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H01L21/67109

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/67109mainly by convection

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor wafer mass metrology apparatus and semiconductor wafe...
- Patent number 12,288,702
- Issue date Apr 29, 2025
- Lam Research Corporation
- Gregor Elliott
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting table and plasma processing apparatus
- Patent number 12,288,713
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,281,389
- Issue date Apr 22, 2025
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Support unit, substrate treating apparatus including the same, and...
- Patent number 12,278,121
- Issue date Apr 15, 2025
- Semes Co., Ltd.
- Kangseop Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer chuck structure with holes in upper surface to improve temper...
- Patent number 12,272,585
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Jung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process control enabled VDC sensor for plasma process
- Patent number 12,272,520
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for treating substrate and temperature control method
- Patent number 12,272,569
- Issue date Apr 8, 2025
- Semes Co., Ltd.
- Sang Min Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced temperature control for wafer carrier in plasma processing...
- Patent number 12,272,575
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Fernando M. Silveira
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method for venting a processing cha...
- Patent number 12,266,508
- Issue date Apr 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for thermal control of devices in electronics tester
- Patent number 12,265,136
- Issue date Apr 1, 2025
- AEHR Test Systems
- Jovan Jovanovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor wafer with wafer chuck havin...
- Patent number 12,249,493
- Issue date Mar 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber with annealing mini-environment
- Patent number 12,249,522
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Michael Honan
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Substrate processing apparatus and ceiling heater
- Patent number 12,241,159
- Issue date Mar 4, 2025
- Kokusai Electric Corporation
- Tetsuya Kosugi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate fixing device and electrostatic chuck
- Patent number 12,243,763
- Issue date Mar 4, 2025
- Shinko Electric Industries Co., Ltd.
- Masakuni Miyazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flange and apparatus for processing substrates
- Patent number 12,243,757
- Issue date Mar 4, 2025
- ASM IP Holding B.V.
- Jeroen de Jonge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chucks with coolant gas zones and corresponding groov...
- Patent number 12,237,201
- Issue date Feb 25, 2025
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for cooling a substrate support
- Patent number 12,232,299
- Issue date Feb 18, 2025
- Applied Materials, Inc.
- Robert Irwin Decottignies
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 12,230,516
- Issue date Feb 18, 2025
- Semes Co., Ltd.
- Jae Oh Bang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exhaust system and process equipment
- Patent number 12,230,517
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsien-Chang Hsieh
- F23 - COMBUSTION APPARATUS COMBUSTION PROCESSES
Information Patent Grant
Substrate support with varying depths of areas between mesas and co...
- Patent number 12,227,840
- Issue date Feb 18, 2025
- Lam Research Corporation
- Keith Gaff
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck heater
- Patent number 12,230,526
- Issue date Feb 18, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cooling sheet attachment apparatus to focusing ring for semiconduct...
- Patent number 12,224,188
- Issue date Feb 11, 2025
- CM TECH Co., Ltd.
- Man Soo Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus with parallel first and second parts o...
- Patent number 12,217,986
- Issue date Feb 4, 2025
- Screen Semiconductor Solutions Co., Ltd.
- Hiroyuki Ogura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device and method of manufacturing substrate p...
- Patent number 12,211,706
- Issue date Jan 28, 2025
- Tokyo Electron Limited
- Manabu Nakagawasai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Baking apparatus
- Patent number 12,211,711
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Bumjin Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for manufacturing display device
- Patent number 12,211,712
- Issue date Jan 28, 2025
- Samsung Display Co., Ltd.
- Jong Jang Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with multiple embedded electrodes
- Patent number 12,198,966
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Philip Allan Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition system and method
- Patent number 12,198,927
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hsi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature adjustment apparatus for high temperature oven
- Patent number 12,188,661
- Issue date Jan 7, 2025
- Yi-Ming Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus for processing substrates
- Patent number 12,183,602
- Issue date Dec 31, 2024
- ASM IP Holding B.V.
- Theodorus Oosterlaken
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SPIN CHUCK AND WAFER CLEANING DEVICE INCLUDING THE SAME
- Publication number 20250140579
