Masks or their effects on the imaging process

Industry

CPC
G03F7/70283

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70283Masks or their effects on the imaging process

Industries

Patents Grantslast 30 patents

Information Patent Grant
Methods of tuning a model for a lithographic process and associated...
- Patent number 12,147,161
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Mhamed Akhssay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shift reticle for use in photolithography
- Patent number 12,078,921
- Issue date Sep 3, 2024
- Entegris, Inc.
- Tse-An Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preparing holographic pattern-expressing organogel using...
- Patent number 12,038,719
- Issue date Jul 16, 2024
- UNIST (ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY)
- Jiseok Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming organic film, patterning process, and polymer
- Patent number 12,032,293
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 12,013,634
- Issue date Jun 18, 2024
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of modeling a mask having patterns with arbitrary angles
- Patent number 11,994,796
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Jen Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle processing system
- Patent number 11,940,724
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Sanjay Bhat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ion exposure method and apparatus
- Patent number 11,915,942
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of determining scattering of radiation by structures of fin...
- Patent number 11,789,371
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Yu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spin-on compositions comprising an inorganic oxide component and an...
- Patent number 11,767,398
- Issue date Sep 26, 2023
- Merck Patent GmbH
- M. Dalil Rahman
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method for performing a manufacturing process and associated appara...
- Patent number 11,733,606
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Thomas Theeuwes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for illuminating image points
- Patent number 11,681,228
- Issue date Jun 20, 2023
- EV Group E. Thallner GmbH
- Bernhard Thallner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, exposure apparatus, and method of fabricating three-dime...
- Patent number 11,662,659
- Issue date May 30, 2023
- Samsung Electronics Co., Ltd.
- Donghwan Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of modeling a mask by taking into account of mask pattern ed...
- Patent number 11,645,443
- Issue date May 9, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Jen Lai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Phase shift mask and manufacturing method of semiconductor device
- Patent number 11,586,107
- Issue date Feb 21, 2023
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Maskless photolithography devices, methods, and systems
- Patent number 11,567,411
- Issue date Jan 31, 2023
- NANOPATH, INC.
- Kevin Donahue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
UV lithography system
- Patent number 11,561,476
- Issue date Jan 24, 2023
- Kenneth Carlisle Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 11,537,043
- Issue date Dec 27, 2022
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Control apparatus and control method, exposure apparatus and exposu...
- Patent number 11,537,051
- Issue date Dec 27, 2022
- Nikon Corporation
- Satoshi Yashiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography system with diffraction optics
- Patent number 11,520,235
- Issue date Dec 6, 2022
- Kenneth Carlisle Johnson
- G02 - OPTICS
Information Patent Grant
Prism-mask for angled patterning applications
- Patent number 11,506,982
- Issue date Nov 22, 2022
- Intel Corporation
- Vahidreza Parichehreh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Utilize pattern recognition to improve SEM contour measurement accu...
- Patent number 11,422,473
- Issue date Aug 23, 2022
- ASML Netherlands B.V.
- Jiao Liang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining scattering of radiation by structures of fin...
- Patent number 11,409,203
- Issue date Aug 9, 2022
- ASML Netherlands B.V.
- Yu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ion exposure method and apparatus
- Patent number 11,393,695
- Issue date Jul 19, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology apparatus and method for determining a characteristic rel...
- Patent number 11,385,554
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Miguel Garcia Granda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography improvement based on defect probability distributions a...
- Patent number 11,314,171
- Issue date Apr 26, 2022
- Synopsys, Inc.
- Lawrence S. Melvin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 11,314,174
- Issue date Apr 26, 2022
- ASML Netherlands B.V.
- Laurentius Cornelius De Winter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV phase-shift SRAF masks by means of embedded phase shift layers
- Patent number 11,300,885
- Issue date Apr 12, 2022
- Intel Corporation
- Robert Bristol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods using mask pattern measurements performed with...
- Patent number 11,281,093
- Issue date Mar 22, 2022
- Samsung Electronics Co., Ltd.
- Ji Hoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for nanoscale data recording
- Patent number 11,269,258
- Issue date Mar 8, 2022
- Franklin Mark Schellenberg
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
DIGITAL ULTRAVIOLET LITHOGRAPHY METHOD AND APPARATUS
- Publication number 20240210837
- Publication date Jun 27, 2024
- The Hong Kong Polytechnic University
