Macromolecular diazonium compounds Macromolecular additives

Industry

CPC
G03F7/021

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/021Macromolecular diazonium compounds Macromolecular additives

Industries

Patents Grantslast 30 patents

Information Patent Grant
Enhanced EUV photoresist materials, formulations and processes
- Patent number 11,681,227
- Issue date Jun 20, 2023
- Alex P. G. Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, its manufacturing method, and manufacturin...
- Patent number 11,592,742
- Issue date Feb 28, 2023
- Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Wei Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound, composition, and method for producing same, underlayer fi...
- Patent number 11,067,889
- Issue date Jul 20, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive adhesive composition, photosensitive conductive adhe...
- Patent number 11,016,385
- Issue date May 25, 2021
- Industrial Technology Research Institute
- Yi-Chi Yang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Black photosensitive resin composition and black column spacer prep...
- Patent number 10,884,335
- Issue date Jan 5, 2021
- Rohm and Haas Electronic Materials Korea Ltd.
- Hyung Gu Jeong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyimide precursor composition, photosensitive resin composition,...
- Patent number 10,538,627
- Issue date Jan 21, 2020
- FUJIFILM Corporation
- Takeshi Kawabata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyimide precursor composition, photosensitive resin composition,...
- Patent number 10,501,580
- Issue date Dec 10, 2019
- FUJIFILM Corporation
- Takeshi Kawabata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Diazo-resin, photoresist composition and method of preparing same
- Patent number 10,303,053
- Issue date May 28, 2019
- BOE Technology Group Co., Ltd.
- Jianguo Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, polymer, photosensitive resin composition, and color filter
- Patent number 10,101,655
- Issue date Oct 16, 2018
- Samsung SDI Co., Ltd.
- Kyuyoung Kim
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive resin composition for screen printing, photosensitiv...
- Patent number 9,588,424
- Issue date Mar 7, 2017
- SUNTYPE CO., LTD.
- Yoshio Umeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition containing a protected hydroxyl group for n...
- Patent number 8,846,295
- Issue date Sep 30, 2014
- International Business Machines Corporation
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Bakeable lithographic printing plates with a high resistance to che...
- Patent number 8,137,891
- Issue date Mar 20, 2012
- Eastman Kodak Company
- Mathias Jarek
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Photo-sensitive composition
- Patent number 7,695,875
- Issue date Apr 13, 2010
- Koninklijke Philips Electronics
- Fredericus Johannes Touwslager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Water-developable infrared-sensitive printing plate
- Patent number 7,659,046
- Issue date Feb 9, 2010
- Eastman Kodak Company
- Heidi M. Munnelly
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
On-press developable negative-working imageable elements
- Patent number 7,592,128
- Issue date Sep 22, 2009
- Eastman Kodak Company
- Jianbing Huang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process of preparing planographic printing plate
- Patent number 7,316,892
- Issue date Jan 8, 2008
- Konica Minolta Medical & Graphic Inc.
- Yasuhiko Takamuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative photosensitive composition and negative photosensitive lit...
- Patent number 7,291,438
- Issue date Nov 6, 2007
- Eastman Kodak Company
- Hideo Sakurai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imageable element with solvent-resistant polymeric binder
- Patent number 7,261,998
- Issue date Aug 28, 2007
- Eastman Kodak Company
- Kouji Hayashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Printing plates using binder resins having polyethylene oxide segments
- Patent number 7,258,964
- Issue date Aug 21, 2007
- Eastman Kodak Company
- Jianbing Huang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Preparation of solvent-resistant binder for an imageable element
- Patent number 7,172,850
- Issue date Feb 6, 2007
- Eastman Kodak Company
- Heidi M. Munnelly
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process of preparing planographic printing plate
- Patent number 7,147,991
- Issue date Dec 12, 2006
- Konica Minolta Medical & Graphic, Inc.
- Toshiyuki Matsumura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imageable composition containing an infrared absorber with counter...
- Patent number 7,056,639
- Issue date Jun 6, 2006
- Eastman Kodak Company
- Eiji Hayakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition
- Patent number 7,049,043
- Issue date May 23, 2006
- Fuji Photo Film Co., Ltd.
- Ippei Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imageable composition containing colorant having a counter anion de...
- Patent number 6,921,620
- Issue date Jul 26, 2005
- Kodak Polychrome Graphics LLC
- Eiji Hayakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Recording material having a negative-working, radiation-sensitive l...
- Patent number 6,911,291
- Issue date Jun 28, 2005
- Agfa-Gevaert
- Michael Dörr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
On-press developable IR sensitive printing plates using binder resi...
- Patent number 6,899,994
- Issue date May 31, 2005
- Kodak Polychrome Graphics LLC
- Jianbing Huang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive compositions having mixtures of alkoxy and non-alkox...
- Patent number 6,861,196
- Issue date Mar 1, 2005
- Kodak Polychrome Graphics LLC
- Stephan J. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition and negative working lithographic printi...
- Patent number 6,858,373
- Issue date Feb 22, 2005
- Fuji Photo Film Co., Ltd.
- Kazuto Kunita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive composition comprising a phenol resin having a urea...
- Patent number 6,824,947
- Issue date Nov 30, 2004
- Kodak Polychrome Graphics, LLC
- Yasuhiro Ishizuka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of processing a printing plate material with a single-fluid ink
- Patent number 6,815,139
- Issue date Nov 9, 2004
