Macromolecular quinonediazides Macromolecular additives

Industry

CPC
G03F7/023

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/023Macromolecular quinonediazides Macromolecular additives

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, photosensitive resin sheet, cured...
- Patent number 11,953,830
- Issue date Apr 9, 2024
- Toray Industries, Inc.
- Yusuke Komori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, positive photosensitive resin composition and use
- Patent number 11,886,115
- Issue date Jan 30, 2024
- YANTAI SUNERA LLC
- Zhiguo Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type photosensitive siloxane composition and cured film fo...
- Patent number 11,860,537
- Issue date Jan 2, 2024
- Merck Patent GmbH
- Naofumi Yoshida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, resin sheet, cured film, organic...
- Patent number 11,852,973
- Issue date Dec 26, 2023
- Toray Industries, Inc.
- Yusuke Komori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
DNQ-type photoresist composition including alkali-soluble acrylic r...
- Patent number 11,822,242
- Issue date Nov 21, 2023
- Merck Patent GmbH
- Weihong Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative-type photosensitive resin composition, cured film, element...
- Patent number 11,822,243
- Issue date Nov 21, 2023
- Toray Industries, Inc.
- Yugo Tanigaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Di-amine compound, and heat-resistant resin and resin composition u...
- Patent number 11,802,181
- Issue date Oct 31, 2023
- Toray Industries, Inc.
- Yuki Masuda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer having a structure of polyamide, polyamide-imide, or polyim...
- Patent number 11,768,434
- Issue date Sep 26, 2023
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition, method for preparing the same, and pattern...
- Patent number 11,762,290
- Issue date Sep 19, 2023
- Beijing Asahi Electronic Materials Co., Ltd
- Teng Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhanced EUV photoresist materials, formulations and processes
- Patent number 11,681,227
- Issue date Jun 20, 2023
- Alex P. G. Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition, method for producing heat-resistant resin film,...
- Patent number 11,640,110
- Issue date May 2, 2023
- Toray Industries, Inc.
- Keika Hashimoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive resin composition and method for producing cured rel...
- Patent number 11,640,112
- Issue date May 2, 2023
- Asahi Kasei Kabushiki Kaisha
- Tomohiro Yorisue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition and cured film
- Patent number 11,624,982
- Issue date Apr 11, 2023
- LG Chem, Ltd.
- Seung Yeon Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type photosensitive resin composition
- Patent number 11,592,743
- Issue date Feb 28, 2023
- HD MICROSYSTEMS, LTD.
- Tadamitsu Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type photosensitive resin composition
- Patent number 11,592,744
- Issue date Feb 28, 2023
- HD MICROSYSTEMS, LTD.
- Daisaku Matsukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 11,572,430
- Issue date Feb 7, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, polyimide resin and method of producing the same, photose...
- Patent number 11,572,442
- Issue date Feb 7, 2023
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive-type photosensitive resin composition and cured film prepa...
- Patent number 11,573,490
- Issue date Feb 7, 2023
- Rohm and Haas Electronic Materials Korea Ltd.
- Ji Ung Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition
- Patent number 11,561,469
- Issue date Jan 24, 2023
- Showa Denko K.K.
- Kentaro Furue
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Resist composition and method for producing resist pattern, and met...
- Patent number 11,543,749
- Issue date Jan 3, 2023
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive compositions and applications thereof
- Patent number 11,537,045
- Issue date Dec 27, 2022
- PROMERUS, LLC
- Brian Knapp
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Semiconductor constructions comprising dielectric material, and met...
- Patent number 11,515,198
- Issue date Nov 29, 2022
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist material
- Patent number 11,487,204
- Issue date Nov 1, 2022
- DIC Corporation
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for manufacturing substrate equipped with wiring electrode,...
- Patent number 11,449,180
- Issue date Sep 20, 2022
- Toray Industries, Inc.
- Kohei Takase
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Silicon-rich silsesquioxane resins
- Patent number 11,370,888
- Issue date Jun 28, 2022
- Dow Silicones Corporation
- Peng-Fei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition
- Patent number 11,347,146
- Issue date May 31, 2022
- Toray Industries, Inc.
- Yuki Masuda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polymer, photosensitive resin composition, patterning method, metho...
- Patent number 11,333,975
- Issue date May 17, 2022
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin, photosensitive resin composition, electronic component and d...
- Patent number 11,333,976
- Issue date May 17, 2022
- Toray Industries, Inc.
- Tomoyuki Yuba
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Novolak resins and resist materials
- Patent number 11,254,778
- Issue date Feb 22, 2022
- DIC Corporation
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 11,243,467
- Issue date Feb 8, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...
