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H01L21/67109

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/67109mainly by convection

Industries

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Patents Grantslast 30 patents

Information Patent Grant
RTP substrate temperature one for all control algorithm
- Patent number 12,169,098
- Issue date Dec 17, 2024
- Applied Materials, Inc.
- Wolfgang Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,165,886
- Issue date Dec 10, 2024
- Shibaura Mechatronics Corporation
- Kensuke Demura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial control of plasma processing environments
- Patent number 12,159,767
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,154,797
- Issue date Nov 26, 2024
- Ebara Corporation
- Itsuki Kobata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support
- Patent number 12,148,636
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Masanori Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and temperature control method
- Patent number 12,142,501
- Issue date Nov 12, 2024
- Tokyo Electron Limited
- Kenichiro Yamada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning apparatus for component for semiconductor production appar...
- Patent number 12,139,788
- Issue date Nov 12, 2024
- Taiyo Nippon Sanso Corporation
- Akira Yamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heating platform, thermal treatment and manufacturing method
- Patent number 12,142,497
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsiao-Hua Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment device
- Patent number 12,138,671
- Issue date Nov 12, 2024
- Shibaura Mechatronics Corporation
- Minami Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of plasma sheath with bias supplies
- Patent number 12,142,460
- Issue date Nov 12, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical batch furnace assembly comprising a cooling gas supply
- Patent number 12,130,084
- Issue date Oct 29, 2024
- ASM IP Holding B.V.
- Melvin Verbaas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated epitaxy and preclean system
- Patent number 12,125,698
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 12,123,091
- Issue date Oct 22, 2024
- Kokusai Electric Corporation
- Takayuki Nakada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone pedestal heater without vias
- Patent number 12,127,310
- Issue date Oct 22, 2024
- Watlow Electric Manufacturing Company
- Kevin Ptasienski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitrogen injection for arc lamps
- Patent number 12,120,780
- Issue date Oct 15, 2024
- Mattson Technology, Inc.
- Rolf Bremensdorfer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching chemistries of high aspect ratio features in dielect...
- Patent number 12,119,243
- Issue date Oct 15, 2024
- Lam Research Corporation
- Keren J. Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Steam-assisted single substrate cleaning process and apparatus
- Patent number 12,106,976
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Jianshe Tang
- B08 - CLEANING
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 12,094,706
- Issue date Sep 17, 2024
- Semes Co., Ltd.
- Myung Chan Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,087,598
- Issue date Sep 10, 2024
- Kokusai Electric Corporation
- Hideto Tateno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, temperature control method, and temper...
- Patent number 12,087,559
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heater, temperature control system, and processing apparatus
- Patent number 12,085,338
- Issue date Sep 10, 2024
- Kokusai Electric Corporation
- Tetsuya Kosugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rapid thermal processing system with cooling system
- Patent number 12,068,177
- Issue date Aug 20, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Manuel Sohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced temperature monitoring system and methods for semiconducto...
- Patent number 12,068,180
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Xuesong Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tool for annealing of magnetic stacks
- Patent number 12,069,789
- Issue date Aug 20, 2024
- III Holdings 1, LLC
- Krishnakumar Mani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 12,065,741
- Issue date Aug 20, 2024
- Kokusai Electric Corporation
- Mikio Ohno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Using cumulative heat amount data to qualify hot plate used for pos...
- Patent number 12,062,542
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Cheng Chao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and particle removal method
- Patent number 12,062,557
- Issue date Aug 13, 2024
- Tokyo Electron Limited
- Genichi Nanasaki
- B08 - CLEANING
Information Patent Grant
Actively cooled foreline trap to reduce throttle valve drift
- Patent number 12,060,637
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Gaosheng Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing device, manufacturing method for semiconductor...
- Patent number 12,062,546
- Issue date Aug 13, 2024
- Kokusai Electric Corporation
- Hidenari Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,054,828
- Issue date Aug 6, 2024
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING EQUIPMENT AND CONTROL METHOD THEREOF
- Publication number 20240419199
- Publication date Dec 19, 2024
- LAPLACE RENEWABLE ENERGY TECHNOLOGY CO., LTD.
- Yang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL PROCESSING APPARATUS, THERMAL PROCESSING METHOD, AND SUBSTR...
- Publication number 20240412989
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Young Eun JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER, TEMPERATURE CONTROL SYSTEM, AND PROCESSING APPARATUS
- Publication number 20240393050
- Publication date Nov 28, 2024
- Kokusai Electric Corporation
- Tetsuya KOSUGI
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
HEATING PLATFORM, THERMAL TREATMENT AND MANUFACTURING METHOD
- Publication number 20240387203
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Hua Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCKS WITH HYBRID PUCKS TO IMPROVE THERMAL PERFORMAN...
- Publication number 20240387224
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Yogananda Sarode
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER CHUCK STRUCTURE WITH HOLES IN UPPER SURFACE TO IMPROVE TEMPER...
- Publication number 20240379400
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ting-Jung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Rapid Thermal Processing System With Cooling System
- Publication number 20240379390
- Publication date Nov 14, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Manuel Sohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOOL FOR ANNEALING OF MAGNETIC STACKS
- Publication number 20240373518
- Publication date Nov 7, 2024
- III Holdings 1, LLC
- Krishnakumar Mani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL DYNAMIC RESPONSE SENSING SYSTEMS FOR HEATERS
- Publication number 20240371665
- Publication date Nov 7, 2024
- WATLOW ELECTRIC MANUFACTURING COMPANY
- Louis P. STEINHAUSER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USING CUMULATIVE HEAT AMOUNT DATA TO QUALIFY HOT PLATE USED FOR POS...
- Publication number 20240371639
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOLDER REFLOW APPARATUS AND METHOD OF MANUFACTURING ELECTRONIC DEVICE
- Publication number 20240355640
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- Youngja Kim
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
PROCESS ASSEMBLY FOR SEMICONDUCTOR PROCESSING AND SEMICONDUCTOR PRO...
- Publication number 20240355649
- Publication date Oct 24, 2024
- CENTROTHERM INTERNATIONAL AG
- Peter Völk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY DEVELOPMENT APPARATUS AND METHODS FOR VOLATILIZATION OF DRY DEV...
- Publication number 20240355650
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCKS WITH COOLANT GAS ZONES AND CORRESPONDING GROOV...
- Publication number 20240347366
- Publication date Oct 17, 2024
- LAM RESEARCH CORPORATION
- Alexander MATYUSHKIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT-TREATING METHOD, HEAT-TREATING APPARATUS, AND STORAGE MEDIUM
- Publication number 20240347354
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Ryouichirou NAITOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICOND...
- Publication number 20240339337
- Publication date Oct 10, 2024
- Kokusai Electric Corporation
- Daigi KAMIMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240332043
- Publication date Oct 3, 2024
- TOKYO ELECTRON LIMITED
- Tomoyuki NAGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Cooling System
- Publication number 20240332044
- Publication date Oct 3, 2024
- Taiwan Semconductor Manufacturing Company, Ltd.
- Otto CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR THERMAL CONTROL OF DEVICES IN AN ELECTRONICS...
- Publication number 20240302451
- Publication date Sep 12, 2024
- Aehr Test Systems
- Jovan Jovanovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240301555
- Publication date Sep 12, 2024
- TOKYO ELECTRON LIMITED
- Tatsuya YAMAGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER PROCESSING APPARATUS WITH FILM UNIFORMITY IMPROVEMENT CAPABIL...
- Publication number 20240287679
- Publication date Aug 29, 2024
- ASM IP HOLDING B.V.
- Yongjin Jeong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN
- Publication number 20240282556
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- B08 - CLEANING
Information Patent Application
WAFER PROCESSING APPARATUS AND WAFER PROCESSING METHOD USING THE SAME
- Publication number 20240282586
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Chanyeong Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY
- Publication number 20240282551
- Publication date Aug 22, 2024
- LAM RESEARCH CORPORATION
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDER AND METHOD
- Publication number 20240264540
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van de Kerkhof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIFT PIN ASSEMBLY
- Publication number 20240266206
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Yogananda SARODE VISHWANATH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...
- Publication number 20240258127
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Keren J. KANARIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...
- Publication number 20240258128
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Keren J. KANARIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...
- Publication number 20240249962
- Publication date Jul 25, 2024
- Kokusai Electric Corporation
- Hideharu ITATANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR MANUFACTURING DISPLAY DEVICE
- Publication number 20240249959
- Publication date Jul 25, 2024
- SAMSUNG DISPLAY CO., LTD.
- Jong Jang PARK
- H01 - BASIC ELECTRIC ELEMENTS

