Mounting of optical systems

Industry

CPC
G03F7/70833

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70833Mounting of optical systems

Industries

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Patents Grantslast 30 patents

Information Patent Grant
End-of-life monitoring of dynamic gas lock membranes and pupil face...
- Patent number 12,158,705
- Issue date Dec 3, 2024
- ASML Holding N.V. & ASML Netherlands B.V.
- Joseph Harry Lyons
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Support, vibration isolation system, lithographic apparatus, object...
- Patent number 11,828,344
- Issue date Nov 28, 2023
- ASML Netherlands B.V.
- Jeroen Johan Maarten Van De Wijdeven
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Projection exposure apparatus for semiconductor lithography having...
- Patent number 11,754,934
- Issue date Sep 12, 2023
- Carl Zeiss SMT GmbH
- Peter Nieland
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adusting a first element of a lithography apparatus towa...
- Patent number 11,460,780
- Issue date Oct 4, 2022
- Carl Zeiss SMT GmbH
- Boaz Pnini
- G02 - OPTICS
Information Patent Grant
Optical apparatus
- Patent number 11,428,892
- Issue date Aug 30, 2022
- Gigaphoton Inc.
- Hiroshi Someya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Movable body apparatus, moving method, exposure apparatus, exposure...
- Patent number 11,402,762
- Issue date Aug 2, 2022
- Nikon Corporation
- Yasuo Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet lithography device
- Patent number 11,360,380
- Issue date Jun 14, 2022
- Imec VZW
- Joern-Holger Franke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stop for arrangement in a constriction of an EUV illumination beam
- Patent number 11,350,513
- Issue date May 31, 2022
- Carl Zeiss SMT GmbH
- Michael Patra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Support of an optical unit
- Patent number 11,307,503
- Issue date Apr 19, 2022
- Carl Zeiss SMT GmbH
- Martin Vogt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus for semiconductor lithography
- Patent number 11,281,114
- Issue date Mar 22, 2022
- Carl Zeiss SMT GmbH
- Jens Kugler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vacuum actuator containment for molecular contaminant and particle...
- Patent number 11,156,926
- Issue date Oct 26, 2021
- KLA Corporation
- Zefram D. Marks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, manufacturing method of flat-panel display, dev...
- Patent number 11,126,094
- Issue date Sep 21, 2021
- Nikon Corporation
- Yasuo Aoki
- G01 - MEASURING TESTING
Information Patent Grant
Bearing device, magnetic gravity compensator, vibration isolation s...
- Patent number 11,029,612
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Maarten Hartger Kimman
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Lithographic apparatus, lithographic projection apparatus and devic...
- Patent number 10,955,761
- Issue date Mar 23, 2021
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vibration isolator with a vertically effective pneumatic spring
- Patent number 10,941,833
- Issue date Mar 9, 2021
- Integrated Dynamics Engineering GmbH
- Arndt Evers
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Support structure, method and lithographic apparatus
- Patent number 10,921,720
- Issue date Feb 16, 2021
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement of optical elements in a lithographic apparatus
- Patent number 10,908,508
- Issue date Feb 2, 2021
- Carl Zeiss SMT GmbH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Component for a projection exposure apparatus
- Patent number 10,866,528
- Issue date Dec 15, 2020
- Carl Zeiss SMT GmbH
- Thomas Wolfsteiner
- G02 - OPTICS
Information Patent Grant
Movable body apparatus, moving method, exposure apparatus, exposure...
- Patent number 10,852,647
- Issue date Dec 1, 2020
- Nikon Corporation
- Yasuo Aoki
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus, lithographic projection apparatus and devic...
- Patent number 10,838,312
- Issue date Nov 17, 2020
- ASML Netherlands B.V.
- Jeroen Pieter Starreveld
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography apparatus and method
- Patent number 10,831,114
- Issue date Nov 10, 2020
- Carl Zeiss SMT GmbH
- Björn Liebaug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vibration isolation device, lithographic apparatus and method to tu...
- Patent number 10,782,620
- Issue date Sep 22, 2020
- ASML Netherlands B.V.
- Alexander Petrus Josephus Van Lankvelt
- F03 - MACHINES OR ENGINES FOR LIQUIDS WIND, SPRING WEIGHT AND MISCELLANEOUS M...
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,649,347
- Issue date May 12, 2020
- ASML Netherlands B.V.
- Michael Johannes Christiaan Ronde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical apparatus and vibration removing method
- Patent number 10,645,289
- Issue date May 5, 2020
- Lasertec Corporation
- Haruhiko Kusunose
- G02 - OPTICS
Information Patent Grant
Lithography system and method
- Patent number 10,635,003
- Issue date Apr 28, 2020
- Carl Zeiss SMT GmbH
- Bernhard Geuppert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage system, lithographic apparatus and device manufacturing method
- Patent number 10,620,552
- Issue date Apr 14, 2020
- ASML Netherlands B.V.
- Hendrikus Herman Marie Cox
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Projection exposure apparatus, and method for reducing deformations...
- Patent number 10,599,051
- Issue date Mar 24, 2020
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus having an active base frame support
- Patent number 10,578,983
- Issue date Mar 3, 2020
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vibration isolation system and lithographic apparatus
- Patent number 10,545,414
- Issue date Jan 28, 2020
- ASML Netherlands B.V.
- Alexander Petrus Josephus Van Lankvelt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement of optical elements in a lithographic apparatus
- Patent number 10,509,325
- Issue date Dec 17, 2019
- Carl Zeiss SMT GmbH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
IMAGE CAPTURING APPARATUS AND IMAGE CAPTURING METHOD
- Publication number 20240385539
- Publication date Nov 21, 2024
- HITACHI HIGH-TECH CORPORATION
- Akira NISHIOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR BONDING HIGH FLUENCE OPTICS TO OPTOMECHANICAL...
- Publication number 20240360023
- Publication date Oct 31, 2024
- KLA Corporation
- Mandar Anand Paranjape
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
MEASUREMENT APPARATUS AND METHOD FOR INSPECTING PHOTOMASKS INTENDED...
- Publication number 20240353757
- Publication date Oct 24, 2024
- Christian Roedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR...
- Publication number 20240353768
- Publication date Oct 24, 2024
- Carl Zeiss SMT GMBH
- Lutz Brekerbohm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR THERMALLY STABLE MOUNTING OF OPTICAL COLUMNS
- Publication number 20240329548
- Publication date Oct 3, 2024
- ASML NETHERLANDS B.V.
- Jasper WINTERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20240288777
- Publication date Aug 29, 2024
- Carl Zeiss SMT GMBH
- Stefan Krone
- G02 - OPTICS
Information Patent Application
DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING
- Publication number 20240280911
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- CHI-MING TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEFORMABLE MIRROR SYSTEM
- Publication number 20240280909
- Publication date Aug 22, 2024
- ASML NETHERLANDS B.V.
- Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN
- G02 - OPTICS
Information Patent Application
SUPPORT FOR AN OPTICAL ELEMENT
- Publication number 20240159988
- Publication date May 16, 2024
- Carl Zeiss SMT GMBH
- Rodolfo Guglielmi Rabe
- G02 - OPTICS
Information Patent Application
PROCESS AND APPARATUS FOR FEEDING A FLEXOGRAPHIC PRINTING PLATE PRO...
- Publication number 20240118623
- Publication date Apr 11, 2024
- ESKO-GRAPHICS IMAGING GMBH
- Thomas Klein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING DEVICE CONDITIONING SYSTEM AND METHOD
- Publication number 20240094647
- Publication date Mar 21, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PNEUMATIC CONTROLLED FLEXURE SYSTEM FOR STABILIZING A PROJECTION DE...
- Publication number 20240069452
- Publication date Feb 29, 2024
- Applied Materials, Inc.
- Assaf KIDRON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK-SUPPORT ASSEMBLY AND PRODUCING METHOD THEREOF
- Publication number 20240049506
- Publication date Feb 8, 2024
- Olum Material Corporation
- Young Ho LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK INSPECTION APPARATUS
- Publication number 20240027895
- Publication date Jan 25, 2024
- STEK CO., LTD.
- Ming-Sheng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A FLUID PURGING SYSTEM, PROJECTION SYSTEM, ILLUMINATION SYSTEM, LIT...
- Publication number 20230205102
- Publication date Jun 29, 2023
- ASML NETHERLANDS B.V.
- José Nilton FONSECA JUNIOR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERFACE PLATE, INSPECTION SYSTEM AND METHOD OF INSTALLING AN INSP...
- Publication number 20230152717
- Publication date May 18, 2023
- ASML NETHERLANDS B.V.
- Marcel Koenraad Marie BAGGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
END-OF-LIFE MONITORING OF DYNAMIC GAS LOCK MEMBRANES AND PUPIL FACE...
- Publication number 20230083834
- Publication date Mar 16, 2023
- ASML Holding N.V.
- Joseph Harry LYONS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICRO-OPTIC CELL DESIGN RANDOMLY POSITIONED LENSLETS AND STATISTICA...
- Publication number 20220373898
- Publication date Nov 24, 2022
- Luminit LLC
- ALEX I. MARTIN
- G02 - OPTICS
Information Patent Application
SUPPORT, VIBRATION ISOLATION SYSTEM, LITHOGRAPHIC APPARATUS, OBJECT...
- Publication number 20220290734
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Jeroen Johan Maarten VAN DE WIJDEVEN
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
STAGE DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
- Publication number 20220283518
- Publication date Sep 8, 2022
- Canon Kabushiki Kaisha
- Satoshi Iwatani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MOUNTING AN OPTICAL SYSTEM
- Publication number 20220283503
- Publication date Sep 8, 2022
- Carl Zeiss SMT GMBH
- Johann Dorn
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUPPORT OF AN OPTICAL UNIT
- Publication number 20220283509
- Publication date Sep 8, 2022
- Carl Zeiss SMT GMBH
- Boaz Pnini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR MOUNTING MEMBER, POSITION MEASURING MIRROR USING SAME, AND E...
- Publication number 20220269040
- Publication date Aug 25, 2022
- KYOCERA CORPORATION
- Tetsuya INOUE
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM
- Publication number 20220236652
- Publication date Jul 28, 2022
- Carl Zeiss SMT GMBH
- Rolf Freimann
- G02 - OPTICS
Information Patent Application
LIGHT SOURCE APPARATUS, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURI...
- Publication number 20220107485
- Publication date Apr 7, 2022
- Canon Kabushiki Kaisha
- Hiroyuki Tomita
- F21 - LIGHTING
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY HAVING...
- Publication number 20220004111
- Publication date Jan 6, 2022
- Carl Zeiss SMT GMBH
- Peter Nieland
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ADUSTING A FIRST ELEMENT OF A LITHOGRAPHY APPARATUS TOWA...
- Publication number 20210232051
- Publication date Jul 29, 2021
- Carl Zeiss SMT GMBH
- Boaz Pnini
- G02 - OPTICS
Information Patent Application
RETICLE STAGE FOR PREVENTING HAZE CONTAMINATION AND EXPOSURE APPARA...
- Publication number 20210208516
- Publication date Jul 8, 2021
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- JIYONG YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL MOUNT
- Publication number 20210157085
- Publication date May 27, 2021
- Corning Incorporated
- Robert Dennis Grejda
- G02 - OPTICS
Information Patent Application
POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS
- Publication number 20210149309
- Publication date May 20, 2021
- Carl Zeiss SMT GMBH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Mounting of optical systems

