Matching circuits, impedance matching circuits per se H03H7/38 and H03H7/40

Industry

CPC
H01J37/32183

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32183Matching circuits, impedance matching circuits per se H03H7/38 and H03H7/40

Industries

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 11,978,612
- Issue date May 7, 2024
- HITACHI HIGH-TECH CORPORATION
- Isao Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for plasma processing arc suppression
- Patent number 11,972,928
- Issue date Apr 30, 2024
- COMET Technologies USA, Inc.
- Anthony Oliveti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency tuning for modulated plasma systems
- Patent number 11,972,927
- Issue date Apr 30, 2024
- Advanced Energy Industries, Inc.
- Gideon van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition method and deposition apparatus
- Patent number 11,972,932
- Issue date Apr 30, 2024
- Ulvac, Inc.
- Toshihiko Nakahata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Voltage waveform generator for plasma processing apparatuses
- Patent number 11,968,771
- Issue date Apr 23, 2024
- PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V.
- Antonius Wilhelmus Hendricus Johannes Driessen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency match network and generator
- Patent number 11,961,711
- Issue date Apr 16, 2024
- COMET Technologies USA, Inc.
- Alexandre De Chambrier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,961,710
- Issue date Apr 16, 2024
- Canon Anelva Corporation
- Tadashi Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Combining the determination of single and mutual, preset preserving...
- Patent number 11,961,712
- Issue date Apr 16, 2024
- Advanced Energy Industries, Inc.
- Frederick Winter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for controlling RF parameters at multiple fre...
- Patent number 11,956,883
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency match strap assembly
- Patent number 11,955,317
- Issue date Apr 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ming-Sze Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of etching and apparatus for plasma processing
- Patent number 11,955,342
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Masanori Hosoya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combined RF generator and RF solid-state matching network
- Patent number 11,948,775
- Issue date Apr 2, 2024
- ASM AMERICA, INC.
- Imran Ahmed Bhutta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High speed synchronization of plasma source/bias power delivery
- Patent number 11,935,726
- Issue date Mar 19, 2024
- MKS Instruments, Inc.
- Aaron T. Radomski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,935,724
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for cleaning an edge ring pocket
- Patent number 11,935,730
- Issue date Mar 19, 2024
- Lam Research Corporation
- Eric Hudson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of tuning to improve plasma stability
- Patent number 11,929,236
- Issue date Mar 12, 2024
- Applied Materials, Inc.
- Shouqian Shao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for tuning a MHz RF generator within a cycle of...
- Patent number 11,929,235
- Issue date Mar 12, 2024
- Lam Research Corporation
- Arthur M. Howald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,923,229
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Yusuke Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, method...
- Patent number 11,923,173
- Issue date Mar 5, 2024
- Kokusai Electric Corporation
- Teruo Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method of supporting plasma ignition
- Patent number 11,923,174
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Yuji Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for variable gain tuning of matching networks
- Patent number 11,923,175
- Issue date Mar 5, 2024
- COMET Technologies USA, Inc.
- Dean Maw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature actuated valve and methods of use thereof
- Patent number 11,913,563
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Shivaram Chandrashekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving peak ion energy enhancement with...
- Patent number 11,915,912
- Issue date Feb 27, 2024
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power supply and method of supplying power to load
- Patent number 11,909,331
- Issue date Feb 20, 2024
- EN2CORE technology, Inc.
- Yeong-Hoon Sohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for manipulating power at an edge ring in pla...
- Patent number 11,908,661
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,908,664
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Naohiko Okunishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF generator device and substrate processing apparatus
- Patent number 11,901,159
- Issue date Feb 13, 2024
- Hitachi Kokusai Electric Inc.
- Naoto Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable capacitor for RF power applications
- Patent number 11,901,160
- Issue date Feb 13, 2024
- Comet AG
- Thomas Fink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling a processing reactor
- Patent number 11,894,220
- Issue date Feb 6, 2024
- Applied Materials, Inc.
- Michael Nichols
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems to modulate film stress
- Patent number 11,887,818
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Tsutomu Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Power Supply and Method of Supplying Power To Load
- Publication number 20240146211
- Publication date May 2, 2024
- EN2CORE technology, Inc
- Yeong-Hoon SOHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF IMPEDANCE MATCHING WITH CONTINUOUS WAVE AND PULSING SOURCES
- Publication number 20240145216
- Publication date May 2, 2024
- ASM IP HOLDING, B.V.
- Imran Ahmed BHUTTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVE BROAD-BAND SENSORS FOR ELECTROMAGNETIC WAVES
- Publication number 20240145221
- Publication date May 2, 2024
- COMET TECHNOLOGIES USA, INC.
- STEPHEN E. SAVAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REPEATABLE STEPPER MOTOR HOMING
- Publication number 20240146219
- Publication date May 2, 2024
- COMET TECHNOLOGIES USA, INC.
- ANTHONY OLIVETI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS
- Publication number 20240136154
- Publication date Apr 25, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240136160
- Publication date Apr 25, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD
- Publication number 20240136155
- Publication date Apr 25, 2024
- Samsung Electronics Co., Ltd.
- Changho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHANNEL PULSE RF POWER SUPPLY APPARATUS
- Publication number 20240128053
- Publication date Apr 18, 2024
- AS ENG CO.
- HYUK SOO LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL APPARATUS AND METHOD USING THE SAME
- Publication number 20240128054
- Publication date Apr 18, 2024
- Samsung Electronics Co., Ltd.
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE, HIGH-FREQUENCY POWER SUPPLY CIRCUIT, AND...
- Publication number 20240120179
- Publication date Apr 11, 2024
- TOKYO ELECTRON LIMITED
- Masaharu SHIRATANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COST EFFECTIVE RADIO FREQUENCY IMPEDANCE MATCHING NETWORKS
- Publication number 20240120178
- Publication date Apr 11, 2024
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BROADBAND SUPPLY CIRCUITRY FOR A PLASMA PROCESSING SYSTEM
- Publication number 20240112886
- Publication date Apr 4, 2024
- Applied Materials, Inc.
- Tiefeng SHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITANCE MEASUREMENT WITHOUT DISCONNECTING FROM HIGH POWER CIRCUIT
- Publication number 20240096598
- Publication date Mar 21, 2024
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIDEBAND VARIABLE IMPEDANCE LOAD FOR HIGH VOLUME MANUFACTURING QUAL...
- Publication number 20240094273
- Publication date Mar 21, 2024
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOLID STATE VARIABLE IMPEDANCE DEVICE AND SYSTEM
- Publication number 20240088873
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- DAVID COUMOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC ANTENNA ARRAYS FOR HIGH DENSITY PLASMA ENHANCED PROCESS C...
- Publication number 20240087847
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Extremum Seeking Control Apparatuses With Online Parameter Adjustme...
- Publication number 20240087850
- Publication date Mar 14, 2024
- MKS Instruments, Inc.
- Aaron BURRY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU CLOSED-LOOP MANAGEMENT OF RADIO FREQUENCY POWER GENERATOR
- Publication number 20240087851
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei Ting LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPACT REMOTE PLASMA SOURCE FOR HDP CVD CHAMBERS
- Publication number 20240087852
- Publication date Mar 14, 2024
- Advanced Refurbishment Technologies LLC d/b/a ARTSemi LLC
- Christopher William Lewis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING IMPEDANCE MEASUREMENT IN A RADIO FREQUENCY PLASMA PROCESSI...
- Publication number 20240079212
- Publication date Mar 7, 2024
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extremum-Seeking Control Apparatuses and Methods for Automatic Freq...
- Publication number 20240079211
- Publication date Mar 7, 2024
- MKS Instruments, Inc.
- Aaron BURRY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR MATCHING IMPEDANCE OF PULSE RADIO FREQUENCY P...
- Publication number 20240071724
- Publication date Feb 29, 2024
- Advanced Micro-Fabrication Equipment Inc. China
- Rubin YE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING PLASMA PROCESSING APPARATUS AND PLASMA PROCES...
- Publication number 20240055229
- Publication date Feb 15, 2024
- SEMES CO., LTD.
- Aixian Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF WAFER BOW IN MULTIPLE STATIONS
- Publication number 20240055285
- Publication date Feb 15, 2024
- LAM RESEARCH CORPORATION
- Edward Augustyniak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240055232
- Publication date Feb 15, 2024
- Hitachi High-Tech Corporation
- Yuki TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL-TIME CONTROL OF TEMPERATURE IN A PLASMA CHAMBER
- Publication number 20240047183
- Publication date Feb 8, 2024
- LAM RESEARCH CORPORATION
- Changyou Jing
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS
- Publication number 20240038498
- Publication date Feb 1, 2024
- TOKYO ELECTRON LIMITED
- Taehoon PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20240038502
- Publication date Feb 1, 2024
- ULVAC, Inc.
- Toshihiko NAKAHATA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOUND HELICAL INDUCTOR COIL
- Publication number 20240038497
- Publication date Feb 1, 2024
- COMET TECHNOLOGIES USA, INC.
- ANTHONY OLIVETI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...
- Publication number 20240030002
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS

Matching circuits, impedance matching circuits per se H03H7/38 and H03H7/40

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus

Method and system for plasma processing arc suppression

Frequency tuning for modulated plasma systems

Deposition method and deposition apparatus

Voltage waveform generator for plasma processing apparatuses

Radio frequency match network and generator

Plasma processing apparatus

Combining the determination of single and mutual, preset preserving...

Methods and apparatus for controlling RF parameters at multiple fre...

Radio frequency match strap assembly

Method of etching and apparatus for plasma processing

Combined RF generator and RF solid-state matching network

High speed synchronization of plasma source/bias power delivery

Symmetric VHF source for a plasma reactor

Systems and methods for cleaning an edge ring pocket

Methods of tuning to improve plasma stability

Systems and methods for tuning a MHz RF generator within a cycle of...

Plasma processing method and plasma processing apparatus

Substrate processing apparatus, substrate processing method, method...

Plasma processing system and method of supporting plasma ignition

Systems and methods for variable gain tuning of matching networks

Temperature actuated valve and methods of use thereof

Systems and methods for achieving peak ion energy enhancement with...

Power supply and method of supplying power to load

Apparatus and methods for manipulating power at an edge ring in pla...

Plasma processing apparatus

RF generator device and substrate processing apparatus

Variable capacitor for RF power applications

Method and apparatus for controlling a processing reactor

Methods and systems to modulate film stress

Patents Applicationslast 30 patents

Power Supply and Method of Supplying Power To Load

RF IMPEDANCE MATCHING WITH CONTINUOUS WAVE AND PULSING SOURCES

INDUCTIVE BROAD-BAND SENSORS FOR ELECTROMAGNETIC WAVES

METHOD FOR REPEATABLE STEPPER MOTOR HOMING

FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD

MULTI-CHANNEL PULSE RF POWER SUPPLY APPARATUS

PLASMA CONTROL APPARATUS AND METHOD USING THE SAME

PLASMA PROCESSING DEVICE, HIGH-FREQUENCY POWER SUPPLY CIRCUIT, AND...

COST EFFECTIVE RADIO FREQUENCY IMPEDANCE MATCHING NETWORKS

BROADBAND SUPPLY CIRCUITRY FOR A PLASMA PROCESSING SYSTEM

CAPACITANCE MEASUREMENT WITHOUT DISCONNECTING FROM HIGH POWER CIRCUIT

WIDEBAND VARIABLE IMPEDANCE LOAD FOR HIGH VOLUME MANUFACTURING QUAL...

SOLID STATE VARIABLE IMPEDANCE DEVICE AND SYSTEM

SYMMETRIC ANTENNA ARRAYS FOR HIGH DENSITY PLASMA ENHANCED PROCESS C...

Extremum Seeking Control Apparatuses With Online Parameter Adjustme...

IN-SITU CLOSED-LOOP MANAGEMENT OF RADIO FREQUENCY POWER GENERATOR

COMPACT REMOTE PLASMA SOURCE FOR HDP CVD CHAMBERS

SCANNING IMPEDANCE MEASUREMENT IN A RADIO FREQUENCY PLASMA PROCESSI...

Extremum-Seeking Control Apparatuses and Methods for Automatic Freq...

METHOD AND DEVICE FOR MATCHING IMPEDANCE OF PULSE RADIO FREQUENCY P...

METHOD OF CONTROLLING PLASMA PROCESSING APPARATUS AND PLASMA PROCES...

CONTROL OF WAFER BOW IN MULTIPLE STATIONS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

REAL-TIME CONTROL OF TEMPERATURE IN A PLASMA CHAMBER

FILM DEPOSITION APPARATUS

DEPOSITION METHOD AND DEPOSITION APPARATUS

COMPOUND HELICAL INDUCTOR COIL

PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...