Masks having auxiliary features

Industry

CPC
G03F1/38

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/38Masks having auxiliary features

Industries

Patents Grantslast 30 patents

Information Patent Grant
Mask plate
- Patent number 12,169,356
- Issue date Dec 17, 2024
- Beijing Boe Display Technology Co., Ltd.
- Jiabin Zou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fabricating semiconductor device with damascene structur...
- Patent number 12,142,518
- Issue date Nov 12, 2024
- NANYA TECHNOLOGY CORPORATION
- Wei-Chen Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Components of an electronic device and methods for their assembly
- Patent number 12,137,529
- Issue date Nov 5, 2024
- Apple Inc.
- Bryan P. Kiple
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Random weight initialization of non-volatile memory array
- Patent number 12,135,497
- Issue date Nov 5, 2024
- International Business Machines Corporation
- Cheng Chi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for enabling deriving of corrected digital patter...
- Patent number 12,135,498
- Issue date Nov 5, 2024
- Mycronic AB
- Robert Eklund
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing a template
- Patent number 12,130,549
- Issue date Oct 29, 2024
- Canon Kabushiki Kaisha
- Amir Tavakkoli Kermani Ghariehali
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Aligning sensors on vehicles using sensor output
- Patent number 12,123,983
- Issue date Oct 22, 2024
- The Boeing Company
- Nick S. Evans
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Mask defect prevention
- Patent number 12,124,163
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with multilayer reflective film, reflective mask blank, r...
- Patent number 12,105,411
- Issue date Oct 1, 2024
- Hoya Corporation
- Kota Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopatterning of molecular orientations
- Patent number 12,044,933
- Issue date Jul 23, 2024
- Qi-Huo Wei
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multiple-mask multiple-exposure lithography and masks
- Patent number 12,044,977
- Issue date Jul 23, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for flat panel display photomask
- Patent number 12,013,642
- Issue date Jun 18, 2024
- Photronics, Inc.
- Bryan S. Kasprowicz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Component for use in a lithographic apparatus, method of protecting...
- Patent number 12,001,149
- Issue date Jun 4, 2024
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of lithography process and transferring a reticle
- Patent number 11,982,944
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsiao-Lun Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 11,984,322
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tien-Shun Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, flexible display panel and manufacturing method thereof
- Patent number 11,963,431
- Issue date Apr 16, 2024
- Chengdu BOE Optoelectronics Technology Co., Ltd.
- Qian Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alternating spacers for pitch structure
- Patent number 11,908,732
- Issue date Feb 20, 2024
- International Business Machines Corporation
- Hsueh-Chung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing phase shift photo masks
- Patent number 11,906,898
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Chieh Tien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cutting fin
- Patent number 11,881,409
- Issue date Jan 23, 2024
- United Microelectronics Corp.
- Wei-Hao Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle constructions and photo-processing methods
- Patent number 11,874,595
- Issue date Jan 16, 2024
- Micron Technology, Inc.
- Chung-Yi Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect prevention
- Patent number 11,860,530
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography mask with a black border regions and method of fabricat...
- Patent number 11,852,966
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chin-Hsiang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method of repairing photomask
- Patent number 11,829,071
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hao-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 11,789,355
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 11,774,844
- Issue date Oct 3, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask including first refractive member that concentrates first ligh...
- Patent number 11,762,255
- Issue date Sep 19, 2023
- Samsung Display Co., Ltd.
- Hyunggyu Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Array substrate and manufacturing method therefor, display device,...
- Patent number 11,765,943
- Issue date Sep 19, 2023
- BOE Technology Group Co., Ltd.
- Qian Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor manufacturing method and apparatus thereof
- Patent number 11,756,789
- Issue date Sep 12, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yung-Yao Lee
- G01 - MEASURING TESTING
Information Patent Grant
Mask, preparation method and operation method thereof
- Patent number 11,746,406
- Issue date Sep 5, 2023
- BOE Technology Group Co., Ltd.
- Chengfa Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lithography process method for defining sidewall morphology of lith...
- Patent number 11,726,400
- Issue date Aug 15, 2023
- Shanghai Huahong Grace Semiconductor Manufacturing Corporation
- Hui Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MASK, LITHOGRAPHING APPARATUS, METHOD OF MANUFACTURING MASK AND LIT...
- Publication number 20240402612
- Publication date Dec 5, 2024
- WESTLAKE UNIVERSITY
- Xijun LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DEFECT PREVENTION
- Publication number 20240385507
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY
- Publication number 20240385505
- Publication date Nov 21, 2024
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS
- Publication number 20240377755
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND MANUFACTURING METHOD THEREOF
- Publication number 20240342749
- Publication date Oct 17, 2024
- Darwin Precisions Corporation
- Ming-Hung Tsai
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PHOTOMASK STRUCTURE
- Publication number 20240345469
- Publication date Oct 17, 2024
- United Microelectronics Corp.
- Chia-Chen Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-SCATTERING AND ANTI-INTERFERENCE COATING PATTERN STRUCTURE OF...
- Publication number 20240319408
- Publication date Sep 26, 2024
- MORRISON OPTOELECTRONICS LTD.
- Chin-Chen KUO
- G02 - OPTICS
Information Patent Application
Optical Component with Apodized Mask
- Publication number 20240319582
- Publication date Sep 26, 2024
- Apple Inc.
- Takeyoshi Saiga
- G02 - OPTICS
Information Patent Application
ORIGINAL, METHOD OF DETERMINING PATTERN OF ORIGINAL, AND METHOD OF...
- Publication number 20240319583
- Publication date Sep 26, 2024
- Canon Kabushiki Kaisha
- TORU KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR FLAT PANEL DISPLAY PHOTOMASK
- Publication number 20240280908
- Publication date Aug 22, 2024
- PHOTRONICS, INC.
- Bryan S. Kasprowicz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240258114
- Publication date Aug 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tien-Shun Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE...
- Publication number 20240248389
- Publication date Jul 25, 2024
- SK enpulse Co., Ltd.
- Tae Wan KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAL MASK STRUCTURE, PHOTOMASK FOR PREPARING SHIELDING LAYER, AND...
- Publication number 20240240303
- Publication date Jul 18, 2024
- Darwin Precisions Corporation
- CHIAO-LING HUANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK, LITHOGRAPHING APPARATUS AND METHOD FOR MANUFACTURING MASK
- Publication number 20240231218
- Publication date Jul 11, 2024
- WESTLAKE UNIVERSITY
- Xijun LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND M...
- Publication number 20240201600
- Publication date Jun 20, 2024
- KIOXIA Corporation
- Kasumi OKABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPONENTS OF AN ELECTRONIC DEVICE AND METHODS FOR THEIR ASSEMBLY
- Publication number 20240188243
- Publication date Jun 6, 2024
- Apple Inc.
- Bryan P. Kiple
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD OF MANUFACTURING PHASE SHIFT PHOTO MASKS
- Publication number 20240184195
- Publication date Jun 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chieh TIEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME
- Publication number 20240142869
- Publication date May 2, 2024
- Applied Materials, Inc.
- Yung-chen LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME
- Publication number 20240142870
- Publication date May 2, 2024
- Applied Materials, Inc.
- Yung-chen LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle Constructions and Photo-Processing Methods
- Publication number 20240126164
- Publication date Apr 18, 2024
- Micron Technology, Inc.
- Chung-Yi Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Forming an Interconnect Structure
- Publication number 20240036470
- Publication date Feb 1, 2024
- IMEC vzw
- Waikin Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPONENT FOR USE IN A LITHOGRAPHIC APPARATUS, METHOD OF PROTECTING...
- Publication number 20240027925
- Publication date Jan 25, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK STRUCTURE
- Publication number 20240012322
- Publication date Jan 11, 2024
- United Microelectronics Corp.
- Chia-Chen Sun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSERTS FOR SPACING IN RETICLE CONTAINERS
- Publication number 20230418152
- Publication date Dec 28, 2023
- Entegris, Inc.
- Russ V. Raschke
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
METHOD FOR MANUFACTURING A SET OF ELECTRONIC COMPONENTS ON THE FRON...
- Publication number 20230408902
- Publication date Dec 21, 2023
- Exagan SAS
- Matthieu NONGAILLARD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SHADOW MASK AND METHOD OF MANUFACTURING BLANK MASK USING THE SAME
- Publication number 20230408903
- Publication date Dec 21, 2023
- SK enpulse Co., Ltd.
- Seong Yoon KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION FLUID RECOVERY SYSTEM AND IMMERSION FLUID RECOVERY METHOD...
- Publication number 20230400774
- Publication date Dec 14, 2023
- ZHEJIANG CHEER TECHNOLOGY CO., LTD.
- XIN FU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20230367195
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS
- Publication number 20230367229
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask Defect Prevention
- Publication number 20230367197
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masks having auxiliary features

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mask plate

Method for fabricating semiconductor device with damascene structur...

Components of an electronic device and methods for their assembly

Random weight initialization of non-volatile memory array

Device and method for enabling deriving of corrected digital patter...

Method of manufacturing a template

Aligning sensors on vehicles using sensor output

Mask defect prevention

Substrate with multilayer reflective film, reflective mask blank, r...

Photopatterning of molecular orientations

Multiple-mask multiple-exposure lithography and masks

Pellicle for flat panel display photomask

Component for use in a lithographic apparatus, method of protecting...

Method of lithography process and transferring a reticle

Semiconductor device and manufacturing method thereof

Mask, flexible display panel and manufacturing method thereof

Alternating spacers for pitch structure

Method of manufacturing phase shift photo masks

Method of cutting fin

Reticle constructions and photo-processing methods

Mask defect prevention

Lithography mask with a black border regions and method of fabricat...

Photomask and method of repairing photomask

Extreme ultraviolet mask and method of manufacturing the same

Extreme ultraviolet mask and method of manufacturing the same

Mask including first refractive member that concentrates first ligh...

Array substrate and manufacturing method therefor, display device,...

Semiconductor manufacturing method and apparatus thereof

Mask, preparation method and operation method thereof

Lithography process method for defining sidewall morphology of lith...

Patents Applicationslast 30 patents

MASK, LITHOGRAPHING APPARATUS, METHOD OF MANUFACTURING MASK AND LIT...

MASK DEFECT PREVENTION

DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY

MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS

MASK AND MANUFACTURING METHOD THEREOF

PHOTOMASK STRUCTURE

ANTI-SCATTERING AND ANTI-INTERFERENCE COATING PATTERN STRUCTURE OF...

Optical Component with Apodized Mask

ORIGINAL, METHOD OF DETERMINING PATTERN OF ORIGINAL, AND METHOD OF...

PELLICLE FOR FLAT PANEL DISPLAY PHOTOMASK

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE...

METAL MASK STRUCTURE, PHOTOMASK FOR PREPARING SHIELDING LAYER, AND...

MASK, LITHOGRAPHING APPARATUS AND METHOD FOR MANUFACTURING MASK

IMPRINT METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND M...

COMPONENTS OF AN ELECTRONIC DEVICE AND METHODS FOR THEIR ASSEMBLY

METHOD OF MANUFACTURING PHASE SHIFT PHOTO MASKS

ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME

ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME

Reticle Constructions and Photo-Processing Methods

Method for Forming an Interconnect Structure

COMPONENT FOR USE IN A LITHOGRAPHIC APPARATUS, METHOD OF PROTECTING...

PHOTOMASK STRUCTURE

INSERTS FOR SPACING IN RETICLE CONTAINERS

METHOD FOR MANUFACTURING A SET OF ELECTRONIC COMPONENTS ON THE FRON...

SHADOW MASK AND METHOD OF MANUFACTURING BLANK MASK USING THE SAME

IMMERSION FLUID RECOVERY SYSTEM AND IMMERSION FLUID RECOVERY METHOD...

EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS

Mask Defect Prevention