Masks or mask blanks for imaging by charged particle beam [CPB] radiation

Industry

CPC
G03F1/20

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/20Masks or mask blanks for imaging by charged particle beam [CPB] radiation

Industries

Patents Grantslast 30 patents

Information Patent Grant
Reticle processing system
- Patent number 11,940,724
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Sanjay Bhat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of and system for manufacturing semiconductor device
- Patent number 11,803,683
- Issue date Oct 31, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yao-Jen Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi charged particle beam writing apparatus and method of adjusti...
- Patent number 11,740,546
- Issue date Aug 29, 2023
- NuFlare Technology, Inc.
- Tsubasa Nanao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography system
- Patent number 11,610,758
- Issue date Mar 21, 2023
- KKT HOLDINGS SYNDICATE
- Tzu-Yi Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using mask fabrication models in correction of lithographic masks
- Patent number 11,556,052
- Issue date Jan 17, 2023
- Synopsys, Inc.
- Lawrence S. Melvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monomer, polymer, negative resist composition, photomask blank, and...
- Patent number 11,548,844
- Issue date Jan 10, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hexagonal boron nitride structures
- Patent number 11,370,662
- Issue date Jun 28, 2022
- Texas Instruments Incorporated
- Luigi Colombo
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Photomask
- Patent number 11,281,091
- Issue date Mar 22, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- You-Hua Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,187,981
- Issue date Nov 30, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi Hori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase shift mask and method for manufacturing semicondu...
- Patent number 11,119,399
- Issue date Sep 14, 2021
- Hoya Corporation
- Atsushi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Design-rule checking for curvilinear device features
- Patent number 10,997,355
- Issue date May 4, 2021
- GLOBALFOUNDRIES U.S. INC.
- Ahmed Hassan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Division mask
- Patent number 10,901,313
- Issue date Jan 26, 2021
- Samsung Display Co., Ltd.
- Minyoung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory system having write assist circuit including memory-adapted...
- Patent number 10,872,659
- Issue date Dec 22, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yangsyu Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask bias approximation
- Patent number 10,705,420
- Issue date Jul 7, 2020
- ASML US, LLC
- Song Lan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask blank with resist film and method for manufacturing the same a...
- Patent number 10,578,960
- Issue date Mar 3, 2020
- Hoya Corporation
- Toru Fukui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preparing synthetic quartz glass substrate
- Patent number 10,558,116
- Issue date Feb 11, 2020
- Shin-Etsu Chemical Co., Ltd.
- Hisashi Yagi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Device having write assist circuit including memory-adapted transis...
- Patent number 10,553,275
- Issue date Feb 4, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yangsyu Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of applying vertex based corrections to a semiconductor design
- Patent number 10,534,255
- Issue date Jan 14, 2020
- Aselta Nanographics
- Thomas Quaglio
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Display panel and mask for manufacturing process of display panel
- Patent number 10,534,214
- Issue date Jan 14, 2020
- HKC CORPORATION LIMITED
- Wei Chen
- G02 - OPTICS
Information Patent Grant
Photomask and method of forming the same
- Patent number 10,488,749
- Issue date Nov 26, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- You-Hua Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
2H/1T phase contact engineering for high performance transition met...
- Patent number 10,436,744
- Issue date Oct 8, 2019
- The Government of the United States of America, as represented by the Secreta...
- Adam L. Friedman
- G01 - MEASURING TESTING
Information Patent Grant
Assistant pattern for measuring critical dimension of main pattern...
- Patent number 10,276,375
- Issue date Apr 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Wen Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods for rapidly fabricating nanopatterns in a paral...
- Patent number 10,207,469
- Issue date Feb 19, 2019
- University of Houston System
- Vincent M. Donnelly
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Polymer, positive resist composition, and pattern forming process
- Patent number 10,191,372
- Issue date Jan 29, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical amplification resist composition, resist film using the sa...
- Patent number 10,139,727
- Issue date Nov 27, 2018
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method and system for forming a pattern on a reticle using charged...
- Patent number 10,101,648
- Issue date Oct 16, 2018
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Ebeam three beam aperture array
- Patent number 10,067,416
- Issue date Sep 4, 2018
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitization chemical-amplification type resist material, met...
- Patent number 10,025,187
- Issue date Jul 17, 2018
- Tokyo Electron Limited
- Seiji Nagahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stencil mask, stencil mask manufacturing method, and imprinting method
- Patent number 10,022,748
- Issue date Jul 17, 2018
- TOSHIBA MEMORY CORPORATION
- Masato Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of generating a pattern on a photomask using a plurality of...
- Patent number 9,989,860
- Issue date Jun 5, 2018
- Samsung Electronics Co., Ltd.
- Sang-Hee Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR ELECTRON BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROL...
- Publication number 20240036456
- Publication date Feb 1, 2024
- Carl Zeiss SMT GMBH
- Gilles Tabbone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL OXIDE FILM-FORMING COMPOSITION, METHOD FOR PRODUCING METAL OX...
- Publication number 20240027889
- Publication date Jan 25, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kenichi YAMAUCHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
Structured Film and Method of Using Same to Form a Pattern on a Sub...
- Publication number 20240004282
- Publication date Jan 4, 2024
- 3M Innovative Properties Company
- Martin B. Wolk
- G02 - OPTICS
Information Patent Application
METHOD OF AND SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20230376666
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yao-Jen YANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Stacking of integrated circuit dies
- Publication number 20230238358
- Publication date Jul 27, 2023
- MELLANOX TECHNOLOGIES, LTD.
- Ido Bourstein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR CREATING A THREE-DIMENSIONAL STRUCTURE IN A LITHOGRAPHY...
- Publication number 20220350239
- Publication date Nov 3, 2022
- Nanoscribe Holding GmbH
- Nicole LINDENMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD OF ADJUSTI...
- Publication number 20220299861
- Publication date Sep 22, 2022
- NuFlare Technology, Inc.
- Tsubasa NANAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF AND SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20220237358
- Publication date Jul 28, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yao-Jen YANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK BLANKS AND METHODS FOR DEPOSITING LAYERS ON MASK BLANK
- Publication number 20210200078
- Publication date Jul 1, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Chang LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RETICLE PROCESSING SYSTEM
- Publication number 20210173295
- Publication date Jun 10, 2021
- Applied Materials, Inc.
- Sanjay Bhat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
USING MASK FABRICATION MODELS IN CORRECTION OF LITHOGRAPHIC MASKS
- Publication number 20210132486
- Publication date May 6, 2021
- Synopsys, Inc.
- Lawrence S. Melvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DESIGN-RULE CHECKING FOR CURVILINEAR DEVICE FEATURES
- Publication number 20210133293
- Publication date May 6, 2021
- GLOBALFOUNDRIES U.S. Inc.
- Ahmed Hassan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BLANKMASK AND PHOTOMASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20210132487
- Publication date May 6, 2021
- S&S TECH CO., LTD.
- Cheol SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Lithography System
- Publication number 20200227235
- Publication date Jul 16, 2020
- Tzu-Yi Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK
- Publication number 20200089099
- Publication date Mar 19, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- You-Hua Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask Patterns and Method of Manufacture
- Publication number 20190391480
- Publication date Dec 26, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Chang Hsueh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOMER, POLYMER, NEGATIVE RESIST COMPOSITION, PHOTOMASK BLANK, AND...
- Publication number 20190361347
- Publication date Nov 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Mask Bias Approximation
- Publication number 20190354005
- Publication date Nov 21, 2019
- Xtal, Inc.
- Song Lan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
HEXAGONAL BORON NITRIDE STRUCTURES
- Publication number 20190202696
- Publication date Jul 4, 2019
- TEXAS INSTRUMENTS INCORPORATED
- Luigi COLOMBO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTORESIST AND PREPARATION METHOD THEREOF
- Publication number 20190204727
- Publication date Jul 4, 2019
- SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Lixuan Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...
- Publication number 20180374675
- Publication date Dec 27, 2018
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
DISPLAY PANEL AND MASK FOR MANUFACTURING PROCESS OF DISPLAY PANEL
- Publication number 20180284533
- Publication date Oct 4, 2018
- HKC Corporation Limited
- Wei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF APPLYING VERTEX BASED CORRECTIONS TO A SEMICONDUCTOR DESIGN
- Publication number 20180267399
- Publication date Sep 20, 2018
- ASELTA NANOGRAPHICS
- Thomas QUAGLIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK AND METHOD FOR MANUFACTURING SEMICONDU...
- Publication number 20180252995
- Publication date Sep 6, 2018
- HOYA CORPORATION
- Atsushi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Assistant Pattern for Measuring Critical Dimension of Main Pattern...
- Publication number 20180144936
- Publication date May 24, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Hung-Wen Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EBEAM THREE BEAM APERTURE ARRAY
- Publication number 20180143526
- Publication date May 24, 2018
- Intel Corporation
- Yan A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIVISION MASK
- Publication number 20180074394
- Publication date Mar 15, 2018
- SAMSUNG DISPLAY CO., LTD.
- MINYOUNG KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR RAPIDLY FABRICATING NANOPATTERNS IN A PARAL...
- Publication number 20170361551
- Publication date Dec 21, 2017
- UNIVERSITY OF HOUSTON SYSTEM
- Vincent M. Donnelly
- B82 - NANO-TECHNOLOGY
Information Patent Application
POLYMER, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20170355795
- Publication date Dec 14, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20170343898
- Publication date Nov 30, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Masks or mask blanks for imaging by charged particle beam [CPB] radiation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Reticle processing system

