Mix-and-match, i.e. multiple exposures of the same area using similar types of exposure

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G03F7/70458

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70458Mix-and-match, i.e. multiple exposures of the same area using similar types of exposure

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Patents Grantslast 30 patents

Information Patent Grant
Method for controlling a manufacturing apparatus and associated app...
- Patent number 11,669,017
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Roy Werkman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and apparatus and lithographic processing cell
- Patent number RE49460
- Issue date Mar 14, 2023
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
Information Patent Grant
Inspection method and apparatus and lithographic processing cell
- Patent number RE49199
- Issue date Sep 6, 2022
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
Information Patent Grant
Method of performing model-based scanner tuning
- Patent number 11,372,337
- Issue date Jun 28, 2022
- ASML Netherlands B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and manufacturing method thereof
- Patent number 10,908,494
- Issue date Feb 2, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Ming Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of performing model-based scanner tuning
- Patent number 10,795,266
- Issue date Oct 6, 2020
- ASML Netherlands B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and projection exposure apparatus for mi...
- Patent number 10,678,144
- Issue date Jun 9, 2020
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining the dose corrections to be applied to an IC...
- Patent number 10,578,978
- Issue date Mar 3, 2020
- Aselta Nanographics
- Mohamed Saib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Model-based scanner tuning systems and methods
- Patent number 10,569,469
- Issue date Feb 25, 2020
- ASML Netherlands B.V.
- Yu Cao
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Projection exposure method and projection exposure apparatus for mi...
- Patent number 10,514,611
- Issue date Dec 24, 2019
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multicolor photolithography materials and methods
- Patent number 10,459,337
- Issue date Oct 29, 2019
- University of Maryland, College Park
- John T. Fourkas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining the parameters of an IC manufacturing proces...
- Patent number 10,156,796
- Issue date Dec 18, 2018
- Aselta Nanographics
- Mohamed Saïb
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model-based process simulation systems and methods
- Patent number 10,137,643
- Issue date Nov 27, 2018
- ASML Netherlands B.V.
- Yu Cao
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Multiscale patterning of a sample with apparatus having both thermo...
- Patent number 9,921,486
- Issue date Mar 20, 2018
- SWISSLITHO AG
- Urs T Duerig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of performing model-based scanner tuning
- Patent number 9,921,485
- Issue date Mar 20, 2018
- ASML Netherlands B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and device manufacturing method
- Patent number 9,400,434
- Issue date Jul 26, 2016
- Canon Kabushiki Kaisha
- Tsutomu Takenaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transverse electric-field type liquid crystal display device, proce...
- Patent number 9,201,309
- Issue date Dec 1, 2015
- Obayashiseikou Co., Ltd.
- Naoto Hirota
- G02 - OPTICS
Information Patent Grant
Method of performing model-based scanner tuning
- Patent number 9,158,208
- Issue date Oct 13, 2015
- ASML Netherlands B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming tight-pitched pattern
- Patent number 9,091,929
- Issue date Jul 28, 2015
- Nanya Technology Corp.
- Chun-Wei Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Model-based scanner tuning systems and methods
- Patent number 8,874,423
- Issue date Oct 28, 2014
- ASML Netherlands B.V.
- Yu Cao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for improved automated semiconductor wafer manufa...
- Patent number 8,825,191
- Issue date Sep 2, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Yao Hsieh
- G05 - CONTROLLING REGULATING
Information Patent Grant
Model-based process simulation systems and methods
- Patent number 8,806,387
- Issue date Aug 12, 2014
- ASML Netherlands B.V.
- Yu Cao
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Exposure method and lithography system
- Patent number 8,605,248
- Issue date Dec 10, 2013
- Nikon Corporation
- Masaharu Kawakubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Model-based scanner tuning systems and methods
- Patent number 8,571,845
- Issue date Oct 29, 2013
- ASML Netherlands B.V.
- Yu Cao
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method for manufacturing a semiconductor device
- Patent number 8,530,145
- Issue date Sep 10, 2013
- Renesas Electronics Corporation
- Takuya Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method for semiconductor processing
- Patent number 8,514,374
- Issue date Aug 20, 2013
- International Business Machines Corporation
- Todd C. Bailey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for improved automated semiconductor wafer manufa...
- Patent number 8,463,419
- Issue date Jun 11, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Yao Hsieh
- G05 - CONTROLLING REGULATING
Information Patent Grant
Lithographic apparatus and method for calibrating the same
- Patent number 8,368,902
- Issue date Feb 5, 2013
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual wavelength exposure method and system for semiconductor device...
- Patent number 8,338,262
- Issue date Dec 25, 2012
