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Plasma processing apparatus
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Patent number 11,967,511
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Issue date Apr 23, 2024
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Tokyo Electron Limited
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Akira Ishikawa
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Substrate treating method
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Patent number 11,927,886
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Issue date Mar 12, 2024
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Semes Co., Ltd.
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Doo Young Oh
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H01 - BASIC ELECTRIC ELEMENTS
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Semiconductor fabricating method
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Patent number 11,915,939
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Issue date Feb 27, 2024
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HITACHI HIGH-TECH CORPORATION
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Yoshihide Yamaguchi
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Wafer placement apparatus
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Patent number 11,887,873
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Issue date Jan 30, 2024
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NGK Insulators, Ltd.
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Keita Mine
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H01 - BASIC ELECTRIC ELEMENTS
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Deposition apparatus
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Patent number 11,869,798
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Issue date Jan 9, 2024
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Tokyo Electron Limited
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Manabu Honma
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Diffusion furnace
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Patent number 11,862,490
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Issue date Jan 2, 2024
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CHANGXIN MEMORY TECHNOLOGIES, INC.
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Pengfei Gao
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H01 - BASIC ELECTRIC ELEMENTS
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