Mark formation

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CPC
G03F9/708

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/708Mark formation

Industries

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Patents Grantslast 30 patents

Information Patent Grant
3D semiconductor devices and structures with metal layers
- Patent number 12,199,093
- Issue date Jan 14, 2025
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having integral alignment marks with decouplin...
- Patent number 12,191,258
- Issue date Jan 7, 2025
- NANYA TECHNOLOGY CORPORATION
- Shing-Yih Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure control in photolithographic direct exposure methods for m...
- Patent number 12,169,370
- Issue date Dec 17, 2024
- Laser Imaging Systems GmbH
- Christian Schwarz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for aligned stitching
- Patent number 12,154,862
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chia Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Offset alignment method and micro-lithographic printing device
- Patent number 12,147,168
- Issue date Nov 19, 2024
- Mycronic AB
- Anders Svensson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical designs of miniaturized overlay measurement system
- Patent number 12,140,872
- Issue date Nov 12, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement method, measurement apparatus, and mark
- Patent number 12,140,879
- Issue date Nov 12, 2024
- Kioxia Corporation
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing system, processing method, measurement apparatus, substr...
- Patent number 12,140,878
- Issue date Nov 12, 2024
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay measurement system using lock-in amplifier technique
- Patent number 12,124,177
- Issue date Oct 22, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of wafer alignment using at resolution metrology on product...
- Patent number 12,124,179
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining position of mark, lithography method, exposur...
- Patent number 12,092,967
- Issue date Sep 17, 2024
- Canon Kabushiki Kaisha
- Ryota Makino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay measurement device
- Patent number 12,085,383
- Issue date Sep 10, 2024
- AUROS TECHNOLOGY, INC.
- Gyu Nam Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement apparatus, measurement method, lithography apparatus an...
- Patent number 12,072,175
- Issue date Aug 27, 2024
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection method, detection apparatus, lithography apparatus, and a...
- Patent number 12,061,079
- Issue date Aug 13, 2024
- Canon Kabushiki Kaisha
- Masaharu Kajitani
- G01 - MEASURING TESTING
Information Patent Grant
Wafer-level etching methods for planar photonics circuits and devices
- Patent number 12,057,332
- Issue date Aug 6, 2024
- Ayar Labs, Inc.
- Chen Sun
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Alignment mark structure and method for making
- Patent number 12,033,951
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Hao Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D semiconductor devices and structures with metal layers
- Patent number 12,027,518
- Issue date Jul 2, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining set of sample shot regions, method of obtaini...
- Patent number 12,025,924
- Issue date Jul 2, 2024
- Canon Kabushiki Kaisha
- Shinichi Egashira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,007,700
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Mark detection method and apparatus, and computer-readable storage...
- Patent number 12,007,703
- Issue date Jun 11, 2024
- Changxin Memory Technologies, Inc.
- Yan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method of movable body, exposure method, device manufacturi...
- Patent number 11,994,811
- Issue date May 28, 2024
- Nikon Corporation
- Akihiro Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark, mask and display substrate motherboard
- Patent number 11,994,810
- Issue date May 28, 2024
- BOE Technology Group Co., Ltd.
- Li Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
3D semiconductor devices and structures with metal layers
- Patent number 11,984,445
- Issue date May 14, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer alignment using form birefringence of targets or product
- Patent number 11,971,665
- Issue date Apr 30, 2024
- ASML Holding N.V.
- Joshua Adams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic overlay correction and lithographic process
- Patent number 11,966,170
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ai-Jen Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement apparatus and a method for determining a substrate grid
- Patent number 11,966,166
- Issue date Apr 23, 2024
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for producing overlay results with absolute reference for se...
- Patent number 11,966,171
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Invariable magnification multilevel optical device with telecentric...
- Patent number 11,960,216
- Issue date Apr 16, 2024
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection apparatus, lithography apparatus, and article manufacturi...
- Patent number 11,934,098
- Issue date Mar 19, 2024
- Canon Kabushiki Kaisha
- Tomokazu Taki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet (EUV) photomask and method of manufacturing sem...
- Patent number 11,927,879