- Aping ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ION EXPOSURE METHOD AND APPARATUS
- Publication number 20240203749
- Publication date Jun 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHY
- Publication number 20240094623
- Publication date Mar 21, 2024
- META PLATFORMS, INC.
- Cheng Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING MASK PATTERN AND TRAINING MACHINE LEARNING M...
- Publication number 20240004305
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Jun TAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MODELING A MASK BY TAKING INTO ACCOUNT OF MASK PATTERN ED...
- Publication number 20230274063
- Publication date Aug 31, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Chien-Jen Lai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASKLESS PHOTOLITHOGRAPHY DEVICES, METHODS, AND SYSTEMS
- Publication number 20230168588
- Publication date Jun 1, 2023
- NanoPath, Inc.
- Kevin Donahue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask Synthesis Integrating Mask Fabrication Effects and Wafer Litho...
- Publication number 20230152683
- Publication date May 18, 2023
- Synopsys, Inc.
- Peng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK FABRICATION EFFECTS IN THREE-DIMENSIONAL MASK SIMULATIONS USIN...
- Publication number 20230104510
- Publication date Apr 6, 2023
- Synopsys, Inc.
- Peng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20230099105
- Publication date Mar 30, 2023
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS OF TUNING A MODEL FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED...
- Publication number 20230084130
- Publication date Mar 16, 2023
- ASML NETHERLANDS B.V.
- Mhamed AKHSSAY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK CORNER ROUNDING EFFECTS IN THREE-DIMENSIONAL MASK SIMULATIONS...
- Publication number 20230079453
- Publication date Mar 16, 2023
- Synopsys, Inc.
- Peng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UV Lithography System
- Publication number 20230011685
- Publication date Jan 12, 2023
- Kenneth Carlisle Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION AIDED TWO-STAGE PHASE UNWRAPPING ON PATTERN WAFER GEOMETR...
- Publication number 20220390862
- Publication date Dec 8, 2022
- KLA Corporation
- Helen Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR GREYSCALE LITHOGRAPHY
- Publication number 20220357668
- Publication date Nov 10, 2022
- Applied Materials, Inc.
- Ludovic GODET
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ion Exposure Method and Apparatus
- Publication number 20220336225
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PHOTOLITHOGRAPHIC IMAGING
- Publication number 20220276564
- Publication date Sep 1, 2022
- Mir Farrokh SHAYEGAN SALEK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF LITHOGRAPHICALLY FORMING AN OPTICAL STRUCTURE IN A SEMICO...
- Publication number 20220269167
- Publication date Aug 25, 2022
- TRUMPF Photonic Components GmbH
- Stephan Gronenborn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING
- Publication number 20220197150
- Publication date Jun 23, 2022
- Franklin Mark Schellenberg
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHASE-SHIFT RETICLE FOR USE IN PHOTOLITHOGRAPHY
- Publication number 20220163881
- Publication date May 26, 2022
- Entegris, Inc.
- Tse-An Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20220155673
- Publication date May 19, 2022
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK, EXPOSURE APPARATUS, AND METHOD OF FABRICATING THREE-DIME...
- Publication number 20220128900
- Publication date Apr 28, 2022
- Samsung Electronics Co., Ltd.
- Donghwan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV Lithography System with Diffraction Optics
- Publication number 20220107568
- Publication date Apr 7, 2022
- Kenneth Carlisle Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TECHNIQUES FOR MANUFACTURING VARIABLE ETCH DEPTH GRATINGS USING GRA...
- Publication number 20220082739
- Publication date Mar 17, 2022
- Facebook Technologies, LLC
- Elliott FRANKE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPIN-ON COMPOSITIONS COMPRISING AN INORGANIC OXIDE COMPONENT AND AN...
- Publication number 20220025109
- Publication date Jan 27, 2022
- Merck Patent GmbH
- M. Dalil RAHMAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR PREPARING HOLOGRAPHIC PATTERN-EXPRESSING ORGANOGEL USING...
- Publication number 20220004147
- Publication date Jan 6, 2022
- UNIST (ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY)
- Jiseok LEE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FORMATION OF THREE-DIMENSIONAL STRUCTURES USING GREY-SCALE PHOTOLIT...
- Publication number 20210405541
- Publication date Dec 30, 2021
- ams AG
- Gerhard Eilmsteiner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS USING MASK PATTERN MEASUREMENTS PERFORMED WITH...
- Publication number 20210302828
- Publication date Sep 30, 2021
- Samsung Electronics Co., Ltd.
- Ji Hoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING SCATTERING OF RADIATION BY STRUCTURES OF FIN...
- Publication number 20210271173
- Publication date Sep 2, 2021
- ASML NETHERLANDS B.V.
- Yu CAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UTILIZE PATTERN RECOGNITION TO IMPROVE SEM CONTOUR MEASUREMENT ACCU...
- Publication number 20210263426
- Publication date Aug 26, 2021
- ASML NETHERLANDS B.V.
- Jiao LIANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR ILLUMINATING IMAGE POINTS
- Publication number 20210247697
- Publication date Aug 12, 2021
- EV GROUP E. THALLNER GMBH
- Bernhard Thallner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masks or their effects on the imaging process

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods of tuning a model for a lithographic process and associated...

