Mechanical adjustments

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CPC
H01J2237/1502

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/1502Mechanical adjustments

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 12,176,187
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling exhaust gas pressure of a plasma reactor for plasma sta...
- Patent number 12,159,768
- Issue date Dec 3, 2024
- Recarbon, Inc.
- George Stephen Leonard
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Optical system for monitoring plasma reactions and reactors
- Patent number 12,014,900
- Issue date Jun 18, 2024
- Recarbon, Inc.
- Curtis Peter Tom
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion milling device
- Patent number 11,894,213
- Issue date Feb 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Asako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle lithography system with alignment sensor and beam...
- Patent number RE49732
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Paul IJmert Scheffers
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 11,804,368
- Issue date Oct 31, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,705,304
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical system for monitoring plasma reactions and reactors
- Patent number 11,469,078
- Issue date Oct 11, 2022
- Recarbon, Inc.
- Curtis Peter Tom
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Ion milling device and ion source adjusting method for ion milling...
- Patent number 11,244,802
- Issue date Feb 8, 2022
- HITACHI HIGH-TECH CORPORATION
- Hitoshi Kamoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle beam writing apparatus and multi-charged-par...
- Patent number 11,145,489
- Issue date Oct 12, 2021
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,062,877
- Issue date Jul 13, 2021
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactors having recuperators
- Patent number 10,854,429
- Issue date Dec 1, 2020
- Recarbon, Inc.
- George Stephen Leonard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Durable auto-ignition device for plasma reactor
- Patent number 10,840,064
- Issue date Nov 17, 2020
- Recarbon, Inc.
- George Stephen Leonard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor for processing gas
- Patent number 10,832,893
- Issue date Nov 10, 2020
- Recarbon, Inc.
- Stefan Andrew McClelland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of adjusting the primary side of an X-ray diffractometer
- Patent number 10,598,615
- Issue date Mar 24, 2020
- Andreas Kleine
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,541,110
- Issue date Jan 21, 2020
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support unit, substrate treating apparatus including the same, and...
- Patent number 10,153,137
- Issue date Dec 11, 2018
- Semes Co., Ltd.
- Seok Won Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 10,026,596
- Issue date Jul 17, 2018
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 9,922,799
- Issue date Mar 20, 2018
- Hermes-Microvision, Inc.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure apparatus and method of manufacturin...
- Patent number 9,824,860
- Issue date Nov 21, 2017
- Advantest Corp.
- Akio Yamada
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle lithography system with alignment sensor and beam...
- Patent number 9,665,014
- Issue date May 30, 2017
- Mapper Lithography IP B.V.
- Paul Ijmert Scheffers
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam writing apparatus, and method for adjusting convergen...
- Patent number 9,336,980
- Issue date May 10, 2016
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double ended electrode manipulator
- Patent number 9,269,536
- Issue date Feb 23, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Jon Ballou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-voltage insulation device for charged-particle optical apparatus
- Patent number 9,093,201
- Issue date Jul 28, 2015
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle source with multiple selectable particle emitters
- Patent number 8,710,453
- Issue date Apr 29, 2014
- FEI Company
- N. William Parker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern definition device with multiple multibeam array
- Patent number 8,546,767
- Issue date Oct 1, 2013
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Extractor for an microcolumn, an alignment method for an extractor...
- Patent number 7,750,295
- Issue date Jul 6, 2010
- Cebt Co., Ltd.
- Ho Soeb Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam tuning with automatic magnet pole rotation for ion implanters
- Patent number 7,476,855
- Issue date Jan 13, 2009
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning interference electron microscope
- Patent number 7,417,227
- Issue date Aug 26, 2008
- Hitachi High-Technologies Corporation
- Takao Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Micro-column electron beam apparatus
- Patent number 7,375,351
- Issue date May 20, 2008
- Electronics and Telecommunications Research Instutute
- Sang Kuk Choi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ADJUSTABLE EDGE RING TILT FOR EDGE OF WAFER SKEW COMPENSATION
- Publication number 20240429089
