Maskless patterned ion implantation

Industry

CPC
H01J37/3172

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3172Maskless patterned ion implantation

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 12,080,510
- Issue date Sep 3, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor structure
- Patent number 11,908,700
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Nai-Han Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 11,837,430
- Issue date Dec 5, 2023
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor structure
- Patent number 11,482,422
- Issue date Oct 25, 2022
- Nai-Han Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 11,183,358
- Issue date Nov 23, 2021
- MI2-FACTORY GMBH
- Florian Krippendorf
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Precision substrate material multi-processing using miniature-colum...
- Patent number 11,037,756
- Issue date Jun 15, 2021
- David K. Lam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method thereof
- Patent number 10,763,117
- Issue date Sep 1, 2020
- Taiwan Semiconductor Manufacturing Company Ltd.
- Nai-Han Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precision substrate material multi-processing using miniature-colum...
- Patent number 10,734,192
- Issue date Aug 4, 2020
- David K. Lam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precision substrate material multi-processing using miniature-colum...
- Patent number 10,658,153
- Issue date May 19, 2020
- David K. Lam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterned atomic layer etching and deposition using miniature-colum...
- Patent number 10,607,845
- Issue date Mar 31, 2020
- Kevin M. Monahan
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Varied component density for thermal isolation
- Patent number 10,535,499
- Issue date Jan 14, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method thereof
- Patent number 9,892,931
- Issue date Feb 13, 2018
- Taiwan Semiconductor Manufacturing Company Ltd.
- Nai-Han Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precision material modification using miniature-column charged part...
- Patent number 9,824,859
- Issue date Nov 21, 2017
- Michael C. Smayling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam dimension control for ion implantation process and apparat...
- Patent number 9,805,913
- Issue date Oct 31, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Hong Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for generating parameter pattern, ion implantation method an...
- Patent number 9,697,989
- Issue date Jul 4, 2017
- Taiwan Semiconductor Manufacturing Company Ltd.
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation tool and ion implantation method
- Patent number 9,679,746
- Issue date Jun 13, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Wei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bias voltage frequency controlled angular ion distribution in plasm...
- Patent number 9,520,267
- Issue date Dec 13, 2016
- Applied Mateirals, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Using wafer geometry to improve scanner correction effectiveness fo...
- Patent number 9,513,565
- Issue date Dec 6, 2016
- KLA-Tencor Corporation
- Craig MacNaughton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ion implantation method and ion implantation apparatus
- Patent number 9,305,784
- Issue date Apr 5, 2016
- Sen Corporation
- Shiro Ninomiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation method and ion implantation apparatus
- Patent number 9,165,772
- Issue date Oct 20, 2015
- Sen Corporation
- Shiro Ninomiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam dimension control for ion implantation process and apparat...
- Patent number 9,070,534
- Issue date Jun 30, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Hong Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Using wafer geometry to improve scanner correction effectiveness fo...
- Patent number 9,029,810
- Issue date May 12, 2015
- KLA-Tencor Corporation
- Craig MacNaughton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam control assembly for ribbon beam of ions for ion implantation
- Patent number 8,993,979
- Issue date Mar 31, 2015
- Advanced Ion Beam Technology, Inc.
- Jiong Chen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
High-energy ion implanter
- Patent number 8,987,690
- Issue date Mar 24, 2015
- Sen Corporation
- Mitsuaki Kabasawa
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Apparatus and method for maskless patterned implantation
- Patent number 8,907,307
- Issue date Dec 9, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Christopher J. Leavitt
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Ion implantation method and ion implantation apparatus
- Patent number 8,772,142
- Issue date Jul 8, 2014
- Sen Corporation
- Shiro Ninomiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implantation method and ion implantation apparatus
- Patent number 8,772,741
- Issue date Jul 8, 2014
- Sen Corporation
- Shiro Ninomiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for multiple slot ion implantation
- Patent number 8,716,682
- Issue date May 6, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam control assembly for ribbon beam of ions for ion implantation
- Patent number 8,680,480
- Issue date Mar 25, 2014
- Advanced Ion Beam Technology, Inc.
- Jiong Chen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Apparatus and method for controlled particle beam manufacturing
- Patent number 8,658,994
- Issue date Feb 25, 2014
- Nexgen Semi Holding, Inc.
- Michael John Zani
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20250014854
- Publication date Jan 9, 2025
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBLIQUE ANGLED ION IMPLANTATION FOR SUBSTRATE STRESS CONTROL
- Publication number 20240395500
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Frank SINCLAIR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILAMENT ALIGNMENT DEVICE
- Publication number 20240153740
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Sangwoo Seon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20240055217
- Publication date Feb 15, 2024
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOSE MAPPING AND SUBSTRATE ROTATION FOR SUBSTRATE CURVATURE CONTROL...
- Publication number 20230369014
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Pradeep Subrahmanyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20220367197
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- NAI-HAN CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20220020556
- Publication date Jan 20, 2022
- mi2-factory GmbH
- Florian KRIPPENDORF
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20200402806
- Publication date Dec 24, 2020
- Taiwan Semiconductor Manufacturing company Ltd.
- NAI-HAN CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DELIVERY DEVICE, SUBSTRATE ION-IMPLANTING SYSTEM AND METHOD THEREOF
- Publication number 20190385879
- Publication date Dec 19, 2019
- WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Rui Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Varied Component Density For Thermal Isolation
- Publication number 20190139742
- Publication date May 9, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Adam M. McLaughlin
- G05 - CONTROLLING REGULATING
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD THEREOF
- Publication number 20180166291
- Publication date Jun 14, 2018
- Taiwan Semiconductor Manufacturing company Ltd.
- NAI-HAN CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION TOOL AND ION IMPLANTATION METHOD
- Publication number 20170125214
- Publication date May 4, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Wei LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR GENERATING PARAMETER PATTERN, ION IMPLANTATION METHOD AN...
- Publication number 20160254122
- Publication date Sep 1, 2016
- Taiwan Semiconductor Manufacturing company Ltd.
- CHENG-TA WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE ASSEMBLY HAVING PIERCE ELECTRODES FOR CONTROLLING SPACE C...
- Publication number 20160111245
- Publication date Apr 21, 2016
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Kourosh SAADATMAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIAS VOLTAGE FREQUENCY CONTROLLED ANGULAR ION DISTRIBUTION IN PLASM...
- Publication number 20150371827
- Publication date Dec 24, 2015
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...
- Publication number 20150212429
- Publication date Jul 30, 2015
- KLA-Tencor Corporation
- Craig MacNaughton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-ENERGY ION IMPLANTER
- Publication number 20140353517
- Publication date Dec 4, 2014
- SEN Corporation
- Mitsuaki Kabasawa
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...
- Publication number 20140353527
- Publication date Dec 4, 2014
- KLA-Tencor Corporation
- Craig MacNaughton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM CONTROL ASSEMBLY FOR RIBBON BEAM OF IONS FOR ION IMPLANTATION
- Publication number 20140261181
- Publication date Sep 18, 2014
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Jiong Chen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS
- Publication number 20140235042
- Publication date Aug 21, 2014
- SEN Corporation
- Shiro NINOMIYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION IMPLANTATION TUNING TO ACHIEVE SIMULTANEOUS MULTIPLE IMPLANT EN...
- Publication number 20140106550
- Publication date Apr 17, 2014
- International Business Machines Corporation
- Anthony I. Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM DIMENSION CONTROL FOR ION IMPLANTATION PROCESS AND APPARAT...
- Publication number 20130295753
- Publication date Nov 7, 2013
- Taiwan Semiconductor Manufacturing Co., LTD
- Chih-Hong HWANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM CONTROL ASSEMBLY FOR RIBBON BEAM OF IONS FOR ION IMPLANTATION
- Publication number 20130239892
- Publication date Sep 19, 2013
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Jiong Chen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS
- Publication number 20130196492
- Publication date Aug 1, 2013
- SEN Corporation
- Shiro NINOMIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS
- Publication number 20120252194
- Publication date Oct 4, 2012
- SEN Corporation
- Shiro NINOMIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR MULTIPLE SLOT ION IMPLANTATION
- Publication number 20120248328
- Publication date Oct 4, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS
- Publication number 20120244691
- Publication date Sep 27, 2012
- SEN Corporation
- Shiro NINOMIYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR MASKLESS PATTERNED IMPLANTION
- Publication number 20120228515
- Publication date Sep 13, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Christopher J. Leavitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STEPPED MASKING FOR PATTERNED IMPLANTATION
- Publication number 20120196430
- Publication date Aug 2, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Benjamin B. Riordon
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20120112323
- Publication date May 10, 2012
- NEXGEN SEMI HOLDING, INC.
- Michael John Zani
- B82 - NANO-TECHNOLOGY

