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PHOTORESIST UNDERLAYER COMPOSITION
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Publication number 20230205087
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Publication date Jun 29, 2023
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Rohm and Haas Electronic Materials Korea Ltd.
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Min Kyung Jang
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTOSENSITIVE POLYIMIDE COMPOSITIONS
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Publication number 20200218152
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Publication date Jul 9, 2020
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Fujifilm Electronic Materials U.S.A., Inc.
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Binod B. De
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B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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PHOTOSENSITIVE POLYIMIDE COMPOSITIONS
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Publication number 20190171105
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Publication date Jun 6, 2019
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Fujifilm Electronic Materials U.S.A., Inc.
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Sanjay Malik
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B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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LASER-ABLATABLE MASK FILM
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Publication number 20180203356
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Publication date Jul 19, 2018
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Flint Group Germany GmbH
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MARKUS MÜHLFEIT
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B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
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METHOD FOR PATTERNING FLEXIBLE SUBSTRATE
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Publication number 20150004549
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Publication date Jan 1, 2015
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Industrial Technology Research Institute
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Pao-Ming Tsai
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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METHOD FOR PATTERNING FLEXIBLE SUBSTRATE
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Publication number 20150004548
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Publication date Jan 1, 2015
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Industrial Technology Research Institute
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Pao-Ming Tsai
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PROCESS FOR THICK FILM CIRCUIT PATTERNING
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Publication number 20100104829
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Publication date Apr 29, 2010
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E.I. du Pont de Nemours and Company
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ROUPEN LEON KEUSSEYAN
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