Means for trapping or directing unwanted particles

Industry

CPC
H01J37/32871

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32871Means for trapping or directing unwanted particles

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 12,094,697
- Issue date Sep 17, 2024
- Tokyo Electron Limited
- Toshimasa Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-stage pumping liner
- Patent number 12,068,144
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Mingle Tong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-patterned sputter traps and methods of making
- Patent number 12,051,573
- Issue date Jul 30, 2024
- Honeywell International Inc.
- James L. Koch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single process volume to perform high-pressure and low-pressure pro...
- Patent number 12,012,652
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Kelvin Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 11,972,934
- Issue date Apr 30, 2024
- Kokusai Electric Corporation
- Tomoki Imamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma flood gun for charged particle apparatus
- Patent number 11,830,705
- Issue date Nov 28, 2023
- Ximan Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,756,774
- Issue date Sep 12, 2023
- Tokyo Electron Limited
- Toshimasa Kobayashi
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Ion filter using aperture plate with plurality of zones
- Patent number 11,747,494
- Issue date Sep 5, 2023
- Plasma-Therm LLC
- Leslie Michael Lea
- G01 - MEASURING TESTING
Information Patent Grant
Plasma flood gun for charged particle apparatus
- Patent number 11,735,398
- Issue date Aug 22, 2023
- Ximan Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber configurations and processes for particle control
- Patent number 11,670,492
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Fei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filter for a plasma plume
- Patent number 11,628,389
- Issue date Apr 18, 2023
- Lam Research Corporation
- Jan Matthijn Dekkers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 11,594,399
- Issue date Feb 28, 2023
- Tokyo Electron Limited
- Shinsuke Oka
- B08 - CLEANING
Information Patent Grant
3D printed chamber components configured for lower film stress and...
- Patent number 11,569,069
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Kadthala R. Narendrnath
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Transparent halo assembly for reduced particle generation
- Patent number 11,424,112
- Issue date Aug 23, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Ernest E. Allen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,355,322
- Issue date Jun 7, 2022
- HITACHI HIGH-TECH CORPORATION
- Taku Iwase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching chamber with etching by-product redistributor
- Patent number 11,239,060
- Issue date Feb 1, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-patterned sputter traps and methods of making
- Patent number 11,183,373
- Issue date Nov 23, 2021
- Honeywell International Inc.
- James L. Koch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 11,152,196
- Issue date Oct 19, 2021
- Tokyo Electron Limited
- Shin Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,139,152
- Issue date Oct 5, 2021
- PSK INC.
- Hung Sheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for co-sputtering multiple targets
- Patent number 11,101,117
- Issue date Aug 24, 2021
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal contamination reduction in substrate processing systems with...
- Patent number 11,056,321
- Issue date Jul 6, 2021
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling an implanter operating in plasma immersion
- Patent number 10,923,325
- Issue date Feb 16, 2021
- Ion Beam Services
- Frank Gilbert Torregrosa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to filter macro particles in a cathodic arc physical vapor d...
- Patent number 10,811,235
- Issue date Oct 20, 2020
- ARGOR ALJBA SA
- Sergey Ukhanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Energy-efficient plasma processes of generating free charges, ozone...
- Patent number 10,784,084
- Issue date Sep 22, 2020
- Seongsik Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D printed chamber components configured for lower film stress and...
- Patent number 10,777,391
- Issue date Sep 15, 2020
- Applied Materials, Inc.
- Kadthala R. Narendrnath
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Apparatus and methods for reducing particles in semiconductor proce...
- Patent number 10,770,269
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Andrew Nguyen
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Process kit shield for improved particle reduction
- Patent number 10,718,049
- Issue date Jul 21, 2020
- Applied Materials, Inc.
- Muhammad Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle generation preventing method and vacuum apparatus
- Patent number 10,643,825
- Issue date May 5, 2020
- Tokyo Electron Limited
- Takashi Tetsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for high temperature clean
- Patent number 10,612,135
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- Sanjeev Baluja
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Macroparticle filter device and method for use in cathodic arc depo...
- Patent number 10,604,835
- Issue date Mar 31, 2020
- OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Juergen Ramm
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS WITH IMPROVED PRODUCTION YIELD
- Publication number 20240384404
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jia-Wei XU
- B08 - CLEANING
Information Patent Application
METHODS AND APPARATUS FOR GENERATING ATMOSPHERIC PRESSURE, LOW TEMP...
- Publication number 20240066161
- Publication date Feb 29, 2024
- TellaPure, LLC
- Edgar Bryan Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230386804
- Publication date Nov 30, 2023
- TOKYO ELECTRON LIMITED
- Toshimasa KOBAYASHI
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
ION BEAM ETCHING CHAMBER WITH ETCHING BY-PRODUCT REDISTRIBUTOR
- Publication number 20230369024
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER CONFIGURATIONS AND PROCESSES FOR PARTICLE CONTROL
- Publication number 20230298870
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Fei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATING DEVICE AND PROCESS EXECUTING APPARATUS INCLUDING...
- Publication number 20230245861
- Publication date Aug 3, 2023
- NP Holdings Co., Ltd.
- Dai Kyu CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND PARTICLE REMOVAL METHOD
- Publication number 20230245871
- Publication date Aug 3, 2023
- TOKYO ELECTRON LIMITED
- Hiroshi NAGAIKE
- B08 - CLEANING
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20230060617
- Publication date Mar 2, 2023
- Creative Coatings Co., Ltd.
- Eiji SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA GENERATION DEVICE COMPRISING POROUS CERAMIC DIELECTRIC
- Publication number 20220406570
- Publication date Dec 22, 2022
- KOREA INSTITUTE OF MATERIALS SCIENCE
- Seung-hoon LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS WITH IMPROVED PRODUCTION YIELD
- Publication number 20220333236
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jia-Wei XU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION BEAM ETCHING CHAMBER WITH ETCHING BY-PRODUCT REDISTRIBUTOR
- Publication number 20220148856
- Publication date May 12, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER CONFIGURATIONS AND PROCESSES FOR PARTICLE CONTROL
- Publication number 20220122823
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Fei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA FLOOD GUN FOR CHARGED PARTICLE APPARATUS
- Publication number 20220059326
- Publication date Feb 24, 2022
- PIE Scientific LLC
- Ximan Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PATTERNED SPUTTER TRAPS AND METHODS OF MAKING
- Publication number 20220044918
- Publication date Feb 10, 2022
- Honeywell International Inc.
- James L. Koch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20210407774
- Publication date Dec 30, 2021
- Kokusai Electric Corporation
- Tomoki IMAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRAP APPARATUS AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210384017
- Publication date Dec 9, 2021
- TOKYO ELECTRON LIMITED
- Takaaki NEZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL CONTAMINATION REDUCTION IN SUBSTRATE PROCESSING SYSTEMS WITH...
- Publication number 20210327689
- Publication date Oct 21, 2021
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D PRINTED CHAMBER COMPONENTS CONFIGURED FOR LOWER FILM STRESS AND...
- Publication number 20200365374
- Publication date Nov 19, 2020
- Applied Materials, Inc.
- Kadthala R. NARENDRNATH
- B22 - CASTING POWDER METALLURGY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200350147
- Publication date Nov 5, 2020
- PSK INC.
- HUNG SHENG WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION FILTER USING APERTURE PLATE WITH PLURALITY OF ZONES
- Publication number 20200319356
- Publication date Oct 8, 2020
- Plasma-Therm LLC
- Leslie Michael Lea
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL CONTAMINATION REDUCTION IN SUBSTRATE PROCESSING SYSTEMS WITH...
- Publication number 20200219708
- Publication date Jul 9, 2020
- LAM RESEARCH CORPORATION
- Maolin LONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER COMPONENT AND METHOD OF FORMING A SURFACE TEXTURE
- Publication number 20200176225
- Publication date Jun 4, 2020
- Cleanpart Group GmbH
- Olivier Marchand
- B22 - CASTING POWDER METALLURGY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200152432
- Publication date May 14, 2020
- TOKYO ELECTRON LIMITED
- Masato KON
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
TEMPERATURE CONTROL SYSTEMS AND METHODS FOR REMOVING METAL OXIDE FILMS
- Publication number 20190385828
- Publication date Dec 19, 2019
- LAM RESEARCH CORPORATION
- Akhil N. Singhal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SINGLE PROCESS VOLUME TO PERFORM HIGH-PRESSURE AND LOW-PRESSURE PRO...
- Publication number 20190352774
- Publication date Nov 21, 2019
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIFFUSIVE PLASMA AIR TREATMENT AND MATERIAL PROCESSING
- Publication number 20190287763
- Publication date Sep 19, 2019
- Alphatech International Limited
- Herman Yik Wai TSUI
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
CLEANING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190259578
- Publication date Aug 22, 2019
- TOKYO ELECTRON LIMITED
- Shinsuke OKA
- B08 - CLEANING
Information Patent Application
ENERGY-EFFICIENT PLASMA PROCESSES OF GENERATING FREE CHARGES, OZONE...
- Publication number 20190237301
- Publication date Aug 1, 2019
- Seongsik Chang
- C01 - INORGANIC CHEMISTRY
Information Patent Application
MULTI-PATTERNED SPUTTER TRAPS AND METHODS OF MAKING
- Publication number 20190108988
- Publication date Apr 11, 2019
- HONEYWELL INTERNATIONAL INC.
- James L. Koch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CLEANING PLASMA PROCESSING APPARATUS
- Publication number 20180330930
- Publication date Nov 15, 2018
- TOKYO ELECTRON LIMITED
- Hiraku MURAKAMI
- B08 - CLEANING

Means for trapping or directing unwanted particles

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus

Multi-stage pumping liner

Multi-patterned sputter traps and methods of making

Single process volume to perform high-pressure and low-pressure pro...

Method of manufacturing semiconductor device, substrate processing...

Plasma flood gun for charged particle apparatus

Plasma processing apparatus

Ion filter using aperture plate with plurality of zones

Plasma flood gun for charged particle apparatus

Chamber configurations and processes for particle control

Filter for a plasma plume

Cleaning method and plasma processing apparatus

3D printed chamber components configured for lower film stress and...

Transparent halo assembly for reduced particle generation

Plasma processing apparatus and plasma processing method

Ion beam etching chamber with etching by-product redistributor

Multi-patterned sputter traps and methods of making

Substrate processing apparatus

Substrate processing apparatus

Methods and apparatus for co-sputtering multiple targets

Metal contamination reduction in substrate processing systems with...

Method of controlling an implanter operating in plasma immersion

Method to filter macro particles in a cathodic arc physical vapor d...

Energy-efficient plasma processes of generating free charges, ozone...

3D printed chamber components configured for lower film stress and...

Apparatus and methods for reducing particles in semiconductor proce...

Process kit shield for improved particle reduction

Particle generation preventing method and vacuum apparatus

Method and system for high temperature clean

Macroparticle filter device and method for use in cathodic arc depo...

Patents Applicationslast 30 patents

SEMICONDUCTOR MANUFACTURING APPARATUS WITH IMPROVED PRODUCTION YIELD

METHODS AND APPARATUS FOR GENERATING ATMOSPHERIC PRESSURE, LOW TEMP...

PLASMA PROCESSING APPARATUS

ION BEAM ETCHING CHAMBER WITH ETCHING BY-PRODUCT REDISTRIBUTOR

CHAMBER CONFIGURATIONS AND PROCESSES FOR PARTICLE CONTROL

PLASMA GENERATING DEVICE AND PROCESS EXECUTING APPARATUS INCLUDING...

SUBSTRATE PROCESSING SYSTEM AND PARTICLE REMOVAL METHOD

FILM FORMING APPARATUS

PLASMA GENERATION DEVICE COMPRISING POROUS CERAMIC DIELECTRIC

SEMICONDUCTOR MANUFACTURING APPARATUS WITH IMPROVED PRODUCTION YIELD

ION BEAM ETCHING CHAMBER WITH ETCHING BY-PRODUCT REDISTRIBUTOR

CHAMBER CONFIGURATIONS AND PROCESSES FOR PARTICLE CONTROL

PLASMA FLOOD GUN FOR CHARGED PARTICLE APPARATUS

MULTI-PATTERNED SPUTTER TRAPS AND METHODS OF MAKING

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

TRAP APPARATUS AND SUBSTRATE PROCESSING APPARATUS

METAL CONTAMINATION REDUCTION IN SUBSTRATE PROCESSING SYSTEMS WITH...

3D PRINTED CHAMBER COMPONENTS CONFIGURED FOR LOWER FILM STRESS AND...

SUBSTRATE PROCESSING APPARATUS

ION FILTER USING APERTURE PLATE WITH PLURALITY OF ZONES

METAL CONTAMINATION REDUCTION IN SUBSTRATE PROCESSING SYSTEMS WITH...

PROCESS CHAMBER COMPONENT AND METHOD OF FORMING A SURFACE TEXTURE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

TEMPERATURE CONTROL SYSTEMS AND METHODS FOR REMOVING METAL OXIDE FILMS

SINGLE PROCESS VOLUME TO PERFORM HIGH-PRESSURE AND LOW-PRESSURE PRO...

DIFFUSIVE PLASMA AIR TREATMENT AND MATERIAL PROCESSING

CLEANING METHOD AND PLASMA PROCESSING APPARATUS

ENERGY-EFFICIENT PLASMA PROCESSES OF GENERATING FREE CHARGES, OZONE...

MULTI-PATTERNED SPUTTER TRAPS AND METHODS OF MAKING

METHOD OF CLEANING PLASMA PROCESSING APPARATUS