacturing a semiconductor device by ion implantation...

Method for photoresist pretreatment prior to charged particle beam...

Accelerated particle lithographic processing and articles so produced

Patents Applicationslast 30 patents

ION BEAM LITHOGRAPHY AND NANOENGINEERING

FABRICATION OF HIGH-ASPECT RATIO NANOSTRUCTURES BY LOCALIZED NANOSP...

MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM,...

Nonlinear Scattering Lithography

MULTIPLE PATTERNING APPROACH USING ION IMPLANTATION

METHOD TO TUNE CONTACT CD AND REDUCE MASK COUNT BY TILTED ION BEAM

Continuous Writing of Pattern

Spin-On Layer for Directed Self Assembly with Tunable Neutrality

COMPOUND FOR ENHANCING GENERATION OF CHEMICAL SPECIES

MULTIPLE EXPOSURE TREATMENT FOR PROCESSING A PATTERNING FEATURE

Projection Patterning With Exposure Mask

Sequential Infiltration Synthesis for Advanced Lithography

PHOTO RESIST (PR) PROFILE CONTROL

SEQUENTIAL INFILTRATION SYNTHESIS FOR ADVANCED LITHOGRAPHY

Multibeam System

Methods for aligning patterns on a substrate based on optical prope...

Method of forming fine pattern

Pattern forming method and method for manufacturing semiconductor d...

Patterning of GaN crystal films with ion beams and subsequent wet e...

Method of manufacturing semiconductor device