Means for preventing sputtering of the vessel

Industry

CPC
H01J37/32504

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32504Means for preventing sputtering of the vessel

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Composite structure and semiconductor manufacturing apparatus inclu...
- Patent number 12,112,924
- Issue date Oct 8, 2024
- Toto Ltd.
- Hiroaki Ashizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 12,100,578
- Issue date Sep 24, 2024
- Tokyo Electron Limited
- Sho Kumakura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing system including coil with RF powered faraday...
- Patent number 12,087,557
- Issue date Sep 10, 2024
- Lam Research Corporation
- Shen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for preventing contamination of self-plasma chamber
- Patent number 11,990,320
- Issue date May 21, 2024
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus
- Patent number 11,955,367
- Issue date Apr 9, 2024
- SHIBAURA MECHATRONICS CORPORATION
- Shohei Tanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 11,923,178
- Issue date Mar 5, 2024
- ULVAC, Inc.
- Koji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for reducing sputtering of a grounded shield...
- Patent number 11,915,917
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Alan Ritchie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for reducing defects in preclean chambers
- Patent number 11,881,385
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- Yueh Sheng Ow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 11,869,748
- Issue date Jan 9, 2024
- Kokusai Electric Corporation
- Takeshi Yasui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,869,750
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Yusuke Hayasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for extending a lifetime of an ion source for mol...
- Patent number 11,756,772
- Issue date Sep 12, 2023
- Axcelis Technologies, Inc.
- David Sporleder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment for high-temperature cleans
- Patent number 11,699,577
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injection process kit to eliminate arcing and improve uniform g...
- Patent number 11,600,477
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Kirankumar Neelasandra Savandaiah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method
- Patent number 11,488,813
- Issue date Nov 1, 2022
- Tokyo Electron Limited
- Satoshi Itoh
- B08 - CLEANING
Information Patent Grant
Methods of reducing particles in a physical vapor deposition (PVD)...
- Patent number 11,450,514
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Wei Dou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating for chamber particle reduction
- Patent number 11,251,024
- Issue date Feb 15, 2022
- Applied Materials, Inc.
- Hsin-wei Tseng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactor, system including the reactor, and methods of manufacturing...
- Patent number 11,114,283
- Issue date Sep 7, 2021
- ASM IP Holding B.V.
- Tom Blomberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Texturizing a surface without bead blasting
- Patent number 10,857,625
- Issue date Dec 8, 2020
- Applied Materials, Inc.
- Gang Peng
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods and apparatus for reducing sputtering of a grounded shield...
- Patent number 10,692,706
- Issue date Jun 23, 2020
- Applied Materials, Inc.
- Alan Ritchie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for surface preparation prior to epitaxial dep...
- Patent number 10,544,519
- Issue date Jan 28, 2020
- Aixtron SE
- Stephen Edward Savas
- C30 - CRYSTAL GROWTH
Information Patent Grant
One-piece process kit shield
- Patent number 10,546,733
- Issue date Jan 28, 2020
- Applied Materials, Inc.
- Kirankumar Savandaiah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Texturizing a surface without bead blasting
- Patent number 10,434,604
- Issue date Oct 8, 2019
- Applied Materials, Inc.
- Gang Peng
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Minimization of ring erosion during plasma processes
- Patent number 10,109,464
- Issue date Oct 23, 2018
- Applied Materials, Inc.
- Olivier Joubert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method
- Patent number 9,818,582
- Issue date Nov 14, 2017
- Tokyo Electron Limited
- Hiraku Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal split faraday shield for a plasma source
- Patent number 9,818,584
- Issue date Nov 14, 2017
- FEI Company
- Thomas G. Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,607,874
- Issue date Mar 28, 2017
- Hitachi High-Technologies Corporation
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus and method of manufacturing electronic device
- Patent number 9,322,092
- Issue date Apr 26, 2016
- Canon Anelva Corporation
- Nobuo Yamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing apparatus comprising a solid solution cera...
- Patent number 9,051,219
- Issue date Jun 9, 2015
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,960,124
- Issue date Feb 24, 2015
- Mitsubishi Heavy Industries, Ltd.
- Ryuichi Matsuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,926,790
- Issue date Jan 6, 2015
- Hitachi High-Technologies Corporation
- Tsutomu Tetsuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER
- Publication number 20240258077
- Publication date Aug 1, 2024
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD...
- Publication number 20240186128