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Sunghwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250140552
- Publication date May 1, 2025
- TOKYO ELECTRON LIMITED
- Motoki SHINDEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS WITH PARALLEL FIRST AND SECOND PARTS O...
- Publication number 20250140584
- Publication date May 1, 2025
- SCREEN Semiconductor Solutions Co., Ltd.
- Hiroyuki Ogura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COOLING SYSTEM FOR SEMICONDUCTOR EQUIPMENT
- Publication number 20250132185
- Publication date Apr 24, 2025
- Samsung Electronics Co., Ltd.
- Jonghwa Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION SYSTEM AND METHOD
- Publication number 20250132148
- Publication date Apr 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRE-HEAT RINGS, HEATING SYSTEMS, AND PROCESSING CHAMBERS INCLUDING...
- Publication number 20250132174
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Haifeng ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING STATION
- Publication number 20250125174
- Publication date Apr 17, 2025
- Samsung Electronics Co., Ltd.
- Haechul KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SUSCEPTOR AND METHOD OF MANUFACTURING SAME
- Publication number 20250125184
- Publication date Apr 17, 2025
- MiCo Ceramics Ltd.
- Min-Ho JI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATICALLY SECURED SUBSTRATE SUPPORT ASSEMBLY
- Publication number 20250118586
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Arvinder Manmohan Singh Chadha
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE TREATMENT APPARATUS HAVING HEATING PART
- Publication number 20250096031
- Publication date Mar 20, 2025
- DEVICEENG CO., LTD.
- Taek Youb Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control System For Adaptive Control Of A Thermal Processing System
- Publication number 20250093852
- Publication date Mar 20, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE AND METHOD OF USING THE SAME
- Publication number 20250079230
- Publication date Mar 6, 2025
- NGK Insulators, Ltd.
- Ikuhisa MORIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INJECTOR MOUNTING APPARATUS OF FURNACE
- Publication number 20250075976
- Publication date Mar 6, 2025
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Jianyong Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250066920
- Publication date Feb 27, 2025
- EUGENE TECHNOLOGY CO., LTD.
- In Soo SON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEATER SYSTEM FOR GAS PROCESSING COMPONENTS
- Publication number 20250069913
- Publication date Feb 27, 2025
- WATLOW ELECTRIC MANUFACTURING COMPANY
- Terry COLHOUR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20250068080
- Publication date Feb 27, 2025
- SEMES CO., LTD.
- Kyung Taek IM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RTP SUBSTRATE TEMPERATURE ONE FOR ALL CONTROL ALGORITHM
- Publication number 20250067511
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Wolfgang Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FURNACE INNER TUBE FOR PROCESS UNIFORMITY
- Publication number 20250062139
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- De-Wei YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, MANUFACTURING METHOD, AND SUBSTRATE PR...
- Publication number 20250062125
- Publication date Feb 20, 2025
- Semes Co., Ltd.
- Gyeong Won SONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPROVED THERMAL AND ELECTRICAL INTERFACE BETWEEN PARTS IN AN ETCH...
- Publication number 20250054778
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Anthony DE LA LLERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE ESC FOR RAPID ALTERNATING PROCESS APPLICATIONS
- Publication number 20250054738
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Dan MAROHL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250046628
- Publication date Feb 6, 2025
- EBARA CORPORATION
- Itsuki KOBATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20250046596
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR ACCURATE DETERMINATION OF SEMICONDUCTOR WAF...
- Publication number 20250046633
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung Hsien Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER BOAT TEMPORARY STORAGE DEVICE AND SEMICONDUCTOR PROCESSING DE...
- Publication number 20250038015
- Publication date Jan 30, 2025
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Jinlong LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-TEMPERATURE TUBE FURNACE
- Publication number 20250029848
- Publication date Jan 23, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT
- Publication number 20250022724
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Masanori TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIRFLOW CONTROL METHOD FOR AIR FLOTATION CYCLONE OPERATION OF LOW-P...
- Publication number 20250022726
- Publication date Jan 16, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Jianmin JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DISTRIBUTION ELEMENT AND HEAT TREATMENT DEVICE CONTAINING THE SAME
- Publication number 20250022725
- Publication date Jan 16, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Jianmin JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING DEVICE, SEMICONDUCTOR PROCESSING SYSTEM, A...
- Publication number 20250014932
- Publication date Jan 9, 2025
- HUAYING RESEARCH CO., LTD
- Sophia Ziying WEN
- H01 - BASIC ELECTRIC ELEMENTS

mainly by convection

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor wafer mass metrology apparatus and semiconductor wafe...

