Lamphouse reflector arrangements

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CPC
G03F7/70175

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70175Lamphouse reflector arrangements

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 12,210,289
- Issue date Jan 28, 2025
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning a structure surface in an EUV chamber
- Patent number 12,189,313
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet lithography system
- Patent number 12,055,865
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV light source and apparatus for lithography
- Patent number 11,979,971
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Shuo Su
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical diffraction component
- Patent number 11,947,265
- Issue date Apr 2, 2024
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source for lithography process
- Patent number 11,829,082
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shang-Ying Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Collector mirror and apparatus for creating extreme ultraviolet lig...
- Patent number 11,698,590
- Issue date Jul 11, 2023
- Samsung Electronics Co., Ltd.
- Hoseok Song
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lamp, light source device, exposure apparatus, and article manufact...
- Patent number 11,586,117
- Issue date Feb 21, 2023
- Canon Kabushiki Kaisha
- Hiroyuki Tomita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV radiation source apparatus for lithography
- Patent number 11,513,441
- Issue date Nov 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Chih Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning a structure surface in an EUV chamber
- Patent number 11,347,154
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation source for lithography process
- Patent number 11,275,318
- Issue date Mar 15, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shang-Ying Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In-situ light detection methods and apparatus for ultraviolet semic...
- Patent number 11,215,934
- Issue date Jan 4, 2022
- Applied Materials, Inc.
- Ralph Peter Antonio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV vessel inspection method and related system
- Patent number 11,092,555
- Issue date Aug 17, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Lin Louis Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet lithography system
- Patent number 11,086,237
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet light generation device and electronic device m...
- Patent number 11,042,102
- Issue date Jun 22, 2021
- Gigaphoton Inc.
- Shinji Nagai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical assembly with a protective element and optical arrangement...
- Patent number 11,022,893
- Issue date Jun 1, 2021
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G02 - OPTICS
Information Patent Grant
System, method and apparatus for target material debris cleaning of...
- Patent number 11,013,096
- Issue date May 18, 2021
- ASML Nettherlands B.V.
- Jonghoon Baek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet light generation apparatus and electronic devic...
- Patent number 10,976,665
- Issue date Apr 13, 2021
- Gigaphoton Inc.
- Yoshiyuki Honda
- G02 - OPTICS
Information Patent Grant
EUV radiation source apparatus for lithography
- Patent number 10,955,752
- Issue date Mar 23, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Chih Chen
- G02 - OPTICS
Information Patent Grant
Radiation source for lithography process
- Patent number 10,928,741
- Issue date Feb 23, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shang-Ying Wu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Collector pellicle
- Patent number 10,880,981
- Issue date Dec 29, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shang-Chieh Chien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV light source and apparatus for lithography
- Patent number 10,859,928
- Issue date Dec 8, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Chih Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet light generation apparatus
- Patent number 10,820,400
- Issue date Oct 27, 2020
- Gigaphoton Inc.
- Hiroaki Tomuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV vessel inspection method and related system
- Patent number 10,718,718
- Issue date Jul 21, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Lin Louis Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Suppression filter, radiation collector and radiation source for a...
- Patent number 10,678,140
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source for lithography process
- Patent number 10,656,539
- Issue date May 19, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shang-Ying Wu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Faceted EUV optical element
- Patent number 10,635,002
- Issue date Apr 28, 2020
- ASML Netherlands B.V.
- David C. Brandt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV Collector
- Patent number 10,503,075
- Issue date Dec 10, 2019
- Carl Zeiss SMT GmbH
- Ingrid Schuster
- G02 - OPTICS
Information Patent Grant
Method of controlling debris in an EUV light source
- Patent number 10,490,313
- Issue date Nov 26, 2019
- ASML Netherlands B.V.
- Alexander I. Ershov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System, method and apparatus for target material debris cleaning of...
- Patent number 10,477,662
- Issue date Nov 12, 2019
- ASML Netherlands B.V.
- Jonghoon Baek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
- Publication number 20240353766
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL COMPONENT GROUP, IN PARTICULAR FOR USE IN AN ILLUMINATION D...
- Publication number 20240255856
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION APPARATUS, ALIGNMENT MICROSCOPE, AND EXPOSURE APPARATUS
- Publication number 20240241457
- Publication date Jul 18, 2024
- Ushio Denki Kabushiki Kaisha
- Naoya SOHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE
- Publication number 20240219848
- Publication date Jul 4, 2024
- Samsung Electronics Co., Ltd.
- Sanghwan LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS
- Publication number 20240094646
- Publication date Mar 21, 2024
- Samsung Electronics Co., Ltd.
- Katsunobu NISHIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM FOR A LITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20240012333
- Publication date Jan 11, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION COLLECTOR
- Publication number 20240004304
- Publication date Jan 4, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng Hung TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT, IN PARTICULAR FOR REFLECTING EUV RADIATION, OPTICA...
- Publication number 20230266673
- Publication date Aug 24, 2023
- Carl Zeiss SMT GMBH
- Vitaliy SHKLOVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV COLLECTOR
- Publication number 20230146235
- Publication date May 11, 2023
- Carl Zeiss SMT GMBH
- Valentin Jonatan Bolsinger
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM
- Publication number 20230126018
- Publication date Apr 27, 2023
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20230122333
- Publication date Apr 20, 2023
- Carl Zeiss SMT GMBH
- Kerstin HILD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV RADIATION SOURCE APPARATUS FOR LITHOGRAPHY
- Publication number 20220382048
- Publication date Dec 1, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chih CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT SOURCE AND APPARATUS FOR LITHOGRAPHY
- Publication number 20220338333
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Shuo SU
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
LAMP, LIGHT SOURCE DEVICE, EXPOSURE APPARATUS, AND ARTICLE MANUFACT...
- Publication number 20220326621
- Publication date Oct 13, 2022
- Canon Kabushiki Kaisha
- Hiroyuki Tomita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION SOURCE FOR LITHOGRAPHY PROCESS
- Publication number 20220197160
- Publication date Jun 23, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shang-Ying WU
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
- Publication number 20220179328
- Publication date Jun 9, 2022
- ASML NETHERLANDS B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL DIFFRACTION COMPONENT
- Publication number 20220171292
- Publication date Jun 2, 2022
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
- Publication number 20210364934
- Publication date Nov 25, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IN-SITU LIGHT DETECTION METHODS AND APPARATUS FOR ULTRAVIOLET SEMIC...
- Publication number 20210223707
- Publication date Jul 22, 2021
- Applied Materials, Inc.
- RALPH PETER ANTONIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV RADIATION SOURCE APPARATUS FOR LITHOGRAPHY
- Publication number 20210208508
- Publication date Jul 8, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Chih CHEN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
RADIATION SOURCE FOR LITHOGRAPHY PROCESS
- Publication number 20210173316
- Publication date Jun 10, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shang-Ying WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
- Publication number 20210063899
- Publication date Mar 4, 2021
- Chunguang Xia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
- Publication number 20210033983
- Publication date Feb 4, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV VESSEL INSPECTION METHOD AND RELATED SYSTEM
- Publication number 20200348241
- Publication date Nov 5, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Lin Louis CHANG
- G01 - MEASURING TESTING
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE AND ELECTRONIC DEVICE M...
- Publication number 20200301285
- Publication date Sep 24, 2020
- Gigaphoton Inc.
- Shinji NAGAI
- B82 - NANO-TECHNOLOGY
Information Patent Application
RADIATION SOURCE FOR LITHOGRAPHY PROCESS
- Publication number 20200278617
- Publication date Sep 3, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shang-Ying WU
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS
- Publication number 20200077501
- Publication date Mar 5, 2020
- Gigaphoton Inc.
- Hiroaki TOMURO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEM, METHOD AND APPARATUS FOR TARGET MATERIAL DEBRIS CLEANING OF...
- Publication number 20200037428
- Publication date Jan 30, 2020
- ASML NETHERLANDS B.V.
- Jonghoon Baek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV VESSEL INSPECTION METHOD AND RELATED SYSTEM
- Publication number 20200025688
- Publication date Jan 23, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Lin Louis CHANG
- G01 - MEASURING TESTING
Information Patent Application
EUV LIGHT SOURCE AND APPARATUS FOR LITHOGRAPHY
- Publication number 20200008290
- Publication date Jan 2, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Shuo SU
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Lamphouse reflector arrangements

