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H01L21/02521

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/02521Materials

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Black phosphorus-two dimensional material complex and method of man...
- Patent number 12,211,904
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Minsu Seol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices having a semiconductor material that is semimetal in bulk a...
- Patent number 12,148,816
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jean-Pierre Colinge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitride semiconductor structure, nitride semiconductor device, and...
- Patent number 12,100,936
- Issue date Sep 24, 2024
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Toshiyuki Takizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and devices for fabricating and assembling printable semico...
- Patent number 12,074,213
- Issue date Aug 27, 2024
- The Board of Trustees of the University of Illinois
- Ralph G. Nuzzo
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 11,990,510
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Yi Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Template-assisted synthesis of 2D nanosheets using nanoparticle tem...
- Patent number 11,964,879
- Issue date Apr 23, 2024
- Nanoco 2D Materials Limited
- Steven Daniels
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Field effect transistor and method of manufacturing the same
- Patent number 11,935,790
- Issue date Mar 19, 2024
- Samsung Electronics Co., Ltd.
- Minsu Seol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices
- Patent number 11,901,453
- Issue date Feb 13, 2024
- Samsung Electronics Co., Ltd.
- Sung Uk Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for preparing a monolayer or few-layer crystalline black ph...
- Patent number 11,885,039
- Issue date Jan 30, 2024
- The Hong Kong Polytechnic University
- Jianhua Hao
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for forming semiconductor device
- Patent number 11,876,122
- Issue date Jan 16, 2024
- United Microelectronics Corp.
- Chia-Wei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 11,855,211
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing a two-dimensional material
- Patent number 11,848,206
- Issue date Dec 19, 2023
- Paragraf Ltd.
- Simon Charles Stewart Thomas
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 11,817,500
- Issue date Nov 14, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and fabricating method thereof
- Patent number 11,764,267
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Chieh Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming epitaxial source/drain features using a self-ali...
- Patent number 11,735,483
- Issue date Aug 22, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yao-Sheng Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 11,735,426
- Issue date Aug 22, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Masking layer with post treatment
- Patent number 11,728,173
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Ju Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition of selected molecular clusters
- Patent number 11,695,053
- Issue date Jul 4, 2023
- STMicroelectronics, Inc.
- John H. Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure of high-voltage transistor and method for fabricating the...
- Patent number 11,682,728
- Issue date Jun 20, 2023
- United Microelectronics Corp.
- Chun-Ya Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated assemblies and methods of forming integrated assemblies
- Patent number 11,670,707
- Issue date Jun 6, 2023
- Micron Technology, Inc.
- David K. Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Passivated nanoparticles
- Patent number 11,656,231
- Issue date May 23, 2023
- Tectus Corporation
- Lianhua Qu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for forming silicon-phosphorous materials
- Patent number 11,649,560
- Issue date May 16, 2023
- Applied Materials, Inc.
- Errol Antonio C Sanchez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process and manufacture of low-dimensional materials supporting bot...
- Patent number 11,651,957
- Issue date May 16, 2023
- SemiNuclear, Inc.
- Patrick Curran
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Structure of a fin field effect transistor (FinFET)
- Patent number 11,626,508
- Issue date Apr 11, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Yang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed plasma (DC/RF) deposition of high quality C films for patter...
- Patent number 11,603,591
- Issue date Mar 14, 2023
- Applied Materials Inc.
- Eswaranand Venkatasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-aligned short-channel electronic devices and fabrication metho...
- Patent number 11,605,730
- Issue date Mar 14, 2023
- Northwestern University
- Mark C. Hersam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and fabrication method thereof
- Patent number 11,545,557
- Issue date Jan 3, 2023
- United Microelectronics Corp.
- Chia-Wei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synthesis and use of precursors for ALD of group VA element contain...
- Patent number 11,542,600
- Issue date Jan 3, 2023
- ASM IP Holding B.V.
- Viljami Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition and method for making picocrystalline artificial borane...
- Patent number 11,521,853
- Issue date Dec 6, 2022
- SemiNuclear, Inc.
- Patrick Curran
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Leakage-free implantation-free ETSOI transistors
- Patent number 11,502,171
- Issue date Nov 15, 2022
- International Business Machines Corporation
- Joel P. de Souza
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR DEPOSITING A MOLYBDENUM METAL FILM ON A DIELECTRIC SURF...
- Publication number 20250029834
- Publication date Jan 23, 2025
- ASM IP HOLDING B.V.