- Agfa-Gevaert
- Jo Vander Aa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
WELDING METHOD FOR CREATING AN UPSCALED MASTER
- Publication number 20230280649
- Publication date Sep 7, 2023
- Morphotonics Holding B.V.
- Leon Willem VELDHUIZEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD...
- Publication number 20230236505
- Publication date Jul 27, 2023
- SAN-APRO LTD.
- Takuto NAKAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230236502
- Publication date Jul 27, 2023
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION AND FLOW CELLS INCORPORATING THE SAME
- Publication number 20220404699
- Publication date Dec 22, 2022
- Illumina, Inc.
- Yekaterina Rokhlenko
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photoresist Composition, its Manufacturing Method, and Manufacturin...
- Publication number 20210333710
- Publication date Oct 28, 2021
- HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Wei Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-RESOLUTION FLEXOGRAPHIC PRINTING PLATE WITH IMPROVED BARRIER L...
- Publication number 20210173307
- Publication date Jun 10, 2021
- FOLEX AG
- François Varescon
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Enhanced EUV Photoresist Materials, Formulations and Processes
- Publication number 20200272050
- Publication date Aug 27, 2020
- IRRESISTIBLE MATERIALS, LTD
- Alex P. G. Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLACK PHOTOSENSITIVE RESIN COMPOSITION AND BLACK COLUMN SPACER PREP...
- Publication number 20190018318
- Publication date Jan 17, 2019
- Rohm and Haas Electronic Materials Korea Ltd.
- Hyung Gu Jeong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, COMPOSITION, AND METHOD FOR PRODUCING SAME, UNDERLAYER FI...
- Publication number 20180246407
- Publication date Aug 30, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi ECHIGO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, CURED PRO...
- Publication number 20170329220
- Publication date Nov 16, 2017
- Hitachi Chemical Company, Ltd.
- Tetsuya KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND, POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, AND COLOR FILTER
- Publication number 20170248846
- Publication date Aug 31, 2017
- Samsung SDI Co., Ltd.
- Kyuyoung KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DIAZO-RESIN, PHOTORESIST COMPOSITION AND METHOD OF PREPARING SAME
- Publication number 20160334704
- Publication date Nov 17, 2016
- Jianguo WANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION CONTAINING A PROTECTED HYDROXYL GROUP FOR N...
- Publication number 20140072915
- Publication date Mar 13, 2014
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION CONTAINING A PROTECTED HYDROXYL GROUP FOR N...
- Publication number 20130288178
- Publication date Oct 31, 2013
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ON-PRESS DEVELOPABLE NEGATIVE-WORKING IMAGEABLE ELEMENTS
- Publication number 20100015549
- Publication date Jan 21, 2010
- Jianbing Huang
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
BAKEABLE LITHOGRAPHIC PRINTING PLATES WITH A HIGH RESISTANCE TO CHE...
- Publication number 20090269554
- Publication date Oct 29, 2009
- Mathias Jarek
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Optical information recording medium, optical information recording...
- Publication number 20070047420
- Publication date Mar 1, 2007
- Fuji Photo Film Co., Ltd.
- Naoto Yanagihara
- G11 - INFORMATION STORAGE
Information Patent Application
On-press developable negative-working imageable elements
- Publication number 20060269874
- Publication date Nov 30, 2006
- KODAK POLYCHROME GRAPHICS LLC.
- Jianbing Huang
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Negative photosensitive composition and negative photosensitive lit...
- Publication number 20060251987
- Publication date Nov 9, 2006
- Hideo Sakurai
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Increased sensitivity, UV imageable photographic elements
- Publication number 20050277051
- Publication date Dec 15, 2005
- Anocoil Corporation
- Stephan J.W. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Increased sensitivity, IR, and UV imageable photographic elements
- Publication number 20050277053
- Publication date Dec 15, 2005
- Anocoil Corporation
- Stephan J.W. Platzer
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Process of preparing planographic printing plate
- Publication number 20050214685
- Publication date Sep 29, 2005
- Medical & Graphic, Inc.
- Yasuhiko Takamuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process of preparing planographic printing plate
- Publication number 20050196700
- Publication date Sep 8, 2005
- KONICA MINOLTA MEDICAL & GRAPHIC, INC.
- Toshiyuki Matsumura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Printing plates using binder resins having polyethylene oxide segments
- Publication number 20050170286
- Publication date Aug 4, 2005
- Kodak Polychrome
- Jianbing Huang
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Water-developable infrared-sensitive printing plate
- Publication number 20050123853
- Publication date Jun 9, 2005
- Kodak Polychrome Graphics LLC
- Heidi M. Munnelly
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Photo-sensitive composition
- Publication number 20050089791
- Publication date Apr 28, 2005
- Fredericus Johannes Touwslager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imageable composition containing an infrared absorber with counter...
- Publication number 20050079439
- Publication date Apr 14, 2005
- Kodak Polychrome Graphics LLC
- Eiji Hayakawa
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Imageable element with solvent-resistant polymeric binder
- Publication number 20050003285
- Publication date Jan 6, 2005
- Kouji Hayashi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Preparation of solvent-resistant binder for an imageable element
- Publication number 20040260050
- Publication date Dec 23, 2004
- Heidi M. Munnelly
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Photosensitive compositions having mixtures of alkoxy and non-alkox...
- Publication number 20040063022
- Publication date Apr 1, 2004
- KODAK POLYCHROME GRAPHICS, L.L.C.
- Stephan J. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Macromolecular diazonium compounds Macromolecular additives

