Matching circuits, impedance matching circuits per se H03H7/38 and H03H7/40

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CPC
H01J37/32183

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32183Matching circuits, impedance matching circuits per se H03H7/38 and H03H7/40

Industries

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Patents Grantslast 30 patents

Information Patent Grant
RF generating device and semiconductor manufacturing apparatus incl...
- Patent number 12,368,022
- Issue date Jul 22, 2025
- Samsung Electronics Co., Ltd.
- Sungyong Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ closed-loop management of radio frequency power generator
- Patent number 12,368,023
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei Ting Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adaptive pulse shaping with post match sensor
- Patent number 12,362,146
- Issue date Jul 15, 2025
- MKS Inc.
- Jonathan Smyka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for controlling a plasma sheath characteristic
- Patent number 12,362,159
- Issue date Jul 15, 2025
- Lam Research Corporation
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,145
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Yuji Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device
- Patent number 12,354,838
- Issue date Jul 8, 2025
- EN2CORE TECHNOLOGY INC.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device, substrate processing system, control m...
- Patent number 12,354,841
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Hiroshi Tsujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two stage pin diode driver with energy recovery
- Patent number 12,355,418
- Issue date Jul 8, 2025
- Advanced Energy Industries, Inc.
- Gideon van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,354,837
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Takahiro Yonezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impedance matching circuit and plasma supply system and operating m...
- Patent number 12,341,478
- Issue date Jun 24, 2025
- TRUMPF Huettinger GmbH + Co. KG
- Birger Nordmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,340,976
- Issue date Jun 24, 2025
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Naoaki Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,340,986
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Hiroyuki Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF impedance matching network
- Patent number 12,334,306
- Issue date Jun 17, 2025
- ASM America, Inc.
- Imran Ahmed Bhutta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power control for rf impedance matching network
- Patent number 12,334,307
- Issue date Jun 17, 2025
- ASM IP Holding B.V.
- Ronald Anthony Decker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antennas, circuits for generating plasma, plasma processing apparat...
- Patent number 12,327,709
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Dong-Hyub Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and method
- Patent number 12,327,748
- Issue date Jun 10, 2025
- PIOTECH INC.
- Zhuo Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for tuning a MHz RF generator within a cycle of...
- Patent number 12,322,572
- Issue date Jun 3, 2025
- Lam Research Corporation
- Arthur M. Howald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Large-area high-density plasma processing chamber for flat panel di...
- Patent number 12,312,689
- Issue date May 27, 2025
- Applied Materials, Inc.
- Suhail Anwar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus
- Patent number 12,315,701
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yasuhiko Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for preventing contamination of self-plasma chamber
- Patent number 12,308,217
- Issue date May 20, 2025
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for use of low frequency harmonics in bias radi...
- Patent number 12,308,211
- Issue date May 20, 2025
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,300,465
- Issue date May 13, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for automated frequency tuning of radiofrequency...
- Patent number 12,300,463
- Issue date May 13, 2025
- Lam Research Corporation
- Mathew Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency diverter assembly enabling on-demand different spatial
- Patent number 12,293,897
- Issue date May 6, 2025
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ignition detection device for connection to an impedance mat...
- Patent number 12,293,898
- Issue date May 6, 2025
- TRUMPF HÜTTINGER GMBH + CO. KG
- Florian Maier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid matcher and radio frequency matching system including the hy...
- Patent number 12,288,674
- Issue date Apr 29, 2025
- Samsung Electronics Co., Ltd.
- Hyosin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Retuning for impedance matching network control
- Patent number 12,288,673
- Issue date Apr 29, 2025
- COMET Technologies USA, Inc.
- Anthony Oliveti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for achieving peak ion energy enhancement with...
- Patent number 12,283,461
- Issue date Apr 22, 2025
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for multi-level pulsing in RF plasma tools
- Patent number 12,283,463
- Issue date Apr 22, 2025
- Lam Research Corporation
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma antenna and apparatus for generating plasma having the same
- Patent number 12,278,088
- Issue date Apr 15, 2025
- Semes Co., Ltd.
- Il Gyo Koo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SWITCHING CIRCUIT FOR MULTILEVEL PLASMA IMPEDANCE MATCHING
- Publication number 20250239435
- Publication date Jul 24, 2025
- Applied Materials, Inc.
- Anm Wasekul AZAD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DELAY AND AMPLITUDE CORRECTION
- Publication number 20250232969
- Publication date Jul 17, 2025
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20250232956
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Nozomu NAGASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE WITH A COOLANT LEAKAGE DETECTION SYSTEM
- Publication number 20250232953
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Ryan T. DOWNEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSING CONTROL MATCH NETWORK AND GENERATOR
- Publication number 20250232955
- Publication date Jul 17, 2025
- COMET TECHNOLOGIES USA, INC.
- Stephen E. SAVAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BALANCED RESONATOR SOURCE FOR PLASMA PROCESSING
- Publication number 20250232952
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS
- Publication number 20250232957
- Publication date Jul 17, 2025
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS
- Publication number 20250226182
- Publication date Jul 10, 2025
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT DEVICE AND ETCHING METHOD
- Publication number 20250226183
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20250220801
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR-CORE COIL IN ANALOG CIRCUIT FILTERS FOR PLASMA PROCESSING
- Publication number 20250218748
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fast Frequency Tracking Control for Radiofrequency Power Amplifiers...
- Publication number 20250218726
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Sanghyeon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE
- Publication number 20250218746
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- In Hee KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATION CIRCUIT AND SUBSTRATE PROCESSING DEVICE INCLUDING...
- Publication number 20250218727
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Sungyong LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extremum-Seeking Control Apparatuses and Methods for Automatic Freq...
- Publication number 20250210311
- Publication date Jun 26, 2025
- MKS Instruments, Inc.
- Aaron Burry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250210331
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Takumi IMAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20250212310
- Publication date Jun 26, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CONTROLLING A POWER LIMITER
- Publication number 20250210309
- Publication date Jun 26, 2025
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD, PROCESS MODULE MATCHING METHOD, AND SUBSTRATE...
- Publication number 20250210310
- Publication date Jun 26, 2025
- SEMES CO., LTD.
- Sang Moon YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY, PLASMA CONTROL METHOD, AND PLASMA PROCE...
- Publication number 20250201521
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Dae Hyun YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA STATE MONITORING DEVICE FOR CONNECTING TO AN IMPEDANCE MATCH...
- Publication number 20250201540
- Publication date Jun 19, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Florian A. Maier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20250203749
- Publication date Jun 19, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR TREATING SUBSTRATE
- Publication number 20250201520
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Hyun Bae KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Plasma Processing Method
- Publication number 20250201522
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Shuto WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20250203748
- Publication date Jun 19, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, RF SYSTEM, AND RF CONTROL METHOD
- Publication number 20250191883
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Ryuta HIGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BALUN TRANSFORMER WITH ENHANCED RF COUPLING EMBEDDED IN HIGH-STRENG...
- Publication number 20250191838
- Publication date Jun 12, 2025
- LAM RESEARCH CORPORATION
- Shen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250191881
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Takahiro TAKEUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND METHOD OF CLEANING INSIDE OF CHAMBER
- Publication number 20250191896
- Publication date Jun 12, 2025
- ASM IP HOLDING B.V.
- Ryo MIYAMA
- B08 - CLEANING
Information Patent Application
SYSTEM AND METHOD FOR ENHANCED RF POWER DELIVERY USING HARMONIC WAV...
- Publication number 20250191879
- Publication date Jun 12, 2025
- FORTH-RITE TECHNOLOGIES, LLC
- Terry R. Turner
- H01 - BASIC ELECTRIC ELEMENTS