- Publication number 20240329525
- Publication date Oct 3, 2024
- Asahi Kasei Kabushiki Kaisha
- Tomohiro YORISUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...
- Publication number 20240210827
- Publication date Jun 27, 2024
- Asahi Kasei Kabushiki Kaisha
- Tomohiro YORISUE
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
POLYIMIDES HAVING LOW DIELECTRIC LOSS
- Publication number 20240166818
- Publication date May 23, 2024
- SOLVAY SPECIALTY POLYMERS ITALY S.P.A.
- Dipankar Basak
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM
- Publication number 20230109843
- Publication date Apr 13, 2023
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Jong Han YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED PHOTORESIST
- Publication number 20220365432
- Publication date Nov 17, 2022
- Merck Patent GmbH
- Takanori KUDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DNQ-TYPE PHOTORESIST COMPOSITION INCLUDING ALKALI-SOLUBLE ACRYLIC R...
- Publication number 20220357658
- Publication date Nov 10, 2022
- Merck Patent GmbH
- Weihong LIU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND DISPLAY DEVICE
- Publication number 20220350244
- Publication date Nov 3, 2022
- TORAY INDUSTRIES, INC.
- Hideyuki Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE WORKING PHOTOSENSITIVE MATERIALS
- Publication number 20220342308
- Publication date Oct 27, 2022
- Weihong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION
- Publication number 20220334478
- Publication date Oct 20, 2022
- DONGJIN SEMICHEM CO., LTD.
- Hyoc Min YOUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC EL ELEMENT PARTITION WALL
- Publication number 20220221790
- Publication date Jul 14, 2022
- SHOWA DENKO K.K.
- Yoshikazu ARAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRANSPARENT ELECTRODE, PROCESS FOR PRODUCING TRANSPARENT ELECTRODE,...
- Publication number 20220209151
- Publication date Jun 30, 2022
- Kabushiki Kaisha Toshiba
- Naomi SHIDA
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN SHEET, CURED...
- Publication number 20220155680
- Publication date May 19, 2022
- TORAY INDUSTRIES, INC.
- Yusuke KOMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
- Publication number 20220019141
- Publication date Jan 20, 2022
- Merck Patent GmbH
- Weihong LIU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING CURED REL...
- Publication number 20220011669
- Publication date Jan 13, 2022
- Asahi Kasei Kabushiki Kaisha
- Tomohiro YORISUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST
- Publication number 20210382390
- Publication date Dec 9, 2021
- Merck Patent GmbH
- Medhat A. Toukhy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND MET...
- Publication number 20210278765
- Publication date Sep 9, 2021
- Sumitomo Chemical Company, Limited
- Masako SUGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF MANUFACTURING HIGH-DEFINED PATTERN AND METHOD OF MANUFACT...
- Publication number 20210191263
- Publication date Jun 24, 2021
- Merck Patent GmbH
- Hirokazu IKEDA
- G02 - OPTICS
Information Patent Application
PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF
- Publication number 20210116807
- Publication date Apr 22, 2021
- PROMERUS, LLC
- BRIAN KNAPP
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM FO...
- Publication number 20210116811
- Publication date Apr 22, 2021
- Merck Patent GmbH
- Naofumi YOSHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSIT...
- Publication number 20200409261
- Publication date Dec 31, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...
- Publication number 20200409263
- Publication date Dec 31, 2020
- Asahi Kasei Kabushiki Kaisha
- Tomohiro YORISUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPA...
- Publication number 20200409266
- Publication date Dec 31, 2020
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Ji Ung KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor Constructions Comprising Dielectric Material, and Met...
- Publication number 20200357682
- Publication date Nov 12, 2020
- Micron Technology, Inc.
- Gurtej S. Sandhu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LAMINATE, COMPOSITE, AND METHOD FOR PRODUCING COMPOSITE
- Publication number 20200316914
- Publication date Oct 8, 2020
- FUJIFILM CORPORATION
- Junji KAWAGUCHI
- B32 - LAYERED PRODUCTS
Information Patent Application
PHOTOSENSITIVE SILOXANE COMPOSITION
- Publication number 20200201179
- Publication date Jun 25, 2020
- MERCK PERFORMANCE MATERIALS MANUFACTURING G.K.
- MEGUMI TAKAHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM,...
- Publication number 20200192227
- Publication date Jun 18, 2020
- TORAY INDUSTRIES, INC.
- Keika HASHIMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPA...
- Publication number 20200174368
- Publication date Jun 4, 2020
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Yeonok KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING MATERIAL, COMPOSITION FOR FILM FORMATION FOR LITHOGRAP...
- Publication number 20200157060
- Publication date May 21, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Yasushi MIKI
- G02 - OPTICS
Information Patent Application
POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPA...
- Publication number 20200142304
- Publication date May 7, 2020
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Kahee SHIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Image Offsetting Apparatuses, Systems, and Methods
- Publication number 20200081342
- Publication date Mar 12, 2020
- John L. Baker
- G02 - OPTICS

