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Plasma processing apparatus
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Patent number 11,756,774
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Issue date Sep 12, 2023
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Tokyo Electron Limited
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Toshimasa Kobayashi
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B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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Filter for a plasma plume
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Patent number 11,628,389
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Issue date Apr 18, 2023
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Lam Research Corporation
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Jan Matthijn Dekkers
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Dry etching method
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Patent number 10,468,266
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Issue date Nov 5, 2019
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BOE Technology Group Co., Ltd.
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Yinghai Ma
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G02 - OPTICS
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Film forming apparatus
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Patent number 10,392,688
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Issue date Aug 27, 2019
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Tokyo Electron Limited
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Junichi Takei
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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