Methods of ionisation

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CPC
H01J2237/0815

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0815Methods of ionisation

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Single beam plasma source
- Patent number 12,165,829
- Issue date Dec 10, 2024
- Board of Trustees of Michigan State University
- Qi Hua Fan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device to control uniformity of extracted ion beam
- Patent number 12,154,753
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- Jay T. Scheuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Ion milling device
- Patent number 12,020,893
- Issue date Jun 25, 2024
- HITACHI HIGH-TECH CORPORATION
- Kengo Asai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite ion source based upon heterogeneous metal-metal fluoride...
- Patent number 11,887,806
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Graham Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam lithography method based on ion beam lithography system
- Patent number 11,538,653
- Issue date Dec 27, 2022
- Beijing Normal University
- Bin Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
GeH4/Ar plasma chemistry for ion implant productivity enhancement
- Patent number 11,450,504
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with tubular cathode
- Patent number 11,424,097
- Issue date Aug 23, 2022
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 11,355,314
- Issue date Jun 7, 2022
- Canon Anelva Corporation
- Yasushi Yasumatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniaxial counter-propagating monolaser atom trap
- Patent number 11,291,103
- Issue date Mar 29, 2022
- GOVERNMENT OF THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY O...
- Stephen Paul Eckel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for generating negative ions by impinging positive ions on a...
- Patent number 11,031,205
- Issue date Jun 8, 2021
- Georg-August-Universitat Gottingen Stiftung Offentlichen Rechts, Universitats...
- Hans Hofsäss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for ion mass separation and ion energy control in process pl...
- Patent number 10,998,170
- Issue date May 4, 2021
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
GeH4/Ar plasma chemistry for ion implant productivity enhancement
- Patent number 10,923,309
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 10,879,040
- Issue date Dec 29, 2020
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Ion source with tubular cathode
- Patent number 10,748,738
- Issue date Aug 18, 2020
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for generating organic molecular cluster ion beam
- Patent number 10,699,868
- Issue date Jun 30, 2020
- Korea Basic Science Institute
- Chang Min Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High brightness ion beam extraction using bias electrodes and magne...
- Patent number 10,290,462
- Issue date May 14, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative ribbon ion beams from pulsed plasmas
- Patent number 10,290,470
- Issue date May 14, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 10,224,179
- Issue date Mar 5, 2019
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Boron-containing dopant compositions, systems and methods of use th...
- Patent number 10,090,133
- Issue date Oct 2, 2018
- Praxair Technology, Inc.
- Ashwini K Sinha
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Resonant enhancement of photoionization of gaseous atoms
- Patent number 10,020,156
- Issue date Jul 10, 2018
- ZEROK NANOTECH CORPORATION
- Brenton J. Knuffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source of an ion implanter
- Patent number 9,852,887
- Issue date Dec 26, 2017
- Advanced Ion Beam Technology, Inc.
- Stephen Edward Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotatable targeting magnet apparatus and method of use thereof in c...
- Patent number 9,757,594
- Issue date Sep 12, 2017
- Vladimir Balakin
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Cancer surface searing apparatus and method of use thereof
- Patent number 9,682,254
- Issue date Jun 20, 2017
- Vladimir Balakin
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Plasma source for a focused ion beam system
- Patent number 9,640,367
- Issue date May 2, 2017
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light bath for particle suppression
- Patent number 9,583,308
- Issue date Feb 28, 2017
- Varian Semiconductor Equipment Associates, Inc.
- William Davis Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Boron-containing dopant compositions, systems and methods of use th...
- Patent number 9,548,181
- Issue date Jan 17, 2017
- Praxair Technology, Inc.
- Ashwini K. Sinha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fast magnet method and apparatus used in conjunction with a charged...
- Patent number 9,314,649
- Issue date Apr 19, 2016
- Vladimir Balakin
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Ion source with independent power supplies
- Patent number 9,214,313
- Issue date Dec 15, 2015
- E. A. Fischione Instruments, Inc.
- Joseph M. Matesa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation based emitter profile engineering via process modi...
- Patent number 9,196,489
- Issue date Nov 24, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Vikram Bhosle
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DUAL CATHODE TEMPERATURE-CONTROLLED MULTI-CATHODE ION SOURCE
- Publication number 20250087451
- Publication date Mar 13, 2025
- Axcelis Technologies, Inc.