Macromolecular quinonediazides Macromolecular additives

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photosensitive resin composition, photosensitive resin sheet, cured...

Resin, positive photosensitive resin composition and use

Positive type photosensitive siloxane composition and cured film fo...

Photosensitive resin composition, resin sheet, cured film, organic...

DNQ-type photoresist composition including alkali-soluble acrylic r...

Negative-type photosensitive resin composition, cured film, element...

Di-amine compound, and heat-resistant resin and resin composition u...

Polymer having a structure of polyamide, polyamide-imide, or polyim...

Photoresist composition, method for preparing the same, and pattern...

Enhanced EUV photoresist materials, formulations and processes

Resin composition, method for producing heat-resistant resin film,...

Photosensitive resin composition and method for producing cured rel...

Photosensitive resin composition and cured film

Positive-type photosensitive resin composition

Positive-type photosensitive resin composition

Compound, resin, resist composition or radiation-sensitive composit...

Compound, polyimide resin and method of producing the same, photose...

Positive-type photosensitive resin composition and cured film prepa...

Photosensitive resin composition

Resist composition and method for producing resist pattern, and met...

Photosensitive compositions and applications thereof

Semiconductor constructions comprising dielectric material, and met...

Resist material

Method for manufacturing substrate equipped with wiring electrode,...

Silicon-rich silsesquioxane resins

Resin composition

Polymer, photosensitive resin composition, patterning method, metho...

Resin, photosensitive resin composition, electronic component and d...

Novolak resins and resist materials

Compound, resin, resist composition or radiation-sensitive composit...

Patents Applicationslast 30 patents

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...

POLYIMIDES HAVING LOW DIELECTRIC LOSS

PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM

CHEMICALLY AMPLIFIED PHOTORESIST

DNQ-TYPE PHOTORESIST COMPOSITION INCLUDING ALKALI-SOLUBLE ACRYLIC R...

PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND DISPLAY DEVICE

POSITIVE WORKING PHOTOSENSITIVE MATERIALS

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION

PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC EL ELEMENT PARTITION WALL

TRANSPARENT ELECTRODE, PROCESS FOR PRODUCING TRANSPARENT ELECTRODE,...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN SHEET, CURED...

POSITIVE WORKING PHOTOSENSITIVE MATERIAL

PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING CURED REL...

NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND MET...

METHOD OF MANUFACTURING HIGH-DEFINED PATTERN AND METHOD OF MANUFACT...

PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF

POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM FO...

COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSIT...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...

POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPA...

Semiconductor Constructions Comprising Dielectric Material, and Met...

LAMINATE, COMPOSITE, AND METHOD FOR PRODUCING COMPOSITE

PHOTOSENSITIVE SILOXANE COMPOSITION

RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM,...

POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPA...

FILM FORMING MATERIAL, COMPOSITION FOR FILM FORMATION FOR LITHOGRAP...

POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPA...

Image Offsetting Apparatuses, Systems, and Methods