Masking pattern being obtained by thermal means

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G03F7/202

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/202Masking pattern being obtained by thermal means

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Patents Grantslast 30 patents

Information Patent Grant
Method for smoother tonal response in flexographic printing
- Patent number 12,168,359
- Issue date Dec 17, 2024
- Esko Software BV
- Peter Morisse
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Information Patent Grant
Photomask, display device, and manufacturing method thereof
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- Issue date Dec 17, 2024
- Samsung Display Co., Ltd.
- Dong Hee Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal plate for manufacturing deposition mask and manufacturing met...
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- Dai Nippon Printing Co., Ltd.
- Hiroki Oka
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- Issue date Oct 1, 2024
- United Microelectronics Corp.
- Yi Jing Wang
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Method for identifying a relief precursor for producing a relief st...
- Patent number 12,076,974
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- Flint Group Germany GmbH
- Markus Muehlfeit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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- Myoung-ha Jeon
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Substrate processing apparatus, estimation method of substrate proc...
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- Tokyo Electron Limited
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- H01 - BASIC ELECTRIC ELEMENTS
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Photoresist structure, patterned deposition layer, semiconductor ch...
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- Tencent Technology (Shenzhen) Company Limited
- Wenlong Zhang
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Patterning interconnects and other structures by photo-sensitizing...
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- Asahi Kasei Kabushiki Kaisha
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Extreme ultraviolet (EUV) photomask and method of manufacturing sem...
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- Moosong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, display device, and manufacturing method thereof
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- Samsung Display Co., Ltd.
- Dong Hee Shin
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- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiatioin-curable mixture containing low-functionalised, partially...
- Patent number 11,914,293
- Issue date Feb 27, 2024
- Flint Group Germany GmbH
- Christian Pietsch
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Imprint apparatus, imprint method, and article manufacturing method
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- Canon Kabushiki Kaisha
- Yosuke Murakami
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Lithography
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- Taiwan Semiconductor Manufacturing Company, Ltd
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Photodynamic compositions, methods of making, and uses thereof
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- North Carolina State University
- Reza Arman Ghiladi
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Film structure for electric field guided photoresist patterning pro...
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- Applied Materials, Inc.
- Huixiong Dai
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Information Patent Grant
Printing form precursor, a process for making the precursor, and a...
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- Issue date Jan 2, 2024
- DUPONT ELECTRONICS, INC.
- Robert M Blomquist
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Nitride-based semiconductor devices with recesses for dicing and me...
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- Issue date Dec 26, 2023
- INNOSCIENCE (ZHUHAI) TECHNOLOGY CO., LTD.
- Weixing Du
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lens adjustment for an edge exposure tool
- Patent number 11,852,979
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yong-Ting Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Relief precursor having low cupping and fluting
- Patent number 11,822,246
- Issue date Nov 21, 2023
- Flint Group Germany GmbH
- Matthias Beyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and template manufacturing method
- Patent number 11,809,082
- Issue date Nov 7, 2023
- Kioxia Corporation
- Mitsuru Kondo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a patterned structure and device thereof
- Patent number 11,803,125
- Issue date Oct 31, 2023
- Singapore University of Technology and Design
- You Sin Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Di-amine compound, and heat-resistant resin and resin composition u...
- Patent number 11,802,181
- Issue date Oct 31, 2023
- Toray Industries, Inc.
- Yuki Masuda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Underlayer material for photoresist
- Patent number 11,796,918
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus for forming a coating film on a substrate havi...
- Patent number 11,791,162
- Issue date Oct 17, 2023
- Tokyo Electron Limited
- Yasuaki Noda
- G06 - COMPUTING CALCULATING COUNTING

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FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVE...
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UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES
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- ESKO-GRAPHICS IMAGING GMBH
- Thomas Klein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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METHOD FOR IDENTIFYING A RELIEF PRECURSOR FOR PRODUCING A RELIEF ST...
- Publication number 20240391231
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- Flint Group Germany GmbH
- Markus MUEHLFEIT
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
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LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES
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- Publication date Nov 14, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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COMPOSITION FOR REMOVING EDGE BEAD FROM METAL-CONTAINING RESISTS, A...
- Publication number 20240369935
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- Samsung SDI Co., Ltd.
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SUBSTRATE PROCESSING APPARATUS, ESTIMATION METHOD OF SUBSTRATE PROC...
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MULTI-LAYER HIGH-ASPECT RATIO X-RAY GRATING AND METHOD OF MANUFACTURE
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PATTERNING INTERCONNECTS AND OTHER STRUCTURES BY PHOTO-SENSITIZING...
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HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
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Redistribution Lines and The Method Forming the Same Through Stitching
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- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shang-Yun Hou
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METHOD OF FABRICATING SEMICONDUCTOR DEVICE
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PHOTOLITHOGRAPHY METHOD BASED ON BILAYER PHOTORESIST
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- SHANGHAI MICROSTART PHOTOELECTRIC TECHNOLOGY CO., LTD.
- Yijiao GAO
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PHOTORESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD...
- Publication number 20240288768
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- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
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PREFERENTIAL INFILTRATION IN LITHOGRAPHIC PROCESS FLOW FOR EUV CAR...
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- GABRIELA ALVA
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SEMICONDUCTOR LITHOGRAPHY SYSTEM AND/OR METHOD
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- Taiwan Semiconductor Manufacturing Company Limited
- Tsiao-Chen Wu
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METHODS AND APPARATUS TO REDUCE EXTREME ULTRAVIOLET LIGHT FOR PHOTO...
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- Intel Corporation
- Marvin Paik
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OVERLAY CORRECTION FOR ADVANCED INTEGRATED-CIRCUIT DEVICES
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- ONTO INNOVATION INC.
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SURFACE TOPOLOGIES OF ELECTROSTATIC SUBSTRATE SUPPORT FOR PARTICLE...
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PHOTO-DEFINABLE HYDROPHOBIC COMPOSITIONS
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APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
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METHOD OF FABRICATING BIT LINE CONTACTS
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- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masking pattern being obtained by thermal means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for smoother tonal response in flexographic printing

