Mask illumination systems

Industry

CPC
G03F7/70058

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70058Mask illumination systems

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Light source apparatus, optical apparatus, exposure apparatus, devi...
- Patent number 11,934,104
- Issue date Mar 19, 2024
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Grant
Method and system for nanoscale data recording
- Patent number 11,886,123
- Issue date Jan 30, 2024
- Franklin Mark Schellenberg
- G11 - INFORMATION STORAGE
Information Patent Grant
Method of forming semiconductor structure
- Patent number 11,764,062
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ping-Hao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Digital masking system, pattern imaging apparatus and digital maski...
- Patent number 11,747,732
- Issue date Sep 5, 2023
- Jabil Inc.
- Scott Klimczak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 11,747,736
- Issue date Sep 5, 2023
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing method, substrate processing apparatus, and st...
- Patent number 11,693,319
- Issue date Jul 4, 2023
- Tokyo Electron Limited
- Keiichi Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of preparing structures employing chemistries for biocompat...
- Patent number 11,655,393
- Issue date May 23, 2023
- The Government of the United States of America, as represented by the Secreta...
- David A. Kidwell
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Photolithography method
- Patent number 11,644,745
- Issue date May 9, 2023
- Samsung Electronics Co., Ltd.
- Yongwook Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 11,579,532
- Issue date Feb 14, 2023
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV radiation source, insert for an EUV radiation source and insert...
- Patent number 11,550,225
- Issue date Jan 10, 2023
- Carl Zeiss SMT GmbH
- Iris Pilch
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method for processing substrate
- Patent number 11,520,245
- Issue date Dec 6, 2022
- Semes Co., Ltd.
- Oh Jin Kwon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method for structure and manufacturing method for liq...
- Patent number 11,465,418
- Issue date Oct 11, 2022
- Canon Kabushiki Kaisha
- Kenji Tamamori
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Chemistries for biocompatible additive nanolithography
- Patent number 11,459,484
- Issue date Oct 4, 2022
- The Government of the United States of America, as represented by the Secreta...
- David A. Kidwell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for simulating interaction of radiation with...
- Patent number 11,429,763
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Remco Dirks
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and systems for printing large periodic patterns by overlap...
- Patent number 11,422,471
- Issue date Aug 23, 2022
- Eulitha A.G.
- Francis Clube
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining a radiation beam intensity pro...
- Patent number 11,353,796
- Issue date Jun 7, 2022
- ASML Netherlands B.V.
- Teis Johan Coenen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Display device and method of manufacturing the same
- Patent number 11,353,631
- Issue date Jun 7, 2022
- Samsung Display Co., Ltd.
- Ju Hwa Ha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Light source apparatus, optical apparatus, exposure apparatus, devi...
- Patent number 11,353,795
- Issue date Jun 7, 2022
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Grant
Tin trap device, extreme ultraviolet light generation apparatus, an...
- Patent number 11,337,292
- Issue date May 17, 2022
- Gigaphoton Inc.
- Gouta Niimi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet light generation apparatus, target control meth...
- Patent number 11,287,744
- Issue date Mar 29, 2022
- Gigaphoton Inc.
- Toru Abe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor manufacturing apparatus and method of manufacturing s...
- Patent number 11,275,310
- Issue date Mar 15, 2022
- Kioxia Corporation
- Sho Kawadahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus, film forming method, and method of manufact...
- Patent number 11,275,309
- Issue date Mar 15, 2022
- Canon Kabushiki Kaisha
- Hiroshi Kurosawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for nanoscale data recording
- Patent number 11,269,258
- Issue date Mar 8, 2022
- Franklin Mark Schellenberg
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus and method for repairing a photolithographic mask
- Patent number 11,256,168
- Issue date Feb 22, 2022
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 11,256,175
- Issue date Feb 22, 2022
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask and exposure system
- Patent number 11,137,676
- Issue date Oct 5, 2021
- HKC CORPORATION LIMITED
- Zeyao Li
- G02 - OPTICS
Information Patent Grant
Drive method for spatial light modulator, method for generating pat...
- Patent number 11,119,411
- Issue date Sep 14, 2021
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Euv lithography system for dense line patterning
- Patent number 11,099,483
- Issue date Aug 24, 2021
- Nikon Corporation
- Donis G. Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system and method thereof
- Patent number 11,086,225
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Shin Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 11,003,096
- Issue date May 11, 2021
- ASML Netherlands B.V.
- Timotheus Franciscus Sengers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EXPOSURE APPARATUS
- Publication number 20240329545
- Publication date Oct 3, 2024
- Ushio Denki Kabushiki Kaisha
- Naoya SOHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR MANUFACTURING DISPLAY DEVICE, AND MASK ASS...
- Publication number 20240324435
- Publication date Sep 26, 2024
- SAMSUNG DISPLAY CO., LTD.
- Jeongkuk Kim
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Application
OPTIMAL SCANNER MAPS AND FIELD LAYOUTS
- Publication number 20240319579
- Publication date Sep 26, 2024
- International Business Machines Corporation
- Allen Gabor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING
- Publication number 20240248407
- Publication date Jul 25, 2024
- Franklin Mark Schellenberg
- B82 - NANO-TECHNOLOGY
Information Patent Application
SYSTEM FOR EXPOSURE OF ULTRA-VIOLET LIGHT TO A PHOTORESIST DEVELOPE...
- Publication number 20240210835
- Publication date Jun 27, 2024
- Intel Corporation
- Joseph Bloxham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVI...
- Publication number 20240176248
- Publication date May 30, 2024
- Nikon Corporation
- Hideki KOMATSUDA
- G02 - OPTICS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240077807
- Publication date Mar 7, 2024
- SCREEN Holdings Co., Ltd.
- Jun KOMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor Featuring Ridged Architecture
- Publication number 20240014262
- Publication date Jan 11, 2024
- Walter A. Tormasi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR MULTIPLE STEP DIRECTIONAL PATTERNING
- Publication number 20230386834
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Kai YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH CONDUC...
- Publication number 20230350284
- Publication date Nov 2, 2023
- AGC Inc.
- Yusuke Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...
- Publication number 20230143407
- Publication date May 11, 2023
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGI...
- Publication number 20230063156
- Publication date Mar 2, 2023
- ASML Holding N.V.
- Ronald Peter ALBRIGHT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of Preparing Structures Employing Chemistries for Biocompat...
- Publication number 20220389273
- Publication date Dec 8, 2022
- The Government of the United States of America, as represented by the Secreta...
- David A. Kidwell
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
EXPOSURE SYSTEM, LASER CONTROL PARAMETER PRODUCTION METHOD, AND ELE...
- Publication number 20220373893
- Publication date Nov 24, 2022
- Gigaphoton Inc.
- Koichi FUJII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVI...
- Publication number 20220260923
- Publication date Aug 18, 2022
- Nikon Corporation
- Hideki KOMATSUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
- Publication number 20220206399
- Publication date Jun 30, 2022
- SEMES CO., LTD.
- Oh Jin Kwon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING
- Publication number 20220197150
- Publication date Jun 23, 2022
- Franklin Mark Schellenberg
- B82 - NANO-TECHNOLOGY
Information Patent Application
TIN TRAP DEVICE, EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, AN...
- Publication number 20220141945
- Publication date May 5, 2022
- Gigaphoton Inc.
- Gouta NIIMI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...
- Publication number 20220121125
- Publication date Apr 21, 2022
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...
- Publication number 20220113628
- Publication date Apr 14, 2022
- TOKYO ELECTRON LIMITED
- Keiichi TANAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR MULTIPLE STEP DIRECTIONAL PATTERNING
- Publication number 20220102139
- Publication date Mar 31, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Kai YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV RADIATION SOURCE, INSERT FOR AN EUV RADIATION SOURCE AND INSERT...
- Publication number 20210382395
- Publication date Dec 9, 2021
- Carl Zeiss SMT GMBH
- Iris Pilch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, TARGET CONTROL METH...
- Publication number 20210333716
- Publication date Oct 28, 2021
- Gigaphoton Inc.
- Toru ABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD FOR STRUCTURE AND MANUFACTURING METHOD FOR LIQ...
- Publication number 20210300042
- Publication date Sep 30, 2021
- Canon Kabushiki Kaisha
- Kenji Tamamori
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Mask, Layout, And Lithography System And Lithography Process Of The...
- Publication number 20210286256
- Publication date Sep 16, 2021
- Shanghai Huahong Grace Semiconductor Manufacturing Corporation
- Weifeng LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING S...
- Publication number 20210278770
- Publication date Sep 9, 2021
- KIOXIA Corporation
- Sho KAWADAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY METHOD
- Publication number 20210165316
- Publication date Jun 3, 2021
- Samsung Electronics Co., Ltd.
- Yongwook Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING
- Publication number 20210124273
- Publication date Apr 29, 2021
- Franklin Mark Schellenberg
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHODS AND SYSTEMS FOR PRINTING LARGE PERIODIC PATTERNS BY OVERLAP...
- Publication number 20210103222
- Publication date Apr 8, 2021
- EULITHA A.G.
- FRANCIS CLUBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...
- Publication number 20210041789
- Publication date Feb 11, 2021
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING

Mask illumination systems

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Light source apparatus, optical apparatus, exposure apparatus, devi...

Method and system for nanoscale data recording

Method of forming semiconductor structure

Digital masking system, pattern imaging apparatus and digital maski...

Exposure apparatus and exposure method, and device manufacturing me...

Substrate processing method, substrate processing apparatus, and st...

Methods of preparing structures employing chemistries for biocompat...

Photolithography method

Exposure apparatus and exposure method, and device manufacturing me...

EUV radiation source, insert for an EUV radiation source and insert...

Apparatus and method for processing substrate

Manufacturing method for structure and manufacturing method for liq...

Chemistries for biocompatible additive nanolithography

Methods and apparatus for simulating interaction of radiation with...

Methods and systems for printing large periodic patterns by overlap...

Method and apparatus for determining a radiation beam intensity pro...

Display device and method of manufacturing the same

Light source apparatus, optical apparatus, exposure apparatus, devi...

Tin trap device, extreme ultraviolet light generation apparatus, an...

Extreme ultraviolet light generation apparatus, target control meth...

Semiconductor manufacturing apparatus and method of manufacturing s...

Film forming apparatus, film forming method, and method of manufact...

Method and system for nanoscale data recording

Apparatus and method for repairing a photolithographic mask

Exposure apparatus and exposure method, and device manufacturing me...

Photomask and exposure system

Drive method for spatial light modulator, method for generating pat...

Euv lithography system for dense line patterning

Lithography system and method thereof

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

EXPOSURE APPARATUS

APPARATUS AND METHOD FOR MANUFACTURING DISPLAY DEVICE, AND MASK ASS...

OPTIMAL SCANNER MAPS AND FIELD LAYOUTS

METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING

SYSTEM FOR EXPOSURE OF ULTRA-VIOLET LIGHT TO A PHOTORESIST DEVELOPE...

LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVI...

SUBSTRATE PROCESSING APPARATUS

Semiconductor Featuring Ridged Architecture

SYSTEM AND METHOD FOR MULTIPLE STEP DIRECTIONAL PATTERNING

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH CONDUC...

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...

LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGI...

Methods of Preparing Structures Employing Chemistries for Biocompat...

EXPOSURE SYSTEM, LASER CONTROL PARAMETER PRODUCTION METHOD, AND ELE...

LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVI...

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING

TIN TRAP DEVICE, EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, AN...

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...

SYSTEM AND METHOD FOR MULTIPLE STEP DIRECTIONAL PATTERNING

EUV RADIATION SOURCE, INSERT FOR AN EUV RADIATION SOURCE AND INSERT...

EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, TARGET CONTROL METH...

MANUFACTURING METHOD FOR STRUCTURE AND MANUFACTURING METHOD FOR LIQ...

Mask, Layout, And Lithography System And Lithography Process Of The...

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING S...

PHOTOLITHOGRAPHY METHOD

METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING

METHODS AND SYSTEMS FOR PRINTING LARGE PERIODIC PATTERNS BY OVERLAP...

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...