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Alan RITCHIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND COMPONENT FOR SEMICONDUCT...
- Publication number 20230420226
- Publication date Dec 28, 2023
- TOKYO ELECTRON LIMITED
- Naoyuki SATOH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS INJECTION PROCESS KIT TO ELIMINATE ARCING AND IMPROVE UNIFORM G...
- Publication number 20230187191
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- Kirankumar Neelasandra SAVANDAIAH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT FOR HIGH-TEMPERATURE CLEANS
- Publication number 20220384161
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Sarah Michelle Bobek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF REDUCING PARTICLES IN A PHYSICAL VAPOR DEPOSITION (PVD)...
- Publication number 20220301828
- Publication date Sep 22, 2022
- Wei DOU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20220199371
- Publication date Jun 23, 2022
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EROSION RESISTANT METAL FLUORIDE COATINGS, METHODS OF PREPARATION A...
- Publication number 20220181124
- Publication date Jun 9, 2022
- Applied Materials, Inc.
- Ren-Guan Duan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REACTOR, SYSTEM INCLUDING THE REACTOR, AND METHODS OF MANUFACTURING...
- Publication number 20210358721
- Publication date Nov 18, 2021
- ASM IP HOLDING B.V.
- Tom Blomberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE STRUCTURE AND SEMICONDUCTOR MANUFACTURING APPARATUS INCLU...
- Publication number 20210343511
- Publication date Nov 4, 2021
- TOTO LTD.
- Hiroaki ASHIZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum Processing Apparatus
- Publication number 20210319985
- Publication date Oct 14, 2021
- Ulvac, Inc.
- Koji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210272779
- Publication date Sep 2, 2021
- TOKYO ELECTRON LIMITED
- Yusuke HAYASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD
- Publication number 20210249240
- Publication date Aug 12, 2021
- TOKYO ELECTRON LIMITED
- Satoshi ITOH
- B08 - CLEANING
Information Patent Application
Components and Processes for Managing Plasma Process Byproduct Mate...
- Publication number 20210225616
- Publication date Jul 22, 2021
- LAM RESEARCH CORPORATION
- Gordon Wen-Yin Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL RF FOR CONTROLLABLE FILM DEPOSITION
- Publication number 20210159048
- Publication date May 27, 2021
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEXTURIZING A SURFACE WITHOUT BEAD BLASTING
- Publication number 20210046587
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Gang PENG
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
COATING FOR CHAMBER PARTICLE REDUCTION
- Publication number 20210043429
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Hsin-wei TSENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM INCLUDING COIL WITH RF POWERED FARADAY...
- Publication number 20200411297
- Publication date Dec 31, 2020
- LAM RESEARCH CORPORATION
- Shen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus and Method of Manufacturing Semicond...
- Publication number 20200402774
- Publication date Dec 24, 2020
- Kokusai Electric Corporation
- Takeshi YASUI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR EXTENDING A LIFETIME OF AN ION SOURCE FOR MOL...
- Publication number 20200388468
- Publication date Dec 10, 2020
- Axcelis Technologies, Inc.
- David Sporleder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD...
- Publication number 20200312640
- Publication date Oct 1, 2020
- Applied Materials, Inc.
- Alan RITCHIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER
- Publication number 20200273676
- Publication date Aug 27, 2020
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING DEVICE AND METHOD OF FORMING PIEZOELECTRIC FILM
- Publication number 20200066494
- Publication date Feb 27, 2020
- FUJIFILM CORPORATION
- Naoki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEXTURIZING A SURFACE WITHOUT BEAD BLASTING
- Publication number 20190358746
- Publication date Nov 28, 2019
- Applied Materials, Inc.
- Gang PENG
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
REACTOR, SYSTEM INCLUDING THE REACTOR, AND METHODS OF MANUFACTURING...
- Publication number 20190287769
- Publication date Sep 19, 2019
- ASM IP HOLDING B.V.
- Tom Blomberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING, PLASMA APPARATUS AND VOLTAGE-ADJUSTING METHOD USING THE...
- Publication number 20190131114
- Publication date May 2, 2019
- Industrial Technology Research Institute
- CHIA-HAO CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SURFACE PREPARATION PRIOR TO EPITAXIAL DEP...
- Publication number 20190062947
- Publication date Feb 28, 2019
- AIXTRON SE
- Stephen Edward Savas
- C30 - CRYSTAL GROWTH
Information Patent Application
MINIMIZATION OF RING EROSION DURING PLASMA PROCESSES
- Publication number 20190043697
- Publication date Feb 7, 2019
- Applied Materials, Inc.
- Olivier JOUBERT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEXTURIZING A SURFACE WITHOUT BEAD BLASTING
- Publication number 20180257172
- Publication date Sep 13, 2018
- Applied Materials, Inc.
- Gang PENG
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
TEXTURIZING A SURFACE WITHOUT BEAD BLAST
- Publication number 20180104767
- Publication date Apr 19, 2018
- Applied Materials, Inc.
- Gang PENG
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Means for preventing sputtering of the vessel

