Means for controlling power transmitted to the plasma

Industry

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H01J37/32266

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32266Means for controlling power transmitted to the plasma

Industries

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and method for using plasma processing...
- Patent number 12,165,845
- Issue date Dec 10, 2024
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Shogo Okita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method using radio frequency and micro...
- Patent number 12,131,887
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed-plasma deposition of thin film layers
- Patent number 12,131,903
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Khokan Chandra Paul
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,046,453
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of low temperature thin film deposition and in-si...
- Patent number 12,018,374
- Issue date Jun 25, 2024
- DSGI Technologies, Inc.
- Jeffrey Edward Kowalski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,002,655
- Issue date Jun 4, 2024
- HITACHI HIGH-TECH CORPORATION
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,948,776
- Issue date Apr 2, 2024
- HITACHI HIGH-TECH CORPORATION
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method using radio frequency (RF) and...
- Patent number 11,887,815
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,887,817
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,842,886
- Issue date Dec 12, 2023
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply device and output method of high-freque...
- Patent number 11,769,651
- Issue date Sep 26, 2023
- Daihen Corporation
- Katsuyuki Fukano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave source with local lorentz force
- Patent number 11,721,532
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Modular microwave source with embedded ground surface
- Patent number 11,670,489
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,658,011
- Issue date May 23, 2023
- HITACHI HIGH-TECH CORPORATION
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma processing
- Patent number 11,646,178
- Issue date May 9, 2023
- Tokyo Electron Limited
- Yuji Onuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Array antenna and plasma processing apparatus
- Patent number 11,476,088
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing apparatus
- Patent number 11,387,075
- Issue date Jul 12, 2022
- Oxford Instruments Nanotechnology Tools, Ltd.
- Michael Cooke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-electrode/multi-modal atmospheric pressure glow discharge pla...
- Patent number 11,366,066
- Issue date Jun 21, 2022
- Battelle Memorial Institute
- David W. Koppenaal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave applicator with solid-state generator power source
- Patent number 11,222,770
- Issue date Jan 11, 2022
- MKS Instruments, Inc.
- Mohammad Kamarehi
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,217,430
- Issue date Jan 4, 2022
- Tokyo Electron Limited
- Masaki Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Elementary device for producing a plasma, having a coaxial applicator
- Patent number 11,120,972
- Issue date Sep 14, 2021
- SAIREM SOCIETE POUR L'APPLICATION INDUSTRIELLE DE LA RECHERCHE EN ELECTRONIQU...
- Louis Latrasse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reactor system coupled to an energy emitter control circuit
- Patent number 11,107,662
- Issue date Aug 31, 2021
- LytEn, Inc.
- Michael W. Stowell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave source with embedded ground surface
- Patent number 11,049,694
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave source with local Lorentz force
- Patent number 11,037,764
- Issue date Jun 15, 2021
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave output device and plasma processing device
- Patent number 11,031,213
- Issue date Jun 8, 2021
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma source
- Patent number 10,923,324
- Issue date Feb 16, 2021
- Verity Instruments, Inc.
- Mark A. Meloni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for determining film thickness using DC self-bi...
- Patent number 10,876,209
- Issue date Dec 29, 2020
- Novellus Systems, Inc.
- Edward J. Augustyniak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 10,879,045
- Issue date Dec 29, 2020
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma device
- Patent number 10,796,916
- Issue date Oct 6, 2020
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave applicator with solid-state generator power source
- Patent number 10,790,118
- Issue date Sep 29, 2020
- MKS Instruments, Inc.
- Mohammad Kamarehi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTRIC FIELD UNIFORMITY ON DISTRIBUTED ELECTRODE
- Publication number 20240404792
- Publication date Dec 5, 2024
- ASM IP HOLDING B.V.
- Jordan Alexander THIMOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240170259
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Hiroshi KONDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240145218
- Publication date May 2, 2024
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20240006161
- Publication date Jan 4, 2024
- ASM IP HOLDING B.V.
- HaeIn Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230352273
- Publication date Nov 2, 2023
- Hitachi High-Tech Corporation
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-port Phase Compensation Nested Microwave-plasma Apparatus for...
- Publication number 20230260756
- Publication date Aug 17, 2023
- Hangzhou Dianzi University
- Jie Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR USING PLASMA PROCESSING...
- Publication number 20230170186
- Publication date Jun 1, 2023
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Shogo OKITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230135618
- Publication date May 4, 2023
- TOKYO ELECTRON LIMITED
- Hiroshi HIROSE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220344132
- Publication date Oct 27, 2022
- Hitachi High-Tech Corporation
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing System And Method Using Radio Frequency And Micro...
- Publication number 20220246402
- Publication date Aug 4, 2022
- TOKYO ELECTRON LIMITED
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE SUPPLY MECHANISM, PLASMA TREATMENT APPARATUS, AND PLASMA...
- Publication number 20220223380
- Publication date Jul 14, 2022
- Tokyo Electron Limited
- Makoto ISHITSUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Plasma Etching
- Publication number 20220208550
- Publication date Jun 30, 2022
- SPTS TECHNOLOGIES LIMITED
- Weikang Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA JET SOLID ABLATION-BASED DIRECT ANALYSIS APPARATUS
- Publication number 20220208522
- Publication date Jun 30, 2022
- CHENGDU ALIEBN SCIENCE AND TECHNOLOGY CO., LTD
- Yanting YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK HEATER RESISTANCE MEASUREMENT TO APPROXIMATE TE...
- Publication number 20220172925
- Publication date Jun 2, 2022
- LAM RESEARCH CORPORATION
- Changyou Jing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for improving service life of magnetron
- Publication number 20220136098
- Publication date May 5, 2022
- Sichuan University
- Kama Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM FOR GROWTH OF ONE OR MORE CRYSTALLINE MATERIALS
- Publication number 20220084793
- Publication date Mar 17, 2022
- Sigma Carbon Technologies
- Tarun Sharda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED-PLASMA DEPOSITION OF THIN FILM LAYERS
- Publication number 20220044930
- Publication date Feb 10, 2022
- Applied Materials, Inc.
- Khokan Chandra Paul
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE
- Publication number 20210313153
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE SOURCE WITH LOCAL LORENTZ FORCE
- Publication number 20210287882
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ARRAY ANTENNA AND PLASMA PROCESSING APPARATUS
- Publication number 20210225612
- Publication date Jul 22, 2021
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210111003
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- B08 - CLEANING
Information Patent Application
High-Frequency Power Supply Device and Output Method of High-Freque...
- Publication number 20210098237
- Publication date Apr 1, 2021
- DAIHEN Corporation
- Katsuyuki Fukano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE
- Publication number 20210098236
- Publication date Apr 1, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REACTOR SYSTEM COUPLED TO AN ENERGY EMITTER CONTROL CIRCUIT
- Publication number 20210057191
- Publication date Feb 25, 2021
- Lyten, Inc.
- Michael W. Stowell
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
MICROWAVE APPLICATOR WITH SOLID-STATE GENERATOR POWER SOURCE
- Publication number 20210005430
- Publication date Jan 7, 2021
- MKS Instruments, Inc.
- Mohammad Kamarehi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC AND IRREGULAR SHAPED PLASMAS USING MODULAR MICROWAVE SOURCES
- Publication number 20200402769
- Publication date Dec 24, 2020
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE PROCESSING APPARATUS
- Publication number 20200321192
- Publication date Oct 8, 2020
- Oxford Instruments Nanotechnology Tools Limited
- Michael Cooke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200161092
- Publication date May 21, 2020
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200144028
- Publication date May 7, 2020
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200135430
- Publication date Apr 30, 2020
- TOKYO ELECTRON LIMITED
- Masaki INOUE
- H01 - BASIC ELECTRIC ELEMENTS

Means for controlling power transmitted to the plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and method for using plasma processing...

Plasma processing system and method using radio frequency and micro...

Pulsed-plasma deposition of thin film layers

Plasma processing apparatus

System and method of low temperature thin film deposition and in-si...

Plasma processing apparatus

Plasma processing apparatus

Plasma processing system and method using radio frequency (RF) and...

Plasma processing apparatus and plasma processing method

Plasma processing method and plasma processing apparatus

High-frequency power supply device and output method of high-freque...

Modular microwave source with local lorentz force

Modular microwave source with embedded ground surface

Plasma processing apparatus

Apparatus for plasma processing

Array antenna and plasma processing apparatus

Surface processing apparatus

Multi-electrode/multi-modal atmospheric pressure glow discharge pla...

Microwave applicator with solid-state generator power source

Plasma processing apparatus and plasma processing method

Elementary device for producing a plasma, having a coaxial applicator

Reactor system coupled to an energy emitter control circuit

Modular microwave source with embedded ground surface

Modular microwave source with local Lorentz force

Microwave output device and plasma processing device

Microwave plasma source

Systems and methods for determining film thickness using DC self-bi...

Plasma processing apparatus

Microwave plasma device

Microwave applicator with solid-state generator power source

Patents Applicationslast 30 patents

ELECTRIC FIELD UNIFORMITY ON DISTRIBUTED ELECTRODE

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

PLASMA PROCESSING APPARATUS

Multi-port Phase Compensation Nested Microwave-plasma Apparatus for...

PLASMA PROCESSING APPARATUS AND METHOD FOR USING PLASMA PROCESSING...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

Plasma Processing System And Method Using Radio Frequency And Micro...

MICROWAVE SUPPLY MECHANISM, PLASMA TREATMENT APPARATUS, AND PLASMA...

Method and Apparatus for Plasma Etching

PLASMA JET SOLID ABLATION-BASED DIRECT ANALYSIS APPARATUS

ELECTROSTATIC CHUCK HEATER RESISTANCE MEASUREMENT TO APPROXIMATE TE...

Method for improving service life of magnetron

SYSTEM FOR GROWTH OF ONE OR MORE CRYSTALLINE MATERIALS

PULSED-PLASMA DEPOSITION OF THIN FILM LAYERS

MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE

MODULAR MICROWAVE SOURCE WITH LOCAL LORENTZ FORCE

ARRAY ANTENNA AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

High-Frequency Power Supply Device and Output Method of High-Freque...

MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE

REACTOR SYSTEM COUPLED TO AN ENERGY EMITTER CONTROL CIRCUIT

MICROWAVE APPLICATOR WITH SOLID-STATE GENERATOR POWER SOURCE

SYMMETRIC AND IRREGULAR SHAPED PLASMAS USING MODULAR MICROWAVE SOURCES

SURFACE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD