Matching circuits, impedance matching circuits per se H03H7/38 and H03H7/40

Industry

CPC
H01J37/32183

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32183Matching circuits, impedance matching circuits per se H03H7/38 and H03H7/40

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 12,193,138
- Issue date Jan 7, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tuning voltage setpoint in a pulsed RF signal for a tunable edge sh...
- Patent number 12,183,544
- Issue date Dec 31, 2024
- Lam Research Corporation
- David Hopkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,183,546
- Issue date Dec 31, 2024
- ASM IP Holding B.V.
- KiChul Um
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High bandwidth architecture for centralized coherent control at the...
- Patent number 12,183,548
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- David Coumou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and tuning method for mitigating RF load impedance variat...
- Patent number 12,183,549
- Issue date Dec 31, 2024
- MKS Instruments, Inc.
- Aaron Burry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Early warning systems and methods for determining capacitor failures
- Patent number 12,176,189
- Issue date Dec 24, 2024
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fleetwide impedance tuning performance optimization
- Patent number 12,165,843
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- David Coumou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity control circuit for impedance match
- Patent number 12,165,844
- Issue date Dec 10, 2024
- Lam Research Corporation
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and etching method
- Patent number 12,165,849
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus and method for operating same
- Patent number 12,159,766
- Issue date Dec 3, 2024
- EN2CORE technology, Inc.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power supply and method of supplying power to load
- Patent number 12,155,320
- Issue date Nov 26, 2024
- EN2CORE technology, Inc.
- Yeong-Hoon Sohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,154,767
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Naoki Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply device
- Patent number 12,148,596
- Issue date Nov 19, 2024
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma uniformity control in pulsed DC plasma chamber
- Patent number 12,148,595
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control and prediction of multiple plasma coupling surfaces and cor...
- Patent number 12,142,461
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- David Coumou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing leakage of heat transfer gas and plasma processi...
- Patent number 12,142,462
- Issue date Nov 12, 2024
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Closed-loop multiple-output radio frequency (RF) matching
- Patent number 12,136,938
- Issue date Nov 5, 2024
- Lam Research Corporation
- Eller Y. Juco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cost effective radio frequency impedance matching networks
- Patent number 12,136,537
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiofrequency power amplifier
- Patent number 12,132,454
- Issue date Oct 29, 2024
- Comet AG
- Daniel Gruner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment device having matching box
- Patent number 12,131,885
- Issue date Oct 29, 2024
- ASM IP Holding B.V.
- Tomohiro Arakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus, plasma processing apparatus, and plasm...
- Patent number 12,131,889
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for extracting process control information from...
- Patent number 12,131,886
- Issue date Oct 29, 2024
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for repeatable stepper motor homing
- Patent number 12,132,435
- Issue date Oct 29, 2024
- COMET Technologies USA, Inc.
- Anthony Oliveti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface charge and power feedback and control using a switch mode b...
- Patent number 12,125,674
- Issue date Oct 22, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,125,676
- Issue date Oct 22, 2024
- Tokyo Electron Limited
- Takahiro Takeuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply apparatus
- Patent number 12,125,677
- Issue date Oct 22, 2024
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and processing method
- Patent number 12,125,679
- Issue date Oct 22, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System of semiconductor process and control method thereof
- Patent number 12,125,687
- Issue date Oct 22, 2024
- Samsung Electronics Co., Ltd.
- Youngdo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma processing
- Patent number 12,119,207
- Issue date Oct 15, 2024
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply device
- Patent number 12,119,208
- Issue date Oct 15, 2024
- Daihen Corporation
- Yuya Ueno
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, AND STORAGE MEDIUM
- Publication number 20250006464
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER DELIVERY TO A PLASMA VIA INDUCTIVE COUPLING
- Publication number 20250006460
- Publication date Jan 2, 2025
- Advanced Energy Industries, Inc.
- Randy Heckman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF REFERENCE MEASURING CIRCUIT FOR A DIRECT DRIVE SYSTEM SUPPLYING...
- Publication number 20240429035
- Publication date Dec 26, 2024
- LAM RESEARCH CORPORATION
- Maolin LONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240420923
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Manabu ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUNDING DEVICE FOR THIN FILM FORMATION USING PLASMA
- Publication number 20240420937
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Yu Cheng LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...
- Publication number 20240420929
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Rajesh Dorai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES
- Publication number 20240420921
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME
- Publication number 20240412960
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Jawon KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO-FREQUENCY (RF) MATCHING NETWORK FOR FAST IMPEDANCE TUNING
- Publication number 20240412947
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240412951
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- DONG-HUN KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER DELIVERY USING MICROWAVE SOURCE
- Publication number 20240404791
- Publication date Dec 5, 2024
- ASM IP HOLDING B.V.
- Imran Ahmed BHUTTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reference Box for Direct-Drive Radiofrequency Power Supply
- Publication number 20240404804
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pulsed RF Plasma Generator With High Dynamic Range
- Publication number 20240404788
- Publication date Dec 5, 2024
- MKS Instruments, Inc.
- Ky LUU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Symmetric Coupling of Coil to Direct-Drive Radiofrequency Power Sup...
- Publication number 20240395503
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- John Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE MATCH WITH AN ELONGATED RF STRAP
- Publication number 20240395504
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Felix Leib Kozakevich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SMART DYNAMIC LOAD SIMULATOR FOR RF POWER DELIVERY CONTROL SYSTEM
- Publication number 20240395505
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Jie Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240387144
- Publication date Nov 21, 2024
- TOKYO ELECTRON LIMITED
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST TUNING RADIO FREQUENCY (RF) MATCHING NETWORK
- Publication number 20240371605
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR MONITORING SUBSTRATE PROCESSING APPARATUS
- Publication number 20240371611
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- SEJIN OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SEMICONDUCTOR DEVICE MANUFACTURING...
- Publication number 20240363309
- Publication date Oct 31, 2024
- Kokusai Electric Corporation
- Naofumi OHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Balanced RF Resonant Antenna System
- Publication number 20240363310
- Publication date Oct 31, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF POWER COMPENSATION TO REDUCE DEPOSITION OR ETCH RATE CHANGES IN...
- Publication number 20240363311
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Weiyi LUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ARCING PROTECTION METHOD, PROCESSING TOOL AND FABRICATION SYSTEM
- Publication number 20240363318
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wun-Kai TSAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Impedance Matching Circuit Using Insulated Air Core Transformer and...
- Publication number 20240364293
- Publication date Oct 31, 2024
- YOUNG IN ACE Co., Ltd.
- Vadim OSIPOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM INCLUDING RF MATCHING CIRCUIT FOR MULTI...
- Publication number 20240355588
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Seyed Jafar JAFARIAN-TEHRANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING
- Publication number 20240355586
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240355583
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- Naohiko OKUNISHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING
- Publication number 20240355587
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MUTUALLY INDUCED FILTERS
- Publication number 20240348223
- Publication date Oct 17, 2024
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRICAL VARIABLE CAPACITOR CIRCUIT AND SEMICONDUCTOR PROCESSING...
- Publication number 20240348225
- Publication date Oct 17, 2024
- INDUSTRIAL COOPERATION FOUDATION JEONBUK NATIONAL UNIVERSITY
- Yongsug SUH
- H01 - BASIC ELECTRIC ELEMENTS

