Matching circuits, impedance matching circuits per se H03H7/38 and H03H7/40

Industry

CPC
H01J37/32183

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32183Matching circuits, impedance matching circuits per se H03H7/38 and H03H7/40

Industries

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,224,157
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Yuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
To an inductively coupled plasma source
- Patent number 12,217,938
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency source for inductively coupled and capacitively cou...
- Patent number 12,217,937
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, and plasma processing method
- Patent number 12,217,941
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Satoru Kawakami
- B08 - CLEANING
Information Patent Grant
RF tuning systems including tuning circuits having impedances for s...
- Patent number 12,217,939
- Issue date Feb 4, 2025
- Lam Research Corporation
- David French
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sensor data compression in a plasma tool
- Patent number 12,217,940
- Issue date Feb 4, 2025
- Lam Research Corporation
- John Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-state pulsing for achieving a balance between bow control and...
- Patent number 12,217,972
- Issue date Feb 4, 2025
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Performing radio frequency matching control using a model-based dig...
- Patent number 12,211,670
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Tao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity control for plasma processing
- Patent number 12,211,677
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Vladimir Nagorny
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
High-frequency power supply apparatus
- Patent number 12,205,798
- Issue date Jan 21, 2025
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for anisotropic pattern etching and treatment
- Patent number 12,205,793
- Issue date Jan 21, 2025
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable output impedance RF generator
- Patent number 12,198,898
- Issue date Jan 14, 2025
- Eagle Harbor Technologies, Inc.
- James Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 12,193,138
- Issue date Jan 7, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tuning voltage setpoint in a pulsed RF signal for a tunable edge sh...
- Patent number 12,183,544
- Issue date Dec 31, 2024
- Lam Research Corporation
- David Hopkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,183,546
- Issue date Dec 31, 2024
- ASM IP Holding B.V.
- KiChul Um
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High bandwidth architecture for centralized coherent control at the...
- Patent number 12,183,548
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- David Coumou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and tuning method for mitigating RF load impedance variat...
- Patent number 12,183,549
- Issue date Dec 31, 2024
- MKS Instruments, Inc.
- Aaron Burry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Early warning systems and methods for determining capacitor failures
- Patent number 12,176,189
- Issue date Dec 24, 2024
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fleetwide impedance tuning performance optimization
- Patent number 12,165,843
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- David Coumou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity control circuit for impedance match
- Patent number 12,165,844
- Issue date Dec 10, 2024
- Lam Research Corporation
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and etching method
- Patent number 12,165,849
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus and method for operating same
- Patent number 12,159,766
- Issue date Dec 3, 2024
- EN2CORE technology, Inc.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power supply and method of supplying power to load
- Patent number 12,155,320
- Issue date Nov 26, 2024
- EN2CORE technology, Inc.
- Yeong-Hoon Sohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,154,767
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Naoki Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply device
- Patent number 12,148,596
- Issue date Nov 19, 2024
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma uniformity control in pulsed DC plasma chamber
- Patent number 12,148,595
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control and prediction of multiple plasma coupling surfaces and cor...
- Patent number 12,142,461
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- David Coumou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing leakage of heat transfer gas and plasma processi...
- Patent number 12,142,462
- Issue date Nov 12, 2024
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Closed-loop multiple-output radio frequency (RF) matching
- Patent number 12,136,938
- Issue date Nov 5, 2024
- Lam Research Corporation
- Eller Y. Juco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cost effective radio frequency impedance matching networks
- Patent number 12,136,537
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
RF SPUTTERING OF MULTIPLE ELECTRODES WITH OPTIMIZED PLAMSA COUPLING...
- Publication number 20250054728
- Publication date Feb 13, 2025
- SPUTTERING COMPONENTS, INC.
- Ken Nauman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING TOOL WITH HIGH-SPEED MATCH NETWORK IMPEDANCE S...
- Publication number 20250054729
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Shen PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250051915
- Publication date Feb 13, 2025
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Systems and Methods for Extracting Process Control Information from...
- Publication number 20250054730
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE ESC FOR RAPID ALTERNATING PROCESS APPLICATIONS
- Publication number 20250054738
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Dan MAROHL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATING APPARATUS AND METHOD FOR OPERATING SAME
- Publication number 20250046571
- Publication date Feb 6, 2025
- EN2CORE technology, Inc
- Sae Hoon UHM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A METHOD AND APPARATUS FOR ENHANCING ION ENERGY AND REDUCING ION EN...
- Publication number 20250046572
- Publication date Feb 6, 2025
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION
- Publication number 20250046576
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Power Supply and Method of Supplying Power To Load
- Publication number 20250047216
- Publication date Feb 6, 2025
- EN2CORE technology, Inc
- Yeong-Hoon SOHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCH NETWORK DESIGN FOR USE WITH FREQUENCY SWEEPING
- Publication number 20250037972
- Publication date Jan 30, 2025
- Advanced Energy Industries, Inc.
- Masahiro Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND COR...
- Publication number 20250037973
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- David Coumou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250029829
- Publication date Jan 23, 2025
- ASM IP HOLDING B.V.
- SungBae Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...
- Publication number 20250022745
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR PLASMA PROCESSING
- Publication number 20250014865
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250014866
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Takahiro TAKEUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250014877
- Publication date Jan 9, 2025
- Panasonic Intellectual Property Management Co., Ltd.
- Hisao NAGAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLOSED-LOOP MULTIPLE-OUTPUT RADIO FREQUENCY (RF) MATCHING
- Publication number 20250015819
- Publication date Jan 9, 2025
- LAM RESEARCH CORPORATION
- Eller Y. Juco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, AND STORAGE MEDIUM
- Publication number 20250006464
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER DELIVERY TO A PLASMA VIA INDUCTIVE COUPLING
- Publication number 20250006460
- Publication date Jan 2, 2025
- Advanced Energy Industries, Inc.
- Randy Heckman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF REFERENCE MEASURING CIRCUIT FOR A DIRECT DRIVE SYSTEM SUPPLYING...
- Publication number 20240429035
- Publication date Dec 26, 2024
- LAM RESEARCH CORPORATION
- Maolin LONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240420923
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Manabu ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUNDING DEVICE FOR THIN FILM FORMATION USING PLASMA
- Publication number 20240420937
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Yu Cheng LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...
- Publication number 20240420929
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Rajesh Dorai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES
- Publication number 20240420921
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME
- Publication number 20240412960
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Jawon KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO-FREQUENCY (RF) MATCHING NETWORK FOR FAST IMPEDANCE TUNING
- Publication number 20240412947
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240412951
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- DONG-HUN KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER DELIVERY USING MICROWAVE SOURCE
- Publication number 20240404791
- Publication date Dec 5, 2024
- ASM IP HOLDING B.V.
- Imran Ahmed BHUTTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reference Box for Direct-Drive Radiofrequency Power Supply
- Publication number 20240404804
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pulsed RF Plasma Generator With High Dynamic Range
- Publication number 20240404788
- Publication date Dec 5, 2024
- MKS Instruments, Inc.
- Ky LUU
- H01 - BASIC ELECTRIC ELEMENTS

Matching circuits, impedance matching circuits per se H03H7/38 and H03H7/40

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

To an inductively coupled plasma source

Radio frequency source for inductively coupled and capacitively cou...

Plasma processing apparatus, and plasma processing method

RF tuning systems including tuning circuits having impedances for s...

Sensor data compression in a plasma tool

Multi-state pulsing for achieving a balance between bow control and...

Performing radio frequency matching control using a model-based dig...

Uniformity control for plasma processing

High-frequency power supply apparatus

Method and apparatus for anisotropic pattern etching and treatment

Variable output impedance RF generator

Matchless plasma source for semiconductor wafer fabrication

Tuning voltage setpoint in a pulsed RF signal for a tunable edge sh...

Substrate processing apparatus

High bandwidth architecture for centralized coherent control at the...

Apparatus and tuning method for mitigating RF load impedance variat...

Early warning systems and methods for determining capacitor failures

Fleetwide impedance tuning performance optimization

Uniformity control circuit for impedance match

Plasma processing apparatus and etching method

Plasma generating apparatus and method for operating same

Power supply and method of supplying power to load

Substrate processing apparatus and substrate processing method

High-frequency power supply device

Plasma uniformity control in pulsed DC plasma chamber

Control and prediction of multiple plasma coupling surfaces and cor...

Method of reducing leakage of heat transfer gas and plasma processi...

Closed-loop multiple-output radio frequency (RF) matching

Cost effective radio frequency impedance matching networks

Patents Applicationslast 30 patents

RF SPUTTERING OF MULTIPLE ELECTRODES WITH OPTIMIZED PLAMSA COUPLING...

SUBSTRATE PROCESSING TOOL WITH HIGH-SPEED MATCH NETWORK IMPEDANCE S...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

Systems and Methods for Extracting Process Control Information from...

TUNABLE ESC FOR RAPID ALTERNATING PROCESS APPLICATIONS

PLASMA GENERATING APPARATUS AND METHOD FOR OPERATING SAME

A METHOD AND APPARATUS FOR ENHANCING ION ENERGY AND REDUCING ION EN...

PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION

Power Supply and Method of Supplying Power To Load

MATCH NETWORK DESIGN FOR USE WITH FREQUENCY SWEEPING

CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND COR...

SUBSTRATE PROCESSING METHOD

Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...

APPARATUS FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

CLOSED-LOOP MULTIPLE-OUTPUT RADIO FREQUENCY (RF) MATCHING

PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, AND STORAGE MEDIUM

POWER DELIVERY TO A PLASMA VIA INDUCTIVE COUPLING

RF REFERENCE MEASURING CIRCUIT FOR A DIRECT DRIVE SYSTEM SUPPLYING...

PLASMA PROCESSING APPARATUS

GROUNDING DEVICE FOR THIN FILM FORMATION USING PLASMA

EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...

IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES

SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME

RADIO-FREQUENCY (RF) MATCHING NETWORK FOR FAST IMPEDANCE TUNING

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

POWER DELIVERY USING MICROWAVE SOURCE

Reference Box for Direct-Drive Radiofrequency Power Supply

Pulsed RF Plasma Generator With High Dynamic Range