1. Field
The present application generally relates to ion implanters, and, more particularly, to a beam control assembly to shape a ribbon beam of ions for ion implantation.
2. Related Art
Ion implanters are used to implant ions in various applications, including semiconductor device fabrication. As depicted in
To increase throughput, particularly in semiconductor applications, a ribbon beam of ions is used. In particular, with reference to
Various conventional devices and techniques exist for controlling ribbon beam 202. For example, see, U.S. Pat. No. 7,078,713, issued Jul. 18, 2006, and U.S. Pat. No. 6,933,607, issued Aug. 23, 2005, which are incorporated herein by reference in their entireties for all purposes. These conventional devices and techniques have various shortcomings in shaping a ribbon beam of ions for ion implantation.
In one exemplary embodiment, a beam control assembly to shape a ribbon beam of ions for ion implantation includes a first bar, second bar, first coil of windings of electrical wire, second coil of windings of electrical wire, first electrical power supply, and second electrical power supply. The first coil is disposed on the first bar. The first coil is the only coil disposed on the first bar. The second bar is disposed opposite the first bar with a gap defined between the first and second bars. The ribbon beam travels between the gap. The second coil is disposed on the second bar. The second coil is the only coil disposed on the second bar. The first electrical power supply is connected to the first coil without being electrically connected to any other coil. The second electrical power supply is connected to the second coil without being electrically connected to any other coil.
The present application can be best understood by reference to the following description taken in conjunction with the accompanying drawing figures, in which like parts may be referred to by like numerals:
The following description sets forth numerous specific configurations, parameters, and the like. It should be recognized, however, that such description is not intended as a limitation on the scope of the present invention, but is instead provided as a description of exemplary embodiments.
With reference to
As depicted in
In one exemplary embodiment, first bar 210 is located at a first position 220 in second dimension 218 and extends into first dimension 216. In this exemplary embodiment, as depicted in
With reference to
With reference again to
With reference again to
With reference to
With reference to
With reference to
With reference to
As depicted in
With reference to
Beam control assembly 208 includes a fourth coil 310 disposed on fourth bar 304. In the present exemplary embodiment, fourth coil 310 is the only coil disposed on fourth bar 304. Fourth coil 310 includes windings of electrical wire. The windings of fourth coil 310 are concentric to fourth bar 304, which corresponds to being wound around first dimension 216 (
Beam control assembly 208 includes a third electrical power supply 312 electrically connected to third coil 308 without being electrically connected to any other coil. Beam control 208 also includes a fourth electrical power supply 314 electrically connected to fourth coil 310 without being electrically connected to any other coil.
With reference to
With reference to
With reference to
In the exemplary embodiment depicted in
With reference to
With reference to
It should be recognized that beam control assembly 208 can include any number of bars located at different positions along second dimension 218, each bar having only one coil disposed on the bar, with the coils of the different bars located at different positions along first dimension 216. For example,
With reference to
Also, the coils described above (such as first coil 222 in
Although exemplary embodiments have been described, various modifications can be made without departing from the spirit and/or scope of the present invention. Therefore, the present invention should not be construed as being limited to the specific forms shown in the drawings and described above.
The present application is a Continuation application of U.S. patent application Ser. No. 13/889,278, filed May 7, 2013, which issued as U.S. Pat. No. 8,680,480 on Mar. 25, 2014, which is a Continuation application of U.S. patent application Ser. No. 12/957,294, filed Nov. 30, 2010, which issued as U.S. Pat. No. 8,502,160 on Aug. 6, 2013, which is a Continuation application of U.S. patent application Ser. No. 12/053,076, filed Mar. 21, 2008, which issued as U.S. Pat. No. 7,851,767 on Dec. 14, 2010, which claims priority to U.S. Provisional Application Ser. No. 60/919,365, filed Mar. 21, 2007, which are incorporated herein by reference in their entirety.
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Entry |
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Non Final Office Action received for U.S. Appl. No. 12/053,076, mailed on Jan. 29, 2010, 11 pages. |
Notice of Allowance received for U.S. Appl. No. 12/053,076, mailed on Aug. 6, 2010, 7 pages. |
Non Final Office Action received for U.S. Appl. No. 12/957,294 mailed on Jun. 1, 2012, 20 pages. |
Notice of Allowance received for U.S. Appl. No. 12/957,294, mailed on Jan. 14, 2013, 22 pages. |
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Number | Date | Country | |
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20140261181 A1 | Sep 2014 | US |
Number | Date | Country | |
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60919365 | Mar 2007 | US |
Number | Date | Country | |
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Parent | 13889278 | May 2013 | US |
Child | 14191364 | US | |
Parent | 12957294 | Nov 2010 | US |
Child | 13889278 | US | |
Parent | 12053076 | Mar 2008 | US |
Child | 12957294 | US |