Matching circuits, impedance matching circuits per se H03H7/38 and H03H7/40

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Matchless plasma source for semiconductor wafer fabrication

Tuning voltage setpoint in a pulsed RF signal for a tunable edge sh...

Substrate processing apparatus

High bandwidth architecture for centralized coherent control at the...

Apparatus and tuning method for mitigating RF load impedance variat...

Early warning systems and methods for determining capacitor failures

Fleetwide impedance tuning performance optimization

Uniformity control circuit for impedance match

Plasma processing apparatus and etching method

Plasma generating apparatus and method for operating same

Power supply and method of supplying power to load

Substrate processing apparatus and substrate processing method

High-frequency power supply device

Plasma uniformity control in pulsed DC plasma chamber

Control and prediction of multiple plasma coupling surfaces and cor...

Method of reducing leakage of heat transfer gas and plasma processi...

Closed-loop multiple-output radio frequency (RF) matching

Cost effective radio frequency impedance matching networks

Radiofrequency power amplifier

Plasma treatment device having matching box

Plasma generating apparatus, plasma processing apparatus, and plasm...

Systems and methods for extracting process control information from...

Method for repeatable stepper motor homing

Surface charge and power feedback and control using a switch mode b...

Plasma processing apparatus and plasma processing method

High-frequency power supply apparatus

Plasma processing apparatus and processing method

System of semiconductor process and control method thereof

Apparatus for plasma processing

High-frequency power supply device

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, AND STORAGE MEDIUM

POWER DELIVERY TO A PLASMA VIA INDUCTIVE COUPLING

RF REFERENCE MEASURING CIRCUIT FOR A DIRECT DRIVE SYSTEM SUPPLYING...

PLASMA PROCESSING APPARATUS

GROUNDING DEVICE FOR THIN FILM FORMATION USING PLASMA

EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...

IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES

SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME

RADIO-FREQUENCY (RF) MATCHING NETWORK FOR FAST IMPEDANCE TUNING

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

POWER DELIVERY USING MICROWAVE SOURCE

Reference Box for Direct-Drive Radiofrequency Power Supply

Pulsed RF Plasma Generator With High Dynamic Range

Symmetric Coupling of Coil to Direct-Drive Radiofrequency Power Sup...

IMPEDANCE MATCH WITH AN ELONGATED RF STRAP

SMART DYNAMIC LOAD SIMULATOR FOR RF POWER DELIVERY CONTROL SYSTEM

PLASMA PROCESSING APPARATUS

FAST TUNING RADIO FREQUENCY (RF) MATCHING NETWORK

METHOD AND SYSTEM FOR MONITORING SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SEMICONDUCTOR DEVICE MANUFACTURING...

Balanced RF Resonant Antenna System

RF POWER COMPENSATION TO REDUCE DEPOSITION OR ETCH RATE CHANGES IN...

ARCING PROTECTION METHOD, PROCESSING TOOL AND FABRICATION SYSTEM

Impedance Matching Circuit Using Insulated Air Core Transformer and...

SUBSTRATE PROCESSING SYSTEM INCLUDING RF MATCHING CIRCUIT FOR MULTI...

MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS

MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING

MUTUALLY INDUCED FILTERS

ELECTRICAL VARIABLE CAPACITOR CIRCUIT AND SEMICONDUCTOR PROCESSING...