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

End-of-life monitoring of dynamic gas lock membranes and pupil face...

Support, vibration isolation system, lithographic apparatus, object...

Projection exposure apparatus for semiconductor lithography having...

Method for adusting a first element of a lithography apparatus towa...

Optical apparatus

Movable body apparatus, moving method, exposure apparatus, exposure...

Extreme ultraviolet lithography device

Stop for arrangement in a constriction of an EUV illumination beam

Support of an optical unit

Projection exposure apparatus for semiconductor lithography

Vacuum actuator containment for molecular contaminant and particle...

Exposure apparatus, manufacturing method of flat-panel display, dev...

Bearing device, magnetic gravity compensator, vibration isolation s...

Lithographic apparatus, lithographic projection apparatus and devic...

Vibration isolator with a vertically effective pneumatic spring

Support structure, method and lithographic apparatus

Position measurement of optical elements in a lithographic apparatus

Component for a projection exposure apparatus

Movable body apparatus, moving method, exposure apparatus, exposure...

Lithographic apparatus, lithographic projection apparatus and devic...

Lithography apparatus and method

Vibration isolation device, lithographic apparatus and method to tu...

Lithographic apparatus and device manufacturing method

Optical apparatus and vibration removing method

Lithography system and method

Stage system, lithographic apparatus and device manufacturing method

Projection exposure apparatus, and method for reducing deformations...

Lithographic apparatus having an active base frame support

Vibration isolation system and lithographic apparatus

Position measurement of optical elements in a lithographic apparatus

Patents Applicationslast 30 patents

IMAGE CAPTURING APPARATUS AND IMAGE CAPTURING METHOD

METHOD AND SYSTEM FOR BONDING HIGH FLUENCE OPTICS TO OPTOMECHANICAL...

MEASUREMENT APPARATUS AND METHOD FOR INSPECTING PHOTOMASKS INTENDED...

MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR...

SYSTEMS AND METHODS FOR THERMALLY STABLE MOUNTING OF OPTICAL COLUMNS

OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD

DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING

DEFORMABLE MIRROR SYSTEM

SUPPORT FOR AN OPTICAL ELEMENT

PROCESS AND APPARATUS FOR FEEDING A FLEXOGRAPHIC PRINTING PLATE PRO...

PATTERNING DEVICE CONDITIONING SYSTEM AND METHOD

PNEUMATIC CONTROLLED FLEXURE SYSTEM FOR STABILIZING A PROJECTION DE...

MASK-SUPPORT ASSEMBLY AND PRODUCING METHOD THEREOF

MASK INSPECTION APPARATUS

A FLUID PURGING SYSTEM, PROJECTION SYSTEM, ILLUMINATION SYSTEM, LIT...

INTERFACE PLATE, INSPECTION SYSTEM AND METHOD OF INSTALLING AN INSP...

END-OF-LIFE MONITORING OF DYNAMIC GAS LOCK MEMBRANES AND PUPIL FACE...

MICRO-OPTIC CELL DESIGN RANDOMLY POSITIONED LENSLETS AND STATISTICA...

SUPPORT, VIBRATION ISOLATION SYSTEM, LITHOGRAPHIC APPARATUS, OBJECT...

STAGE DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD

METHOD FOR MOUNTING AN OPTICAL SYSTEM

SUPPORT OF AN OPTICAL UNIT

MIRROR MOUNTING MEMBER, POSITION MEASURING MIRROR USING SAME, AND E...

OPTICAL SYSTEM

LIGHT SOURCE APPARATUS, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURI...

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY HAVING...

METHOD FOR ADUSTING A FIRST ELEMENT OF A LITHOGRAPHY APPARATUS TOWA...

RETICLE STAGE FOR PREVENTING HAZE CONTAMINATION AND EXPOSURE APPARA...

OPTICAL MOUNT

POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS