Means for avoiding or neutralising unwanted electrical charges on tube components

Industry

CPC
H01J37/026

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/026Means for avoiding or neutralising unwanted electrical charges on tube components

Industries

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Patents Grantslast 30 patents

Information Patent Grant
System for inspecting and grounding a mask in a charged particle sy...
- Patent number 12,142,451
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Tianming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus, ion implantation apparatus, and ion i...
- Patent number 11,961,695
- Issue date Apr 16, 2024
- Semes Co., Ltd.
- Doyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems including pulsed dual-beam charge neutralization
- Patent number 11,915,901
- Issue date Feb 27, 2024
- ULVAC-PHI, INCORPORATED
- Scott R. Bryan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for reducing the charging effect in a transmissio...
- Patent number 11,715,618
- Issue date Aug 1, 2023
- FEI Company
- Yuchen Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 11,662,323
- Issue date May 30, 2023
- ASML Netherlands B.V.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reentrant gas system for charged particle microscope
- Patent number 11,651,928
- Issue date May 16, 2023
- James B McGinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing apparatus and drawing method
- Patent number 11,556,114
- Issue date Jan 17, 2023
- NuFlare Technology, Inc.
- Hikaru Yamamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing apparatus and control method thereof
- Patent number 11,352,694
- Issue date Jun 7, 2022
- NuFlare Technology, Inc.
- Satoshi Nakahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Calibrating method and calibrating system
- Patent number 11,289,303
- Issue date Mar 29, 2022
- Industrial Technology Research Institute
- Yen-Cheng Chen
- G01 - MEASURING TESTING
Information Patent Grant
Methods and devices for examining an electrically charged specimen...
- Patent number 11,170,970
- Issue date Nov 9, 2021
- Carl Zeiss SMT GmbH
- Michael Budach
- G01 - MEASURING TESTING
Information Patent Grant
Biased cover ring for a substrate processing system
- Patent number 11,049,701
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Adolph Miller Allen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of controlling an implanter operating in plasma immersion
- Patent number 10,923,325
- Issue date Feb 16, 2021
- Ion Beam Services
- Frank Gilbert Torregrosa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged-particle beam device
- Patent number 10,903,036
- Issue date Jan 26, 2021
- HITACHI HIGH-TECH CORPORATION
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,872,742
- Issue date Dec 22, 2020
- HITACHI HIGH-TECH CORPORATION
- Takafumi Miwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low work function electron beam filament assembly
- Patent number 10,796,876
- Issue date Oct 6, 2020
- Colorado State University Research Foundation
- Bao Gia Nguyen
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Charged-particle beam device
- Patent number 10,790,111
- Issue date Sep 29, 2020
- HITACHI HIGH-TECH CORPORATION
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam irradiation apparatus, charged particle beam...
- Patent number 10,790,110
- Issue date Sep 29, 2020
- NUFLARE TECHNOLOGY, INC.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 10,775,325
- Issue date Sep 15, 2020
- ASML Netherlands B.V.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 10,770,257
- Issue date Sep 8, 2020
- ASM IP Holding B.V.
- Yuko Kengoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement method, method of removing static electricity, and plas...
- Patent number 10,755,957
- Issue date Aug 25, 2020
- Tokyo Electron Limited
- Masanori Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment apparatus using plasma
- Patent number 10,692,686
- Issue date Jun 23, 2020
- JEHARA CORPORATION
- Hongseub Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite beam apparatus
- Patent number 10,636,615
- Issue date Apr 28, 2020
- Hitachi High-Tech Science Corporation
- Tatsuya Asahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 10,586,681
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of operating a charged particle beam specimen inspection system
- Patent number 10,522,327
- Issue date Dec 31, 2019
- Applied Materials Israel Ltd.
- Gilad Erel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature electrolysis glow discharge method
- Patent number 10,395,892
- Issue date Aug 27, 2019
- Foret Plasma Labs, LLC
- Todd Foret
- F22 - STEAM GENERATION
Information Patent Grant
Conductive contact point pin and charged particle beam apparatus
- Patent number 10,373,793
- Issue date Aug 6, 2019
- NUFLARE TECHNOLOGY, INC.
- Michihiro Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite beam apparatus
- Patent number 10,204,759
- Issue date Feb 12, 2019
- Hitachi High-Tech Science Corporation
- Tatsuya Asahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for discharging an area that is scanned by an electron beam
- Patent number 10,153,126
- Issue date Dec 11, 2018
- Applied Materials Israel Ltd.
- Alex Goldenshtein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and devices for charge compensation
- Patent number 10,115,558
- Issue date Oct 30, 2018
- Carl Zeiss Microscopy GmbH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus configured for enhanced vacuum ultraviolet (VUV) spectral...
- Patent number 10,109,451
- Issue date Oct 23, 2018
- Applied Materials, Inc.
- Georg Jost
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COMPENSATION RASTER SCANNING
- Publication number 20240395492
- Publication date Nov 28, 2024
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20240321543
- Publication date Sep 26, 2024
- Hitachi High-Tech Corporation
- Hideyuki Kotsuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISCHARGING AN ELECTROSTATIC CHUCK LOCATED WITHIN A VACUUM CHAMBER
- Publication number 20240234078
- Publication date Jul 11, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Adam Faust
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM IRRADIATION DEVICE
- Publication number 20240186099
- Publication date Jun 6, 2024
- NHV CORPORATION
- Tomonori SHIRAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILAMENT ALIGNMENT DEVICE
- Publication number 20240153740
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Sangwoo Seon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR NON-INVASIVE SEMICONDUCTOR TECHNIQUE FOR M...
- Publication number 20240071710
- Publication date Feb 29, 2024
- FemtoMetrix, Inc.
- Timothy M. Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20240062986
- Publication date Feb 22, 2024
- Hitachi High-Tech Corporation
- Naho TERAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND RELATED SYSTEM AND C...
- Publication number 20240047175
- Publication date Feb 8, 2024
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOOD COLUMN AND CHARGED PARTICLE APPARATUS
- Publication number 20240006147
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Christiaan OTTEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20230411108
- Publication date Dec 21, 2023
- HITACHI HIGH-TECH CORPORATION
- Hideyuki Kotsuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS AND METHOD OF MANUFACTURE
- Publication number 20230326705
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Company Limited
- Chansyun David YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS INCLUDING PULSED DUAL-BEAM CHARGE NEUTRALIZATION
- Publication number 20230245848
- Publication date Aug 3, 2023
- ULVAC-PHI, INCORPORATED
- Scott R. Bryan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR REDUCING THE CHARGING EFFECT IN A TRANSMISSIO...
- Publication number 20230040558
- Publication date Feb 9, 2023
- FEI Company
- Yuchen Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reentrant Gas System for Charged Particle Microscope
- Publication number 20230005697
- Publication date Jan 5, 2023
- FEI Company
- James B MCGINN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR INSPECTING AND GROUNDING A MASK IN A CHARGED PARTICLE SY...
- Publication number 20230005698
- Publication date Jan 5, 2023
- ASML NETHERLANDS B.V.
- Tianming CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION
- Publication number 20220375712
- Publication date Nov 24, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20220359149
- Publication date Nov 10, 2022
- HITACHI HIGH-TECH CORPORATION
- Makoto SAKAKIBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM MANIPULATION OF ADVANCED CHARGE CONTROLLER MODULE IN A CHARGED...
- Publication number 20220351932
- Publication date Nov 3, 2022
- ASML NETHERLANDS B.V.
- Jian ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR VOLTAGE CONTRAST IMAGING WITH A CORPUSCULAR MULTI-BEAM M...
- Publication number 20220254600
- Publication date Aug 11, 2022
- Carl Zeiss MultiSEM GmbH
- Gregor Frank Dellemann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS, ION IMPLANTATION APPARATUS, AND ION I...
- Publication number 20220059309
- Publication date Feb 24, 2022
- SEMES CO., LTD.
- DOYEON KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINATED COMPOSITIONS FOR ION SOURCE PERFORMANCE IMPROVEMENTS IN...
- Publication number 20220044908
- Publication date Feb 10, 2022
- Entegris, Inc.
- Barry Lewis CHAMBERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CALIBRATING METHOD AND CALIBRATING SYSTEM
- Publication number 20210225607
- Publication date Jul 22, 2021
- Industrial Technology Research Institute
- Yen-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
- Publication number 20210172891
- Publication date Jun 10, 2021
- ASML NETHERLANDS B.V.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION METHOD AND INSPECTION APPARATUS
- Publication number 20210043417
- Publication date Feb 11, 2021
- Kioxia Corporation
- Osamu NAGANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged-Particle Beam Device
- Publication number 20200395188
- Publication date Dec 17, 2020
- HITACHI HIGH-TECH CORPORATION
- Seiichiro KANNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20200251305
- Publication date Aug 6, 2020
- ASML NETHERLANDS B.V.
- Zhongwei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE VALVE
- Publication number 20200027686
- Publication date Jan 23, 2020
- EBARA CORPORATION
- Tsutomu KARIMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20200027685
- Publication date Jan 23, 2020
- ASM IP HOLDING B.V.
- Yuko KENGOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20200006032
- Publication date Jan 2, 2020
- Hitachi High-Technologies Corporation
- Takafumi MIWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged-Particle Beam Device
- Publication number 20190355541
- Publication date Nov 21, 2019
- Hitachi High-Technologies Corporation
- Seiichiro KANNO
- H01 - BASIC ELECTRIC ELEMENTS