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Peter MURAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230402269
- Publication date Dec 14, 2023
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE PARTICLE BEAM SYSTEM WITH A CONTRAST CORRECTION LENS SYSTEM
- Publication number 20230207251
- Publication date Jun 29, 2023
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM FOR MONITORING PLASMA REACTIONS AND REACTORS
- Publication number 20230110414
- Publication date Apr 13, 2023
- RECARBON, INC.
- Curtis Peter Tom
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210384013
- Publication date Dec 9, 2021
- TOKYO ELECTRON LIMITED
- Hwajun Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210272782
- Publication date Sep 2, 2021
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device
- Publication number 20210265130
- Publication date Aug 26, 2021
- Hitachi High-Tech Corporation
- Asako KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device and Ion Source Adjusting Method for Ion Milling...
- Publication number 20210066020
- Publication date Mar 4, 2021
- Hitachi High-Tech Corporation
- Hitoshi KAMOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR FOR PROCESSING GAS
- Publication number 20200312627
- Publication date Oct 1, 2020
- RECARBON, INC.
- Stefan Andrew McClelland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTORS HAVING RECUPERATORS
- Publication number 20200312638
- Publication date Oct 1, 2020
- RECARBON, INC.
- George Stephen Leonard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED-PARTICLE BEAM WRITING APPARATUS AND MULTI-CHARGED-PAR...
- Publication number 20200258716
- Publication date Aug 13, 2020
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR MEASURING MISALIGNMENT O...
- Publication number 20200234929
- Publication date Jul 23, 2020
- TOKYO ELECTRON LIMITED
- Atsushi OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20180350555
- Publication date Dec 6, 2018
- HERMES MICROVISION, INC.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTINUOUSLY VARIABLE APERTURE
- Publication number 20180226220
- Publication date Aug 9, 2018
- HOWARD HUGHES MEDICAL INSTITUTE
- Tamir Gonen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPORT UNIT, SUBSTRATE TREATING APPARATUS INCLUDING THE SAME, AND...
- Publication number 20170110295
- Publication date Apr 20, 2017
- SEMES CO., LTD.
- Seok Won HWANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND APPARATUS FOR ANISOTROPIC METAL ETCHING
- Publication number 20160379844
- Publication date Dec 29, 2016
- Thomas R. Omstead
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUES AND APPARATUS FOR ANISOTROPIC METAL ETCHING
- Publication number 20160042922
- Publication date Feb 11, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Thomas R. Omstead
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM WRITING APPARATUS, AND METHOD FOR ADJUSTING CONVERGEN...
- Publication number 20150303026
- Publication date Oct 22, 2015
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURIN...
- Publication number 20150243480
- Publication date Aug 27, 2015
- Advantest Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20140352890
- Publication date Dec 4, 2014
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-VOLTAGE INSULATION DEVICE FOR CHARGED-PARTICLE OPTICAL APPARATUS
- Publication number 20140197327
- Publication date Jul 17, 2014
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Application
IRRADIATION APPARATUS, DRAWING APPARATUS, AND METHOD OF MANUFACTURI...
- Publication number 20140106268
- Publication date Apr 17, 2014
- Canon Kabushiki Kaisha
- Nobuo Imaoka
- B82 - NANO-TECHNOLOGY
Information Patent Application
DOUBLE ENDED ELECTRODE MANIPULATOR
- Publication number 20130270450
- Publication date Oct 17, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Jon Ballou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SYSTEM FOR PROCESSING A TARGET SURFACE
- Publication number 20120273691
- Publication date Nov 1, 2012
- Alrik van den Brom
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged Particle Source with Multiple Selectable Particle Emitters
- Publication number 20120168638
- Publication date Jul 5, 2012
- FEI Company
- N. William Parker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN DEFINITION DEVICE WITH MULTIPLE MULTIBEAM ARRAY
- Publication number 20110204253
- Publication date Aug 25, 2011
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Application
LITHOGRAPHY SYSTEM WITH LENS ROTATION
- Publication number 20110174985
- Publication date Jul 21, 2011
- Jerry Peijster
- B82 - NANO-TECHNOLOGY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20100243167
- Publication date Sep 30, 2010
- TOKYO ELECTRON LIMITED
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam tuning with automatic magnet pole rotation for ion implanters
- Publication number 20080067435
- Publication date Mar 20, 2008
- Axcelis Technologies Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Micro-column electron beam apparatus
- Publication number 20060151716
- Publication date Jul 13, 2006
- Sang Kuk Choi
- B82 - NANO-TECHNOLOGY

Mechanical adjustments

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Cleaning method and plasma processing apparatus

Controlling exhaust gas pressure of a plasma reactor for plasma sta...

Optical system for monitoring plasma reactions and reactors

Ion milling device

Charged particle lithography system with alignment sensor and beam...

Cleaning method and plasma processing apparatus

Apparatus of plural charged-particle beams

Optical system for monitoring plasma reactions and reactors

Ion milling device and ion source adjusting method for ion milling...

Multi-charged-particle beam writing apparatus and multi-charged-par...

Apparatus of plural charged-particle beams

Plasma reactors having recuperators

Durable auto-ignition device for plasma reactor

Plasma reactor for processing gas

Method of adjusting the primary side of an X-ray diffractometer

Apparatus of plural charged-particle beams

Support unit, substrate treating apparatus including the same, and...

Substrate processing apparatus

Apparatus of plural charged-particle beams

Charged particle beam exposure apparatus and method of manufacturin...

Charged particle lithography system with alignment sensor and beam...

Electron beam writing apparatus, and method for adjusting convergen...

Double ended electrode manipulator

High-voltage insulation device for charged-particle optical apparatus

Charged particle source with multiple selectable particle emitters

Pattern definition device with multiple multibeam array

Extractor for an microcolumn, an alignment method for an extractor...

Beam tuning with automatic magnet pole rotation for ion implanters

Scanning interference electron microscope

Micro-column electron beam apparatus

Patents Applicationslast 30 patents

ADJUSTABLE EDGE RING TILT FOR EDGE OF WAFER SKEW COMPENSATION

CLEANING METHOD AND PLASMA PROCESSING APPARATUS

MULTIPLE PARTICLE BEAM SYSTEM WITH A CONTRAST CORRECTION LENS SYSTEM

OPTICAL SYSTEM FOR MONITORING PLASMA REACTIONS AND REACTORS

PLASMA PROCESSING APPARATUS

CLEANING METHOD AND PLASMA PROCESSING APPARATUS

Ion Milling Device

Ion Milling Device and Ion Source Adjusting Method for Ion Milling...

PLASMA REACTOR FOR PROCESSING GAS

PLASMA REACTORS HAVING RECUPERATORS

MULTI-CHARGED-PARTICLE BEAM WRITING APPARATUS AND MULTI-CHARGED-PAR...

PLASMA PROCESSING APPARATUS AND METHOD FOR MEASURING MISALIGNMENT O...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

CONTINUOUSLY VARIABLE APERTURE

SUPPORT UNIT, SUBSTRATE TREATING APPARATUS INCLUDING THE SAME, AND...

TECHNIQUES AND APPARATUS FOR ANISOTROPIC METAL ETCHING

TECHNIQUES AND APPARATUS FOR ANISOTROPIC METAL ETCHING

ELECTRON BEAM WRITING APPARATUS, AND METHOD FOR ADJUSTING CONVERGEN...

CHARGED PARTICLE BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURIN...

SUBSTRATE PROCESSING APPARATUS

HIGH-VOLTAGE INSULATION DEVICE FOR CHARGED-PARTICLE OPTICAL APPARATUS

IRRADIATION APPARATUS, DRAWING APPARATUS, AND METHOD OF MANUFACTURI...

DOUBLE ENDED ELECTRODE MANIPULATOR

CHARGED PARTICLE SYSTEM FOR PROCESSING A TARGET SURFACE

Charged Particle Source with Multiple Selectable Particle Emitters

PATTERN DEFINITION DEVICE WITH MULTIPLE MULTIBEAM ARRAY

LITHOGRAPHY SYSTEM WITH LENS ROTATION

SUBSTRATE PROCESSING APPARATUS

Beam tuning with automatic magnet pole rotation for ion implanters

Micro-column electron beam apparatus