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Composite structure and semiconductor manufacturing apparatus inclu...

Substrate processing method

Substrate processing system including coil with RF powered faraday...

Apparatus for preventing contamination of self-plasma chamber

Film formation apparatus

Vacuum processing apparatus

Methods and apparatus for reducing sputtering of a grounded shield...

Methods and apparatus for reducing defects in preclean chambers

Substrate processing apparatus and method of manufacturing semicond...

Plasma processing apparatus

System and method for extending a lifetime of an ion source for mol...

Treatment for high-temperature cleans

Gas injection process kit to eliminate arcing and improve uniform g...

Cleaning method

Methods of reducing particles in a physical vapor deposition (PVD)...

Coating for chamber particle reduction

Reactor, system including the reactor, and methods of manufacturing...

Texturizing a surface without bead blasting

Methods and apparatus for reducing sputtering of a grounded shield...

Method and apparatus for surface preparation prior to epitaxial dep...

One-piece process kit shield

Texturizing a surface without bead blasting

Minimization of ring erosion during plasma processes

Plasma processing method

Internal split faraday shield for a plasma source

Plasma processing apparatus

Sputtering apparatus and method of manufacturing electronic device

Semiconductor processing apparatus comprising a solid solution cera...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Patents Applicationslast 30 patents

APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER

METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD...

SEMICONDUCTOR MANUFACTURING APPARATUS AND COMPONENT FOR SEMICONDUCT...

GAS INJECTION PROCESS KIT TO ELIMINATE ARCING AND IMPROVE UNIFORM G...

TREATMENT FOR HIGH-TEMPERATURE CLEANS

METHODS OF REDUCING PARTICLES IN A PHYSICAL VAPOR DEPOSITION (PVD)...

SUBSTRATE PROCESSING METHOD

EROSION RESISTANT METAL FLUORIDE COATINGS, METHODS OF PREPARATION A...

REACTOR, SYSTEM INCLUDING THE REACTOR, AND METHODS OF MANUFACTURING...

COMPOSITE STRUCTURE AND SEMICONDUCTOR MANUFACTURING APPARATUS INCLU...

Vacuum Processing Apparatus

PLASMA PROCESSING APPARATUS

CLEANING METHOD

Components and Processes for Managing Plasma Process Byproduct Mate...

DUAL RF FOR CONTROLLABLE FILM DEPOSITION

TEXTURIZING A SURFACE WITHOUT BEAD BLASTING

COATING FOR CHAMBER PARTICLE REDUCTION

SUBSTRATE PROCESSING SYSTEM INCLUDING COIL WITH RF POWERED FARADAY...

Substrate Processing Apparatus and Method of Manufacturing Semicond...

SYSTEM AND METHOD FOR EXTENDING A LIFETIME OF AN ION SOURCE FOR MOL...

METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD...

APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER

FILM FORMING DEVICE AND METHOD OF FORMING PIEZOELECTRIC FILM

TEXTURIZING A SURFACE WITHOUT BEAD BLASTING

REACTOR, SYSTEM INCLUDING THE REACTOR, AND METHODS OF MANUFACTURING...

FOCUS RING, PLASMA APPARATUS AND VOLTAGE-ADJUSTING METHOD USING THE...

METHOD AND APPARATUS FOR SURFACE PREPARATION PRIOR TO EPITAXIAL DEP...

MINIMIZATION OF RING EROSION DURING PLASMA PROCESSES

TEXTURIZING A SURFACE WITHOUT BEAD BLASTING

TEXTURIZING A SURFACE WITHOUT BEAD BLAST