Phase-shift reticle for use in photolithography

Method for preparing holographic pattern-expressing organogel using...

Composition for forming organic film, patterning process, and polymer

Reduction or elimination of pattern placement error in metrology me...

Method of modeling a mask having patterns with arbitrary angles

Reticle processing system

Ion exposure method and apparatus

Methods of determining scattering of radiation by structures of fin...

Spin-on compositions comprising an inorganic oxide component and an...

Method for performing a manufacturing process and associated appara...

Method and apparatus for illuminating image points

Photomask, exposure apparatus, and method of fabricating three-dime...

Method of modeling a mask by taking into account of mask pattern ed...

Phase shift mask and manufacturing method of semiconductor device

Maskless photolithography devices, methods, and systems

UV lithography system

Reduction or elimination of pattern placement error in metrology me...

Control apparatus and control method, exposure apparatus and exposu...

EUV lithography system with diffraction optics

Prism-mask for angled patterning applications

Utilize pattern recognition to improve SEM contour measurement accu...

Methods of determining scattering of radiation by structures of fin...

Ion exposure method and apparatus

Metrology apparatus and method for determining a characteristic rel...

Lithography improvement based on defect probability distributions a...

Methods and patterning devices and apparatuses for measuring focus...

EUV phase-shift SRAF masks by means of embedded phase shift layers

Systems and methods using mask pattern measurements performed with...

Method and system for nanoscale data recording

Patents Applicationslast 30 patents

DIGITAL ULTRAVIOLET LITHOGRAPHY METHOD AND APPARATUS

ION EXPOSURE METHOD AND APPARATUS

ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHY

METHOD FOR DETERMINING MASK PATTERN AND TRAINING MACHINE LEARNING M...

METHOD OF MODELING A MASK BY TAKING INTO ACCOUNT OF MASK PATTERN ED...

MASKLESS PHOTOLITHOGRAPHY DEVICES, METHODS, AND SYSTEMS

Mask Synthesis Integrating Mask Fabrication Effects and Wafer Litho...

MASK FABRICATION EFFECTS IN THREE-DIMENSIONAL MASK SIMULATIONS USIN...

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

METHODS OF TUNING A MODEL FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED...

MASK CORNER ROUNDING EFFECTS IN THREE-DIMENSIONAL MASK SIMULATIONS...

UV Lithography System

DETECTION AIDED TWO-STAGE PHASE UNWRAPPING ON PATTERN WAFER GEOMETR...

METHOD AND APPARATUS FOR GREYSCALE LITHOGRAPHY

Ion Exposure Method and Apparatus

METHOD AND APPARATUS FOR PHOTOLITHOGRAPHIC IMAGING

METHOD OF LITHOGRAPHICALLY FORMING AN OPTICAL STRUCTURE IN A SEMICO...

METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING

PHASE-SHIFT RETICLE FOR USE IN PHOTOLITHOGRAPHY

PHASE SHIFT MASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

PHOTOMASK, EXPOSURE APPARATUS, AND METHOD OF FABRICATING THREE-DIME...

EUV Lithography System with Diffraction Optics

TECHNIQUES FOR MANUFACTURING VARIABLE ETCH DEPTH GRATINGS USING GRA...

SPIN-ON COMPOSITIONS COMPRISING AN INORGANIC OXIDE COMPONENT AND AN...

METHOD FOR PREPARING HOLOGRAPHIC PATTERN-EXPRESSING ORGANOGEL USING...

FORMATION OF THREE-DIMENSIONAL STRUCTURES USING GREY-SCALE PHOTOLIT...

SYSTEMS AND METHODS USING MASK PATTERN MEASUREMENTS PERFORMED WITH...

METHODS OF DETERMINING SCATTERING OF RADIATION BY STRUCTURES OF FIN...

UTILIZE PATTERN RECOGNITION TO IMPROVE SEM CONTOUR MEASUREMENT ACCU...

METHOD AND APPARATUS FOR ILLUMINATING IMAGE POINTS