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H01L21/67109

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/67109mainly by convection

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for managing chip manufacturing equipment, apparatus, electr...
- Patent number 12,327,769
- Issue date Jun 10, 2025
- Saimeite Technology Co, Ltd.
- Wang Sheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, and method and program for controlling...
- Patent number 12,315,704
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yusuke Saitoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom cover plate to reduce wafer planar nonuniformity
- Patent number 12,315,746
- Issue date May 27, 2025
- Applied Materials, Inc.
- Zubin Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate fixing device
- Patent number 12,315,755
- Issue date May 27, 2025
- Shinko Electric Industries Co., Ltd.
- Yasuhiko Kusama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heated substrate support
- Patent number 12,309,888
- Issue date May 20, 2025
- Applied Materials, Inc.
- Govinda Raj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for drying substrate
- Patent number 12,308,255
- Issue date May 20, 2025
- Samsung Electronics Co., Ltd.
- Sangjine Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Subfab area installation apparatus
- Patent number 12,300,520
- Issue date May 13, 2025
- Ebara Corporation
- Motoshi Kohaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for treating substrate and temperature control method
- Patent number 12,300,517
- Issue date May 13, 2025
- Semes Co., Ltd.
- Sang Min Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,300,475
- Issue date May 13, 2025
- Tokyo Electron Limited
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 12,293,928
- Issue date May 6, 2025
- Semes Co., Ltd.
- Eui Sang Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for thermal control of devices in an electronics...
- Patent number 12,292,484
- Issue date May 6, 2025
- AEHR Test Systems
- Jovan Jovanovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,293,930
- Issue date May 6, 2025
- Kokusai Electric Corporation
- Shinobu Sugiura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer mass metrology apparatus and semiconductor wafe...
- Patent number 12,288,702
- Issue date Apr 29, 2025
- Lam Research Corporation
- Gregor Elliott
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting table and plasma processing apparatus
- Patent number 12,288,713
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,281,389
- Issue date Apr 22, 2025
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Support unit, substrate treating apparatus including the same, and...
- Patent number 12,278,121
- Issue date Apr 15, 2025
- Semes Co., Ltd.
- Kangseop Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer chuck structure with holes in upper surface to improve temper...
- Patent number 12,272,585
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Jung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process control enabled VDC sensor for plasma process
- Patent number 12,272,520
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for treating substrate and temperature control method
- Patent number 12,272,569
- Issue date Apr 8, 2025
- Semes Co., Ltd.
- Sang Min Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced temperature control for wafer carrier in plasma processing...
- Patent number 12,272,575
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Fernando M. Silveira
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method for venting a processing cha...
- Patent number 12,266,508
- Issue date Apr 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for thermal control of devices in electronics tester
- Patent number 12,265,136
- Issue date Apr 1, 2025
- AEHR Test Systems
- Jovan Jovanovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor wafer with wafer chuck havin...
- Patent number 12,249,493
- Issue date Mar 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber with annealing mini-environment
- Patent number 12,249,522
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Michael Honan
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Substrate processing apparatus and ceiling heater
- Patent number 12,241,159
- Issue date Mar 4, 2025
- Kokusai Electric Corporation
- Tetsuya Kosugi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate fixing device and electrostatic chuck
- Patent number 12,243,763
- Issue date Mar 4, 2025
- Shinko Electric Industries Co., Ltd.
- Masakuni Miyazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flange and apparatus for processing substrates
- Patent number 12,243,757
- Issue date Mar 4, 2025
- ASM IP Holding B.V.
- Jeroen de Jonge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chucks with coolant gas zones and corresponding groov...
- Patent number 12,237,201
- Issue date Feb 25, 2025
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for cooling a substrate support
- Patent number 12,232,299
- Issue date Feb 18, 2025
- Applied Materials, Inc.
- Robert Irwin Decottignies
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 12,230,516
- Issue date Feb 18, 2025
- Semes Co., Ltd.
- Jae Oh Bang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250191942
- Publication date Jun 12, 2025
- Yest Co., Ltd.
- Young Joon Ham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND CEILING HEATER
- Publication number 20250179642
- Publication date Jun 5, 2025
- Kokusai Electric Corporation
- Tetsuya KOSUGI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLANGE AND APPARATUS FOR PROCESSING SUBSTRATES
- Publication number 20250183065
- Publication date Jun 5, 2025
- ASM IP HOLDING B.V.
- Jeroen de Jonge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WARPAGE REDUCTION
- Publication number 20250183091
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Jooho LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING STATION
- Publication number 20250183063
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Pandu Maddherla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PREHEATING MODULE, A DEVICE PROCESSING ASSEMBLY WITH A SU...
- Publication number 20250183064
- Publication date Jun 5, 2025
- ASM IP HOLDING B.V.
- Mandar Vijay Deshpande
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DELIVERY SYSTEM FOR A THERMAL PROCESSING APPARATUS
- Publication number 20250167008
- Publication date May 22, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Matthias Bauer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHAMBER ASSEMBLY FOR HANDLING REMOVABLE EPITAXIAL REACTION UNITS
- Publication number 20250167017
- Publication date May 22, 2025
- LPE S.p.A.
- Maurilio Meschia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20250166970
- Publication date May 22, 2025
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF USING EXHAUST SYSTEM AND METHOD OF USING PROCESS EQUIPMENT
- Publication number 20250167014
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsien-Chang HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-PRESSURE HEAT TREATMENT APPARATUS AND GAS MONITORING MODULE US...
- Publication number 20250157834
- Publication date May 15, 2025
- HPSP Co., Ltd.
- Kun Young LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPIN CHUCK AND WAFER CLEANING DEVICE INCLUDING THE SAME
- Publication number 20250140579
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Sunghwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250140552
- Publication date May 1, 2025
- TOKYO ELECTRON LIMITED
- Motoki SHINDEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS WITH PARALLEL FIRST AND SECOND PARTS O...
- Publication number 20250140584
- Publication date May 1, 2025
- SCREEN Semiconductor Solutions Co., Ltd.
- Hiroyuki Ogura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COOLING SYSTEM FOR SEMICONDUCTOR EQUIPMENT
- Publication number 20250132185
- Publication date Apr 24, 2025
- Samsung Electronics Co., Ltd.
- Jonghwa Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION SYSTEM AND METHOD
- Publication number 20250132148
- Publication date Apr 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRE-HEAT RINGS, HEATING SYSTEMS, AND PROCESSING CHAMBERS INCLUDING...
- Publication number 20250132174
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Haifeng ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING STATION
- Publication number 20250125174
- Publication date Apr 17, 2025
- Samsung Electronics Co., Ltd.
- Haechul KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SUSCEPTOR AND METHOD OF MANUFACTURING SAME
- Publication number 20250125184
- Publication date Apr 17, 2025
- MiCo Ceramics Ltd.
- Min-Ho JI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATICALLY SECURED SUBSTRATE SUPPORT ASSEMBLY
- Publication number 20250118586
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Arvinder Manmohan Singh Chadha
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE TREATMENT APPARATUS HAVING HEATING PART
- Publication number 20250096031
- Publication date Mar 20, 2025
- DEVICEENG CO., LTD.
- Taek Youb Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control System For Adaptive Control Of A Thermal Processing System
- Publication number 20250093852
- Publication date Mar 20, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE AND METHOD OF USING THE SAME
- Publication number 20250079230
- Publication date Mar 6, 2025
- NGK Insulators, Ltd.
- Ikuhisa MORIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INJECTOR MOUNTING APPARATUS OF FURNACE
- Publication number 20250075976
- Publication date Mar 6, 2025
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Jianyong Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250066920
- Publication date Feb 27, 2025
- EUGENE TECHNOLOGY CO., LTD.
- In Soo SON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20250068080
- Publication date Feb 27, 2025
- SEMES CO., LTD.
- Kyung Taek IM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HEATER SYSTEM FOR GAS PROCESSING COMPONENTS
- Publication number 20250069913
- Publication date Feb 27, 2025
- WATLOW ELECTRIC MANUFACTURING COMPANY
- Terry COLHOUR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RTP SUBSTRATE TEMPERATURE ONE FOR ALL CONTROL ALGORITHM
- Publication number 20250067511
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Wolfgang Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FURNACE INNER TUBE FOR PROCESS UNIFORMITY
- Publication number 20250062139
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- De-Wei YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, MANUFACTURING METHOD, AND SUBSTRATE PR...
- Publication number 20250062125
- Publication date Feb 20, 2025
- Semes Co., Ltd.
- Gyeong Won SONG
- H01 - BASIC ELECTRIC ELEMENTS