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Heng-Jen Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Recording medium storing program for determining exposure parameter...
- Patent number 8,334,968
- Issue date Dec 18, 2012
- Canon Kabushiki Kaisha
- Kouichirou Tsujita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DIGITAL LITHOGRAPHY SCAN SEQUENCING
- Publication number 20240288778
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Ying-Chiao Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING LITHOGRAPHIC MATCHING PERFORMANCE
- Publication number 20230341783
- Publication date Oct 26, 2023
- ASML NETHERLANDS B.V.
- Arnaud HUBAUX
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PERFORMING MODEL-BASED SCANNER TUNING
- Publication number 20210018844
- Publication date Jan 21, 2021
- ASML NETHERLANDS B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fabricating Devices with Reduced Isolation Regions
- Publication number 20200409273
- Publication date Dec 31, 2020
- Spin Memory, Inc.
- Amitay Levi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CONTROLLING A MANUFACTURING APPARATUS AND ASSOCIATED APP...
- Publication number 20200278614
- Publication date Sep 3, 2020
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS
- Publication number 20200189192
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Yu CAO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...
- Publication number 20200096877
- Publication date Mar 26, 2020
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PERFORMING MODEL-BASED SCANNER TUNING
- Publication number 20180231896
- Publication date Aug 16, 2018
- ASML NETHERLANDS B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING THE DOSE CORRECTIONS TO BE APPLIED TO AN IC...
- Publication number 20180203361
- Publication date Jul 19, 2018
- ASELTA NANOGRAPHICS
- Mohamed SAIB
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODEL-BASED PROCESS SIMULATION SYSTEMS AND METHODS
- Publication number 20140351773
- Publication date Nov 27, 2014
- ASML NETHERLANDS B.V.
- Yu CAO
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD OF FORMING TIGHT-PITCHED PATTERN
- Publication number 20140205955
- Publication date Jul 24, 2014
- NANYA TECHNOLOGY CORP.
- Chun-Wei Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, EXPOSURE APPARATUS, EXPOSURE SYSTEM AND DEVICE MAN...
- Publication number 20140204359
- Publication date Jul 24, 2014
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Method and Apparatus and Lithographic Processing Cell
- Publication number 20140089870
- Publication date Mar 27, 2014
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF FORMING TIGHT-PITCHED PATTERN
- Publication number 20140057211
- Publication date Feb 27, 2014
- Chun-Wei Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS
- Publication number 20140046646
- Publication date Feb 13, 2014
- ASML NETHERLANDS B.V.
- Yu CAO
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
TRANSVERSE ELECTRIC-FIELD TYPE LIQUID CRYSTAL DISPLAY DEVICE, PROCE...
- Publication number 20130314687
- Publication date Nov 28, 2013
- Naoto Hirota
- G02 - OPTICS
Information Patent Application
System and Method for Improved Automated Semiconductor Wafer Manufa...
- Publication number 20130253681
- Publication date Sep 26, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Yao Hsieh
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
SYSTEM AND METHOD FOR AN ADJUSTING OPTICAL PROXIMITY EFFECT FOR AN...
- Publication number 20130044308
- Publication date Feb 21, 2013
- Nikon Precision Inc.
- Stephen P. Renwick
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Performing Model-Based Scanner Tuning
- Publication number 20110267597
- Publication date Nov 3, 2011
- ASML NETHERLANDS B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT METHOD FOR SEMICONDUCTOR PROCESSING
- Publication number 20110102760
- Publication date May 5, 2011
- International Business Machines Corporation
- Todd C. Bailey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PATTERN
- Publication number 20110091819
- Publication date Apr 21, 2011
- RENESAS ELECTRONICS CORPORATION
- Takuya Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME
- Publication number 20110075154
- Publication date Mar 31, 2011
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DUAL WAVELENGTH EXPOSURE METHOD AND SYSTEM FOR SEMICONDUCTOR DEVICE...
- Publication number 20100308439
- Publication date Dec 9, 2010
- Taiwan Semiconductor Manufacturing Co., LTD
- Heng-Jen LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME
- Publication number 20100220335
- Publication date Sep 2, 2010
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Improved Automated Semiconductor Wafer Manufa...
- Publication number 20100185311
- Publication date Jul 22, 2010
- Wen-Yao Hsieh
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD FOR FORMING PATTERN
- Publication number 20100104986
- Publication date Apr 29, 2010
- Renesas Technology Corp.
- Takuya Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process, Apparatus and Device
- Publication number 20100092881
- Publication date Apr 15, 2010
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS
- Publication number 20100010784
- Publication date Jan 14, 2010
- Yu Cao
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
RECORDING MEDIUM STORING PROGRAM FOR DETERMINING EXPOSURE PARAMETER...
- Publication number 20090310116
- Publication date Dec 17, 2009
- Canon Kabushiki Kaisha
- Kouichirou Tsujita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODEL-BASED PROCESS SIMULATION SYSTEMS AND METHODS
- Publication number 20090300573
- Publication date Dec 3, 2009
- Yu Cao
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Mix-and-match, i.e. multiple exposures of the same area using similar types of exposure

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for controlling a manufacturing apparatus and associated app...

Inspection method and apparatus and lithographic processing cell

Inspection method and apparatus and lithographic processing cell

Method of performing model-based scanner tuning

Photomask and manufacturing method thereof

Method of performing model-based scanner tuning

Projection exposure method and projection exposure apparatus for mi...

Method for determining the dose corrections to be applied to an IC...

Model-based scanner tuning systems and methods

Projection exposure method and projection exposure apparatus for mi...

Multicolor photolithography materials and methods

Method for determining the parameters of an IC manufacturing proces...

Model-based process simulation systems and methods

Multiscale patterning of a sample with apparatus having both thermo...

Method of performing model-based scanner tuning

Exposure apparatus, exposure method, and device manufacturing method

Transverse electric-field type liquid crystal display device, proce...

Method of performing model-based scanner tuning

Method of forming tight-pitched pattern

Model-based scanner tuning systems and methods

System and method for improved automated semiconductor wafer manufa...

Model-based process simulation systems and methods

Exposure method and lithography system

Model-based scanner tuning systems and methods

Method for manufacturing a semiconductor device

Alignment method for semiconductor processing

System and method for improved automated semiconductor wafer manufa...

Lithographic apparatus and method for calibrating the same

Dual wavelength exposure method and system for semiconductor device...

Recording medium storing program for determining exposure parameter...

Patents Applicationslast 30 patents

DIGITAL LITHOGRAPHY SCAN SEQUENCING

DETERMINING LITHOGRAPHIC MATCHING PERFORMANCE

METHOD OF PERFORMING MODEL-BASED SCANNER TUNING

Fabricating Devices with Reduced Isolation Regions

METHOD FOR CONTROLLING A MANUFACTURING APPARATUS AND ASSOCIATED APP...

MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...

METHOD OF PERFORMING MODEL-BASED SCANNER TUNING

METHOD FOR DETERMINING THE DOSE CORRECTIONS TO BE APPLIED TO AN IC...

MODEL-BASED PROCESS SIMULATION SYSTEMS AND METHODS

METHOD OF FORMING TIGHT-PITCHED PATTERN

EXPOSURE METHOD, EXPOSURE APPARATUS, EXPOSURE SYSTEM AND DEVICE MAN...

Inspection Method and Apparatus and Lithographic Processing Cell

METHOD OF FORMING TIGHT-PITCHED PATTERN

MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS

TRANSVERSE ELECTRIC-FIELD TYPE LIQUID CRYSTAL DISPLAY DEVICE, PROCE...

System and Method for Improved Automated Semiconductor Wafer Manufa...

SYSTEM AND METHOD FOR AN ADJUSTING OPTICAL PROXIMITY EFFECT FOR AN...

Method of Performing Model-Based Scanner Tuning

ALIGNMENT METHOD FOR SEMICONDUCTOR PROCESSING

METHOD FOR FORMING PATTERN

LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME

DUAL WAVELENGTH EXPOSURE METHOD AND SYSTEM FOR SEMICONDUCTOR DEVICE...

LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME

System and Method for Improved Automated Semiconductor Wafer Manufa...

METHOD FOR FORMING PATTERN

Process, Apparatus and Device

MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS

RECORDING MEDIUM STORING PROGRAM FOR DETERMINING EXPOSURE PARAMETER...

MODEL-BASED PROCESS SIMULATION SYSTEMS AND METHODS