Mask blanks not covered by G03F1/20 - G03F1/34 Preparation thereof

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CPC
G03F1/50

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/50Mask blanks not covered by G03F1/20 - G03F1/34 Preparation thereof

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Mask blank, transfer mask, and method for manufacturing semiconduct...
- Patent number 12,013,631
- Issue date Jun 18, 2024
- Hoya Corporation
- Hiroaki Shishido
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for making photolithography mask plate
- Patent number 11,947,255
- Issue date Apr 2, 2024
- Tsinghua University
- Mo Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for making photolithography mask plate
- Patent number 11,947,261
- Issue date Apr 2, 2024
- Tsinghua University
- Mo Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating reticle
- Patent number 11,940,737
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsueh-Yi Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for producing an etch resist pattern on a metallic surface
- Patent number 11,807,947
- Issue date Nov 7, 2023
- Kateeva, Inc.
- Nava Shpaisman
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of forming semiconductor structure
- Patent number 11,764,062
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ping-Hao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making photolithography mask plate
- Patent number 11,747,730
- Issue date Sep 5, 2023
- Tsinghua University
- Mo Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for forming organic film, patterning process, and polymer
- Patent number 11,680,133
- Issue date Jun 20, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Overlay pattern
- Patent number 11,635,680
- Issue date Apr 25, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Mei-Li Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, transfer mask, and method of manufacturing semiconducto...
- Patent number 11,624,979
- Issue date Apr 11, 2023
- Hoya Corporation
- Kazutake Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maskless photolithography devices, methods, and systems
- Patent number 11,567,411
- Issue date Jan 31, 2023
- NANOPATH, INC.
- Kevin Donahue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for detecting particles on the surface of an object, wafer,...
- Patent number 11,555,783
- Issue date Jan 17, 2023
- Carl Zeiss SMT GmbH
- Oliver Beyer
- G01 - MEASURING TESTING
Information Patent Grant
Mask blank, transfer mask, and method for manufacturing semiconduct...
- Patent number 11,543,744
- Issue date Jan 3, 2023
- Hoya Corporation
- Hiroaki Shishido
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Three-dimensional mask model for photolithography simulation
- Patent number 11,461,532
- Issue date Oct 4, 2022
- ASML Netherlands B.V.
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Onium salt, negative resist composition, and resist pattern forming...
- Patent number 11,429,023
- Issue date Aug 30, 2022
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Mask structure and manufacturing method thereof
- Patent number 11,366,381
- Issue date Jun 21, 2022
- Unimicron Technology Corp.
- Pu-Ju Lin
- G01 - MEASURING TESTING
Information Patent Grant
Mask blank, transfer mask, and method of manufacturing semiconducto...
- Patent number 11,314,162
- Issue date Apr 26, 2022
- Hoya Corporation
- Kazutake Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation method using a photo mask for manufacturing a sem...
- Patent number 11,294,286
- Issue date Apr 5, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ru-Gun Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for producing an etch resist pattern on a metallic surface
- Patent number 11,255,018
- Issue date Feb 22, 2022
- KATEEVA, LTD.
- Nava Shpaisman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for preparing a screen printing screen
- Patent number 11,214,051
- Issue date Jan 4, 2022
- M&R Printing Equipment, Inc.
- Andrew L. Oleson
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Mask assembly, mask apparatus and mask control method
- Patent number 11,194,193
- Issue date Dec 7, 2021
- BOE Technology Group Co., Ltd.
- Guojing Ma
- G02 - OPTICS
Information Patent Grant
Method of evaluating photomask blank-associated substrate
- Patent number 11,137,678
- Issue date Oct 5, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takahiro Kishita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask adopted to manufacturing process of display panel
- Patent number 11,137,674
- Issue date Oct 5, 2021
- HKC CORPORATION LIMITED
- Chung-Kuang Chien
- G02 - OPTICS
Information Patent Grant
Lithography mask with both transmission-type and reflective-type ov...
- Patent number 11,137,684
- Issue date Oct 5, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, and method of manufacturing photomask
- Patent number 11,131,920
- Issue date Sep 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, transfer mask, and method for manufacturing semiconduct...
- Patent number 11,112,690
- Issue date Sep 7, 2021
- Hoya Corporation
- Hiroaki Shishido
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern decomposition lithography techniques
- Patent number 11,107,786
- Issue date Aug 31, 2021
- Intel Corporation
- Charles H. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask plate, array substrate, and preparation method thereof
- Patent number 11,099,481
- Issue date Aug 24, 2021
- Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Zhuming Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask plate
- Patent number 11,086,214
- Issue date Aug 10, 2021
- BOE Technology Group Co., Ltd.
