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CPC
H01J37/32467

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32467Material

Industries

Patents Grantslast 30 patents

Information Patent Grant
L-motion slit door for substrate processing chamber
- Patent number 12,125,688
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Hamid Noorbakhsh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for storage and supply of F3NO-free FNO gases a...
- Patent number 12,106,940
- Issue date Oct 1, 2024
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Ayaka Nishiyama
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Substrate halo arrangement for improved process uniformity
- Patent number 12,106,943
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source having a dielectric plasma chamber with improved plas...
- Patent number 12,075,554
- Issue date Aug 27, 2024
- MKS Instruments, Inc.
- Xing Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Member for plasma processing device and plasma processing device pr...
- Patent number 12,065,727
- Issue date Aug 20, 2024
- Kyocera Corporation
- Kazuhiro Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing system
- Patent number 12,051,571
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Kazuya Ichiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave source with multiple metal housings
- Patent number 12,033,835
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Philip Allan Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching of Ru metal
- Patent number 12,020,908
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Yung-chen Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film, in-situ measurement through transparent crystal and tran...
- Patent number 12,009,191
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Patrick Tae
- G01 - MEASURING TESTING
Information Patent Grant
Temperature control method and temperature control device
- Patent number 12,009,182
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Ryo Matsubara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming a protective coating on processing chamber surf...
- Patent number 11,976,357
- Issue date May 7, 2024
- Applied Materials, Inc.
- Geetika Bajaj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing system including dual ion filter for downstrea...
- Patent number 11,967,486
- Issue date Apr 23, 2024
- Lam Research Corporation
- Andrew Stratton Bravo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 11,942,337
- Issue date Mar 26, 2024
- Semes Co., Ltd.
- Eui Sang Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for tuning plasma distribution using phase control
- Patent number 11,908,662
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition apparatus and method of manufacturing dis...
- Patent number 11,842,883
- Issue date Dec 12, 2023
- Samsung Display Co., Ltd.
- Jong-hoon Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generation apparatus, deposition apparatus using the same, a...
- Patent number 11,823,865
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composite structure and semiconductor manufacturing apparatus inclu...
- Patent number 11,802,085
- Issue date Oct 31, 2023
- Toto Ltd.
- Hiroaki Ashizawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Plasma processing apparatus and power supply control method
- Patent number 11,776,795
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,742,183
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Ryuji Hisatomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming plasma processing apparatus, related apparatus, a...
- Patent number 11,715,628
- Issue date Aug 1, 2023
- Samsung Electronics Co., Ltd.
- Jeongil Mun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aluminum apparatus with aluminum oxide layer and method for forming...
- Patent number 11,699,574
- Issue date Jul 11, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ru-Chien Chiu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Apparatuses and methods of protecting nickel and nickel containing...
- Patent number 11,658,014
- Issue date May 23, 2023
- Applied Materials, Inc.
- Pingyan Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chamber seasoning to improve etch uniformity by reducing chemistry
- Patent number 11,626,269
- Issue date Apr 11, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma oxidation chamber
- Patent number 11,615,944
- Issue date Mar 28, 2023
- Applied Materials, Inc.
- Christopher S. Olsen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxygen controlled PVD ALN buffer for GAN-based optoelectronic and e...
- Patent number 11,575,071
- Issue date Feb 7, 2023
- Applied Materials, Inc.
- Mingwei Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D printed chamber components configured for lower film stress and...
- Patent number 11,569,069
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Kadthala R. Narendrnath
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Fluorine ion implantation system with non-tungsten materials and me...
- Patent number 11,538,687
- Issue date Dec 27, 2022
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-pressure plasma chamber, low-pressure plasma installation and m...
- Patent number 11,532,465
- Issue date Dec 20, 2022
- Christof-Herbert Diener
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Grant
Confinement ring with extended life
- Patent number 11,515,128
- Issue date Nov 29, 2022
- Lam Research Corporation
- Justin Charles Canniff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of treating surface of quartz member and quartz member obtai...
- Patent number 11,505,493
- Issue date Nov 22, 2022
- Semes Co., Ltd.
- Su Hyung Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
STRUCTURE AND METHOD FOR SOLVING PARASITIC PLASMA IN PLASMA PROCESS...
