Measurements of electric or magnetic variables

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CPC
H01J2237/24564

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/24564Measurements of electric or magnetic variables

Industries

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Patents Grantslast 30 patents

Information Patent Grant
In-situ closed-loop management of radio frequency power generator
- Patent number 12,368,023
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei Ting Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,143
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Satoru Kawakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for controlling a plasma sheath characteristic
- Patent number 12,362,159
- Issue date Jul 15, 2025
- Lam Research Corporation
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,145
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Yuji Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for measuring pedestal voltage uniformity in p...
- Patent number 12,362,136
- Issue date Jul 15, 2025
- Stephen Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio-frequency antenna and plasma processing device
- Patent number 12,354,839
- Issue date Jul 8, 2025
- EMD CORPORATION
- Akinori Ebe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Determining an optimal ion energy for plasma processing of a dielec...
- Patent number 12,347,662
- Issue date Jul 1, 2025
- PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V.
- Qihao Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple charged-particle beam apparatus and methods of operating t...
- Patent number 12,347,643
- Issue date Jul 1, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 12,334,299
- Issue date Jun 17, 2025
- HITACHI HIGH-TECH CORPORATION
- U Oh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma diagnosis system and plasma diagnosis method
- Patent number 12,315,710
- Issue date May 27, 2025
- Kwangwoon University Industry-Academic Collaboration Foundation
- Gi Chung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier device, semiconductor apparatus, and residual charge detect...
- Patent number 12,315,706
- Issue date May 27, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jian Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power adjustment method of upper electrode power supply and semicon...
- Patent number 12,300,460
- Issue date May 13, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jing Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid matcher and radio frequency matching system including the hy...
- Patent number 12,288,674
- Issue date Apr 29, 2025
- Samsung Electronics Co., Ltd.
- Hyosin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 12,281,381
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Sireesh Adimadhyam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Closed loop faraday correction of a horizontal beam current profile...
- Patent number 12,283,460
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Assessment of matching networks
- Patent number 12,272,533
- Issue date Apr 8, 2025
- Advanced Energy Industries, Inc.
- Corneluis Erasmus van Greunen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductive broad-band sensors for electromagnetic waves
- Patent number 12,272,532
- Issue date Apr 8, 2025
- COMET Technologies USA, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for using binning to increase power during a lo...
- Patent number 12,266,505
- Issue date Apr 1, 2025
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and dielectric window cleaning m...
- Patent number 12,257,608
- Issue date Mar 25, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Chunming Liu
- B08 - CLEANING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,027
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam particle beam system and method for operating same
- Patent number 12,255,040
- Issue date Mar 18, 2025
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,249,485
- Issue date Mar 11, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 12,230,471
- Issue date Feb 18, 2025
- HITACHI HIGH-TECH CORPORATION
- Shota Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring instrument and measuring method
- Patent number 12,222,379
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Takayuki Hatanaka
- G01 - MEASURING TESTING
Information Patent Grant
High-frequency power supply apparatus
- Patent number 12,205,798
- Issue date Jan 21, 2025
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rating substrate support assemblies based on impedance circuit elec...
- Patent number 12,205,791
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,205,801
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Toshiaki Saijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,191,124
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Tatsuo Matsudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arc management algorithm of RF generator and match box for CCP plas...
- Patent number 12,176,190
- Issue date Dec 24, 2024
- Applied Materials, Inc.
- Tiefeng Shi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Ribbon beam angle adjustment in an ion implantation system
- Patent number 12,170,182
- Issue date Dec 17, 2024
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM DEVICE, AND MEASUREMENT METHOD
- Publication number 20250232946
- Publication date Jul 17, 2025
- Hitachi High-Tech Corporation
- Minami UCHIHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT DEVICE AND ETCHING METHOD
- Publication number 20250226183
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL-TIME MEASUREMENT OF MICROWAVE RESONATORS AS PLASMA DIAGNOSTICS...