- Siquan Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, photomask blank making method, and photomask makin...
- Patent number 11,073,756
- Issue date Jul 27, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING FLEXIBLE PRINTED WIRING BOARD
- Publication number 20240365469
- Publication date Oct 31, 2024
- FUJIKURA PRINTED CIRCUITS LTD.
- Daisuke Arai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METAL STRUCTURE AND METHOD FOR MANUFACTURING SAME
- Publication number 20240218547
- Publication date Jul 4, 2024
- POINT ENGINEERING CO., LTD.
- Bum Mo AHN
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
MANUFACTURING METHOD OF METAL MASK AND METAL MASK THEREOF
- Publication number 20240192600
- Publication date Jun 13, 2024
- Darwin Precisions Corporation
- Cheng-Wei Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20240192584
- Publication date Jun 13, 2024
- SK enpulse Co., Ltd.
- Hyung-joo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING MASK, MASK AND METHOD OF MANUFACTURING MASK...
- Publication number 20240060168
- Publication date Feb 22, 2024
- DAI NIPPON PRINTING CO., LTD.
- Hideyuki OKAMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR PRODUCING AN ETCH RESIST PATTERN ON A METALLIC SURFACE
- Publication number 20240035167
- Publication date Feb 1, 2024
- Kateeva, Inc.
- Nava Shpaisman
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR MANUFACTURING ELEMENT SUBSTRATE, ELEMENT SUBSTRATE, AND...
- Publication number 20230311493
- Publication date Oct 5, 2023
- Canon Kabushiki Kaisha
- Tetsushi Ishikawa
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
MASKLESS PHOTOLITHOGRAPHY DEVICES, METHODS, AND SYSTEMS
- Publication number 20230168588
- Publication date Jun 1, 2023
- NanoPath, Inc.
- Kevin Donahue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASK
- Publication number 20230148427
- Publication date May 11, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoki MATSUHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCT...
- Publication number 20230099176
- Publication date Mar 30, 2023
- HOYA CORPORATION
- Hiroaki SHISHIDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20230083755
- Publication date Mar 16, 2023
- SKC solmics Co., Ltd.
- GeonGon LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK AND METHOD OF MANUFACTURING PHOTOMASK
- Publication number 20230069092
- Publication date Mar 2, 2023
- HOYA CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK USING THE SAME
- Publication number 20220350237
- Publication date Nov 3, 2022
- SKC solmics Co., Ltd.
- Min Gyo JEONG
- G01 - MEASURING TESTING
Information Patent Application
FABRICATION OF MICRO/NANO- FLUIDIC CHANNELS THROUGH ULTRAVIOLET PAT...
- Publication number 20220342304
- Publication date Oct 27, 2022
- Facebook Technologies, LLC
- Li YAO
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20220308451
- Publication date Sep 29, 2022
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMATION METHOD AND TEMPLATE MANUFACTURING METHOD
- Publication number 20220206382
- Publication date Jun 30, 2022
- KIOXIA Corporation
- Noriko SAKURAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASKS AND MANUFACTURING METHODS OF MASKS
- Publication number 20220209211
- Publication date Jun 30, 2022
- KUNSHAN GO-VISIONOX OPTO-ELECTRONICS CO., LTD.
- Chen Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING SEMICONDUCTO...
- Publication number 20220206381
- Publication date Jun 30, 2022
- HOYA CORPORATION
- Kazutake TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR PRODUCING AN ETCH RESIST PATTERN ON A METALLIC SURFACE
- Publication number 20220136113
- Publication date May 5, 2022
- Kateeva, Inc.
- Nava Shpaisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY PATTERN
- Publication number 20220050375
- Publication date Feb 17, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Mei-Li Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20220035250
- Publication date Feb 3, 2022
- SAMSUNG DISPLAY CO., LTD.
- JEONGKUK KIM
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
PATTERN DECOMPOSITION LITHOGRAPHY TECHNIQUES
- Publication number 20210375807
- Publication date Dec 2, 2021
- Intel Corporation
- CHARLES H. WALLACE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCT...
- Publication number 20210373432
- Publication date Dec 2, 2021
- HOYA CORPORATION
- Hiroaki SHISHIDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FABRICATING RETICLE
- Publication number 20210263425
- Publication date Aug 26, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsueh-Yi CHUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
- Publication number 20210163675
- Publication date Jun 3, 2021
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR MAKING PHOTOLITHOGRAPHY MASK PLATE
- Publication number 20210165329
- Publication date Jun 3, 2021
- TSINGHUA UNIVERSITY
- MO CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MAKING PHOTOLITHOGRAPHY MASK PLATE
- Publication number 20210157239
- Publication date May 27, 2021
- TSINGHUA UNIVERSITY
- MO CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MAKING PHOTOLITHOGRAPHY MASK PLATE
- Publication number 20210132500
- Publication date May 6, 2021
- TSINGHUA UNIVERSITY
- MO CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION
- Publication number 20210064811
- Publication date Mar 4, 2021
- ASML NETHERLANDS B.V.
- Peng LIU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS FOR PRODUCING AN ETCH RESIST PATTERN ON A METALLIC SURFACE
- Publication number 20210007225
- Publication date Jan 7, 2021
- Kateeva, Inc.
- Nava Shpaisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Mask blanks not covered by G03F1/20 - G03F1/34 Preparation thereof

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mask blank, transfer mask, and method for manufacturing semiconduct...

Method for making photolithography mask plate

Method for making photolithography mask plate

Method of fabricating reticle

Methods for producing an etch resist pattern on a metallic surface

Method of forming semiconductor structure

Method for making photolithography mask plate

Material for forming organic film, patterning process, and polymer

Overlay pattern

Mask blank, transfer mask, and method of manufacturing semiconducto...

Maskless photolithography devices, methods, and systems

Method for detecting particles on the surface of an object, wafer,...

Mask blank, transfer mask, and method for manufacturing semiconduct...

Three-dimensional mask model for photolithography simulation

Onium salt, negative resist composition, and resist pattern forming...

Mask structure and manufacturing method thereof

Mask blank, transfer mask, and method of manufacturing semiconducto...

Pattern formation method using a photo mask for manufacturing a sem...

Methods for producing an etch resist pattern on a metallic surface

Method and apparatus for preparing a screen printing screen

Mask assembly, mask apparatus and mask control method

Method of evaluating photomask blank-associated substrate

Mask adopted to manufacturing process of display panel

Lithography mask with both transmission-type and reflective-type ov...

Photomask blank, and method of manufacturing photomask

Mask blank, transfer mask, and method for manufacturing semiconduct...

Pattern decomposition lithography techniques

Mask plate, array substrate, and preparation method thereof

Mask plate

Photomask blank, photomask blank making method, and photomask makin...

Patents Applicationslast 30 patents

METHOD FOR PRODUCING FLEXIBLE PRINTED WIRING BOARD

METAL STRUCTURE AND METHOD FOR MANUFACTURING SAME

MANUFACTURING METHOD OF METAL MASK AND METAL MASK THEREOF

BLANK MASK AND PHOTOMASK USING THE SAME

METHOD OF MANUFACTURING MASK, MASK AND METHOD OF MANUFACTURING MASK...

METHODS FOR PRODUCING AN ETCH RESIST PATTERN ON A METALLIC SURFACE

METHOD FOR MANUFACTURING ELEMENT SUBSTRATE, ELEMENT SUBSTRATE, AND...

MASKLESS PHOTOLITHOGRAPHY DEVICES, METHODS, AND SYSTEMS

PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASK

MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCT...

BLANK MASK AND PHOTOMASK USING THE SAME

MASK BLANK AND METHOD OF MANUFACTURING PHOTOMASK

PHOTOMASK BLANK AND PHOTOMASK USING THE SAME

FABRICATION OF MICRO/NANO- FLUIDIC CHANNELS THROUGH ULTRAVIOLET PAT...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

PATTERN FORMATION METHOD AND TEMPLATE MANUFACTURING METHOD

MASKS AND MANUFACTURING METHODS OF MASKS

MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING SEMICONDUCTO...

METHODS FOR PRODUCING AN ETCH RESIST PATTERN ON A METALLIC SURFACE

OVERLAY PATTERN

MASK AND METHOD OF MANUFACTURING THE SAME

PATTERN DECOMPOSITION LITHOGRAPHY TECHNIQUES

MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCT...

METHOD OF FABRICATING RETICLE

MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER

METHOD FOR MAKING PHOTOLITHOGRAPHY MASK PLATE

METHOD FOR MAKING PHOTOLITHOGRAPHY MASK PLATE

METHOD FOR MAKING PHOTOLITHOGRAPHY MASK PLATE

THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION

METHODS FOR PRODUCING AN ETCH RESIST PATTERN ON A METALLIC SURFACE