Ions [SIMS]

Industry

CPC
H01J2237/2527

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/2527Ions [SIMS]

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Methods and systems including pulsed dual-beam charge neutralization
- Patent number 11,915,901
- Issue date Feb 27, 2024
- ULVAC-PHI, INCORPORATED
- Scott R. Bryan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple beam secondary ion mass spectrometry device
- Patent number 11,545,352
- Issue date Jan 3, 2023
- LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)
- Marina Verruno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source, ion gun, and analysis instrument
- Patent number 9,372,161
- Issue date Jun 21, 2016
- ULVAC-PHI, INC.
- Daisuke Sakai
- G01 - MEASURING TESTING
Information Patent Grant
Image processing method
- Patent number 8,644,637
- Issue date Feb 4, 2014
- Canon Kabushiki Kaisha
- Takeo Suga
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Surface analyzer of object to be measured and analyzing method
- Patent number 8,541,738
- Issue date Sep 24, 2013
- Japan Science and Technology Agency
- Masahide Tona
- G01 - MEASURING TESTING
Information Patent Grant
Multi-beam ion/electron spectra-microscope
- Patent number 7,947,951
- Issue date May 24, 2011
- National University of Singapore
- Anjam Khursheed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for crystal analysis
- Patent number 7,091,484
- Issue date Aug 15, 2006
- TDK Corporation
- Katsuaki Yanagiuchi
- G01 - MEASURING TESTING
Information Patent Grant
Analysis of semiconductor surfaces by secondary ion mass spectromet...
- Patent number 6,855,928
- Issue date Feb 15, 2005
- Micron Technology, Inc.
- Eugene P. Marsh
- G01 - MEASURING TESTING
Information Patent Grant
Analysis of semiconductor surfaces by secondary ion mass spectromet...
- Patent number 6,713,760
- Issue date Mar 30, 2004
- Micron Technology, Inc.
- Eugene P. Marsh
- G01 - MEASURING TESTING
Information Patent Grant
Analysis of semiconductor surfaces by secondary ion mass spectromet...
- Patent number 6,528,786
- Issue date Mar 4, 2003
- Micron Technology, Inc.
- Eugene P. Marsh
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for enhancing yield of secondary ions
- Patent number 6,414,307
- Issue date Jul 2, 2002
- FEI Company
- Robert L. Gerlach
- G01 - MEASURING TESTING
Information Patent Grant
Analysis of semiconductor surfaces by secondary ion mass spectrometry
- Patent number 6,271,519
- Issue date Aug 7, 2001
- Micron Technology, Inc.
- Eugene P. Marsh
- G01 - MEASURING TESTING
Information Patent Grant
Analysis of semiconductor surfaces by secondary ion mass spectrometry
- Patent number 6,232,600
- Issue date May 15, 2001
- Micron Technology, Inc.
- Eugene P. Marsh
- G01 - MEASURING TESTING
Information Patent Grant
Secondary ion mass spectrometer with aperture mask
- Patent number 6,080,986
- Issue date Jun 27, 2000
- Atomika Instruments GmbH
- Mark Graeme Dowsett
- G01 - MEASURING TESTING
Information Patent Grant
Process for analysis of a sample
- Patent number 6,078,045
- Issue date Jun 20, 2000
- Atomika Instruments GmbH
- Johann L. Maul
- G01 - MEASURING TESTING
Information Patent Grant
Method for testing semiconductor device
- Patent number 6,037,588
- Issue date Mar 14, 2000
- Oki Electric Industry Co., Ltd.
- Guo-Lin Liu
- G01 - MEASURING TESTING
Information Patent Grant
Time-of-flight SIMS/MSRI reflectron mass analyzer and method
- Patent number 6,008,491
- Issue date Dec 28, 1999
- The United States of America as represented by the United States Department o...
- Vincent S. Smentkowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analysis of semiconductor surfaces by secondary ion mass spectrometry
- Patent number 5,920,068
- Issue date Jul 6, 1999
- Micron Technology, Inc.
- Eugene P. Marsh
- G01 - MEASURING TESTING
Information Patent Grant
Method of ultra high sensitivity hydrogen detection with slow multi...
- Patent number 5,528,034
- Issue date Jun 18, 1996
- The University of Tokyo
- Yasunori Yamazaki
- G01 - MEASURING TESTING
Information Patent Grant
Secondary-ion mass spectrometry apparatus using field limiting method
- Patent number 5,278,407
- Issue date Jan 11, 1994
- Hitachi, Ltd.
- Yoshinori Ikebe
- G01 - MEASURING TESTING
Information Patent Grant
Method of secondary ion mass spectrometry analysis
- Patent number 5,208,457
- Issue date May 4, 1993
- NEC Corporation
- Tsutomu Tsuji
- G01 - MEASURING TESTING
Information Patent Grant
Ion-scattering spectrometer
- Patent number 5,166,521
- Issue date Nov 24, 1992
- Shimadzu Corporation
- Shigeki Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle analyzer apparatus and method
- Patent number 5,128,543
- Issue date Jul 7, 1992
- Charles Evans & Associates
- David A. Reed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Secondary charged particle analyzing apparatus and secondary charge...
- Patent number 5,089,699
- Issue date Feb 18, 1992
- Hitachi, Ltd.
- Yoichi Ose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 4,841,143
- Issue date Jun 20, 1989
- Hitachi, Ltd.
- Hifumi Tamura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND SYSTEMS INCLUDING PULSED DUAL-BEAM CHARGE NEUTRALIZATION
- Publication number 20230245848
- Publication date Aug 3, 2023
- ULVAC-PHI, INCORPORATED
- Scott R. Bryan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRINTED CIRCUIT BOARD MULTIPOLE UNITS USED FOR ION TRANSPORTATION
- Publication number 20140326874
- Publication date Nov 6, 2014
- CARL ZEISS MICROSCOPY GMBH
- Albrecht Glasmachers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE PROCESSING METHOD
- Publication number 20120301043
- Publication date Nov 29, 2012
- Canon Kabushiki Kaisha
- Takeo Suga
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SURFACE ANALYZER OF OBJECT TO BE MEASURED AND ANALYZING METHOD
- Publication number 20120061564
- Publication date Mar 15, 2012
- Japan Science and Technology Agency
- Masahide Tona
- G01 - MEASURING TESTING
Information Patent Application
Apparatus for transmission of energy and/or for transportation of a...
- Publication number 20110192973
- Publication date Aug 11, 2011
- Albrecht Glasmachers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-beam ion/electron spectra-microscope
- Publication number 20090321634
- Publication date Dec 31, 2009
- National University of Singapore
- Anjam Khursheed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for crystal analysis
- Publication number 20050103995
- Publication date May 19, 2005
- Katsuaki Yanagiuchi
- G01 - MEASURING TESTING
Information Patent Application
ANALYSIS OF SEMICONDUCTOR SURFACES BY SECONDARY ION MASS SPECTROMET...
- Publication number 20030193023
- Publication date Oct 16, 2003
- Eugene P. Marsh
- G01 - MEASURING TESTING
Information Patent Application
Analysis of semiconductor surfaces by secondary ion mass spectromet...
- Publication number 20030136906
- Publication date Jul 24, 2003
- Eugene P. Marsh
- G01 - MEASURING TESTING
Information Patent Application
Analysis of semiconductor surfaces by secondary ion mass spectrometry
- Publication number 20010019108
- Publication date Sep 6, 2001
- Eugene P. Marsh
- G01 - MEASURING TESTING

Ions [SIMS]

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods and systems including pulsed dual-beam charge neutralization

Multiple beam secondary ion mass spectrometry device

Ion source, ion gun, and analysis instrument

Image processing method

Surface analyzer of object to be measured and analyzing method

Multi-beam ion/electron spectra-microscope

Method and apparatus for crystal analysis

Analysis of semiconductor surfaces by secondary ion mass spectromet...

Analysis of semiconductor surfaces by secondary ion mass spectromet...

Analysis of semiconductor surfaces by secondary ion mass spectromet...

Method and apparatus for enhancing yield of secondary ions

Analysis of semiconductor surfaces by secondary ion mass spectrometry

Analysis of semiconductor surfaces by secondary ion mass spectrometry

Secondary ion mass spectrometer with aperture mask

Process for analysis of a sample

Method for testing semiconductor device

Time-of-flight SIMS/MSRI reflectron mass analyzer and method

Analysis of semiconductor surfaces by secondary ion mass spectrometry

Method of ultra high sensitivity hydrogen detection with slow multi...

Secondary-ion mass spectrometry apparatus using field limiting method

Method of secondary ion mass spectrometry analysis

Ion-scattering spectrometer

Particle analyzer apparatus and method

Secondary charged particle analyzing apparatus and secondary charge...

Charged particle beam apparatus

Patents Applicationslast 30 patents

METHODS AND SYSTEMS INCLUDING PULSED DUAL-BEAM CHARGE NEUTRALIZATION

PRINTED CIRCUIT BOARD MULTIPOLE UNITS USED FOR ION TRANSPORTATION

IMAGE PROCESSING METHOD

SURFACE ANALYZER OF OBJECT TO BE MEASURED AND ANALYZING METHOD

Apparatus for transmission of energy and/or for transportation of a...

Multi-beam ion/electron spectra-microscope

Method and apparatus for crystal analysis

ANALYSIS OF SEMICONDUCTOR SURFACES BY SECONDARY ION MASS SPECTROMET...

Analysis of semiconductor surfaces by secondary ion mass spectromet...

Analysis of semiconductor surfaces by secondary ion mass spectrometry