Masks with semi-transparent phase shifters

Industry

CPC
G03F1/0076

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/0076Masks with semi-transparent phase shifters

Industries

Patents Grantslast 30 patents

Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,634,990
- Issue date Apr 28, 2020
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,394,118
- Issue date Aug 27, 2019
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,048,580
- Issue date Aug 14, 2018
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and method for manufacturing photomask blank
- Patent number 9,709,885
- Issue date Jul 18, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 9,519,211
- Issue date Dec 13, 2016
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and method for manufacturing photomask blank
- Patent number 9,488,906
- Issue date Nov 8, 2016
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing photomask blank
- Patent number 9,400,422
- Issue date Jul 26, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takashi Yoshii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask blank, halftone phase shift photomas...
- Patent number 9,366,951
- Issue date Jun 14, 2016
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 8,974,987
- Issue date Mar 10, 2015
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light pattern exposure method, halftone phase shift mask, and halft...
- Patent number 8,753,786
- Issue date Jun 17, 2014
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
BLANK PHASE SHIFT PHOTOMASKS, PHASE SHIFT PHOTOMASKS FABRICATED USI...
- Publication number 20190354004
- Publication date Nov 21, 2019
- SK HYNIX INC.
- Choong Han RYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20190332006
- Publication date Oct 31, 2019
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...
- Publication number 20190302604
- Publication date Oct 3, 2019
- HOYA CORPORATION
- Yasutaka HORIGOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK
- Publication number 20180335692
- Publication date Nov 22, 2018
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20180321582
- Publication date Nov 8, 2018
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, PHASE SHIFT MASK MANUFACTURING METHOD...
- Publication number 20180210331
- Publication date Jul 26, 2018
- HOYA CORPORATION
- Takenori KAJIWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIGHT PATTERN EXPOSURE METHOD, HALFTONE PHASE SHIFT MASK, AND HALFT...
- Publication number 20130130159
- Publication date May 23, 2013
- Toppan Printing Co., Ltd.
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20110294045
- Publication date Dec 1, 2011
- DAI NIPPON PRINTING CO., LTD.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masks with semi-transparent phase shifters

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photomask and methods for manufacturing and correcting photomask

Photomask and methods for manufacturing and correcting photomask

Photomask and methods for manufacturing and correcting photomask

Photomask blank and method for manufacturing photomask blank

Photomask and methods for manufacturing and correcting photomask

Photomask blank and method for manufacturing photomask blank

Method for manufacturing photomask blank

Halftone phase shift photomask blank, halftone phase shift photomas...

Photomask and methods for manufacturing and correcting photomask

Light pattern exposure method, halftone phase shift mask, and halft...

Patents Applicationslast 30 patents

BLANK PHASE SHIFT PHOTOMASKS, PHASE SHIFT PHOTOMASKS FABRICATED USI...

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...

PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

MASK BLANK, PHASE SHIFT MASK, PHASE SHIFT MASK MANUFACTURING METHOD...

LIGHT PATTERN EXPOSURE METHOD, HALFTONE PHASE SHIFT MASK, AND HALFT...

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK