isotropy

Industry

CPC
H01J2237/3344

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/3344isotropy

Industries

Patents Grantslast 30 patents

Information Patent Grant
Multi-zone gas distribution systems and methods
- Patent number 12,148,597
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treating substrate and apparatus for treating substrate
- Patent number 12,142,492
- Issue date Nov 12, 2024
- Semes Co., Ltd.
- Ji-Hwan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method of manufacturing semiconduct...
- Patent number 12,106,945
- Issue date Oct 1, 2024
- Samsung Electronics Co., Ltd.
- Siqing Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Workpiece processing method
- Patent number 11,735,423
- Issue date Aug 22, 2023
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,676,799
- Issue date Jun 13, 2023
- Tokyo Electron Limited
- Koji Yamagishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone gas distribution systems and methods
- Patent number 11,581,165
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting stage, substrate processing device, and edge ring
- Patent number 11,538,668
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma processing apparatus
- Patent number 11,515,167
- Issue date Nov 29, 2022
- HITACHI HIGH-TECH CORPORATION
- Sumiko Fujisaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit for a substrate support
- Patent number 11,387,134
- Issue date Jul 12, 2022
- Applied Materials, Inc.
- Muhannad Mustafa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber conditioning and removal processes
- Patent number 11,328,909
- Issue date May 10, 2022
- Applied Materials, Inc.
- Hanshen Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing method
- Patent number 11,322,354
- Issue date May 3, 2022
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 11,315,760
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure variable type of a plasma source coil and a method for co...
- Patent number 11,315,764
- Issue date Apr 26, 2022
- Adaptive Plasma Technology Corp.
- Woo Hyung Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Circuits for edge ring control in shaped DC pulsed plasma process d...
- Patent number 11,289,310
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and etching apparatus
- Patent number 11,217,454
- Issue date Jan 4, 2022
- HITACHI HIGH-TECH CORPORATION
- Kazunori Shinoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical source with contained plasma
- Patent number 11,201,035
- Issue date Dec 14, 2021
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing method
- Patent number 11,133,192
- Issue date Sep 28, 2021
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly and semiconductor manufacturing appara...
- Patent number 11,004,716
- Issue date May 11, 2021
- Samsung Electronics Co., Ltd.
- Song-yi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active control of radial etch uniformity
- Patent number 10,916,409
- Issue date Feb 9, 2021
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone gas distribution systems and methods
- Patent number 10,903,054
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,854,431
- Issue date Dec 1, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Separate plasma source coil and method of controlling the same
- Patent number 10,825,655
- Issue date Nov 3, 2020
- Adaptive Plasma Technology Corp.
- Sang Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing method
- Patent number 10,748,766
- Issue date Aug 18, 2020
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,615,006
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,580,620
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing method
- Patent number 10,559,472
- Issue date Feb 11, 2020
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,546,728
- Issue date Jan 28, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,546,727
- Issue date Jan 28, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,535,502
- Issue date Jan 14, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Component of a plasma processing apparatus having a protective in s...
- Patent number 10,497,544
- Issue date Dec 3, 2019
- Lam Research Corporation
- Harmeet Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR ION-ASSISTED SELF-LIMITED CONFORMAL ETCH
- Publication number 20240379372
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Adam Pranda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING
- Publication number 20240355587
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COIL STRUCTURE FOR GENERATING PLASMA AND SEMICONDUCTOR EQUIPMENT
- Publication number 20240339296
- Publication date Oct 10, 2024
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Jinrong ZHAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Methods for Plasma Processing
- Publication number 20240331979
- Publication date Oct 3, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING PROCESSING METHOD
- Publication number 20240312789
- Publication date Sep 19, 2024
- Hitachi High-Tech Corporation
- Takashi HATTORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240297021
- Publication date Sep 5, 2024
- Hitachi High-Tech Corporation
- Yoshinori YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS
- Publication number 20240258070
- Publication date Aug 1, 2024
- Applied Materials, Inc.
- Michael Andrew STEARNS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING PLASMA
- Publication number 20230317419
- Publication date Oct 5, 2023
- SEMES CO., LTD.
- Young Je UM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230197501
- Publication date Jun 22, 2023
- TOKYO ELECTRON LIMITED
- Takehiro UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20230068877
- Publication date Mar 2, 2023
- Kokusai Electric Corporation
- Naofumi OHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230033655
- Publication date Feb 2, 2023
- Hitachi High-Tech Corporation
- Shoji Akashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20220254606
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORKPIECE PROCESSING METHOD
- Publication number 20220254635
- Publication date Aug 11, 2022
- TOKYO ELECTRON LIMITED
- Masahiro TABATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCUITS FOR EDGE RING CONTROL IN SHAPED DC PULSED PLASMA PROCESS D...
- Publication number 20220223386
- Publication date Jul 14, 2022
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20220076931
- Publication date Mar 10, 2022
- Samsung Electronics Co., Ltd.
- Siqing Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210358760
- Publication date Nov 18, 2021
- Hitachi High-Technologies Corporation
- Sumiko FUJISAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE VARIABLE TYPE OF A PLASMA SOURCE COIL AND A METHOD FOR CO...
- Publication number 20210335583
- Publication date Oct 28, 2021
- Adaptive Plasma Technology Corp.
- Woo Hyung CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210287879
- Publication date Sep 16, 2021
- TOKYO ELECTRON LIMITED
- Koji YAMAGISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND ETCHING APPARATUS
- Publication number 20210242030
- Publication date Aug 5, 2021
- Hitachi High-Technologies Corporation
- Kazunori SHINODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TREATING SUBSTRATE AND APPARATUS FOR TREATING SUBSTRATE
- Publication number 20210151333
- Publication date May 20, 2021
- SEMES CO., LTD.
- JI-HWAN LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20210082669
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING POROUS FILM
- Publication number 20200395221
- Publication date Dec 17, 2020
- TOKYO ELECTRON LIMITED
- Shigeru TAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORKPIECE PROCESSING METHOD
- Publication number 20200343091
- Publication date Oct 29, 2020
- TOKYO ELECTRON LIMITED
- Masahiro TABATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COIL AND WINDOW FOR PLASMA PROCESSING SYSTEM
- Publication number 20200234920
- Publication date Jul 23, 2020
- LAM RESEARCH CORPORATION
- Shen PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mounting Stage, Substrate Processing Device, and Edge Ring
- Publication number 20200194239
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE FOR SUBSTRATE PROCESSING APPARATUS
- Publication number 20200194238
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Daisuke ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20200185192
- Publication date Jun 11, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20200176230
- Publication date Jun 4, 2020
- Samsung Electronics Co., Ltd.
- Siqing LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCUITS FOR EDGE RING CONTROL IN SHAPED DC PULSED PLASMA PROCESS D...
- Publication number 20200161098
- Publication date May 21, 2020
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORKPIECE PROCESSING METHOD
- Publication number 20200135480
- Publication date Apr 30, 2020
- TOKYO ELECTRON LIMITED
- Masahiro TABATA
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi-zone gas distribution systems and methods