Mounting table and plasma processing apparatus

Substrate processing method and substrate processing apparatus

Support unit, substrate treating apparatus including the same, and...

Wafer chuck structure with holes in upper surface to improve temper...

Process control enabled VDC sensor for plasma process

Apparatus for treating substrate and temperature control method

Advanced temperature control for wafer carrier in plasma processing...

Plasma processing apparatus and method for venting a processing cha...

Method and system for thermal control of devices in electronics tester

Method for manufacturing semiconductor wafer with wafer chuck havin...

Processing chamber with annealing mini-environment

Substrate processing apparatus and ceiling heater

Substrate fixing device and electrostatic chuck

Flange and apparatus for processing substrates

Electrostatic chucks with coolant gas zones and corresponding groov...

Methods and apparatus for cooling a substrate support

Substrate treating apparatus and substrate treating method

Exhaust system and process equipment

Substrate support with varying depths of areas between mesas and co...

Electrostatic chuck heater

Cooling sheet attachment apparatus to focusing ring for semiconduct...

Substrate treating apparatus with parallel first and second parts o...

Substrate processing device and method of manufacturing substrate p...

Baking apparatus

Apparatus for manufacturing display device

Substrate support with multiple embedded electrodes

Deposition system and method

Temperature adjustment apparatus for high temperature oven

Substrate processing apparatus for processing substrates

Patents Applicationslast 30 patents

SPIN CHUCK AND WAFER CLEANING DEVICE INCLUDING THE SAME

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE TREATING APPARATUS WITH PARALLEL FIRST AND SECOND PARTS O...

COOLING SYSTEM FOR SEMICONDUCTOR EQUIPMENT

DEPOSITION SYSTEM AND METHOD

PRE-HEAT RINGS, HEATING SYSTEMS, AND PROCESSING CHAMBERS INCLUDING...

COOLING STATION

CERAMIC SUSCEPTOR AND METHOD OF MANUFACTURING SAME

ELECTROSTATICALLY SECURED SUBSTRATE SUPPORT ASSEMBLY

SUBSTRATE TREATMENT APPARATUS HAVING HEATING PART

Control System For Adaptive Control Of A Thermal Processing System

WAFER PLACEMENT TABLE AND METHOD OF USING THE SAME

INJECTOR MOUNTING APPARATUS OF FURNACE

SUBSTRATE PROCESSING APPARATUS

HEATER SYSTEM FOR GAS PROCESSING COMPONENTS

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

RTP SUBSTRATE TEMPERATURE ONE FOR ALL CONTROL ALGORITHM

FURNACE INNER TUBE FOR PROCESS UNIFORMITY

SUBSTRATE PROCESSING METHOD, MANUFACTURING METHOD, AND SUBSTRATE PR...

IMPROVED THERMAL AND ELECTRICAL INTERFACE BETWEEN PARTS IN AN ETCH...

TUNABLE ESC FOR RAPID ALTERNATING PROCESS APPLICATIONS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

SYSTEMS AND METHODS FOR ACCURATE DETERMINATION OF SEMICONDUCTOR WAF...

WAFER BOAT TEMPORARY STORAGE DEVICE AND SEMICONDUCTOR PROCESSING DE...

HIGH-TEMPERATURE TUBE FURNACE

SUBSTRATE SUPPORT

AIRFLOW CONTROL METHOD FOR AIR FLOTATION CYCLONE OPERATION OF LOW-P...

GAS DISTRIBUTION ELEMENT AND HEAT TREATMENT DEVICE CONTAINING THE SAME

SEMICONDUCTOR PROCESSING DEVICE, SEMICONDUCTOR PROCESSING SYSTEM, A...