Masks, special

Industry

CPC
Y10S148/106

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Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S148/00Metal treatment

Current Industry

Y10S148/106Masks, special

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for improving the thermal conductivity of metal lines in int...
- Patent number 6,171,956
- Issue date Jan 9, 2001
- Worldwide Semiconductor Manufacturing Corp.
- Chine-Gie Lou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Advanced technique to grow single crystal films on amorphous and/or...
- Patent number 6,103,019
- Issue date Aug 15, 2000
- Arjun Saxena
- C30 - CRYSTAL GROWTH
Information Patent Grant
Processing techniques for achieving production-worthy, low dielectr...
- Patent number 5,965,934
- Issue date Oct 12, 1999
- Advanced Micro Devices, Inc.
- Robin W. Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing phase-shifting mask
- Patent number 5,932,489
- Issue date Aug 3, 1999
- United Microelectronics Corp.
- Chien Chao Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabrication LDD semiconductor device with amorphous regions
- Patent number 5,869,377
- Issue date Feb 9, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Kiyoto Watabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a semiconductor device with a graded lightly-dop...
- Patent number 5,811,342
- Issue date Sep 22, 1998
- Texas Instruments - Acer Incorporated
- Shye-Lin Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for forming a pattern of nucleation sites
- Patent number 5,792,270
- Issue date Aug 11, 1998
- Arjun Saxena
- C30 - CRYSTAL GROWTH
Information Patent Grant
Reactive ion etched assisted gold post process
- Patent number 5,683,936
- Issue date Nov 4, 1997
- The Whitaker Corporation
- Krishna Pande
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing techniques for achieving production-worthy, low dielectr...
- Patent number 5,679,608
- Issue date Oct 21, 1997
- Advanced Micro Devices, Inc.
- Robin W. Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for aligning micro patterns of a semiconductor device
- Patent number 5,668,042
- Issue date Sep 16, 1997
- Hyundai Electronics Industries Co., Ltr.
- Sang Man Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low temperature selective growth of silicon or silicon alloys
- Patent number 5,634,973
- Issue date Jun 3, 1997
- International Business Machines Corporation
- Cyril Cabral
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature selective growth of silicon or silicon alloys
- Patent number 5,595,600
- Issue date Jan 21, 1997
- International Business Machines Corporation
- Cyril Cabral
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing a semiconductor laser device
- Patent number 5,571,750
- Issue date Nov 5, 1996
- Sharp Kabushiki Kaisha
- Masanori Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for low temperature selective growth of silicon or silicon a...
- Patent number 5,565,031
- Issue date Oct 15, 1996
- International Business Machines Corporation
- Cyril Cabral
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing techniques for achieving production-worthy, low dielectr...
- Patent number 5,550,405
- Issue date Aug 27, 1996
- Advanced Micro Devices, Incorporated
- Robin W. Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned via and contact interconnect manufacturing method
- Patent number 5,512,514
- Issue date Apr 30, 1996
- Spider Systems, Inc.
- Chong E. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a metal wire of a semiconductor device
- Patent number 5,466,640
- Issue date Nov 14, 1995
- Hyundai Electronics Industries Co., Ltd.
- Yang K. Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing semiconductor device
- Patent number 5,432,117
- Issue date Jul 11, 1995
- Rohm Co., Ltd.
- Kouji Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask material for low temperature selective growth of silicon or si...
- Patent number 5,427,630
- Issue date Jun 27, 1995
- International Business Machines Corporation
- Cyril Cabral
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing a semiconductor laser device
- Patent number 5,413,956
- Issue date May 9, 1995
- Sharp Kabushiki Kaisha
- Masanori Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices having a mesa structure and method of fabrica...
- Patent number 5,399,901
- Issue date Mar 21, 1995
- General Instrument Corp.
- W. G. Einthoven
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor devices having electrodes compr...
- Patent number 5,395,799
- Issue date Mar 7, 1995
- AT&T Corp.
- Chen-Hua D. Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for the production of a thin film transistor having a doubl...
- Patent number 5,356,824
- Issue date Oct 18, 1994
- France Telecom Establissement autonome de droit public
- Yannick Chouan
- G02 - OPTICS
Information Patent Grant
Method of fabrication of devices with different operating character...
- Patent number 5,342,804
- Issue date Aug 30, 1994
- Texas Instruments Incorporated
- Edward A. Beam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making a semiconductor device by forming a nanochannel mask
- Patent number 5,332,681
- Issue date Jul 26, 1994
- The United States of America as represented by the Secretary of the Navy
- Ronald J. Tonucci
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of doping gate electrodes discretely with either P-type or N...
- Patent number 5,328,864
- Issue date Jul 12, 1994
- Hitachi, Ltd.
- Keiichi Yoshizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing, by a factor or 2.sup.-N, the minimum masking p...
- Patent number 5,328,810
- Issue date Jul 12, 1994
- Micron Technology, Inc.
- Tyler A. Lowrey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making a registration mark on a semiconductor
- Patent number 5,314,837
- Issue date May 24, 1994
- Analog Devices, Incorporated
- Herbert J. Barber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making staggered gate MOSTFT
- Patent number 5,300,446
- Issue date Apr 5, 1994
- Yamaha Corporation
- Toshio Fujioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming doped regions within a semiconductor substrate
- Patent number 5,300,454
- Issue date Apr 5, 1994
- Motorola, Inc.
- Robert C. Taft
- H01 - BASIC ELECTRIC ELEMENTS

Masks, special

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for improving the thermal conductivity of metal lines in int...

Advanced technique to grow single crystal films on amorphous and/or...

Processing techniques for achieving production-worthy, low dielectr...

Method for manufacturing phase-shifting mask

Method of fabrication LDD semiconductor device with amorphous regions

Method for forming a semiconductor device with a graded lightly-dop...

Apparatus for forming a pattern of nucleation sites

Reactive ion etched assisted gold post process

Processing techniques for achieving production-worthy, low dielectr...

Method for aligning micro patterns of a semiconductor device

Low temperature selective growth of silicon or silicon alloys

Low temperature selective growth of silicon or silicon alloys

Method for producing a semiconductor laser device

Method for low temperature selective growth of silicon or silicon a...

Processing techniques for achieving production-worthy, low dielectr...

Self-aligned via and contact interconnect manufacturing method

Method for forming a metal wire of a semiconductor device

Method of producing semiconductor device

Mask material for low temperature selective growth of silicon or si...

Method for producing a semiconductor laser device

Semiconductor devices having a mesa structure and method of fabrica...

Method of fabricating semiconductor devices having electrodes compr...

Process for the production of a thin film transistor having a doubl...

Method of fabrication of devices with different operating character...

Method of making a semiconductor device by forming a nanochannel mask

Method of doping gate electrodes discretely with either P-type or N...

Method for reducing, by a factor or 2.sup.-N, the minimum masking p...

Method of making a registration mark on a semiconductor

Method of making staggered gate MOSTFT

Method for forming doped regions within a semiconductor substrate