Maskless patterned ion implantation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Energy filter element for ion implantation systems for the use in t...

Method for manufacturing semiconductor structure

Energy filter element for ion implantation systems for the use in t...

Method for manufacturing semiconductor structure

Energy filter element for ion implantation systems for the use in t...

Precision substrate material multi-processing using miniature-colum...

Semiconductor manufacturing apparatus and method thereof

Precision substrate material multi-processing using miniature-colum...

Precision substrate material multi-processing using miniature-colum...

Patterned atomic layer etching and deposition using miniature-colum...

Varied component density for thermal isolation

Semiconductor manufacturing apparatus and method thereof

Precision material modification using miniature-column charged part...

Ion beam dimension control for ion implantation process and apparat...

Method for generating parameter pattern, ion implantation method an...

Ion implantation tool and ion implantation method

Bias voltage frequency controlled angular ion distribution in plasm...

Using wafer geometry to improve scanner correction effectiveness fo...

Ion implantation method and ion implantation apparatus

Ion implantation method and ion implantation apparatus

Ion beam dimension control for ion implantation process and apparat...

Using wafer geometry to improve scanner correction effectiveness fo...

Beam control assembly for ribbon beam of ions for ion implantation

High-energy ion implanter

Apparatus and method for maskless patterned implantation

Ion implantation method and ion implantation apparatus

Ion implantation method and ion implantation apparatus

Apparatus and method for multiple slot ion implantation

Beam control assembly for ribbon beam of ions for ion implantation

Apparatus and method for controlled particle beam manufacturing

Patents Applicationslast 30 patents

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

OBLIQUE ANGLED ION IMPLANTATION FOR SUBSTRATE STRESS CONTROL

FILAMENT ALIGNMENT DEVICE

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

DOSE MAPPING AND SUBSTRATE ROTATION FOR SUBSTRATE CURVATURE CONTROL...

METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

DELIVERY DEVICE, SUBSTRATE ION-IMPLANTING SYSTEM AND METHOD THEREOF

Varied Component Density For Thermal Isolation

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD THEREOF

ION IMPLANTATION TOOL AND ION IMPLANTATION METHOD

METHOD FOR GENERATING PARAMETER PATTERN, ION IMPLANTATION METHOD AN...

ELECTRODE ASSEMBLY HAVING PIERCE ELECTRODES FOR CONTROLLING SPACE C...

BIAS VOLTAGE FREQUENCY CONTROLLED ANGULAR ION DISTRIBUTION IN PLASM...

Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...

HIGH-ENERGY ION IMPLANTER

Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...

BEAM CONTROL ASSEMBLY FOR RIBBON BEAM OF IONS FOR ION IMPLANTATION

ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS

ION IMPLANTATION TUNING TO ACHIEVE SIMULTANEOUS MULTIPLE IMPLANT EN...

ION BEAM DIMENSION CONTROL FOR ION IMPLANTATION PROCESS AND APPARAT...

BEAM CONTROL ASSEMBLY FOR RIBBON BEAM OF IONS FOR ION IMPLANTATION

ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS

ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS

APPARATUS AND METHOD FOR MULTIPLE SLOT ION IMPLANTATION

ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS

APPARATUS AND METHOD FOR MASKLESS PATTERNED IMPLANTION

STEPPED MASKING FOR PATTERNED IMPLANTATION

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING