Means for deflecting or directing discharge

Industry

CPC
H01J2237/15

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/15Means for deflecting or directing discharge

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Simple spherical aberration corrector for SEM
- Patent number 12,362,132
- Issue date Jul 15, 2025
- FEI Company
- Alexander Henstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for automatic zone axis alignment
- Patent number 12,362,135
- Issue date Jul 15, 2025
- FEI Company
- John J. Flanagan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 12,354,826
- Issue date Jul 8, 2025
- HITACHI HIGH-TECH CORPORATION
- Tomonori Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 12,347,642
- Issue date Jul 1, 2025
- TASMIT, INC.
- Naoya Saitoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,347,654
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Hwajun Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device, and method for controlling charged pa...
- Patent number 12,340,970
- Issue date Jun 24, 2025
- HITACHI HIGH-TECH CORPORATION
- Shingo Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and aberration correction method
- Patent number 12,327,708
- Issue date Jun 10, 2025
- HITACHI HIGH-TECH CORPORATION
- Shingo Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-electron beam inspection apparatus, multipole array control m...
- Patent number 12,308,202
- Issue date May 20, 2025
- NuFlare Technology, Inc.
- Yuichi Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of determining aberrations of a charged particle beam, and...
- Patent number 12,308,203
- Issue date May 20, 2025
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Dominik Ehberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam device having a deflection unit
- Patent number 12,288,664
- Issue date Apr 29, 2025
- Carl Zeiss Microscopy GmbH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample display method
- Patent number 12,288,665
- Issue date Apr 29, 2025
- TESCAN BRNO s.r.o
- Jiri Dluhos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for alignment of secondary beams in multi-beam in...
- Patent number 12,278,081
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Qingpo Xi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system and control method therefor
- Patent number 12,261,013
- Issue date Mar 25, 2025
- Jeol Ltd.
- Takeshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron detection device and scanning electron microscope
- Patent number 12,261,016
- Issue date Mar 25, 2025
- CIQTEK CO., LTD.
- Da Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and method of correcting aberration
- Patent number 12,255,041
- Issue date Mar 18, 2025
- Jeol Ltd.
- Keito Aibara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam particle beam system and method for operating same
- Patent number 12,255,040
- Issue date Mar 18, 2025
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system for azimuthal deflection of individual particl...
- Patent number 12,249,478
- Issue date Mar 11, 2025
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun and system and method using electron gun
- Patent number 12,237,140
- Issue date Feb 25, 2025
- Ralf Edinger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,237,143
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of local control of a charged particle beam
- Patent number 12,230,469
- Issue date Feb 18, 2025
- ASML Netherlands B.V.
- Albertus Victor Gerardus Mangnus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for chromatic aberration mitigation
- Patent number 12,217,929
- Issue date Feb 4, 2025
- ASML Netherlands B.V.
- Yan Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,211,669
- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas jet deflection in pressurized systems
- Patent number 12,209,579
- Issue date Jan 28, 2025
- SHINE Technologies, LLC
- Arne V. Kobernik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 12,205,790
- Issue date Jan 21, 2025
- HITACHI HIGH-TECH CORPORATION
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Permeance magnetic assembly
- Patent number 12,198,910
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Jen Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods of determining aberrations in images obtained b...
- Patent number 12,183,540
- Issue date Dec 31, 2024
- ASML Netherlands B.V.
- Yifeng Shao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, device and system for reducing off-axial aberration in elec...
- Patent number 12,176,179
- Issue date Dec 24, 2024
- FEI Company
- Maarten Bischoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 12,176,187
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam angle adjustment in an ion implantation system
- Patent number 12,170,182
- Issue date Dec 17, 2024
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle microscope device and method for adjusting field-o...
- Patent number 12,170,183
- Issue date Dec 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Mitsutoshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20250232945
- Publication date Jul 17, 2025
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPOLE LENS AND CHARGED PARTICLE BEAM DEVICE
- Publication number 20250232944
- Publication date Jul 17, 2025
- HITACHI HIGH-TECH CORPORATION
- Shun KIZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam System
- Publication number 20250232947
- Publication date Jul 17, 2025
- Hitachi High-Tech Corporation
- Naoto ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE CONFIGURATIONS AND MAGNET CONFIGURATIONS FOR PROCESSING C...
- Publication number 20250210319
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM FOR A PLURALITY OF PRIMARY BEAMLETS, CHARGED PARTICL...
- Publication number 20250191874
- Publication date Jun 12, 2025
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR AUTOMATIC FOCUSING AND ASTIGMATISM CORRECTION FOR AN ELE...
- Publication number 20250174427
- Publication date May 29, 2025
- Max-Planck-Gesellschaft zur Forderung der Wissenschaften e.V.
- Jörgen KORNFELD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEFLECTOR FOR A CHARGED PARTICLE BEAM APPARATUS, DEFLECTING SYSTEM,...
- Publication number 20250166958
- Publication date May 22, 2025
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Pavel Adamec
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A PARTICLE BEAM APPARATUS, COMPUTER PROGRAM PR...
- Publication number 20250157782
- Publication date May 15, 2025
- CARL ZEISS MICROSCOPY GMBH
- Bjoern Gamm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE-BEAM IMAGE ACQUISITION APPARATUS AND MULTIPLE-BEAM IMAGE A...
- Publication number 20250149290
- Publication date May 8, 2025
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED...
- Publication number 20250140521
- Publication date May 1, 2025
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM CHARGED PARTICLE MICROSCOPE DESIGN WITH MIRROR FOR FIELD...
- Publication number 20250132124
- Publication date Apr 24, 2025
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS, MULTI-ELECTRON BEA...
- Publication number 20250132119
- Publication date Apr 24, 2025
- NuFlare Technology, Inc.
- Kazuhiko INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20250132123
- Publication date Apr 24, 2025
- Hitachi High-Tech Corporation
- Hiroyuki YAMAMOTO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CORRECTION OF OPTICAL ABERRATIONS IN CHARGED PARTICLE BEAM MICROSCOPY
- Publication number 20250125116
- Publication date Apr 17, 2025
- FEI Company
- Erik Franken
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
GAS JET DEFLECTION IN PRESSURIZED SYSTEMS
- Publication number 20250116264
- Publication date Apr 10, 2025
- SHINE Technologies, LLC
- Arne V. Kobernik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTION SYSTEMS AND CHARGED PARTICLE MICROSCOPE SYSTE...
- Publication number 20250112018
- Publication date Apr 3, 2025
- FEI Company
- Alexander Henstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPOLE ELEMENTS AND CHARGED PARTICLE MICROSCOPE SYSTEMS INCLUDIN...
- Publication number 20250112019
- Publication date Apr 3, 2025
- FEI Company
- Alexander Henstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20250112023
- Publication date Apr 3, 2025
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PERMEANCE MAGNETIC ASSEMBLY
- Publication number 20250112032
- Publication date Apr 3, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Tsung-Jen YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH ENERGY IMPLANTER WITH SMALL FOOTPRINT
- Publication number 20250104965
- Publication date Mar 27, 2025
- Axcelis Technologies, Inc.
- Wilhelm Platow
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AUTOMATED REGION SELECTION FOR AUTO SWEEP
- Publication number 20250095159
- Publication date Mar 20, 2025
- FEI Company
- Umesh ADIGA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ELECTRON BEAM APPARATUS, FOIL OR GRID LENS, AND METHOD OF OPERATING...
- Publication number 20250087442
- Publication date Mar 13, 2025
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING ALIGNMENT APPARATUS
- Publication number 20250087464
- Publication date Mar 13, 2025
- Samsung Electronics Co., LTD
- Jaehyun SOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shape-based proximity effect correction method for throughput, patt...
- Publication number 20250079115
- Publication date Mar 6, 2025
- National Taipei University
- Chun-Hung LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RIBBON BEAM ANGLE ADJUSTMENT IN AN ION IMPLANTATION SYSTEM
- Publication number 20250062097
- Publication date Feb 20, 2025
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Zhimin WAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR DYNAMIC ABERRATION CORRECTION
- Publication number 20250062098
- Publication date Feb 20, 2025
- KLA Corporation
- Xiaoxue Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON GUN AND SYSTEM AND METHOD USING ELECTRON GUN
- Publication number 20250054720
- Publication date Feb 13, 2025
- Ralf Edinger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE OPTICAL DEVICE AND METHOD
- Publication number 20250046570
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Petrus Wilhelmus SMORENBURG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION
- Publication number 20250037961
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Martin Frans, Pierre SMEETS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20250014855
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS

Means for deflecting or directing discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Simple spherical aberration corrector for SEM

Method and system for automatic zone axis alignment

Charged particle beam apparatus

Scanning electron microscope

Plasma processing apparatus

Charged particle beam device, and method for controlling charged pa...

Charged particle beam device and aberration correction method

Multi-electron beam inspection apparatus, multipole array control m...

Methods of determining aberrations of a charged particle beam, and...

Particle beam device having a deflection unit

Sample display method

System and method for alignment of secondary beams in multi-beam in...

Charged particle beam system and control method therefor

Electron detection device and scanning electron microscope

Electron microscope and method of correcting aberration

Multi-beam particle beam system and method for operating same

Particle beam system for azimuthal deflection of individual particl...

Electron gun and system and method using electron gun

Apparatus of plural charged-particle beams

Apparatus for and method of local control of a charged particle beam

Systems and methods for chromatic aberration mitigation

Multiple charged-particle beam apparatus with low crosstalk

Gas jet deflection in pressurized systems

Charged particle beam device

Permeance magnetic assembly

Systems and methods of determining aberrations in images obtained b...

Method, device and system for reducing off-axial aberration in elec...

Cleaning method and plasma processing apparatus

Ribbon beam angle adjustment in an ion implantation system

Charged particle microscope device and method for adjusting field-o...

Patents Applicationslast 30 patents

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

MULTIPOLE LENS AND CHARGED PARTICLE BEAM DEVICE

Charged Particle Beam System

ELECTRODE CONFIGURATIONS AND MAGNET CONFIGURATIONS FOR PROCESSING C...

OPTICAL SYSTEM FOR A PLURALITY OF PRIMARY BEAMLETS, CHARGED PARTICL...

METHOD FOR AUTOMATIC FOCUSING AND ASTIGMATISM CORRECTION FOR AN ELE...

DEFLECTOR FOR A CHARGED PARTICLE BEAM APPARATUS, DEFLECTING SYSTEM,...

METHOD FOR OPERATING A PARTICLE BEAM APPARATUS, COMPUTER PROGRAM PR...

MULTIPLE-BEAM IMAGE ACQUISITION APPARATUS AND MULTIPLE-BEAM IMAGE A...

MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED...

MULTI-BEAM CHARGED PARTICLE MICROSCOPE DESIGN WITH MIRROR FOR FIELD...

MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS, MULTI-ELECTRON BEA...

Charged Particle Beam Device

CORRECTION OF OPTICAL ABERRATIONS IN CHARGED PARTICLE BEAM MICROSCOPY

GAS JET DEFLECTION IN PRESSURIZED SYSTEMS

ABERRATION CORRECTION SYSTEMS AND CHARGED PARTICLE MICROSCOPE SYSTE...

MULTIPOLE ELEMENTS AND CHARGED PARTICLE MICROSCOPE SYSTEMS INCLUDIN...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

PERMEANCE MAGNETIC ASSEMBLY

HIGH ENERGY IMPLANTER WITH SMALL FOOTPRINT

AUTOMATED REGION SELECTION FOR AUTO SWEEP

ELECTRON BEAM APPARATUS, FOIL OR GRID LENS, AND METHOD OF OPERATING...

FOCUS RING ALIGNMENT APPARATUS

Shape-based proximity effect correction method for throughput, patt...

RIBBON BEAM ANGLE ADJUSTMENT IN AN ION IMPLANTATION SYSTEM

SYSTEM AND METHOD FOR DYNAMIC ABERRATION CORRECTION

ELECTRON GUN AND SYSTEM AND METHOD USING ELECTRON GUN

CHARGED PARTICLE OPTICAL DEVICE AND METHOD

BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION

CHARGED PARTICLE APPARATUS AND METHOD