- Issue date Mar 12, 2024
- Samsung Electronics Co., Ltd.
- Moosong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE HAVING INTEGRAL ALIGNMENT MARKS WITH DECOUPLIN...
- Publication number 20250006657
- Publication date Jan 2, 2025
- NANYA TECHNOLOGY CORPORATION
- SHING-YIH SHIH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A SENSOR POSITIONING METHOD, A POSITIONING SYSTEM, A LITHOGRAPHIC A...
- Publication number 20250004390
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Jeroen Johan Maarten VAN DE WIJDEVEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20240369919
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT APPARATUS, MEASUREMENT METHOD, LITHOGRAPHY APPARATUS AN...
- Publication number 20240369347
- Publication date Nov 7, 2024
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR EVALUATING REFERENCE MARK FORMED ON EUV MASK BLANK
- Publication number 20240345474
- Publication date Oct 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takahiro KISHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20240329549
- Publication date Oct 3, 2024
- Ushio Denki Kabushiki Kaisha
- Naoya SOHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...
- Publication number 20240319620
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
ALIGNMENT MARK STRUCTURE AND METHOD FOR MAKING
- Publication number 20240321767
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Hao Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN CORRECTION DEVICE, PATTERN CORRECTION METHOD, AND PATTERN F...
- Publication number 20240302758
- Publication date Sep 12, 2024
- Samsung Electronics Co., Ltd.
- Ingyun CHUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS
- Publication number 20240304617
- Publication date Sep 12, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-OVERLAY STACKED GRATING METROLOGY TARGET
- Publication number 20240302751
- Publication date Sep 12, 2024
- KLA Corporation
- Jordan Pio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OBTAINING ARRAY OF PLURALITY OF REGIONS ON SUBSTRATE, EXP...
- Publication number 20240288781
- Publication date Aug 29, 2024
- Canon Kabushiki Kaisha
- MITSURU INOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING METHOD OF MEASURING SUBSTRATE BY CAPTURING IMAGES OF MARK...
- Publication number 20240288787
- Publication date Aug 29, 2024
- Canon Kabushiki Kaisha
- WATARU YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM
- Publication number 20240241454
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology system for packaging applications
- Publication number 20240241456
- Publication date Jul 18, 2024
- Venkatakaushik VOLETI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION APPARATUS, ALIGNMENT MICROSCOPE, AND EXPOSURE APPARATUS
- Publication number 20240241457
- Publication date Jul 18, 2024
- Ushio Denki Kabushiki Kaisha
- Naoya SOHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY APPARATUS AND LITHOGRAPHIC APPARATUS
- Publication number 20240241452
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Arjan Johannes Anton Beukman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS
- Publication number 20240231247
- Publication date Jul 11, 2024
- ASML NETHERLANDS B.V.
- Arjan Johannes Anton BEUKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS
- Publication number 20240222368
- Publication date Jul 4, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20240210844
- Publication date Jun 27, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTROL APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING...
- Publication number 20240210843
- Publication date Jun 27, 2024
- Canon Kabushiki Kaisha
- Nozomu Hayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMBINATION OF INLINE METROLOGY AND ON TOOL METROLOGY FOR ADVANCED...
- Publication number 20240201605
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Ulrich MUELLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES
- Publication number 20240184221
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Samee Ur REHMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS
- Publication number 20240184222
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Guido DE HAAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, A...
- Publication number 20240184214
- Publication date Jun 6, 2024
- Nikon Corporation
- Yoji WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASYMMETRY EXTENDED GRID MODEL FOR WAFER ALIGNMENT
- Publication number 20240168397
- Publication date May 23, 2024
- ASML NETHERLANDS B.V.
- Joshua ADAMS
- G01 - MEASURING TESTING
Information Patent Application
3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS
- Publication number 20240120332
- Publication date Apr 11, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BUTTRESSED FIELD TARGET DESIGN FOR OPTICAL AND E-BEAM BASED METROLO...
- Publication number 20240069447
- Publication date Feb 29, 2024
- Intel Corporation
- Deepak SELVANATHAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR FORMING ALIGNMENT MARKS
- Publication number 20240069448
- Publication date Feb 29, 2024
- Applied Materials, Inc.
- Prayudi LIANTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETECTING COORDINATE OF MARK, COMPUTING SYSTEM FOR PERFO...
- Publication number 20240061354
- Publication date Feb 22, 2024
- Samsung Electronics Co., Ltd.
- Seung Hak PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Mark formation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

3D semiconductor devices and structures with metal layers

Semiconductor device having integral alignment marks with decouplin...

Exposure control in photolithographic direct exposure methods for m...

System and method for aligned stitching

Offset alignment method and micro-lithographic printing device

Optical designs of miniaturized overlay measurement system

Measurement method, measurement apparatus, and mark

Processing system, processing method, measurement apparatus, substr...

Overlay measurement system using lock-in amplifier technique

Method of wafer alignment using at resolution metrology on product...

Method of determining position of mark, lithography method, exposur...

Overlay measurement device

Measurement apparatus, measurement method, lithography apparatus an...

Detection method, detection apparatus, lithography apparatus, and a...

Wafer-level etching methods for planar photonics circuits and devices

Alignment mark structure and method for making

3D semiconductor devices and structures with metal layers

Method of determining set of sample shot regions, method of obtaini...

Metrology system and method for determining a characteristic of one...

Mark detection method and apparatus, and computer-readable storage...

Control method of movable body, exposure method, device manufacturi...

Alignment mark, mask and display substrate motherboard

3D semiconductor devices and structures with metal layers

Wafer alignment using form birefringence of targets or product

Lithographic overlay correction and lithographic process

Measurement apparatus and a method for determining a substrate grid

Method for producing overlay results with absolute reference for se...

Invariable magnification multilevel optical device with telecentric...

Detection apparatus, lithography apparatus, and article manufacturi...

Extreme ultraviolet (EUV) photomask and method of manufacturing sem...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE HAVING INTEGRAL ALIGNMENT MARKS WITH DECOUPLIN...

A SENSOR POSITIONING METHOD, A POSITIONING SYSTEM, A LITHOGRAPHIC A...

PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHOD

MEASUREMENT APPARATUS, MEASUREMENT METHOD, LITHOGRAPHY APPARATUS AN...

METHOD FOR EVALUATING REFERENCE MARK FORMED ON EUV MASK BLANK

EXPOSURE APPARATUS

METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...

ALIGNMENT MARK STRUCTURE AND METHOD FOR MAKING

PATTERN CORRECTION DEVICE, PATTERN CORRECTION METHOD, AND PATTERN F...

3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS

MULTI-OVERLAY STACKED GRATING METROLOGY TARGET

METHOD OF OBTAINING ARRAY OF PLURALITY OF REGIONS ON SUBSTRATE, EXP...

MEASURING METHOD OF MEASURING SUBSTRATE BY CAPTURING IMAGES OF MARK...

METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM

Metrology system for packaging applications

DETECTION APPARATUS, ALIGNMENT MICROSCOPE, AND EXPOSURE APPARATUS

METROLOGY APPARATUS AND LITHOGRAPHIC APPARATUS

METROLOGY METHOD AND APPARATUS

3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

CONTROL APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING...

COMBINATION OF INLINE METROLOGY AND ON TOOL METROLOGY FOR ADVANCED...

ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES

METROLOGY METHOD AND APPARATUS

EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, A...

ASYMMETRY EXTENDED GRID MODEL FOR WAFER ALIGNMENT

3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS

BUTTRESSED FIELD TARGET DESIGN FOR OPTICAL AND E-BEAM BASED METROLO...

METHODS FOR FORMING ALIGNMENT MARKS

METHOD FOR DETECTING COORDINATE OF MARK, COMPUTING SYSTEM FOR PERFO...