Method of and system for manufacturing semiconductor device

Multi charged particle beam writing apparatus and method of adjusti...

Charged particle beam lithography system

Using mask fabrication models in correction of lithographic masks

Monomer, polymer, negative resist composition, photomask blank, and...

Hexagonal boron nitride structures

Photomask

Resist composition and method of forming resist pattern

Mask blank, phase shift mask and method for manufacturing semicondu...

Design-rule checking for curvilinear device features

Division mask

Memory system having write assist circuit including memory-adapted...

Mask bias approximation

Mask blank with resist film and method for manufacturing the same a...

Method for preparing synthetic quartz glass substrate

Device having write assist circuit including memory-adapted transis...

Method of applying vertex based corrections to a semiconductor design

Display panel and mask for manufacturing process of display panel

Photomask and method of forming the same

2H/1T phase contact engineering for high performance transition met...

Assistant pattern for measuring critical dimension of main pattern...

Systems and methods for rapidly fabricating nanopatterns in a paral...

Polymer, positive resist composition, and pattern forming process

Chemical amplification resist composition, resist film using the sa...

Method and system for forming a pattern on a reticle using charged...

Ebeam three beam aperture array

Photosensitization chemical-amplification type resist material, met...

Stencil mask, stencil mask manufacturing method, and imprinting method

Method of generating a pattern on a photomask using a plurality of...

Patents Applicationslast 30 patents

METHOD FOR ELECTRON BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROL...

METAL OXIDE FILM-FORMING COMPOSITION, METHOD FOR PRODUCING METAL OX...

Structured Film and Method of Using Same to Form a Pattern on a Sub...

METHOD OF AND SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE

Stacking of integrated circuit dies

PROCESS FOR CREATING A THREE-DIMENSIONAL STRUCTURE IN A LITHOGRAPHY...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD OF ADJUSTI...

METHOD OF AND SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE

MASK BLANKS AND METHODS FOR DEPOSITING LAYERS ON MASK BLANK

RETICLE PROCESSING SYSTEM

USING MASK FABRICATION MODELS IN CORRECTION OF LITHOGRAPHIC MASKS

DESIGN-RULE CHECKING FOR CURVILINEAR DEVICE FEATURES

BLANKMASK AND PHOTOMASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY

Charged Particle Beam Lithography System

PHOTOMASK

Mask Patterns and Method of Manufacture

MONOMER, POLYMER, NEGATIVE RESIST COMPOSITION, PHOTOMASK BLANK, AND...

Mask Bias Approximation

HEXAGONAL BORON NITRIDE STRUCTURES

PHOTORESIST AND PREPARATION METHOD THEREOF

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...

DISPLAY PANEL AND MASK FOR MANUFACTURING PROCESS OF DISPLAY PANEL

METHOD OF APPLYING VERTEX BASED CORRECTIONS TO A SEMICONDUCTOR DESIGN

MASK BLANK, PHASE SHIFT MASK AND METHOD FOR MANUFACTURING SEMICONDU...

Assistant Pattern for Measuring Critical Dimension of Main Pattern...

EBEAM THREE BEAM APERTURE ARRAY

DIVISION MASK

SYSTEMS AND METHODS FOR RAPIDLY FABRICATING NANOPATTERNS IN A PARAL...

POLYMER, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS

POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS