Magnet arrangements in particular for cathodic sputtering apparatus

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CPC
H01J37/345

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/345Magnet arrangements in particular for cathodic sputtering apparatus

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Movable magnet array for magnetron sputtering
- Patent number 12,191,128
- Issue date Jan 7, 2025
- Intellivation LLC
- Michael G. Simmons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for particle control in MRAM processing
- Patent number 12,176,192
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Han Kuo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition system and method
- Patent number 12,176,253
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Hao Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron design for improved bottom coverage and uniformity
- Patent number 12,176,191
- Issue date Dec 24, 2024
- Applied Materials, Inc.
- Cory Lafollett
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 12,163,215
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Koji Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition process apparatus and method of optimizin...
- Patent number 12,165,935
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Hung Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum deposition into trenches and vias
- Patent number 12,154,770
- Issue date Nov 26, 2024
- Ascentool, Inc.
- George Xinsheng Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch uniformity improvement for single turn internal coil PVD chamber
- Patent number 12,136,544
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Anthony Chih-Tung Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition method for tuning magnetic field distribution of deposit...
- Patent number 12,129,541
- Issue date Oct 29, 2024
- SKY TECH INC.
- Jing-Cheng Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition apparatus and method thereof
- Patent number 12,094,698
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hsi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for controlling ion fraction in physical vapo...
- Patent number 12,094,699
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,087,563
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Liang Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrically and magnetically enhanced ionized physical vapor depos...
- Patent number 12,077,849
- Issue date Sep 3, 2024
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for adjustable coating using magnetron sputtering...
- Patent number 12,062,531
- Issue date Aug 13, 2024
- Interpane Entwicklungs-und Beratungsgesellschaft mbH
- Dominik Wagner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and apparatus
- Patent number 12,027,353
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Shota Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for generating magnetic fields on substrates during semic...
- Patent number 12,027,352
- Issue date Jul 2, 2024
- Applied Materials, Inc.
- Suhas Bangalore Umesh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputter target magnet
- Patent number 12,020,917
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Jie He
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for physical vapor deposition
- Patent number 12,014,912
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Yu-Young Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus
- Patent number 11,978,615
- Issue date May 7, 2024
- Samsung Display Co., Ltd.
- Hyun-Woo Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for controlling stress variation in a material...
- Patent number 11,961,722
- Issue date Apr 16, 2024
- SPTS Technologies Limited
- Anthony Wilby
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Electromagnet pulsing effect on PVD step coverage
- Patent number 11,952,655
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Kevin Kashefi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tilted PVD source with rotating pedestal
- Patent number 11,948,784
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Harish Penmethsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for particle removal from wafers through plasma modification...
- Patent number 11,932,934
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering system with a plurality of cathode assemblies
- Patent number 11,932,932
- Issue date Mar 19, 2024
- Alluxa, Inc.
- Michael A. Scobey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and a method of controlling thickness variation in a mate...
- Patent number 11,913,109
- Issue date Feb 27, 2024
- SPTS Technologies Limited
- Tony Wilby
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron sputtering apparatus and magnetron sputtering method
- Patent number 11,901,166
- Issue date Feb 13, 2024
- Tokyo Electron Limited
- Tetsuya Miyashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for depositing a material
- Patent number 11,875,980
- Issue date Jan 16, 2024
- Stephen R Burgess
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device, method and machine of manufacture
- Patent number 11,851,749
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jen-Chun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Permeance magnetic assembly
- Patent number 11,854,776
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Jen Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of and apparatus for magnetron sputtering
- Patent number 11,848,179
- Issue date Dec 19, 2023
- EVATEC AG
- Hartmut Rohrmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240347327
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Liang LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR PHYSICAL VAPOR DEPOSITION
- Publication number 20240339310
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Yu-Young WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF...
- Publication number 20240301546
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Thomas Werner Zilbauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetron Design for Improved Bottom Coverage and Uniformity
- Publication number 20240290593
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Cory LAFOLLETT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY
- Publication number 20240282558
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Sathiyamurthi GOVINDASAMY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMATION METHOD AND FILM FORMATION DEVICE
- Publication number 20240274420
- Publication date Aug 15, 2024
- TOKYO ELECTRON LIMITED
- Atsushi SHIMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20240258088
- Publication date Aug 1, 2024
- SAMSUNG DISPLAY CO., LTD.
- HYUN-WOO KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CYLINDRICAL CATHODE AND CHAMBER USING SAME FOR SPUTTERING
- Publication number 20240258087
- Publication date Aug 1, 2024
- INTEVAC, INC.
- Samuel D. Harkness
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS APPARATUS
- Publication number 20240212980
- Publication date Jun 27, 2024
- Samsung Electronics Co., Ltd.
- Jaesuk KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STABLE GROUND ANODE FOR THIN FILM PROCESSING
- Publication number 20240194464
- Publication date Jun 13, 2024
- INTEVAC, INC.
- Samuel D. Harkness
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20240194462
- Publication date Jun 13, 2024
- EMD CORPORATION
- Akinori EBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIAS MAGNETIC FIELD CONTROL METHOD, CONTROL DEVICE, AND SEMICONDUCT...
- Publication number 20240191340
- Publication date Jun 13, 2024
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Yujie GENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION METHOD AND FILM FORMATION APPARATUS
- Publication number 20240183027
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Naoki TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHODS FOR DEPOSITING MATERIAL ON A SUBSTRATE
- Publication number 20240170269
- Publication date May 23, 2024
- Applied Materials, Inc.
- Harish PENMETHSA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS FOR COATING OF 3D-OBJECTS
- Publication number 20240136156
- Publication date Apr 25, 2024
- Evatec AG
- Stephan VOSER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240120182
- Publication date Apr 11, 2024
- TOKYO ELECTRON LIMITED
- Yusuke KIKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device, Method and Machine of Manufacture
- Publication number 20240093357
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jen-Chun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240096609
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Liang LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PERMEANCE MAGNETIC ASSEMBLY
- Publication number 20240087861
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Tsung-Jen YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM DEPOSITION INTO TRENCHES AND VIAS
- Publication number 20240021421
- Publication date Jan 18, 2024
- Ascentool, Inc.
- George Xinsheng Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS AND METHOD OF CONTROLLING FILM FORMING APPAR...
- Publication number 20240021423
- Publication date Jan 18, 2024
- TOKYO ELECTRON LIMITED
- Yasuhiko KOJIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and a Method of Controlling Thickness Variation in a Mate...
- Publication number 20240014018
- Publication date Jan 11, 2024
- SPTS TECHNOLOGIES LIMITED
- Tony WILBY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS AND PROCESS CHAMBER
- Publication number 20230411132
- Publication date Dec 21, 2023
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Shiru WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...
- Publication number 20230402271
- Publication date Dec 14, 2023
- Applied Materials, Inc.
- Xiaodong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR PARTICLE CONTROL IN MRAM PROCESSING
- Publication number 20230386806
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Tsung-Han KUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR TOOL FOR COPPER DEPOSITION
- Publication number 20230386809
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Hung TSAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN SITU AND TUNABLE DEPOSITION OF A FILM
- Publication number 20230374654
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Hsi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION SYSTEM AND METHOD
- Publication number 20230352350
- Publication date Nov 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Hao CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR USE IN GENERATING PLASMA
- Publication number 20230352270
- Publication date Nov 2, 2023
- Dyson Technology Limited
- Sven GAUTER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROMAGNET PULSING EFFECT ON PVD STEP COVERAGE
- Publication number 20230313364
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Kevin KASHEFI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Magnet arrangements in particular for cathodic sputtering apparatus

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Movable magnet array for magnetron sputtering

System and method for particle control in MRAM processing

Deposition system and method

Magnetron design for improved bottom coverage and uniformity

Film forming apparatus and film forming method

Physical vapor deposition process apparatus and method of optimizin...

Vacuum deposition into trenches and vias

Etch uniformity improvement for single turn internal coil PVD chamber

Deposition method for tuning magnetic field distribution of deposit...

Physical vapor deposition apparatus and method thereof

Methods and apparatus for controlling ion fraction in physical vapo...

Semiconductor processing tool and methods of operation

Electrically and magnetically enhanced ionized physical vapor depos...

Method and system for adjustable coating using magnetron sputtering...

Substrate processing method and apparatus

Apparatus for generating magnetic fields on substrates during semic...

Sputter target magnet

Apparatus and method for physical vapor deposition

Sputtering apparatus

Method and apparatus for controlling stress variation in a material...

Electromagnet pulsing effect on PVD step coverage

Tilted PVD source with rotating pedestal

Method for particle removal from wafers through plasma modification...

Sputtering system with a plurality of cathode assemblies

Apparatus and a method of controlling thickness variation in a mate...

Magnetron sputtering apparatus and magnetron sputtering method

Method and apparatus for depositing a material

Semiconductor device, method and machine of manufacture

Permeance magnetic assembly

Methods of and apparatus for magnetron sputtering

Patents Applicationslast 30 patents

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

APPARATUS AND METHOD FOR PHYSICAL VAPOR DEPOSITION

SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF...

Magnetron Design for Improved Bottom Coverage and Uniformity

PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY

FILM FORMATION METHOD AND FILM FORMATION DEVICE

SPUTTERING APPARATUS

CYLINDRICAL CATHODE AND CHAMBER USING SAME FOR SPUTTERING

PLASMA PROCESS APPARATUS

STABLE GROUND ANODE FOR THIN FILM PROCESSING

SPUTTERING APPARATUS

BIAS MAGNETIC FIELD CONTROL METHOD, CONTROL DEVICE, AND SEMICONDUCT...

FILM FORMATION METHOD AND FILM FORMATION APPARATUS

SYSTEM AND METHODS FOR DEPOSITING MATERIAL ON A SUBSTRATE

SPUTTERING APPARATUS FOR COATING OF 3D-OBJECTS

PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS

Semiconductor Device, Method and Machine of Manufacture

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

PERMEANCE MAGNETIC ASSEMBLY

VACUUM DEPOSITION INTO TRENCHES AND VIAS

FILM FORMING APPARATUS AND METHOD OF CONTROLLING FILM FORMING APPAR...

Apparatus and a Method of Controlling Thickness Variation in a Mate...

SEMICONDUCTOR PROCESS APPARATUS AND PROCESS CHAMBER

METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...

SYSTEM AND METHOD FOR PARTICLE CONTROL IN MRAM PROCESSING

SEMICONDUCTOR TOOL FOR COPPER DEPOSITION

IN SITU AND TUNABLE DEPOSITION OF A FILM

DEPOSITION SYSTEM AND METHOD

METHOD AND APPARATUS FOR USE IN GENERATING PLASMA

ELECTROMAGNET PULSING EFFECT ON PVD STEP COVERAGE