- Neil J. Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20250014861
- Publication date Jan 9, 2025
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
ION IMPLANTATION SYSTEM AND RELATED METHODS
- Publication number 20240379320
- Publication date Nov 14, 2024
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE HEAD AND ION SOURCE HEAD CURVED LINER, DEFLECTOR, OR REP...
- Publication number 20240249906
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Tang TSENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION MILLING DEVICE
- Publication number 20230352263
- Publication date Nov 2, 2023
- Hitachi High-Tech Corporation
- Kengo ASAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE ION SOURCE BASED UPON HETEROGENEOUS METAL-METAL FLUORIDE...
- Publication number 20230326703
- Publication date Oct 12, 2023
- Applied Materials, Inc.
- Graham Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURI...
- Publication number 20220285170
- Publication date Sep 8, 2022
- KIOXIA Corporation
- Junichi HASHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20220262598
- Publication date Aug 18, 2022
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
SINGLE BEAM PLASMA SOURCE
- Publication number 20220013324
- Publication date Jan 13, 2022
- Board of Trustees of Michigan State University
- Qi Hua FAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGEN CO-GAS WHEN USING A CHLORINE-BASED ION SOURCE MATERIAL
- Publication number 20220013323
- Publication date Jan 13, 2022
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM LITHOGRAPHY METHOD BASED ON ION BEAM LITHOGRAPHY SYSTEM
- Publication number 20210183616
- Publication date Jun 17, 2021
- BEIJING NORMAL UNIVERSITY
- Bin Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20210104377
- Publication date Apr 8, 2021
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GeH4/Ar Plasma Chemistry For Ion Implant Productivity Enhancement
- Publication number 20210005416
- Publication date Jan 7, 2021
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH TUBULAR CATHODE
- Publication number 20200343071
- Publication date Oct 29, 2020
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR GENERATING ORGANIC MOLECULAR CLUSTER ION BEAM
- Publication number 20190355542
- Publication date Nov 21, 2019
- KOREA BASIC SCIENCE INSTITUTE
- Chang Min CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Ion Mass Separation and Ion Energy Control in Process Pl...
- Publication number 20190318916
- Publication date Oct 17, 2019
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20190108973
- Publication date Apr 11, 2019
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
LIGHT BATH FOR PARTICLE SUPPRESSION
- Publication number 20170062173
- Publication date Mar 2, 2017
- Varian Semiconductor Equipment Associates, Inc.
- William Davis Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BORON-CONTAINING DOPANT COMPOSITIONS, SYSTEMS AND METHODS OF USE TH...
- Publication number 20160133427
- Publication date May 12, 2016
- ASHWINI K. SINHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam System and Method of Operating a Charged Part...
- Publication number 20160104598
- Publication date Apr 14, 2016
- Carl Zeiss Microscopy, LLC
- John A. Notte
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Uninterrupted Production of a Polyatomic Boron Molecular...
- Publication number 20140239191
- Publication date Aug 28, 2014
- Ady Itzchak Hershcovitch
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ION IMPLANTATION BASED EMITTER PROFILE ENGINEERING VIA PROCESS MODI...
- Publication number 20140213014
- Publication date Jul 31, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Vikram Bhosle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Source, Nanofabrication Apparatus Comprising Such Source, and a...
- Publication number 20140175301
- Publication date Jun 26, 2014
- UNIVERSITE LYON 1 CLAUDE BERNARD
- Jacques Gierak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively Coupled Plasma ION Source Chamber with Dopant Material...
- Publication number 20140097752
- Publication date Apr 10, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT OF AN ATOM BEAM WITH AN ELECTRIC FIELD IN THE PRODUCTION...
- Publication number 20130320202
- Publication date Dec 5, 2013
- United States of America, as represented by the Secretary of Commerce, NIST
- Jabez McClelland
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
EXCITED GAS INJECTION FOR ION IMPLANT CONTROL
- Publication number 20130313443
- Publication date Nov 28, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE, HEAVY PARTICLE BEAM IRRADIATION APPARATUS, ION SOURCE D...
- Publication number 20130234036
- Publication date Sep 12, 2013
- Kabushiki Kaisha Toshiba
- Akiko KAKUTANI
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
MICROPLASMA ION SOURCE FOR FOCUSED ION BEAM APPLICATIONS
- Publication number 20130221232
- Publication date Aug 29, 2013
- Vladimir V. Makarov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETICALLY ENHANCED, INDUCTIVELY COUPLED PLASMA SOURCE FOR A FOCU...
- Publication number 20120319000
- Publication date Dec 20, 2012
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Source for Charged Particle Beam System
- Publication number 20120280136
- Publication date Nov 8, 2012
- FEI Company
- Shouyin Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Methods of ionisation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Single beam plasma source

Device to control uniformity of extracted ion beam

Ion beam processing apparatus, electrode assembly, and method of cl...