- Bhushan Zope
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Devices Having a Semiconductor Material That Is Semimetal in Bulk a...
- Publication number 20240387711
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jean-Pierre Colinge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR LAYER INCLUDING Sn BASED PEROVSKITE INCLUDING CHLORID...
- Publication number 20240351905
- Publication date Oct 24, 2024
- POSTECH Research and Business Development Foundation
- Yong-Young NOH
- C01 - INORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240282820
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Yi PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DEPOSITING BORON CARBON NITRIDE
- Publication number 20240222115
- Publication date Jul 4, 2024
- ASM IP HOLDING B.V.
- Antti Niskanen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FIELD EFFECT TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
- Publication number 20240186183
- Publication date Jun 6, 2024
- Samsung Electronics Co., Ltd.
- Minsu SEOL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
P-GAN HIGH-ELECTRON-MOBILITY TRANSISTOR
- Publication number 20240154021
- Publication date May 9, 2024
- NATIONAL SUN YAT-SEN UNIVERSITY
- TING-CHANG CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MEHTOD OF FABRICATING THE SAME
- Publication number 20240136441
- Publication date Apr 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ken-Ichi Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20240088294
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shahaji B. MORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20230411322
- Publication date Dec 21, 2023
- KIOXIA Corporation
- Hiroaki ASHIDATE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING EPITAXIAL SOURCE/DRAIN FEATURES USING A SELF-ALI...
- Publication number 20230395433
- Publication date Dec 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yao-Sheng Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20230378357
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shahaji B. MORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PREPARING TWO-DIMENSIONAL BLACK PHOSPHORUS
- Publication number 20230357953
- Publication date Nov 9, 2023
- The Hong Kong Polytechnic University
- Jianhua HAO
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD FOR MANUFACTURING TELLURIUM-BASED SEMICONDUCTOR DEVICE, TELL...
- Publication number 20230352596
- Publication date Nov 2, 2023
- IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
- Jae Kyeong JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Masking Layer with Post Treatment
- Publication number 20230335406
- Publication date Oct 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Ju Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR HIGH-VOLTAGE TRANSISTOR
- Publication number 20230261108
- Publication date Aug 17, 2023
- United Microelectronics Corp.
- Chun-Ya Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE OF A FIN FIELD EFFECT TRANSISTOR (FINFET)
- Publication number 20230246091
- Publication date Aug 3, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Yang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SILICON-PHOSPHOROUS MATERIALS
- Publication number 20230243068
- Publication date Aug 3, 2023
- Applied Materials, Inc.
- Errol Antonio C Sanchez
- C30 - CRYSTAL GROWTH
Information Patent Application
PULSED PLASMA (DC/RF) DEPOSITION OF HIGH QUALITY C FILMS FOR PATTER...
- Publication number 20230220551
- Publication date Jul 13, 2023
- Applied Materials, Inc.
- Eswaranand VENKATASUBRAMANIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPLEX OF HETEROGENEOUS TWO-DIMENSIONAL MATERIALS AND METHOD OF MA...
- Publication number 20230197837
- Publication date Jun 22, 2023
- Samsung Electronics Co., Ltd.
- Minsu SEOL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TWO-DIMENSIONAL MATERIAL STRUCTURE, SEMICONDUCTOR DEVICE INCLUDING...
- Publication number 20230112883
- Publication date Apr 13, 2023
- Samsung Electronics Co., Ltd.
- Minsu SEOL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIELD EFFECT TRANSISTOR, ELECTRONIC APPARATUS INCLUDING THE SAME, A...
- Publication number 20230103876
- Publication date Apr 6, 2023
- Samsung Electronics Co., Ltd.
- Minseok YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF ITO THIN FILM BASED ON SOLUTION METHOD
- Publication number 20230094245
- Publication date Mar 30, 2023
- WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Jia LI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SYNTHESIS AND USE OF PRECURSORS FOR ALD OF GROUP VA ELEMENT CONTAIN...
- Publication number 20230093384
- Publication date Mar 23, 2023
- ASM IP HOLDING B.V.
- Viljami Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE
- Publication number 20230091153
- Publication date Mar 23, 2023
- UNITED MICROELECTRONICS CORP.
- Chia-Wei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjusting the Profile of Source/Drain Regions to Reduce Leakage
- Publication number 20230028591
- Publication date Jan 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsz-Mei Kwok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION OF SELECTED MOLECULAR CLUSTERS
- Publication number 20230018529
- Publication date Jan 19, 2023
- STMicroelectronics, Inc.
- John H. Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
A METHOD OF PRODUCING A TWO-DIMENSIONAL MATERIAL
- Publication number 20220399201
- Publication date Dec 15, 2022
- Paragraf Ltd.
- Simon Charles Stewart THOMAS
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20220384653
- Publication date Dec 1, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Epitaxial Layers In Source/Drain Contacts And Methods Of Forming Th...
- Publication number 20220359310
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ding-Kang Shih
- C30 - CRYSTAL GROWTH

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Black phosphorus-two dimensional material complex and method of man...