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Enhanced EUV photoresist materials, formulations and processes

Photoresist composition, its manufacturing method, and manufacturin...

Compound, composition, and method for producing same, underlayer fi...

Photosensitive adhesive composition, photosensitive conductive adhe...

Black photosensitive resin composition and black column spacer prep...

Polyimide precursor composition, photosensitive resin composition,...

Polyimide precursor composition, photosensitive resin composition,...

Diazo-resin, photoresist composition and method of preparing same

Compound, polymer, photosensitive resin composition, and color filter

Photosensitive resin composition for screen printing, photosensitiv...

Photoresist composition containing a protected hydroxyl group for n...

Bakeable lithographic printing plates with a high resistance to che...

Photo-sensitive composition

Water-developable infrared-sensitive printing plate

On-press developable negative-working imageable elements

Process of preparing planographic printing plate

Negative photosensitive composition and negative photosensitive lit...

Imageable element with solvent-resistant polymeric binder

Printing plates using binder resins having polyethylene oxide segments

Preparation of solvent-resistant binder for an imageable element

Process of preparing planographic printing plate

Imageable composition containing an infrared absorber with counter...

Photosensitive composition

Imageable composition containing colorant having a counter anion de...

Recording material having a negative-working, radiation-sensitive l...

On-press developable IR sensitive printing plates using binder resi...

Photosensitive compositions having mixtures of alkoxy and non-alkox...

Photosensitive composition and negative working lithographic printi...

Photosensitive composition comprising a phenol resin having a urea...

Method of processing a printing plate material with a single-fluid ink

Patents Applicationslast 30 patents

WELDING METHOD FOR CREATING AN UPSCALED MASTER

NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

RESIN COMPOSITION AND FLOW CELLS INCORPORATING THE SAME

Photoresist Composition, its Manufacturing Method, and Manufacturin...

HIGH-RESOLUTION FLEXOGRAPHIC PRINTING PLATE WITH IMPROVED BARRIER L...

Enhanced EUV Photoresist Materials, Formulations and Processes

BLACK PHOTOSENSITIVE RESIN COMPOSITION AND BLACK COLUMN SPACER PREP...

COMPOUND, COMPOSITION, AND METHOD FOR PRODUCING SAME, UNDERLAYER FI...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, CURED PRO...

COMPOUND, POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, AND COLOR FILTER

DIAZO-RESIN, PHOTORESIST COMPOSITION AND METHOD OF PREPARING SAME

PHOTORESIST COMPOSITION CONTAINING A PROTECTED HYDROXYL GROUP FOR N...

PHOTORESIST COMPOSITION CONTAINING A PROTECTED HYDROXYL GROUP FOR N...

ON-PRESS DEVELOPABLE NEGATIVE-WORKING IMAGEABLE ELEMENTS

BAKEABLE LITHOGRAPHIC PRINTING PLATES WITH A HIGH RESISTANCE TO CHE...

Optical information recording medium, optical information recording...

On-press developable negative-working imageable elements

Negative photosensitive composition and negative photosensitive lit...

Increased sensitivity, UV imageable photographic elements

Increased sensitivity, IR, and UV imageable photographic elements

Process of preparing planographic printing plate

Process of preparing planographic printing plate

Printing plates using binder resins having polyethylene oxide segments

Water-developable infrared-sensitive printing plate

Photo-sensitive composition

Imageable composition containing an infrared absorber with counter...

Imageable element with solvent-resistant polymeric binder

Preparation of solvent-resistant binder for an imageable element

Photosensitive compositions having mixtures of alkoxy and non-alkox...