mainly by convection

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for managing chip manufacturing equipment, apparatus, electr...

Plasma processing apparatus, and method and program for controlling...

Bottom cover plate to reduce wafer planar nonuniformity

Substrate fixing device

Heated substrate support

Apparatus and method for drying substrate

Subfab area installation apparatus

Apparatus for treating substrate and temperature control method

Substrate support and substrate processing apparatus

Apparatus and method for treating substrate

Method and system for thermal control of devices in an electronics...

Substrate processing apparatus, method of manufacturing semiconduct...

Semiconductor wafer mass metrology apparatus and semiconductor wafe...

Mounting table and plasma processing apparatus

Substrate processing method and substrate processing apparatus

Support unit, substrate treating apparatus including the same, and...

Wafer chuck structure with holes in upper surface to improve temper...

Process control enabled VDC sensor for plasma process

Apparatus for treating substrate and temperature control method

Advanced temperature control for wafer carrier in plasma processing...

Plasma processing apparatus and method for venting a processing cha...

Method and system for thermal control of devices in electronics tester

Method for manufacturing semiconductor wafer with wafer chuck havin...

Processing chamber with annealing mini-environment

Substrate processing apparatus and ceiling heater

Substrate fixing device and electrostatic chuck

Flange and apparatus for processing substrates

Electrostatic chucks with coolant gas zones and corresponding groov...

Methods and apparatus for cooling a substrate support

Substrate treating apparatus and substrate treating method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND CEILING HEATER

FLANGE AND APPARATUS FOR PROCESSING SUBSTRATES

SUBSTRATE WARPAGE REDUCTION

COOLING STATION

SUBSTRATE PREHEATING MODULE, A DEVICE PROCESSING ASSEMBLY WITH A SU...

GAS DELIVERY SYSTEM FOR A THERMAL PROCESSING APPARATUS

MULTI-CHAMBER ASSEMBLY FOR HANDLING REMOVABLE EPITAXIAL REACTION UNITS

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

METHOD OF USING EXHAUST SYSTEM AND METHOD OF USING PROCESS EQUIPMENT

HIGH-PRESSURE HEAT TREATMENT APPARATUS AND GAS MONITORING MODULE US...

SPIN CHUCK AND WAFER CLEANING DEVICE INCLUDING THE SAME

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE TREATING APPARATUS WITH PARALLEL FIRST AND SECOND PARTS O...

COOLING SYSTEM FOR SEMICONDUCTOR EQUIPMENT

DEPOSITION SYSTEM AND METHOD

PRE-HEAT RINGS, HEATING SYSTEMS, AND PROCESSING CHAMBERS INCLUDING...

COOLING STATION

CERAMIC SUSCEPTOR AND METHOD OF MANUFACTURING SAME

ELECTROSTATICALLY SECURED SUBSTRATE SUPPORT ASSEMBLY

SUBSTRATE TREATMENT APPARATUS HAVING HEATING PART

Control System For Adaptive Control Of A Thermal Processing System

WAFER PLACEMENT TABLE AND METHOD OF USING THE SAME

INJECTOR MOUNTING APPARATUS OF FURNACE

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

HEATER SYSTEM FOR GAS PROCESSING COMPONENTS

RTP SUBSTRATE TEMPERATURE ONE FOR ALL CONTROL ALGORITHM

FURNACE INNER TUBE FOR PROCESS UNIFORMITY

SUBSTRATE PROCESSING METHOD, MANUFACTURING METHOD, AND SUBSTRATE PR...