Measurements of electric or magnetic variables

Industry

CPC
H01J2237/24564

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/24564Measurements of electric or magnetic variables

Industries

Patents Grantslast 30 patents

Information Patent Grant
High-frequency power supply apparatus
- Patent number 12,125,677
- Issue date Oct 22, 2024
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System of semiconductor process and control method thereof
- Patent number 12,125,687
- Issue date Oct 22, 2024
- Samsung Electronics Co., Ltd.
- Youngdo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,087,563
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Liang Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for monitoring substrate processing apparatus
- Patent number 12,068,140
- Issue date Aug 20, 2024
- Samsung Electronics Co., Ltd.
- Sejin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF current measurement in semiconductor processing tool
- Patent number 12,051,630
- Issue date Jul 30, 2024
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 12,046,449
- Issue date Jul 23, 2024
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma non-uniformity detection
- Patent number 12,027,351
- Issue date Jul 2, 2024
- COMET Technologies USA, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing with broadband RF waveforms
- Patent number 12,020,902
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chucking process and system for substrate processing chambers
- Patent number 12,020,911
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Bhaskar Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for controlling cleaning and plasma processing apparatus
- Patent number 12,009,189
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Takashi Tsuto
- B08 - CLEANING
Information Patent Grant
Wafer de-chucking detection and arcing prevention
- Patent number 12,002,702
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Ganesh Balasubramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion collector for use in plasma systems
- Patent number 11,996,276
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Otto Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF signal parameter measurement in an integrated circuit fabricatio...
- Patent number 11,994,542
- Issue date May 28, 2024
- Lam Research Corporation
- Sunil Kapoor
- G01 - MEASURING TESTING
Information Patent Grant
Substrate pedestal for improved substrate processing
- Patent number 11,984,305
- Issue date May 14, 2024
- Applied Materials, Inc.
- Viren Kalsekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency match network and generator
- Patent number 11,961,711
- Issue date Apr 16, 2024
- COMET Technologies USA, Inc.
- Alexandre De Chambrier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analysis method and analysis system of voltage contrast defect
- Patent number 11,927,625
- Issue date Mar 12, 2024
- Powerchip Semiconductor Manufacturing Corporation
- Yue-Ying Yen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus and measurement method
- Patent number 11,908,665
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for tuning plasma distribution using phase control
- Patent number 11,908,662
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 11,894,222
- Issue date Feb 6, 2024
- Tokyo Electron Limited
- Atsushi Takeuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Common substrate and shadow ring lift apparatus
- Patent number 11,881,375
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- Abhishek Chowdhury
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ closed-loop management of radio frequency power generator
- Patent number 11,854,768
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei Ting Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 11,837,440
- Issue date Dec 5, 2023
- Kokusai Electric Corporation
- Takeshi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductive broad-band sensors for electromagnetic waves
- Patent number 11,830,708
- Issue date Nov 28, 2023
- COMET Technologies USA, Inc.
- Stephen E. Savas
- G01 - MEASURING TESTING
Information Patent Grant
Primary charged particle beam current measurement
- Patent number 11,817,292
- Issue date Nov 14, 2023
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and power supply device
- Patent number 11,810,752
- Issue date Nov 7, 2023
- HITACHI HIGH-TECH CORPORATION
- Wen Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and power supply control method
- Patent number 11,776,795
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real time photoresist outgassing control system and method
- Patent number 11,749,500
- Issue date Sep 5, 2023
- Applied Materials, Inc.
- Nevin Clay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Direct frequency tuning for matchless plasma source in substrate pr...
- Patent number 11,728,137
- Issue date Aug 15, 2023
- Lam Research Corporation
- Yuhou Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of power generation with phase linked solid-state...
- Patent number 11,721,526
- Issue date Aug 8, 2023
- MKS Instruments, Inc.
- Francesco Braghiroli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and plasma processing apparatus
- Patent number 11,705,313
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Yusuke Hirayama
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE IMAGING SYSTEM AND USE THEREOF
- Publication number 20240382166
- Publication date Nov 21, 2024
- Rodney HERRING
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
FOCUSED ION BEAM SYSTEM
- Publication number 20240371598
- Publication date Nov 7, 2024
- V TECHNOLOGY CO., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR MONITORING SUBSTRATE PROCESSING APPARATUS
- Publication number 20240371611
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- SEJIN OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE DE-CHUCKING VOLTAGE
- Publication number 20240363315
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Andrew NGUYEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240347327
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Liang LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF CURRENT MEASUREMENT IN SEMICONDUCTOR PROCESSING TOOL
- Publication number 20240347400
- Publication date Oct 17, 2024
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and System for Plasma Processing
- Publication number 20240347317
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEMS WITH MATCHING NETWORK AND METHODS
- Publication number 20240339297
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20240321543
- Publication date Sep 26, 2024
- Hitachi High-Tech Corporation
- Hideyuki Kotsuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240312765
- Publication date Sep 19, 2024
- Samsung Electronics Co., Ltd.
- Kyung Min LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CURRENT SENSING USING EMBEDDED ELECTRODES
- Publication number 20240312772
- Publication date Sep 19, 2024
- MKS Instruments, Inc.
- Chiu-Ying Tai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING WITH BROADBAND RF WAVEFORMS
- Publication number 20240312766
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Novel arc management algorithm of RF generator and match box for CC...
- Publication number 20240304429
- Publication date Sep 12, 2024
- Tiefeng SHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Device and Method for Calibrating a Charged-Particle Beam
- Publication number 20240304407
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Measuring Method and Plasma Processing Apparatus
- Publication number 20240290589
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Mitsutoshi Ashida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION COLLECTOR FOR USE IN PLASMA SYSTEMS
- Publication number 20240290588
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Otto Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT METHOD AND MEASUREMENT SYSTEM
- Publication number 20240280383
- Publication date Aug 22, 2024
- TOKYO ELECTRON LIMITED
- Hikaru FUJIWARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20240282557
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- JINUK PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DENSITY MEASUREMENT SENSOR, APPARATUS FOR MEASURING REAL-TIM...
- Publication number 20240274418
- Publication date Aug 15, 2024
- Samsung Electronics Co., Ltd.
- Sungho Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF SIGNAL PARAMETER MEASUREMENT IN AN INTEGRATED CIRCUIT FABRICATIO...
- Publication number 20240272210
- Publication date Aug 15, 2024
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- G01 - MEASURING TESTING
Information Patent Application
System and Method for Reducing Particle Formation in a Process Cham...
- Publication number 20240274404
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULE FOR MEASURING CURRENT/VOLTAGE/POWER OF PLASMA APPARATUS AND...
- Publication number 20240266156
- Publication date Aug 8, 2024
- KOREA INSTITUTE OF FUSION ENERGY
- Jongsik KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240266201
- Publication date Aug 8, 2024
- Panasonic Intellectual Property Management Co., Ltd.
- Toshiyuki TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dose Cup Assembly for an Ion Implanter
- Publication number 20240249908
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Frank Sinclair
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA DIAGNOSTIC APPARATUS AND OPERATING METHOD THEREOF
- Publication number 20240242944
- Publication date Jul 18, 2024
- Samsung Electronics Co., Ltd.
- Haewook PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, A...
- Publication number 20240234083
- Publication date Jul 11, 2024
- NuFlare Technology, Inc.
- Yasutaka SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240234105
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND DEVICES FOR PLASMA TREATMENT
- Publication number 20240222088
- Publication date Jul 4, 2024
- VOESTALPINE STAHL GMBH
- Pierre VANDEN BRANDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD FOR SUPPORT UNIT, SUBSTRATE TREATING METHOD AND SUBS...
- Publication number 20240222099
- Publication date Jul 4, 2024
- SEMES CO., LTD.
- Yun Sik JU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, P...
- Publication number 20240222078
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS

Measurements of electric or magnetic variables

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

High-frequency power supply apparatus

System of semiconductor process and control method thereof

Semiconductor processing tool and methods of operation

Method and system for monitoring substrate processing apparatus

RF current measurement in semiconductor processing tool

Methods and apparatus for processing a substrate

Plasma non-uniformity detection

Plasma processing with broadband RF waveforms

Chucking process and system for substrate processing chambers

Method for controlling cleaning and plasma processing apparatus

Wafer de-chucking detection and arcing prevention

Ion collector for use in plasma systems

RF signal parameter measurement in an integrated circuit fabricatio...

Substrate pedestal for improved substrate processing

Radio frequency match network and generator

Analysis method and analysis system of voltage contrast defect

Plasma processing apparatus and measurement method

Device and method for tuning plasma distribution using phase control

Film forming apparatus and film forming method

Common substrate and shadow ring lift apparatus

In-situ closed-loop management of radio frequency power generator

Substrate processing apparatus, method of manufacturing semiconduct...

Inductive broad-band sensors for electromagnetic waves

Primary charged particle beam current measurement

Charged particle beam device and power supply device

Plasma processing apparatus and power supply control method

Real time photoresist outgassing control system and method

Direct frequency tuning for matchless plasma source in substrate pr...

System and method of power generation with phase linked solid-state...

Inspection method and plasma processing apparatus

Patents Applicationslast 30 patents

CHARGED PARTICLE IMAGING SYSTEM AND USE THEREOF

FOCUSED ION BEAM SYSTEM

METHOD AND SYSTEM FOR MONITORING SUBSTRATE PROCESSING APPARATUS

ADJUSTABLE DE-CHUCKING VOLTAGE

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

RF CURRENT MEASUREMENT IN SEMICONDUCTOR PROCESSING TOOL

Method and System for Plasma Processing

PLASMA PROCESSING SYSTEMS WITH MATCHING NETWORK AND METHODS

Charged Particle Beam Device

SUBSTRATE PROCESSING APPARATUS

APPARATUS AND METHOD FOR CURRENT SENSING USING EMBEDDED ELECTRODES

PLASMA PROCESSING WITH BROADBAND RF WAVEFORMS

Novel arc management algorithm of RF generator and match box for CC...

Device and Method for Calibrating a Charged-Particle Beam

Plasma Measuring Method and Plasma Processing Apparatus

ION COLLECTOR FOR USE IN PLASMA SYSTEMS

MEASUREMENT METHOD AND MEASUREMENT SYSTEM

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

PLASMA DENSITY MEASUREMENT SENSOR, APPARATUS FOR MEASURING REAL-TIM...

RF SIGNAL PARAMETER MEASUREMENT IN AN INTEGRATED CIRCUIT FABRICATIO...

System and Method for Reducing Particle Formation in a Process Cham...

MODULE FOR MEASURING CURRENT/VOLTAGE/POWER OF PLASMA APPARATUS AND...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Dose Cup Assembly for an Ion Implanter

PLASMA DIAGNOSTIC APPARATUS AND OPERATING METHOD THEREOF

BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, A...

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

METHOD AND DEVICES FOR PLASMA TREATMENT

CONTROL METHOD FOR SUPPORT UNIT, SUBSTRATE TREATING METHOD AND SUBS...

PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, P...