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H01J37/10

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/10Lenses

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Particle beam system and the use thereof for flexibly setting the c...
- Patent number 12,119,204
- Issue date Oct 15, 2024
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to correct first order astigmatism and first order distortio...
- Patent number 12,106,933
- Issue date Oct 1, 2024
- FEI Company
- Jan Stopka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple charged-particle beams
- Patent number 12,080,515
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a multiple particle beam system while altering...
- Patent number 12,057,290
- Issue date Aug 6, 2024
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and inspection method
- Patent number 12,057,288
- Issue date Aug 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam electronics scan
- Patent number 12,014,895
- Issue date Jun 18, 2024
- KLA Corporation
- Tomas Plettner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple electron-beam image acquisition apparatus and multiple ele...
- Patent number 11,961,703
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Chosaku Noda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transmission charged particle microscope with an electron energy lo...
- Patent number 11,955,310
- Issue date Apr 9, 2024
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,887,807
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Setting position of a particle beam device component
- Patent number 11,837,434
- Issue date Dec 5, 2023
- Carl Zeiss Microscopy GmbH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle optical device, objective lens assembly, detector,...
- Patent number 11,821,859
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,817,289
- Issue date Nov 14, 2023
- HITACHI HIGH-TECH CORPORATION
- Tsunenori Nomaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system, method of operating a charged particl...
- Patent number 11,810,749
- Issue date Nov 7, 2023
- Carl Zeiss SMT GmbH
- Eugen Foca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of determining aberrations of a charged particle beam, and...
- Patent number 11,810,753
- Issue date Nov 7, 2023
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Dominik Ehberger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,791,124
- Issue date Oct 17, 2023
- Hitachi High-Technologies Corporation
- Yuta Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,784,023
- Issue date Oct 10, 2023
- Hitachi High-Technologies Corporation
- Yuta Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring aberration and electron microscope
- Patent number 11,764,029
- Issue date Sep 19, 2023
- Jeol Ltd.
- Shigeyuki Morishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wien filter and charged particle beam imaging apparatus
- Patent number 11,756,761
- Issue date Sep 12, 2023
- Zhongke Jingyuan Electron Limited, Beijing (CN)
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transmission electron microscope and method of adjusting optical sy...
- Patent number 11,742,176
- Issue date Aug 29, 2023
- Jeol Ltd.
- Kazuki Yagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and method of adjusti...
- Patent number 11,740,546
- Issue date Aug 29, 2023
- NuFlare Technology, Inc.
- Tsubasa Nanao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,705,304
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of charged-particle beam such as scanning electron micros...
- Patent number 11,664,189
- Issue date May 30, 2023
- BORRIES PTE. LTD.
- Zhongwei Chen
- B08 - CLEANING
Information Patent Grant
Charged particle beam adjustment method, charged particle beam draw...
- Patent number 11,658,002
- Issue date May 23, 2023
- NuFlare Technology, Inc.
- Ryoichi Kakehi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and method for the particle-optical examinatio...
- Patent number 11,657,999
- Issue date May 23, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatially phase-modulated electron wave generation device
- Patent number 11,651,930
- Issue date May 16, 2023
- HITACHI HIGH-TECH CORPORATION
- Makoto Kuwahara
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Multiple electron beam writing apparatus and multiple electron beam...
- Patent number 11,621,140
- Issue date Apr 4, 2023
- NuFlare Technology, Inc.
- Kota Iwasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,587,758
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern inspection apparatus and pattern outline position acquisiti...
- Patent number 11,569,057
- Issue date Jan 31, 2023
- NuFlare Technology, Inc.
- Shinji Sugihara
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle source module
- Patent number 11,557,455
- Issue date Jan 17, 2023
- ASML Netherlands B.V.
- Laura Dinu-Gurtler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and sample observation method using the same
- Patent number 11,551,907
- Issue date Jan 10, 2023
- Riken
- Ken Harada
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR MANUFACTURING DEVICE AND CONTROL OF THE SAME
- Publication number 20240412407
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Junghee Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTI-BEAM PARTICLE MICROSCOPE FOR REDUCING PARTICLE BEAM-INDUCED T...
- Publication number 20240402104
- Publication date Dec 5, 2024
- Carl Zeiss MultiSEM GmbH
- Gero Storeck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Fully Integrated Microcrystal Electron Diffra...
- Publication number 20240387141
- Publication date Nov 21, 2024
- The Regents of the University of California
- Tamir Gonen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATI...
- Publication number 20240371596
- Publication date Nov 7, 2024
- Carl Zeiss MultiSEM GmbH
- Ingo Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETERMINING AN ENERGY SPECTRUM OR ENERGY WIDTH OF A CHARG...
- Publication number 20240371600
- Publication date Nov 7, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-VACUUM CHAMBER CONTROLLED-GAS-FILM DEVICE TO REDUCE LASER ABLATI...
- Publication number 20240363304
- Publication date Oct 31, 2024
- FEI Company
- Jaroslav Velcovský
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...
- Publication number 20240347316
- Publication date Oct 17, 2024
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE DEVICE, CHARGED PARTICLE ASSESSMENT APPARATUS, MEA...
- Publication number 20240339292
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...
- Publication number 20240331968
- Publication date Oct 3, 2024
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE OPTICAL DEVICE
- Publication number 20240321547
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM MICROSCOPE
- Publication number 20240302542
- Publication date Sep 12, 2024
- CARL ZEISS MICROSCOPY GMBH
- Erik Essers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSMISSION CHARGED PARTICLE MICROSCOPE WITH AN ELECTRON ENERGY LO...
- Publication number 20240258067
- Publication date Aug 1, 2024
- FEI Company
- Peter Christiaan TIEMEIJER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM PARTICLE BEAM SYSTEM
- Publication number 20240234080
- Publication date Jul 11, 2024
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Alignment Free Ion Column
- Publication number 20240222067
- Publication date Jul 4, 2024
- FEI Company
- Radek Smolka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM CURRENT CONTROL
- Publication number 20240203687
- Publication date Jun 20, 2024
- Carl Zeiss MultiSEM GmbH
- Gero Storeck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM PARTICLE BEAM SYSTEM
- Publication number 20240136146
- Publication date Apr 25, 2024
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20240128044
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM CHARGED PARTICLE SOURCE WITH ALIGHMENT MEANS
- Publication number 20240096585
- Publication date Mar 21, 2024
- Technische Universiteit Delft
- Pieter KRUIT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE OPTICAL DEVICE, OBJECTIVE LENS ASSEMBLY, DETECTOR,...
- Publication number 20240044824
- Publication date Feb 8, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM, METHOD OF OPERATING A CHARGED PARTICL...
- Publication number 20240038482
- Publication date Feb 1, 2024
- Carl Zeiss SMT GMBH
- Eugen Foca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL SYSTEM AND METHOD OF OPERATING AN ELECTRON-OPTICAL...
- Publication number 20240029995
- Publication date Jan 25, 2024
- ASML NETHERLANDS B.V.
- Stijn Wilem Herman Karel STEENBRINK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20240014003
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Specimen Observation Method
- Publication number 20230343549
- Publication date Oct 26, 2023
- Hitachi High-Tech Corporation
- Masahiro FUKUTA
- G01 - MEASURING TESTING
Information Patent Application
ELECTRON BEAM SYSTEM
- Publication number 20230317404
- Publication date Oct 5, 2023
- Focus-eBeam Technology (Beijing) Co., Ltd.
- Shuai LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOELECTRIC SURFACE ELECTRON SOURCE
- Publication number 20230290605
- Publication date Sep 14, 2023
- Hamamatsu Photonics K.K.
- Tomohiko HIRANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS RESERVOIR, GAS SUPPLY DEVICE HAVING A GAS RESERVOIR, AND PARTIC...
- Publication number 20230282442
- Publication date Sep 7, 2023
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20230282441
- Publication date Sep 7, 2023
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY DEVICE, SYSTEM HAVING A GAS SUPPLY DEVICE, AND PARTICLE...
- Publication number 20230241650
- Publication date Aug 3, 2023
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- B08 - CLEANING
Information Patent Application
Focused Ion Beam System and Method of Correcting Deviation of Field...
- Publication number 20230230801
- Publication date Jul 20, 2023
- JEOL Ltd.
- Yuichiro Ohori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL DEVICE, METHOD OF COMPENSATING FOR VARIATIONS IN A...
- Publication number 20230207253
- Publication date Jun 29, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Particle beam system and the use thereof for flexibly setting the c...

Method to correct first order astigmatism and first order distortio...

Apparatus for multiple charged-particle beams

Method for operating a multiple particle beam system while altering...

Charged particle beam device and inspection method

Multi-beam electronics scan

Multiple electron-beam image acquisition apparatus and multiple ele...

Transmission charged particle microscope with an electron energy lo...

Apparatus of plural charged-particle beams

Setting position of a particle beam device component

Charged particle optical device, objective lens assembly, detector,...

Charged particle beam device

Charged particle beam system, method of operating a charged particl...

Methods of determining aberrations of a charged particle beam, and...

Charged particle beam apparatus

Charged particle beam apparatus

Method of measuring aberration and electron microscope

Wien filter and charged particle beam imaging apparatus

Transmission electron microscope and method of adjusting optical sy...

Multi charged particle beam writing apparatus and method of adjusti...

Apparatus of plural charged-particle beams

Apparatus of charged-particle beam such as scanning electron micros...

Charged particle beam adjustment method, charged particle beam draw...

Particle beam system and method for the particle-optical examinatio...

Spatially phase-modulated electron wave generation device

Multiple electron beam writing apparatus and multiple electron beam...

Apparatus of plural charged-particle beams

Pattern inspection apparatus and pattern outline position acquisiti...

Charged particle source module

Electron microscope and sample observation method using the same

Patents Applicationslast 30 patents

SEMICONDUCTOR MANUFACTURING DEVICE AND CONTROL OF THE SAME

MULTI-BEAM PARTICLE MICROSCOPE FOR REDUCING PARTICLE BEAM-INDUCED T...

System and Method for Fully Integrated Microcrystal Electron Diffra...

MULTIPLE CHARGED PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATI...

METHOD OF DETERMINING AN ENERGY SPECTRUM OR ENERGY WIDTH OF A CHARG...

IN-VACUUM CHAMBER CONTROLLED-GAS-FILM DEVICE TO REDUCE LASER ABLATI...

METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...

CHARGED PARTICLE DEVICE, CHARGED PARTICLE ASSESSMENT APPARATUS, MEA...

CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...

CHARGED-PARTICLE OPTICAL DEVICE

PARTICLE BEAM MICROSCOPE

TRANSMISSION CHARGED PARTICLE MICROSCOPE WITH AN ELECTRON ENERGY LO...

MULTI-BEAM PARTICLE BEAM SYSTEM

Method for Alignment Free Ion Column

MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM CURRENT CONTROL

MULTI-BEAM PARTICLE BEAM SYSTEM

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

MULTI-BEAM CHARGED PARTICLE SOURCE WITH ALIGHMENT MEANS

CHARGED PARTICLE OPTICAL DEVICE, OBJECTIVE LENS ASSEMBLY, DETECTOR,...

CHARGED PARTICLE BEAM SYSTEM, METHOD OF OPERATING A CHARGED PARTICL...

ELECTRON-OPTICAL SYSTEM AND METHOD OF OPERATING AN ELECTRON-OPTICAL...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

Charged Particle Beam Device and Specimen Observation Method

ELECTRON BEAM SYSTEM

PHOTOELECTRIC SURFACE ELECTRON SOURCE

GAS RESERVOIR, GAS SUPPLY DEVICE HAVING A GAS RESERVOIR, AND PARTIC...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

GAS SUPPLY DEVICE, SYSTEM HAVING A GAS SUPPLY DEVICE, AND PARTICLE...

Focused Ion Beam System and Method of Correcting Deviation of Field...

ELECTRON-OPTICAL DEVICE, METHOD OF COMPENSATING FOR VARIATIONS IN A...