Means for deflecting or directing discharge

Industry

CPC
H01J2237/15

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/15Means for deflecting or directing discharge

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,211,669
- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas jet deflection in pressurized systems
- Patent number 12,209,579
- Issue date Jan 28, 2025
- SHINE Technologies, LLC
- Arne V. Kobernik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 12,205,790
- Issue date Jan 21, 2025
- HITACHI HIGH-TECH CORPORATION
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Permeance magnetic assembly
- Patent number 12,198,910
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Jen Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods of determining aberrations in images obtained b...
- Patent number 12,183,540
- Issue date Dec 31, 2024
- ASML Netherlands B.V.
- Yifeng Shao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, device and system for reducing off-axial aberration in elec...
- Patent number 12,176,179
- Issue date Dec 24, 2024
- FEI Company
- Maarten Bischoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 12,176,187
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam angle adjustment in an ion implantation system
- Patent number 12,170,182
- Issue date Dec 17, 2024
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle microscope device and method for adjusting field-o...
- Patent number 12,170,183
- Issue date Dec 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Mitsutoshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transmission electron microscope and inspection method using transm...
- Patent number 12,170,184
- Issue date Dec 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Toshie Yaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for scanning a sample using multi-beam inspection...
- Patent number 12,165,837
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Martinus Gerardus Maria Johannes Maassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,165,830
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Shichen Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of image-forming multi-electron beams
- Patent number 12,165,831
- Issue date Dec 10, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling exhaust gas pressure of a plasma reactor for plasma sta...
- Patent number 12,159,768
- Issue date Dec 3, 2024
- Recarbon, Inc.
- George Stephen Leonard
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Automated ion-beam alignment for dual-beam instrument
- Patent number 12,154,757
- Issue date Nov 26, 2024
- FEI Company
- Jeremy Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam pattern device having beam absorber structure
- Patent number 12,154,756
- Issue date Nov 26, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanism for adjusting angle of incidence on charged particle beam...
- Patent number 12,119,202
- Issue date Oct 15, 2024
- HITACHI HIGH-TECH CORPORATION
- Shunichi Motomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to correct first order astigmatism and first order distortio...
- Patent number 12,106,933
- Issue date Oct 1, 2024
- FEI Company
- Jan Stopka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulation of rolling k vectors of angled gratings
- Patent number 12,106,935
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,087,541
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple charged-particle beams
- Patent number 12,080,515
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam deflection device, aberration corrector, monochromator, and ch...
- Patent number 12,062,519
- Issue date Aug 13, 2024
- HITACHI HIGH-TECH CORPORATION
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for aligning a multi-beam system
- Patent number 12,057,287
- Issue date Aug 6, 2024
- Jan Stopka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam device and inspection method
- Patent number 12,057,288
- Issue date Aug 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas jet deflection in pressurized systems
- Patent number 12,049,883
- Issue date Jul 30, 2024
- SHINE Technologies, LLC
- Arne V. Kobernik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stationary intraoral tomosynthesis imaging systems, methods, and co...
- Patent number 12,016,716
- Issue date Jun 25, 2024
- Surround Medical Systems, Inc.
- Jianping Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical system for monitoring plasma reactions and reactors
- Patent number 12,014,900
- Issue date Jun 18, 2024
- Recarbon, Inc.
- Curtis Peter Tom
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Measurement and correction of optical aberrations in charged partic...
- Patent number 11,990,315
- Issue date May 21, 2024
- FEI Company
- Erik Franken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,984,295
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grid structures of ion beam etching (IBE) systems
- Patent number 11,961,706
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun David Yang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION
- Publication number 20250037961
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Martin Frans, Pierre SMEETS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20250014855
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A PARTICLE BEAM MICROSCOPE
- Publication number 20250006455
- Publication date Jan 2, 2025
- CARL ZEISS MICROSCOPY GMBH
- Bjoern Gamm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DETERMINING A DISTORTION-CORRECTED POSITION OF A FEATURE...
- Publication number 20250006459
- Publication date Jan 2, 2025
- Carl Zeiss MultiSEM GmbH
- Daniel Weiss
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MICROSCOPE ABERRATION CORRECTION
- Publication number 20250006457
- Publication date Jan 2, 2025
- FEI Company
- Maurits Diephuis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE GAS GENERATION APPARATUS
- Publication number 20240429028
- Publication date Dec 26, 2024
- TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- Kensuke WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM POSITION DETECTION AND REPOSITIONING
- Publication number 20240429017
- Publication date Dec 26, 2024
- KLA Corporation
- Henning Stoschus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EDGE RING TILT FOR EDGE OF WAFER SKEW COMPENSATION
- Publication number 20240429089
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Peter MURAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20240420915
- Publication date Dec 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Mihiro TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING DEVICE AND CONTROL OF THE SAME
- Publication number 20240412407
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Junghee Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
AUTOFOCUS METHOD FOR SINGLE BEAM AND MULTI-BEAM SYSTEMS
- Publication number 20240412944
- Publication date Dec 12, 2024
- KLA Corporation
- Weijie Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS
- Publication number 20240395495
- Publication date Nov 28, 2024
- UChicago Argonne, LLC
- Brahim Mustapha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETERMINING AN ENERGY SPECTRUM OR ENERGY WIDTH OF A CHARG...
- Publication number 20240371600
- Publication date Nov 7, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPOLE ELEMENT, IMAGE ERROR CORRECTOR AND PARTICLE BEAM SYSTEM
- Publication number 20240371597
- Publication date Nov 7, 2024
- CARL ZEISS MICROSCOPY GMBH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTOR, A CHARGED PARTICLE BEAM APPARATUS, A METHOD O...
- Publication number 20240355576
- Publication date Oct 24, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Florian Lampersberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS
- Publication number 20240355577
- Publication date Oct 24, 2024
- Eldico Scientific AG
- Gunther STEINFELD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR ELECTRON ENERGY LOSS SPECTROSCOPY AT HIGH ENERGY
- Publication number 20240347314
- Publication date Oct 17, 2024
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20240321545
- Publication date Sep 26, 2024
- Kabushiki Kaisha Toshiba
- Hiroko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Determining Focal Properties in a Target Beam Field of a...
- Publication number 20240304415
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS JET DEFLECTION IN PRESSURIZED SYSTEMS
- Publication number 20240295213
- Publication date Sep 5, 2024
- SHINE Technologies, LLC
- Arne V. Kobernik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE OPTICS, CHARGED PARTICLE BEAM APPARATUS, AND METHO...
- Publication number 20240290571
- Publication date Aug 29, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Benjamin Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...
- Publication number 20240282547
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEM Orientation Mapping via Dark-Field Vector Images
- Publication number 20240272097
- Publication date Aug 15, 2024
- Virginia Commonwealth University
- Carl R. Mayer
- G01 - MEASURING TESTING
Information Patent Application
Electron Microscope, Aberration Correction Method, And Imaging Method
- Publication number 20240274402
- Publication date Aug 15, 2024
- JEOL Ltd.
- Motofumi Saitoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...
- Publication number 20240274396
- Publication date Aug 15, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GLOBAL AND LOCAL OPTIMIZATION OF IMAGING RESOLUTION IN A...
- Publication number 20240274398
- Publication date Aug 15, 2024
- Carl Zeiss MultiSEM GmbH
- Christof Riedesel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING IMPROVEMENT
- Publication number 20240266146
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Christopher S. OLSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRO...
- Publication number 20240258065
- Publication date Aug 1, 2024
- CARL ZEISS MICROSCOPY GMBH
- Dirk Preikszas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20240249912
- Publication date Jul 25, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Microscope
- Publication number 20240242923
- Publication date Jul 18, 2024
- Hitachi High-Tech Corporation
- Michiko SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS

Means for deflecting or directing discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multiple charged-particle beam apparatus with low crosstalk

Gas jet deflection in pressurized systems

Charged particle beam device

Permeance magnetic assembly

Systems and methods of determining aberrations in images obtained b...

Method, device and system for reducing off-axial aberration in elec...

Cleaning method and plasma processing apparatus

Ribbon beam angle adjustment in an ion implantation system

Charged particle microscope device and method for adjusting field-o...

Transmission electron microscope and inspection method using transm...

System and method for scanning a sample using multi-beam inspection...

Multiple charged-particle beam apparatus with low crosstalk

Method and system of image-forming multi-electron beams

Controlling exhaust gas pressure of a plasma reactor for plasma sta...

Automated ion-beam alignment for dual-beam instrument

Beam pattern device having beam absorber structure

Mechanism for adjusting angle of incidence on charged particle beam...

Method to correct first order astigmatism and first order distortio...

Modulation of rolling k vectors of angled gratings

Apparatus of plural charged-particle beams

Apparatus for multiple charged-particle beams

Beam deflection device, aberration corrector, monochromator, and ch...

Methods and systems for aligning a multi-beam system

Charged particle beam device and inspection method

Gas jet deflection in pressurized systems

Stationary intraoral tomosynthesis imaging systems, methods, and co...

Optical system for monitoring plasma reactions and reactors

Measurement and correction of optical aberrations in charged partic...

Charged particle assessment tool, inspection method

Grid structures of ion beam etching (IBE) systems

Patents Applicationslast 30 patents

BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION

CHARGED PARTICLE APPARATUS AND METHOD

METHOD FOR OPERATING A PARTICLE BEAM MICROSCOPE

METHOD FOR DETERMINING A DISTORTION-CORRECTED POSITION OF A FEATURE...

MICROSCOPE ABERRATION CORRECTION

ACTIVE GAS GENERATION APPARATUS

ELECTRON BEAM POSITION DETECTION AND REPOSITIONING

ADJUSTABLE EDGE RING TILT FOR EDGE OF WAFER SKEW COMPENSATION

CHARGED PARTICLE BEAM DEVICE

SEMICONDUCTOR MANUFACTURING DEVICE AND CONTROL OF THE SAME

AUTOFOCUS METHOD FOR SINGLE BEAM AND MULTI-BEAM SYSTEMS

COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS

METHOD OF DETERMINING AN ENERGY SPECTRUM OR ENERGY WIDTH OF A CHARG...

MULTIPOLE ELEMENT, IMAGE ERROR CORRECTOR AND PARTICLE BEAM SYSTEM

ABERRATION CORRECTOR, A CHARGED PARTICLE BEAM APPARATUS, A METHOD O...

CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS

TECHNIQUES FOR ELECTRON ENERGY LOSS SPECTROSCOPY AT HIGH ENERGY

SEMICONDUCTOR DEVICE

Method for Determining Focal Properties in a Target Beam Field of a...

GAS JET DEFLECTION IN PRESSURIZED SYSTEMS

CHARGED PARTICLE OPTICS, CHARGED PARTICLE BEAM APPARATUS, AND METHO...

MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...

TEM Orientation Mapping via Dark-Field Vector Images

Electron Microscope, Aberration Correction Method, And Imaging Method

METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...

METHOD OF GLOBAL AND LOCAL OPTIMIZATION OF IMAGING RESOLUTION IN A...

PLASMA PROCESSING IMPROVEMENT

METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRO...

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

Electron Microscope