- Publication number 20250218751
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- DAVID PETERSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fast Frequency Tracking Control for Radiofrequency Power Amplifiers...
- Publication number 20250218726
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Sanghyeon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE
- Publication number 20250218747
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Dong Hun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIMODE DOSE COMPENSATION SYSTEM
- Publication number 20250218722
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Klaus PETRY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD, PROCESS MODULE MATCHING METHOD, AND SUBSTRATE...
- Publication number 20250210310
- Publication date Jun 26, 2025
- SEMES CO., LTD.
- Sang Moon YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE MEASUREMENT METHOD OF SUBSTRATE PROCESSING APPARATUS
- Publication number 20250201515
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Sang Moon YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA STATE MONITORING DEVICE FOR CONNECTING TO AN IMPEDANCE MATCH...
- Publication number 20250201540
- Publication date Jun 19, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Florian A. Maier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIT, SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING,...
- Publication number 20250201518
- Publication date Jun 19, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, RF SYSTEM, AND RF CONTROL METHOD
- Publication number 20250191883
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Ryuta HIGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DEVICE FOR SEMICONDUCTOR EQUIPMENT, METHOD OF OPERATING A SE...
- Publication number 20250189347
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Gyoseon Choo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR ENHANCED RF POWER DELIVERY USING HARMONIC WAV...
- Publication number 20250191879
- Publication date Jun 12, 2025
- FORTH-RITE TECHNOLOGIES, LLC
- Terry R. Turner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING PATTERNS FOR SCIENTIFIC INSTRUMENTS
- Publication number 20250183002
- Publication date Jun 5, 2025
- FEI Company
- Gert-Jan de Vos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-BEAM EXPOSURE METHOD AND MASK MANUFACTURING METHOD COMPRISING THE...
- Publication number 20250157789
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Jungwook SHON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, IN...
- Publication number 20250157798
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Ryohei TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...
- Publication number 20250157788
- Publication date May 15, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REAL-TIME PLASMA MEASUREMENT AND CONTROL
- Publication number 20250140541
- Publication date May 1, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD TO MEASURE ION PROPERTIES IN A PLASMA SYSTEM
- Publication number 20250132138
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Novel arc management algorithm of RF generator and Match box for CC...
- Publication number 20250118543
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Tiefeng SHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND INTERLOCK METHOD THEREOF
- Publication number 20250112028
- Publication date Apr 3, 2025
- JUSUNG ENGINEERING CO., LTD.
- Sang Kyo KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RIBBON BEAM ANGLE ADJUSTMENT IN AN ION IMPLANTATION SYSTEM
- Publication number 20250062097
- Publication date Feb 20, 2025
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Zhimin WAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE AND SPUTTERING CHAMBERS
- Publication number 20250062165
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Hung LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DIAGNOSIS DEVICE AND MANUFACTURING METHOD OF PLASMA DIAGNOSI...
- Publication number 20250046588
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Youn Sok Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, DISCHARGE DETECTION METHOD...
- Publication number 20250037969
- Publication date Jan 30, 2025
- NuFlare Technology, Inc.
- Tatsuya MUROFUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MONITORING NEUTRON RAY AND ION IMPLANTER
- Publication number 20250014862
- Publication date Jan 9, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Tsuyoshi NAKAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DIAGNOSTIC APPARATUS, AND APPARATUS FOR FABRICATING SEMICOND...
- Publication number 20250006477
- Publication date Jan 2, 2025
- Samsung Electronics Co., Ltd.
- Haewook PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DIAGNOSTIC CIRCUIT INCLUDING VARIABLE AMPLIFICATION UNIT AND...
- Publication number 20240429034
- Publication date Dec 26, 2024
- Samsung Electronics Co., Ltd.
- Juhyun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240420923
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Manabu ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING AND METHOD OF ETCHING
- Publication number 20240395509
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS

Measurements of electric or magnetic variables

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

In-situ closed-loop management of radio frequency power generator

Plasma processing apparatus and plasma processing method

Systems and methods for controlling a plasma sheath characteristic

Plasma processing apparatus and plasma processing method

Apparatus and method for measuring pedestal voltage uniformity in p...

Radio-frequency antenna and plasma processing device

Determining an optimal ion energy for plasma processing of a dielec...

Multiple charged-particle beam apparatus and methods of operating t...

Charged particle beam device

Plasma diagnosis system and plasma diagnosis method

Carrier device, semiconductor apparatus, and residual charge detect...

Power adjustment method of upper electrode power supply and semicon...

Hybrid matcher and radio frequency matching system including the hy...

Methods and apparatus for processing a substrate

Closed loop faraday correction of a horizontal beam current profile...

Assessment of matching networks

Inductive broad-band sensors for electromagnetic waves

Systems and methods for using binning to increase power during a lo...

Semiconductor processing apparatus and dielectric window cleaning m...

Plasma processing apparatus and plasma processing method

Multi-beam particle beam system and method for operating same

Substrate processing apparatus, method of manufacturing semiconduct...

Ion milling device

Measuring instrument and measuring method

High-frequency power supply apparatus

Rating substrate support assemblies based on impedance circuit elec...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Arc management algorithm of RF generator and match box for CCP plas...

Ribbon beam angle adjustment in an ion implantation system

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM DEVICE, AND MEASUREMENT METHOD

PLASMA TREATMENT DEVICE AND ETCHING METHOD

REAL-TIME MEASUREMENT OF MICROWAVE RESONATORS AS PLASMA DIAGNOSTICS...

Fast Frequency Tracking Control for Radiofrequency Power Amplifiers...

APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE

MULTIMODE DOSE COMPENSATION SYSTEM

MANUFACTURING METHOD, PROCESS MODULE MATCHING METHOD, AND SUBSTRATE...

IMPEDANCE MEASUREMENT METHOD OF SUBSTRATE PROCESSING APPARATUS

PLASMA STATE MONITORING DEVICE FOR CONNECTING TO AN IMPEDANCE MATCH...

PLASMA UNIT, SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING,...

PLASMA PROCESSING APPARATUS, RF SYSTEM, AND RF CONTROL METHOD

SENSOR DEVICE FOR SEMICONDUCTOR EQUIPMENT, METHOD OF OPERATING A SE...

SYSTEM AND METHOD FOR ENHANCED RF POWER DELIVERY USING HARMONIC WAV...

SCANNING PATTERNS FOR SCIENTIFIC INSTRUMENTS

E-BEAM EXPOSURE METHOD AND MASK MANUFACTURING METHOD COMPRISING THE...

CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, IN...

RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...

REAL-TIME PLASMA MEASUREMENT AND CONTROL

SYSTEM AND METHOD TO MEASURE ION PROPERTIES IN A PLASMA SYSTEM

Novel arc management algorithm of RF generator and Match box for CC...

SUBSTRATE PROCESSING APPARATUS AND INTERLOCK METHOD THEREOF

RIBBON BEAM ANGLE ADJUSTMENT IN AN ION IMPLANTATION SYSTEM

METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE AND SPUTTERING CHAMBERS

PLASMA DIAGNOSIS DEVICE AND MANUFACTURING METHOD OF PLASMA DIAGNOSI...

CHARGED PARTICLE BEAM WRITING APPARATUS, DISCHARGE DETECTION METHOD...

METHOD FOR MONITORING NEUTRON RAY AND ION IMPLANTER

PLASMA DIAGNOSTIC APPARATUS, AND APPARATUS FOR FABRICATING SEMICOND...

PLASMA DIAGNOSTIC CIRCUIT INCLUDING VARIABLE AMPLIFICATION UNIT AND...

PLASMA PROCESSING APPARATUS

APPARATUS FOR PLASMA PROCESSING AND METHOD OF ETCHING