Means for avoiding or neutralising unwanted electrical charges on tube components

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

System for inspecting and grounding a mask in a charged particle sy...

Substrate treating apparatus, ion implantation apparatus, and ion i...

Methods and systems including pulsed dual-beam charge neutralization

System and method for reducing the charging effect in a transmissio...

Method and system for inspecting an EUV mask

Reentrant gas system for charged particle microscope

Drawing apparatus and drawing method

Drawing apparatus and control method thereof

Calibrating method and calibrating system

Methods and devices for examining an electrically charged specimen...

Biased cover ring for a substrate processing system

Method of controlling an implanter operating in plasma immersion

Charged-particle beam device

Charged particle beam device

Low work function electron beam filament assembly

Charged-particle beam device

Charged particle beam irradiation apparatus, charged particle beam...

Method and system for inspecting an EUV mask

Substrate processing method

Measurement method, method of removing static electricity, and plas...

Surface treatment apparatus using plasma

Composite beam apparatus

Charged particle beam apparatus

Method of operating a charged particle beam specimen inspection system

High temperature electrolysis glow discharge method

Conductive contact point pin and charged particle beam apparatus

Composite beam apparatus

System for discharging an area that is scanned by an electron beam

Methods and devices for charge compensation

Apparatus configured for enhanced vacuum ultraviolet (VUV) spectral...

Patents Applicationslast 30 patents

COMPENSATION RASTER SCANNING

Charged Particle Beam Device

DISCHARGING AN ELECTROSTATIC CHUCK LOCATED WITHIN A VACUUM CHAMBER

ELECTRON BEAM IRRADIATION DEVICE

FILAMENT ALIGNMENT DEVICE

METHOD AND APPARATUS FOR NON-INVASIVE SEMICONDUCTOR TECHNIQUE FOR M...

Charged Particle Beam Device

METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND RELATED SYSTEM AND C...

FLOOD COLUMN AND CHARGED PARTICLE APPARATUS

CHARGED PARTICLE BEAM DEVICE

PROCESSING APPARATUS AND METHOD OF MANUFACTURE

METHODS AND SYSTEMS INCLUDING PULSED DUAL-BEAM CHARGE NEUTRALIZATION

SYSTEM AND METHOD FOR REDUCING THE CHARGING EFFECT IN A TRANSMISSIO...

Reentrant Gas System for Charged Particle Microscope

SYSTEM FOR INSPECTING AND GROUNDING A MASK IN A CHARGED PARTICLE SY...

SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION

CHARGED PARTICLE BEAM DEVICE

BEAM MANIPULATION OF ADVANCED CHARGE CONTROLLER MODULE IN A CHARGED...

METHOD FOR VOLTAGE CONTRAST IMAGING WITH A CORPUSCULAR MULTI-BEAM M...

SUBSTRATE TREATING APPARATUS, ION IMPLANTATION APPARATUS, AND ION I...

FLUORINATED COMPOSITIONS FOR ION SOURCE PERFORMANCE IMPROVEMENTS IN...

CALIBRATING METHOD AND CALIBRATING SYSTEM

METHOD AND SYSTEM FOR INSPECTING AN EUV MASK

INSPECTION METHOD AND INSPECTION APPARATUS

Charged-Particle Beam Device

CHARGED PARTICLE BEAM APPARATUS

GATE VALVE

SUBSTRATE PROCESSING METHOD

CHARGED PARTICLE BEAM DEVICE

Charged-Particle Beam Device