mainly by convection

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

RTP substrate temperature one for all control algorithm

Substrate processing apparatus and substrate processing method

Spatial control of plasma processing environments

Substrate processing method and substrate processing apparatus

Substrate support

Substrate processing system and temperature control method

Cleaning apparatus for component for semiconductor production appar...

Heating platform, thermal treatment and manufacturing method

Substrate treatment device

Control of plasma sheath with bias supplies

Vertical batch furnace assembly comprising a cooling gas supply

Integrated epitaxy and preclean system

Substrate processing apparatus and method of manufacturing semicond...

Multi-zone pedestal heater without vias

Nitrogen injection for arc lamps

Plasma etching chemistries of high aspect ratio features in dielect...

Steam-assisted single substrate cleaning process and apparatus

Substrate treating apparatus and substrate treating method

Substrate processing apparatus

Plasma processing apparatus, temperature control method, and temper...

Heater, temperature control system, and processing apparatus

Rapid thermal processing system with cooling system

Advanced temperature monitoring system and methods for semiconducto...

Tool for annealing of magnetic stacks

Substrate processing apparatus and method of manufacturing semicond...

Using cumulative heat amount data to qualify hot plate used for pos...

Substrate processing system and particle removal method

Actively cooled foreline trap to reduce throttle valve drift

Substrate processing device, manufacturing method for semiconductor...

Substrate processing method and substrate processing apparatus

Patents Applicationslast 30 patents

PROCESSING EQUIPMENT AND CONTROL METHOD THEREOF

THERMAL PROCESSING APPARATUS, THERMAL PROCESSING METHOD, AND SUBSTR...

HEATER, TEMPERATURE CONTROL SYSTEM, AND PROCESSING APPARATUS

HEATING PLATFORM, THERMAL TREATMENT AND MANUFACTURING METHOD

ELECTROSTATIC CHUCKS WITH HYBRID PUCKS TO IMPROVE THERMAL PERFORMAN...

WAFER CHUCK STRUCTURE WITH HOLES IN UPPER SURFACE TO IMPROVE TEMPER...

Rapid Thermal Processing System With Cooling System

TOOL FOR ANNEALING OF MAGNETIC STACKS

THERMAL DYNAMIC RESPONSE SENSING SYSTEMS FOR HEATERS

USING CUMULATIVE HEAT AMOUNT DATA TO QUALIFY HOT PLATE USED FOR POS...

SOLDER REFLOW APPARATUS AND METHOD OF MANUFACTURING ELECTRONIC DEVICE

PROCESS ASSEMBLY FOR SEMICONDUCTOR PROCESSING AND SEMICONDUCTOR PRO...

DRY DEVELOPMENT APPARATUS AND METHODS FOR VOLATILIZATION OF DRY DEV...

ELECTROSTATIC CHUCKS WITH COOLANT GAS ZONES AND CORRESPONDING GROOV...

HEAT-TREATING METHOD, HEAT-TREATING APPARATUS, AND STORAGE MEDIUM

SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICOND...

SUBSTRATE PROCESSING APPARATUS

Wafer Cooling System

METHOD AND SYSTEM FOR THERMAL CONTROL OF DEVICES IN AN ELECTRONICS...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

WAFER PROCESSING APPARATUS WITH FILM UNIFORMITY IMPROVEMENT CAPABIL...

FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN

WAFER PROCESSING APPARATUS AND WAFER PROCESSING METHOD USING THE SAME

SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY

SUBSTRATE HOLDER AND METHOD

LIFT PIN ASSEMBLY

PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...

PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECT...

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...

APPARATUS FOR MANUFACTURING DISPLAY DEVICE