Devices having a semiconductor material that is semimetal in bulk a...

Nitride semiconductor structure, nitride semiconductor device, and...

Methods and devices for fabricating and assembling printable semico...

Semiconductor device and manufacturing method thereof

Template-assisted synthesis of 2D nanosheets using nanoparticle tem...

Field effect transistor and method of manufacturing the same

Semiconductor devices

Methods for preparing a monolayer or few-layer crystalline black ph...

Method for forming semiconductor device

Method of manufacturing a semiconductor device and a semiconductor...

Method of producing a two-dimensional material

Method of manufacturing a semiconductor device and a semiconductor...

Semiconductor device and fabricating method thereof

Method for forming epitaxial source/drain features using a self-ali...

Semiconductor device and method of manufacture

Masking layer with post treatment

Atomic layer deposition of selected molecular clusters

Structure of high-voltage transistor and method for fabricating the...

Integrated assemblies and methods of forming integrated assemblies

Passivated nanoparticles

Method for forming silicon-phosphorous materials

Process and manufacture of low-dimensional materials supporting bot...

Structure of a fin field effect transistor (FinFET)

Pulsed plasma (DC/RF) deposition of high quality C films for patter...

Self-aligned short-channel electronic devices and fabrication metho...

Semiconductor device and fabrication method thereof

Synthesis and use of precursors for ALD of group VA element contain...

Composition and method for making picocrystalline artificial borane...

Leakage-free implantation-free ETSOI transistors

Patents Applicationslast 30 patents

METHODS FOR DEPOSITING A MOLYBDENUM METAL FILM ON A DIELECTRIC SURF...

Devices Having a Semiconductor Material That Is Semimetal in Bulk a...

SEMICONDUCTOR LAYER INCLUDING Sn BASED PEROVSKITE INCLUDING CHLORID...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

METHOD AND SYSTEM FOR DEPOSITING BORON CARBON NITRIDE

FIELD EFFECT TRANSISTOR AND METHOD OF MANUFACTURING THE SAME

P-GAN HIGH-ELECTRON-MOBILITY TRANSISTOR

SEMICONDUCTOR DEVICE AND MEHTOD OF FABRICATING THE SAME

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METHOD FOR FORMING EPITAXIAL SOURCE/DRAIN FEATURES USING A SELF-ALI...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

METHODS FOR PREPARING TWO-DIMENSIONAL BLACK PHOSPHORUS

METHOD FOR MANUFACTURING TELLURIUM-BASED SEMICONDUCTOR DEVICE, TELL...

Masking Layer with Post Treatment

MANUFACTURING METHOD FOR HIGH-VOLTAGE TRANSISTOR

STRUCTURE OF A FIN FIELD EFFECT TRANSISTOR (FINFET)

METHOD FOR FORMING SILICON-PHOSPHOROUS MATERIALS

PULSED PLASMA (DC/RF) DEPOSITION OF HIGH QUALITY C FILMS FOR PATTER...

COMPLEX OF HETEROGENEOUS TWO-DIMENSIONAL MATERIALS AND METHOD OF MA...

TWO-DIMENSIONAL MATERIAL STRUCTURE, SEMICONDUCTOR DEVICE INCLUDING...

FIELD EFFECT TRANSISTOR, ELECTRONIC APPARATUS INCLUDING THE SAME, A...

MANUFACTURING METHOD OF ITO THIN FILM BASED ON SOLUTION METHOD

SYNTHESIS AND USE OF PRECURSORS FOR ALD OF GROUP VA ELEMENT CONTAIN...

METHOD FOR FORMING SEMICONDUCTOR DEVICE

Adjusting the Profile of Source/Drain Regions to Reduce Leakage

ATOMIC LAYER DEPOSITION OF SELECTED MOLECULAR CLUSTERS

A METHOD OF PRODUCING A TWO-DIMENSIONAL MATERIAL

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

Epitaxial Layers In Source/Drain Contacts And Methods Of Forming Th...