Loading effect mitigation

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CPC
Y10S438/941

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S438/00Semiconductor device manufacturing: process

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Y10S438/941Loading effect mitigation

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Patents Grantslast 30 patents

Information Patent Grant
Methods of fabricating multiple sets of field effect transistors
- Patent number 7,368,372
- Issue date May 6, 2008
- Micron Technology, Inc.
- Fred D. Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating multiple sets of field effect transistors
- Patent number 7,067,378
- Issue date Jun 27, 2006
- Micron Technology, Inc.
- Fred D. Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating multiple sets of field effect transistors
- Patent number 7,060,569
- Issue date Jun 13, 2006
- Micron Technology, Inc.
- Fred D. Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating multiple sets of field effect transistors
- Patent number 7,060,570
- Issue date Jun 13, 2006
- Micron Technology, Inc.
- Fred D. Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating multiple sets of field effect transistors
- Patent number 6,927,135
- Issue date Aug 9, 2005
- Micron Technology, Inc.
- Fred D. Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor device and a substrate proce...
- Patent number 6,720,274
- Issue date Apr 13, 2004
- Hitachi Kokusai Electric Inc.
- Takashi Ozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with enhanced plasma uniformity by gas addition, red...
- Patent number 6,125,788
- Issue date Oct 3, 2000
- Applied Materials, Inc.
- Graham W. Hills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of deposting uniform dielectric film deposition on textured...
- Patent number 6,008,086
- Issue date Dec 28, 1999
- Micron Technology, Inc.
- Klaus F. Schuegraf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing system with gas curtain
- Patent number 5,997,588
- Issue date Dec 7, 1999
- Advanced Semiconductor Materials America, Inc.
- Dennis L. Goodwin
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Precision capacitor array
- Patent number 5,838,032
- Issue date Nov 17, 1998
- Taiwan Semiconductor Manufacturing Company Ltd.
- Jyh-Kang Ting
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for performing plain etching treatment
- Patent number 5,837,093
- Issue date Nov 17, 1998
- Kabushiki Kaisha Toshiba
- Makoto Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform dielectric film deposition on textured surfaces
- Patent number 5,801,104
- Issue date Sep 1, 1998
- Micron Technology, Inc.
- Klaus F. Schuegraf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with enhanced plasma uniformity by gas addition, and...
- Patent number 5,744,049
- Issue date Apr 28, 1998
- Applied Materials, Inc.
- Graham W. Hills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chessboard pattern layout for scribe lines
- Patent number 5,668,401
- Issue date Sep 16, 1997
- Taiwan Semiconductor Manufacturing Company LTD.
- Ying Chen Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making a precision capacitor array
- Patent number 5,635,421
- Issue date Jun 3, 1997
- Taiwan Semiconductor Manufacturing Company
- Jyh-Kang Ting
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor chips separated by scribe lines...
- Patent number 5,622,899
- Issue date Apr 22, 1997
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ying-Chem Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of performing plain etching treatment and apparatus therefor
- Patent number 5,415,728
- Issue date May 16, 1995
- Kabushiki Kaisha Toshiba
- Makoto Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensation of lithographic and etch proximity effects
- Patent number 5,057,462
- Issue date Oct 15, 1991
- AT&T Bell Laboratories
- Juli H. Eisenberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vapor processing of a substrate
- Patent number 4,980,314
- Issue date Dec 25, 1990
- AT&T Bell Laboratories
- Keith E. Strege
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device fabrication by plasma etching
- Patent number 4,226,665
- Issue date Oct 7, 1980
- Bell Telephone Laboratories, Incorporated
- Cyril J. Mogab
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Methods of fabricating multiple sets of field effect transistors
- Publication number 20060166445
- Publication date Jul 27, 2006
- Fred D. Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of fabricating multiple sets of field effect transistors
- Publication number 20050009278
- Publication date Jan 13, 2005
- Fred D. Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of fabricating multiple sets of field effect transistors
- Publication number 20050009280
- Publication date Jan 13, 2005
- Fred D. Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of fabricating multiple sets of field effect transistors
- Publication number 20050009279
- Publication date Jan 13, 2005
- Fred D. Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of fabricating multiple sets of field effect transistors
- Publication number 20040121548
- Publication date Jun 24, 2004
- Fred D. Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating a semiconductor device and a substrate proce...
- Publication number 20030092283
- Publication date May 15, 2003
- Hitachi Kokusai Electric Inc.
- Takashi Ozaki
- H01 - BASIC ELECTRIC ELEMENTS

Loading effect mitigation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods of fabricating multiple sets of field effect transistors

Methods of fabricating multiple sets of field effect transistors

Methods of fabricating multiple sets of field effect transistors

Methods of fabricating multiple sets of field effect transistors

Methods of fabricating multiple sets of field effect transistors

Method for fabricating a semiconductor device and a substrate proce...

Plasma reactor with enhanced plasma uniformity by gas addition, red...

Method of deposting uniform dielectric film deposition on textured...

Semiconductor processing system with gas curtain

Precision capacitor array

Apparatus for performing plain etching treatment

Uniform dielectric film deposition on textured surfaces

Plasma reactor with enhanced plasma uniformity by gas addition, and...

Chessboard pattern layout for scribe lines

Method of making a precision capacitor array

Method of fabricating semiconductor chips separated by scribe lines...

Method of performing plain etching treatment and apparatus therefor

Compensation of lithographic and etch proximity effects

Vapor processing of a substrate

Device fabrication by plasma etching

Patents Applicationslast 30 patents

Methods of fabricating multiple sets of field effect transistors

Methods of fabricating multiple sets of field effect transistors

Methods of fabricating multiple sets of field effect transistors

Methods of fabricating multiple sets of field effect transistors

Methods of fabricating multiple sets of field effect transistors

Method for fabricating a semiconductor device and a substrate proce...