Matching circuits, impedance matching circuits per se H03H7/38 and H03H7/40

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

RF generating device and semiconductor manufacturing apparatus incl...

In-situ closed-loop management of radio frequency power generator

Adaptive pulse shaping with post match sensor

Systems and methods for controlling a plasma sheath characteristic

Plasma processing apparatus and plasma processing method

Plasma generating device

Substrate processing device, substrate processing system, control m...

Two stage pin diode driver with energy recovery

Plasma processing method and plasma processing apparatus

Impedance matching circuit and plasma supply system and operating m...

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

RF impedance matching network

Power control for rf impedance matching network

Antennas, circuits for generating plasma, plasma processing apparat...

Semiconductor processing apparatus and method

Systems and methods for tuning a MHz RF generator within a cycle of...

Large-area high-density plasma processing chamber for flat panel di...

Film forming apparatus

Apparatus for preventing contamination of self-plasma chamber

Systems and methods for use of low frequency harmonics in bias radi...

Plasma processing apparatus

Method and system for automated frequency tuning of radiofrequency...

Radio frequency diverter assembly enabling on-demand different spatial

Plasma ignition detection device for connection to an impedance mat...

Hybrid matcher and radio frequency matching system including the hy...

Retuning for impedance matching network control

Systems and methods for achieving peak ion energy enhancement with...

Systems and methods for multi-level pulsing in RF plasma tools

Plasma antenna and apparatus for generating plasma having the same

Patents Applicationslast 30 patents

SWITCHING CIRCUIT FOR MULTILEVEL PLASMA IMPEDANCE MATCHING

SYSTEMS AND METHODS FOR DELAY AND AMPLITUDE CORRECTION

PLASMA PROCESSING DEVICE

PLASMA SOURCE WITH A COOLANT LEAKAGE DETECTION SYSTEM

PULSING CONTROL MATCH NETWORK AND GENERATOR

BALANCED RESONATOR SOURCE FOR PLASMA PROCESSING

SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS

SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS

PLASMA TREATMENT DEVICE AND ETCHING METHOD

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

AIR-CORE COIL IN ANALOG CIRCUIT FILTERS FOR PLASMA PROCESSING

Fast Frequency Tracking Control for Radiofrequency Power Amplifiers...

APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE

PLASMA GENERATION CIRCUIT AND SUBSTRATE PROCESSING DEVICE INCLUDING...

Extremum-Seeking Control Apparatuses and Methods for Automatic Freq...

PLASMA PROCESSING APPARATUS

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

SYSTEMS AND METHODS FOR CONTROLLING A POWER LIMITER

MANUFACTURING METHOD, PROCESS MODULE MATCHING METHOD, AND SUBSTRATE...

SUBSTRATE SUPPORT ASSEMBLY, PLASMA CONTROL METHOD, AND PLASMA PROCE...

PLASMA STATE MONITORING DEVICE FOR CONNECTING TO AN IMPEDANCE MATCH...

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

APPARATUS AND METHOD FOR TREATING SUBSTRATE

Plasma Processing Apparatus and Plasma Processing Method

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

PLASMA PROCESSING APPARATUS, RF SYSTEM, AND RF CONTROL METHOD

BALUN TRANSFORMER WITH ENHANCED RF COUPLING EMBEDDED IN HIGH-STRENG...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE TREATMENT APPARATUS AND METHOD OF CLEANING INSIDE OF CHAMBER

SYSTEM AND METHOD FOR ENHANCED RF POWER DELIVERY USING HARMONIC WAV...