- Publication number 20240321554
- Publication date Sep 26, 2024
- SUZHOU MAXWELL TECHNOLOGIES CO., LTD.
- Dengzhi WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM, IN-SITU MEASUREMENT THROUGH TRANSPARENT CRYSTAL AND TRAN...
- Publication number 20240290592
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Patrick Tae
- G01 - MEASURING TESTING
Information Patent Application
PLASMA-RESISTANT GLASS, CHAMBER INTERIOR PARTS FOR SEMICONDUCTOR MA...
- Publication number 20240274410
- Publication date Aug 15, 2024
- Hansol IONES Co., Ltd.
- Dae Gun Kim
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...
- Publication number 20240266147
- Publication date Aug 8, 2024
- LAM RESEARCH CORPORATION
- Andrew Stratton BRAVO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus with Contact Temperature Sensor
- Publication number 20240222094
- Publication date Jul 4, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Zhaotong Yang
- G01 - MEASURING TESTING
Information Patent Application
YTTRIUM ALUMINUM PEROVSKITE (YAP) BASED COATINGS FOR SEMICONDUCTOR...
- Publication number 20240212991
- Publication date Jun 27, 2024
- LAM RESEARCH CORPORATION
- Eric A. PAPE
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COMPOSITE STRUCTURE AND SEMICONDUCTOR MANUFACTURING DEVICE PROVIDED...
- Publication number 20240170264
- Publication date May 23, 2024
- TOTO LTD.
- Hiroaki ASHIZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS SYSTEM FOR MULTI-STATION
- Publication number 20240162006
- Publication date May 16, 2024
- EN2CORE technology, Inc
- Sae Hoon UHM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTION TREATMENTS FOR SURFACES OF SEMICONDUCTOR FABRICATION EQU...
- Publication number 20240153745
- Publication date May 9, 2024
- Applied Materials, Inc.
- Katherine Woo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240145261
- Publication date May 2, 2024
- SEMES CO., LTD.
- Eui Sang LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240112891
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Masaru ISAGO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINTERED YTTRIUM OXIDE BODY OF LARGE DIMENSION
- Publication number 20240010510
- Publication date Jan 11, 2024
- Heraeus Conamic North America LLC
- Luke WALKER
- C01 - INORGANIC CHEMISTRY
Information Patent Application
CERAMIC COMPONENT WITH CHANNELS
- Publication number 20230411124
- Publication date Dec 21, 2023
- LAM RESEARCH CORPORATION
- John Michael KERNS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR USE IN GENERATING PLASMA
- Publication number 20230352270
- Publication date Nov 2, 2023
- Dyson Technology Limited
- Sven GAUTER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNESIUM ALUMINUM OXYNITRIDE COMPONENT FOR USE IN A PLASMA PROCESS...
- Publication number 20230317423
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Pankaj HAZARIKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EROSION RESISTANT PLASMA PROCESSING CHAMBER COMPONENTS
- Publication number 20230317424
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Harmeet SINGH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR CHAMBER COMPONENTS WITH MULTI-LAYER COATING
- Publication number 20230290616
- Publication date Sep 14, 2023
- Applied Materials, Inc.
- Laksheswar Kalita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORMITY CONTROL FOR PLASMA PROCESSING USING WALL RECOMBINATION
- Publication number 20230215702
- Publication date Jul 6, 2023
- Applied Materials, Inc.
- Vladimir Nagorny
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20230207248
- Publication date Jun 29, 2023
- SEMES CO., LTD.
- Young Je UM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA RESISTANT ARC PREVENTATIVE COATINGS FOR MANUFACTURING EQUPIM...
- Publication number 20230187182
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- Joseph Frederick Sommers
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PLASMA RESISTANT MEMBER, PLASMA TREATMENT DEVICE COMPONENT, AND PLA...
- Publication number 20230019508
- Publication date Jan 19, 2023
- KYOCERA CORPORATION
- Mamoru YAMASHIRO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING OF RU METAL
- Publication number 20220392752
- Publication date Dec 8, 2022
- Applied Materials, Inc.
- Yung-chen LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE CRYSTAL METAL OXIDE PLASMA CHAMBER COMPONENT
- Publication number 20220392753
- Publication date Dec 8, 2022
- Lin XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY
- Publication number 20220384156
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROL METHOD AND TEMPERATURE CONTROL DEVICE
- Publication number 20220375728
- Publication date Nov 24, 2022
- TOKYO ELECTRON LIMITED
- Ryo MATSUBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS MEMBER AND SEMICONDUCTOR MANU...
- Publication number 20220351944
- Publication date Nov 3, 2022
- TOTO LTD.
- Ryunosuke NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATION APPARATUS, DEPOSITION APPARATUS USING THE SAME, A...
- Publication number 20220336190
- Publication date Oct 20, 2022
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL COMPONENT AND MANUFACTURING METHOD THEREOF AND PROCESS CHAMBE...
- Publication number 20220336192
- Publication date Oct 20, 2022
- ABM CO., LTD.
- Bum Mo AHN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CHAMBER WITH ANCILLARY REACTION CHAMBER
- Publication number 20220293400
- Publication date Sep 15, 2022
- RECARBON, INC.
- George Stephen Leonard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF MANUFACTURING DIS...
- Publication number 20220238306
- Publication date Jul 28, 2022
- SAMSUNG DISPLAY CO., LTD.
- Jong-hoon Park
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

L-motion slit door for substrate processing chamber

Systems and methods for storage and supply of F3NO-free FNO gases a...

Substrate halo arrangement for improved process uniformity

Plasma source having a dielectric plasma chamber with improved plas...

Member for plasma processing device and plasma processing device pr...

Substrate processing method and substrate processing system

Modular microwave source with multiple metal housings

Atomic layer etching of Ru metal

Thin film, in-situ measurement through transparent crystal and tran...

Temperature control method and temperature control device

Methods for forming a protective coating on processing chamber surf...

Substrate processing system including dual ion filter for downstrea...

Apparatus and method for treating substrate

Device and method for tuning plasma distribution using phase control

Chemical vapor deposition apparatus and method of manufacturing dis...

Plasma generation apparatus, deposition apparatus using the same, a...

Composite structure and semiconductor manufacturing apparatus inclu...

Plasma processing apparatus and power supply control method

Plasma processing apparatus and control method

Method of forming plasma processing apparatus, related apparatus, a...

Aluminum apparatus with aluminum oxide layer and method for forming...

Apparatuses and methods of protecting nickel and nickel containing...

Chamber seasoning to improve etch uniformity by reducing chemistry

Remote plasma oxidation chamber

Oxygen controlled PVD ALN buffer for GAN-based optoelectronic and e...

3D printed chamber components configured for lower film stress and...

Fluorine ion implantation system with non-tungsten materials and me...

Low-pressure plasma chamber, low-pressure plasma installation and m...

Confinement ring with extended life

Method of treating surface of quartz member and quartz member obtai...

Patents Applicationslast 30 patents

STRUCTURE AND METHOD FOR SOLVING PARASITIC PLASMA IN PLASMA PROCESS...

THIN FILM, IN-SITU MEASUREMENT THROUGH TRANSPARENT CRYSTAL AND TRAN...

PLASMA-RESISTANT GLASS, CHAMBER INTERIOR PARTS FOR SEMICONDUCTOR MA...

SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...

Workpiece Processing Apparatus with Contact Temperature Sensor

YTTRIUM ALUMINUM PEROVSKITE (YAP) BASED COATINGS FOR SEMICONDUCTOR...

COMPOSITE STRUCTURE AND SEMICONDUCTOR MANUFACTURING DEVICE PROVIDED...

PLASMA PROCESS SYSTEM FOR MULTI-STATION

PROTECTION TREATMENTS FOR SURFACES OF SEMICONDUCTOR FABRICATION EQU...

APPARATUS AND METHOD FOR TREATING SUBSTRATE

PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS

SINTERED YTTRIUM OXIDE BODY OF LARGE DIMENSION

CERAMIC COMPONENT WITH CHANNELS

METHOD AND APPARATUS FOR USE IN GENERATING PLASMA

MAGNESIUM ALUMINUM OXYNITRIDE COMPONENT FOR USE IN A PLASMA PROCESS...

EROSION RESISTANT PLASMA PROCESSING CHAMBER COMPONENTS

SEMICONDUCTOR CHAMBER COMPONENTS WITH MULTI-LAYER COATING

UNIFORMITY CONTROL FOR PLASMA PROCESSING USING WALL RECOMBINATION

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

PLASMA RESISTANT ARC PREVENTATIVE COATINGS FOR MANUFACTURING EQUPIM...

PLASMA RESISTANT MEMBER, PLASMA TREATMENT DEVICE COMPONENT, AND PLA...

ATOMIC LAYER ETCHING OF RU METAL

SINGLE CRYSTAL METAL OXIDE PLASMA CHAMBER COMPONENT

SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY

TEMPERATURE CONTROL METHOD AND TEMPERATURE CONTROL DEVICE

SEMICONDUCTOR MANUFACTURING APPARATUS MEMBER AND SEMICONDUCTOR MANU...

PLASMA GENERATION APPARATUS, DEPOSITION APPARATUS USING THE SAME, A...

METAL COMPONENT AND MANUFACTURING METHOD THEREOF AND PROCESS CHAMBE...

PLASMA CHAMBER WITH ANCILLARY REACTION CHAMBER

CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF MANUFACTURING DIS...