Photomask, display device, and manufacturing method thereof

Metal plate for manufacturing deposition mask and manufacturing met...

Patterning method and overlay measurement method

Method for identifying a relief precursor for producing a relief st...

Display device and method for manufacturing the same

Substrate processing apparatus, estimation method of substrate proc...

Photoresist structure, patterned deposition layer, semiconductor ch...

Patterning interconnects and other structures by photo-sensitizing...

Method of cutting conductive patterns

Substrate measuring device and a method of using the same

Microfluidic device and method for manufacturing the same, and meth...

Ablation layer, photosensitive resin structure, method for producin...

Extreme ultraviolet (EUV) photomask and method of manufacturing sem...

Photomask, display device, and manufacturing method thereof

Semiconductor lithography system and/or method

Radiatioin-curable mixture containing low-functionalised, partially...

Imprint apparatus, imprint method, and article manufacturing method

Lithography

Photodynamic compositions, methods of making, and uses thereof

Film structure for electric field guided photoresist patterning pro...

Printing form precursor, a process for making the precursor, and a...

Nitride-based semiconductor devices with recesses for dicing and me...

Lens adjustment for an edge exposure tool

Relief precursor having low cupping and fluting

Pattern forming method and template manufacturing method

Method of forming a patterned structure and device thereof

Di-amine compound, and heat-resistant resin and resin composition u...

Underlayer material for photoresist

Processing apparatus for forming a coating film on a substrate havi...

Patents Applicationslast 30 patents

A RELIEF PRECURSOR WITH VEGETABLE OILS AS PLASTICIZERS SUITABLE FOR...

FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVE...

UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES

METHOD FOR IDENTIFYING A RELIEF PRECURSOR FOR PRODUCING A RELIEF ST...

LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL-CONTAINING RESISTS, A...

SUBSTRATE PROCESSING APPARATUS, ESTIMATION METHOD OF SUBSTRATE PROC...

MULTI-LAYER HIGH-ASPECT RATIO X-RAY GRATING AND METHOD OF MANUFACTURE

PATTERNING INTERCONNECTS AND OTHER STRUCTURES BY PHOTO-SENSITIZING...

HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

Redistribution Lines and The Method Forming the Same Through Stitching

METHOD OF FABRICATING SEMICONDUCTOR DEVICE

PHOTOLITHOGRAPHY METHOD BASED ON BILAYER PHOTORESIST

PHOTORESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD...

PREFERENTIAL INFILTRATION IN LITHOGRAPHIC PROCESS FLOW FOR EUV CAR...

SEMICONDUCTOR LITHOGRAPHY SYSTEM AND/OR METHOD

METHODS AND APPARATUS TO REDUCE EXTREME ULTRAVIOLET LIGHT FOR PHOTO...

OVERLAY CORRECTION FOR ADVANCED INTEGRATED-CIRCUIT DEVICES

SURFACE TOPOLOGIES OF ELECTROSTATIC SUBSTRATE SUPPORT FOR PARTICLE...

PHOTO-DEFINABLE HYDROPHOBIC COMPOSITIONS

TWO-DIMENSIONAL (2D) PATTERNS USING MULTIPLE EXPOSURES OF ONE-DIMEN...

PHOTOMASK, DISPLAY DEVICE, AND MANUFACTURING METHOD THEREOF

LITHOGRAPHY

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE

METHOD, APPARATUS AND COMPUTER PROGRAM FOR PROCESSING A SURFACE OF...

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING T...

LENS ADJUSTMENT FOR AN EDGE EXPOSURE TOOL

BUTTRESSED FIELD TARGET DESIGN FOR OPTICAL AND E-BEAM BASED METROLO...

METHOD FOR FORMING RESIST PATTERN BY USING EXTREME ULTRAVIOLET LIGH...

METHOD OF FABRICATING BIT LINE CONTACTS