Maintenance

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CPC
H01J37/3288

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3288Maintenance

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Calibration jig and calibration method
- Patent number 12,148,645
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Andrew Myles
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer dicing using femtosecond-based laser and plasma etch
- Patent number 12,131,952
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
RF pulsing assisted low-k film deposition with high mechanical stre...
- Patent number 12,125,675
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Ruitong Xiong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,112,927
- Issue date Oct 8, 2024
- Picosun Oy
- Väinö Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor manufacturing apparatus and method for cleaning off d...
- Patent number 12,051,572
- Issue date Jul 30, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Wulin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Connect structure for semiconductor processing equipment
- Patent number 12,040,163
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Ming-Sze Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sensors and system for in-situ edge ring erosion monitor
- Patent number 12,009,236
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of controlling the same, and...
- Patent number 12,001,194
- Issue date Jun 4, 2024
- Semes Co., Ltd.
- Seung Yeon Kim
- G05 - CONTROLLING REGULATING
Information Patent Grant
Process cooling-water isolation
- Patent number 12,002,658
- Issue date Jun 4, 2024
- Lam Research Corporation
- Sreeram Sonti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for processing a semiconductor substrate
- Patent number 11,972,935
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Hsiang Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Calibration jig and calibration method
- Patent number 11,935,773
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Andrew Myles
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing substrate
- Patent number 11,894,219
- Issue date Feb 6, 2024
- Semes Co., Ltd.
- Je Ho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma cleaning of chambers for electronics manufacturing sy...
- Patent number 11,854,773
- Issue date Dec 26, 2023
- Applied Materials, Inc.
- Yuanhong Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus member and semiconductor manu...
- Patent number 11,749,507
- Issue date Sep 5, 2023
- Toto Ltd.
- Ryunosuke Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma cleaning apparatus and semiconductor process equipment with...
- Patent number 11,643,722
- Issue date May 9, 2023
- Korea Institute of Machinery & Materials
- Min Hur
- B08 - CLEANING
Information Patent Grant
Method and apparatus for coating plastic bottles
- Patent number 11,634,809
- Issue date Apr 25, 2023
- KHS GmbH
- Sebastian Kytzia
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer dicing using femtosecond-based laser and plasma etch
- Patent number 11,621,194
- Issue date Apr 4, 2023
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Vacuum processing apparatus and operating method of vacuum processi...
- Patent number 11,600,472
- Issue date Mar 7, 2023
- HITACHI HIGH-TECH CORPORATION
- Ryoichi Isomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D printed chamber components configured for lower film stress and...
- Patent number 11,569,069
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Kadthala R. Narendrnath
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Controlling multiple plasma processes
- Patent number 11,538,670
- Issue date Dec 27, 2022
- TRUMPF Huettinger Sp. z o. o.
- Jan Peter Engelstaedter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Maintenance device
- Patent number 11,532,467
- Issue date Dec 20, 2022
- Tokyo Electron Limited
- Takehiro Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Part-life estimation utilizing feature metrology
- Patent number 11,532,466
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Chien-Min Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system
- Patent number 11,495,480
- Issue date Nov 8, 2022
- Tokyo Electron Limited
- Suguru Motegi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling multiple plasma processes
- Patent number 11,430,642
- Issue date Aug 30, 2022
- TRUMPF Huettinger Sp. z o. o.
- Jan Peter Engelstaedter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for coating surfaces
- Patent number 11,348,759
- Issue date May 31, 2022
- AGM Container Controls, Inc.
- Andrew Tudhope
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus and maintenance apparatus
- Patent number 11,309,168
- Issue date Apr 19, 2022
- Tokyo Electron Limited
- Takehiro Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for galvanizing by plasma evaporation
- Patent number 11,268,185
- Issue date Mar 8, 2022
- NEOVAC GMBH
- Pierre Vandenbrande
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generator configured for use with an auxiliary device
- Patent number 11,197,708
- Issue date Dec 14, 2021
- GYRUS ACMI, INC.
- Ming J. Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Display panel, plasma etching method and system
- Patent number 11,189,797
- Issue date Nov 30, 2021
- WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Pengbin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wastage determination method and plasma processing apparatus
- Patent number 11,183,374
- Issue date Nov 23, 2021
- Tokyo Electron Limited
- Shu Kusano
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CONNECT STRUCTURE FOR SEMICONDUCTOR PROCESSING EQUIPMENT
- Publication number 20240355591
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Ming-Sze Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PERFORMING MAINTENANCE ON SUBSTRATE PROCESSING APPARATUS,...
- Publication number 20240339307
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Yuya MINOURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR
- Publication number 20240321610
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Yaoling PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS COOLING-WATER ISOLATION
- Publication number 20240312768
- Publication date Sep 19, 2024
- LAM RESEARCH CORPORATION
- Sreeram SONTI
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING APPARATUS
- Publication number 20240297025
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Kota SENO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240290587
- Publication date Aug 29, 2024
- Semes Co., Ltd.
- Dong Hun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU FOCUS RING COATING
- Publication number 20240249921
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PROCESSING A SEMICONDUCTOR SUBSTRATE
- Publication number 20240222097
- Publication date Jul 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Hsiang CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CALIBRATION JIG AND CALIBRATION METHOD
- Publication number 20240178035
- Publication date May 30, 2024
- Applied Materials, Inc.
- Andrew MYLES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD
- Publication number 20240162019
- Publication date May 16, 2024
- Picosun Oy
- Väinö KILPI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATU...
- Publication number 20240150894
- Publication date May 9, 2024
- ASM IP HOLDING B.V.
- Toshiharu Watarai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240087843
- Publication date Mar 14, 2024
- PSK INC.
- JONG CHAN LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING SUBSTRATE
- Publication number 20240078663
- Publication date Mar 7, 2024
- PSK INC.
- KWANG SUNG YOO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR MEASURING DEGREE OF...
- Publication number 20240079221
- Publication date Mar 7, 2024
- SEMES CO., LTD.
- Chul Ho WON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR MEASURING DEGREE OF...
- Publication number 20240071736
- Publication date Feb 29, 2024
- SEMES CO., LTD.
- Chul Ho WON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA CLEANING OF CHAMBERS FOR ELECTRONICS MANUFACTURING SY...
- Publication number 20240062999
- Publication date Feb 22, 2024
- Applied Materials, Inc.
- Yuanhong Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONNECT STRUCTURE FOR SEMICONDUCTOR PROCESSING EQUIPMENT
- Publication number 20240021416
- Publication date Jan 18, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Ming-Sze Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20230411184
- Publication date Dec 21, 2023
- SEMES CO., LTD.
- Kwang Ryul KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SPECTRUM SENSOR WAFER OR ROBOT FOR CHAMBER CONDITION MONITO...
- Publication number 20230326726
- Publication date Oct 12, 2023
- Applied Materials, Inc.
- Chuang-Chia Lin
- B08 - CLEANING
Information Patent Application
MAINTENANCE METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, N...
- Publication number 20230317438
- Publication date Oct 5, 2023
- Kokusai Electric Corporation
- Teruo YOSHINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR FABRICATION FACILITY
- Publication number 20230268166
- Publication date Aug 24, 2023
- Samsung Electronics Co., Ltd.
- JONGHYUN LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOTE PLASMA UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING REM...
- Publication number 20230215709
- Publication date Jul 6, 2023
- ASM IP HOLDING B.V.
- Zhikai Miao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH
- Publication number 20230207393
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SLIDE AND PIVOT ASSEMBLIES FOR PROCESS MODULE BIAS ASSEMBLIES OF SU...
- Publication number 20230154772
- Publication date May 18, 2023
- LAM RESEARCH CORPORATION
- David William PAQUET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF PULSING ASSISTED LOW-K FILM DEPOSITION WITH HIGH MECHANICAL STRE...
- Publication number 20230094012
- Publication date Mar 30, 2023
- Applied Materials, Inc.
- Ruitong Xiong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LINEAR ARRANGEMENT FOR SUBSTRATE PROCESSING TOOLS
- Publication number 20230085987
- Publication date Mar 23, 2023
- LAM RESEARCH CORPORATION
- Danny Arthur BROWN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focus Ring Regeneration
- Publication number 20230081862
- Publication date Mar 16, 2023
- TOKYO ELECTRON LIMITED
- Yanxiang Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM AND SEMICONDUCTOR DEVICE...
- Publication number 20230072665
- Publication date Mar 9, 2023
- Hitachi High-Tech Corporation
- Toru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PROCESSING A SEMICONDUCTOR SUBSTRATE
- Publication number 20230065243
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Hsiang CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20230015560
- Publication date Jan 19, 2023
- TOKYO ELECTRON LIMITED
- Suguru MOTEGI
- H01 - BASIC ELECTRIC ELEMENTS

Maintenance

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Calibration jig and calibration method

Wafer dicing using femtosecond-based laser and plasma etch

RF pulsing assisted low-k film deposition with high mechanical stre...

Substrate processing apparatus and method

Semiconductor manufacturing apparatus and method for cleaning off d...

Connect structure for semiconductor processing equipment

Sensors and system for in-situ edge ring erosion monitor

Substrate processing apparatus, method of controlling the same, and...

Process cooling-water isolation

Methods for processing a semiconductor substrate

Calibration jig and calibration method

Method for processing substrate

Remote plasma cleaning of chambers for electronics manufacturing sy...

Semiconductor manufacturing apparatus member and semiconductor manu...

Plasma cleaning apparatus and semiconductor process equipment with...

Method and apparatus for coating plastic bottles

Wafer dicing using femtosecond-based laser and plasma etch

Vacuum processing apparatus and operating method of vacuum processi...

3D printed chamber components configured for lower film stress and...

Controlling multiple plasma processes

Maintenance device

Part-life estimation utilizing feature metrology

Substrate processing system

Controlling multiple plasma processes

Systems and methods for coating surfaces

Vacuum processing apparatus and maintenance apparatus

Method and system for galvanizing by plasma evaporation

Plasma generator configured for use with an auxiliary device

Display panel, plasma etching method and system

Wastage determination method and plasma processing apparatus

Patents Applicationslast 30 patents

CONNECT STRUCTURE FOR SEMICONDUCTOR PROCESSING EQUIPMENT

METHOD OF PERFORMING MAINTENANCE ON SUBSTRATE PROCESSING APPARATUS,...

SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR

PROCESS COOLING-WATER ISOLATION

PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING APPARATUS

APPARATUS AND METHOD FOR TREATING SUBSTRATE

IN-SITU FOCUS RING COATING

METHODS FOR PROCESSING A SEMICONDUCTOR SUBSTRATE

CALIBRATION JIG AND CALIBRATION METHOD

SUBSTRATE PROCESSING APPARATUS AND METHOD

EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATU...

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

METHOD FOR PROCESSING SUBSTRATE

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR MEASURING DEGREE OF...

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR MEASURING DEGREE OF...

REMOTE PLASMA CLEANING OF CHAMBERS FOR ELECTRONICS MANUFACTURING SY...

CONNECT STRUCTURE FOR SEMICONDUCTOR PROCESSING EQUIPMENT

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

OPTICAL SPECTRUM SENSOR WAFER OR ROBOT FOR CHAMBER CONDITION MONITO...

MAINTENANCE METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, N...

SEMICONDUCTOR FABRICATION FACILITY

REMOTE PLASMA UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING REM...

WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH

SLIDE AND PIVOT ASSEMBLIES FOR PROCESS MODULE BIAS ASSEMBLIES OF SU...

RF PULSING ASSISTED LOW-K FILM DEPOSITION WITH HIGH MECHANICAL STRE...

LINEAR ARRANGEMENT FOR SUBSTRATE PROCESSING TOOLS

Focus Ring Regeneration

SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM AND SEMICONDUCTOR DEVICE...

METHODS FOR PROCESSING A SEMICONDUCTOR SUBSTRATE

SUBSTRATE PROCESSING SYSTEM