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mirror, in particular for a microlithographic projection exposure a...

Cleaning a structure surface in an EUV chamber

Extreme ultraviolet lithography system

EUV light source and apparatus for lithography

Optical diffraction component

Radiation source for lithography process

Collector mirror and apparatus for creating extreme ultraviolet lig...

Lamp, light source device, exposure apparatus, and article manufact...

EUV radiation source apparatus for lithography

Cleaning a structure surface in an EUV chamber

Radiation source for lithography process

In-situ light detection methods and apparatus for ultraviolet semic...

EUV vessel inspection method and related system

Extreme ultraviolet lithography system

Extreme ultraviolet light generation device and electronic device m...

Optical assembly with a protective element and optical arrangement...

System, method and apparatus for target material debris cleaning of...

Extreme ultraviolet light generation apparatus and electronic devic...

EUV radiation source apparatus for lithography

Radiation source for lithography process

Collector pellicle

EUV light source and apparatus for lithography

Extreme ultraviolet light generation apparatus

EUV vessel inspection method and related system

Suppression filter, radiation collector and radiation source for a...

Radiation source for lithography process

Faceted EUV optical element

EUV Collector

Method of controlling debris in an EUV light source

System, method and apparatus for target material debris cleaning of...

Patents Applicationslast 30 patents

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM

OPTICAL COMPONENT GROUP, IN PARTICULAR FOR USE IN AN ILLUMINATION D...

DETECTION APPARATUS, ALIGNMENT MICROSCOPE, AND EXPOSURE APPARATUS

EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE

EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS

OPTICAL SYSTEM FOR A LITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

RADIATION COLLECTOR

OPTICAL ELEMENT, IN PARTICULAR FOR REFLECTING EUV RADIATION, OPTICA...

EUV COLLECTOR

OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

EUV RADIATION SOURCE APPARATUS FOR LITHOGRAPHY

EUV LIGHT SOURCE AND APPARATUS FOR LITHOGRAPHY

LAMP, LIGHT SOURCE DEVICE, EXPOSURE APPARATUS, AND ARTICLE MANUFACT...

RADIATION SOURCE FOR LITHOGRAPHY PROCESS

CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER

OPTICAL DIFFRACTION COMPONENT

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM

IN-SITU LIGHT DETECTION METHODS AND APPARATUS FOR ULTRAVIOLET SEMIC...

EUV RADIATION SOURCE APPARATUS FOR LITHOGRAPHY

RADIATION SOURCE FOR LITHOGRAPHY PROCESS

CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM

EUV VESSEL INSPECTION METHOD AND RELATED SYSTEM

EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE AND ELECTRONIC DEVICE M...

RADIATION SOURCE FOR LITHOGRAPHY PROCESS

EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS

SYSTEM, METHOD AND APPARATUS FOR TARGET MATERIAL DEBRIS CLEANING OF...

EUV VESSEL INSPECTION METHOD AND RELATED SYSTEM

EUV LIGHT SOURCE AND APPARATUS FOR LITHOGRAPHY