Method for treating substrate and apparatus for treating substrate

Plasma processing apparatus and method of manufacturing semiconduct...

Workpiece processing method

Plasma processing apparatus

Multi-zone gas distribution systems and methods

Mounting stage, substrate processing device, and edge ring

Plasma etching method and plasma processing apparatus

Process kit for a substrate support

Chamber conditioning and removal processes

Workpiece processing method

Symmetric plasma process chamber

Structure variable type of a plasma source coil and a method for co...

Circuits for edge ring control in shaped DC pulsed plasma process d...

Plasma processing method and etching apparatus

Radical source with contained plasma

Workpiece processing method

Electrostatic chuck assembly and semiconductor manufacturing appara...

Active control of radial etch uniformity

Multi-zone gas distribution systems and methods

Plasma processing apparatus and method

Separate plasma source coil and method of controlling the same

Workpiece processing method

Symmetric plasma process chamber

Symmetric plasma process chamber

Workpiece processing method

Symmetric plasma process chamber

Plasma processing apparatus and method

Symmetric plasma process chamber

Component of a plasma processing apparatus having a protective in s...

Patents Applicationslast 30 patents

METHOD FOR ION-ASSISTED SELF-LIMITED CONFORMAL ETCH

MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING

COIL STRUCTURE FOR GENERATING PLASMA AND SEMICONDUCTOR EQUIPMENT

Apparatus and Methods for Plasma Processing

ETCHING PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING PLASMA

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

PLASMA PROCESSING APPARATUS

SYMMETRIC PLASMA PROCESS CHAMBER

WORKPIECE PROCESSING METHOD

CIRCUITS FOR EDGE RING CONTROL IN SHAPED DC PULSED PLASMA PROCESS D...

PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...

PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS

STRUCTURE VARIABLE TYPE OF A PLASMA SOURCE COIL AND A METHOD FOR CO...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND ETCHING APPARATUS

METHOD FOR TREATING SUBSTRATE AND APPARATUS FOR TREATING SUBSTRATE

PLASMA PROCESSING APPARATUS AND METHOD

METHOD OF ETCHING POROUS FILM

WORKPIECE PROCESSING METHOD

COIL AND WINDOW FOR PLASMA PROCESSING SYSTEM

Mounting Stage, Substrate Processing Device, and Edge Ring

STRUCTURE FOR SUBSTRATE PROCESSING APPARATUS

SYMMETRIC PLASMA PROCESS CHAMBER

PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...

CIRCUITS FOR EDGE RING CONTROL IN SHAPED DC PULSED PLASMA PROCESS D...

WORKPIECE PROCESSING METHOD