Ion milling device

Composite ion source based upon heterogeneous metal-metal fluoride...

Ion beam lithography method based on ion beam lithography system

GeH4/Ar plasma chemistry for ion implant productivity enhancement

Ion source with tubular cathode

Ion beam processing apparatus, electrode assembly, and method of cl...

Uniaxial counter-propagating monolaser atom trap

Device for generating negative ions by impinging positive ions on a...

Method for ion mass separation and ion energy control in process pl...

GeH4/Ar plasma chemistry for ion implant productivity enhancement

Ion beam processing apparatus, electrode assembly, and method of cl...

Ion source with tubular cathode

Device and method for generating organic molecular cluster ion beam

High brightness ion beam extraction using bias electrodes and magne...

Negative ribbon ion beams from pulsed plasmas

Ion beam processing apparatus, electrode assembly, and method of cl...

Boron-containing dopant compositions, systems and methods of use th...

Resonant enhancement of photoionization of gaseous atoms

Ion source of an ion implanter

Rotatable targeting magnet apparatus and method of use thereof in c...

Cancer surface searing apparatus and method of use thereof

Plasma source for a focused ion beam system

Light bath for particle suppression

Boron-containing dopant compositions, systems and methods of use th...

Fast magnet method and apparatus used in conjunction with a charged...

Ion source with independent power supplies

Ion implantation based emitter profile engineering via process modi...

Patents Applicationslast 30 patents

DUAL CATHODE TEMPERATURE-CONTROLLED MULTI-CATHODE ION SOURCE

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

ION IMPLANTATION SYSTEM AND RELATED METHODS

ION SOURCE HEAD AND ION SOURCE HEAD CURVED LINER, DEFLECTOR, OR REP...

ION MILLING DEVICE

COMPOSITE ION SOURCE BASED UPON HETEROGENEOUS METAL-METAL FLUORIDE...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURI...

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

SINGLE BEAM PLASMA SOURCE

HYDROGEN CO-GAS WHEN USING A CHLORINE-BASED ION SOURCE MATERIAL

ION BEAM LITHOGRAPHY METHOD BASED ON ION BEAM LITHOGRAPHY SYSTEM

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

GeH4/Ar Plasma Chemistry For Ion Implant Productivity Enhancement

ION SOURCE WITH TUBULAR CATHODE

DEVICE AND METHOD FOR GENERATING ORGANIC MOLECULAR CLUSTER ION BEAM

Method for Ion Mass Separation and Ion Energy Control in Process Pl...

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

LIGHT BATH FOR PARTICLE SUPPRESSION

BORON-CONTAINING DOPANT COMPOSITIONS, SYSTEMS AND METHODS OF USE TH...

Charged Particle Beam System and Method of Operating a Charged Part...

Method for Uninterrupted Production of a Polyatomic Boron Molecular...

ION IMPLANTATION BASED EMITTER PROFILE ENGINEERING VIA PROCESS MODI...

Ion Source, Nanofabrication Apparatus Comprising Such Source, and a...

Inductively Coupled Plasma ION Source Chamber with Dopant Material...

ALIGNMENT OF AN ATOM BEAM WITH AN ELECTRIC FIELD IN THE PRODUCTION...

EXCITED GAS INJECTION FOR ION IMPLANT CONTROL

ION SOURCE, HEAVY PARTICLE BEAM IRRADIATION APPARATUS, ION SOURCE D...

MICROPLASMA ION SOURCE FOR FOCUSED ION BEAM APPLICATIONS

MAGNETICALLY ENHANCED, INDUCTIVELY COUPLED PLASMA SOURCE FOR A FOCU...

Plasma Source for Charged Particle Beam System