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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

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H01J2237/032Mounting or supporting

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Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus
- Patent number 12,183,552
- Issue date Dec 31, 2024
- KELK Ltd.
- Atsushi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for substrate transport in vacuum processing systems
- Patent number 12,142,463
- Issue date Nov 12, 2024
- VON ARDENNE Asset GmbH & Co. KG
- Falk Milde
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cathode mechanism of electron emission source, and method for manuf...
- Patent number 12,106,928
- Issue date Oct 1, 2024
- NuFlare Technology, Inc.
- Ryoei Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interlocking fastening upper electrode assembly having improved fas...
- Patent number 12,104,638
- Issue date Oct 1, 2024
- TEM CO., LTD.
- Jin Kyung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multistage-connected multipole, multistage multipole unit, and char...
- Patent number 11,769,650
- Issue date Sep 26, 2023
- HITACHI HIGH-TECH CORPORATION
- Hideto Dohi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Height measuring device, charged particle beam apparatus, and heigh...
- Patent number 11,754,388
- Issue date Sep 12, 2023
- Jeol Ltd.
- Yukinori Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle beam lithography system
- Patent number 11,610,758
- Issue date Mar 21, 2023
- KKT HOLDINGS SYNDICATE
- Tzu-Yi Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aberration corrector and method of aligning aberration corrector
- Patent number 11,501,947
- Issue date Nov 15, 2022
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Matthias Firnkes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation detector and radiation detection apparatus
- Patent number 11,444,213
- Issue date Sep 13, 2022
- Fondazione Bruno Kessler
- Antonino Picciotto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detecting method and detecting equipment therefor
- Patent number 11,237,414
- Issue date Feb 1, 2022
- HKC CORPORATION LIMITED
- Chung-Kuang Chien
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,094,426
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Anode, and x-ray generating tube, x-ray generating apparatus, and r...
- Patent number 10,998,161
- Issue date May 4, 2021
- Canon Kabushiki Kaisha
- Yasuo Ohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 10,991,551
- Issue date Apr 27, 2021
- Tokyo Electron Limited
- Mohd Fairuz Bin Budiman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle device, structure manufacturing method, and struct...
- Patent number 10,879,029
- Issue date Dec 29, 2020
- Nikon Corporation
- Atsushi Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 10,586,625
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Electron-beam spot optimization
- Patent number 10,529,529
- Issue date Jan 7, 2020
- Moxtek, Inc.
- Dustin Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shielded, transmission-target, x-ray tube
- Patent number 10,453,643
- Issue date Oct 22, 2019
- Moxtek, Inc.
- Dustin Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and ion implantation method
- Patent number 10,381,192
- Issue date Aug 13, 2019
- TOSHIBA MEMORY CORPORATION
- Tsuyoshi Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray tube including support for latitude supply wires
- Patent number 10,181,390
- Issue date Jan 15, 2019
- Toshiba Electron Tubes & Devices Co., Ltd.
- Naoki Takahashi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Inspection device
- Patent number 10,157,722
- Issue date Dec 18, 2018
- Ebara Corporation
- Masahiro Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray tube including hybrid electron emission source
- Patent number 10,147,581
- Issue date Dec 4, 2018
- Electronics and Telecommunications Research Institute
- Jun Tae Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray generation device having multiple metal target members
- Patent number 10,115,557
- Issue date Oct 30, 2018
- Hamamatsu Photonics K.K.
- Atsushi Ishii
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Coil filament for plasma enhanced chemical vapor deposition source
- Patent number 10,109,465
- Issue date Oct 23, 2018
- Seagate Technology LLC
- Romulo Ata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Filament holder for hot cathode PECVD source
- Patent number 9,991,099
- Issue date Jun 5, 2018
- Seagate Technology LLC
- Samuel Lewis Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cathode filament assembly
- Patent number 9,916,959
- Issue date Mar 13, 2018
- Koninklijke Philips N.V.
- Marcus Walter Foellmer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-electrode electron optics
- Patent number 9,905,322
- Issue date Feb 27, 2018
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Extraction electrode
- Patent number 9,793,094
- Issue date Oct 17, 2017
- Ion Technology Solutions, LLC
- Manuel A. Jerez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray tube
- Patent number 9,653,248
- Issue date May 16, 2017
- Toshiba Electron Tubes & Devices Co., Ltd.
- Tomonari Ishihara
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE

Patents Applicationslast 30 patents

Information Patent Application
ORIENTATION TOOL FOR ELECTRON BACKSCATTER DIFFRACTION
- Publication number 20240395498
- Publication date Nov 28, 2024
- GM GLOBAL TECHNOLOGY OPERATIONS LLC
- Chelsea Edge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AFE (ACTIVE FAR EDGE) HEATER/BIPOLAR ESC WITH SIMPLIFIED AND OPTIMI...
- Publication number 20240387154
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Juan Carlos ROCHA-ALVAREZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM PLASMA PROCESSING WITH A LINEAR PLASMA SOURCE
- Publication number 20240355592
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Vladimir Nagorny
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LIQUID METAL ION SOURCE DEVICE FOR USING BISMUTH AND ALLOY OF BISMUTH
- Publication number 20240331967
- Publication date Oct 3, 2024
- KOREA BASIC SCIENCE INSTITUTE
- Myoung Choul Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE GAS GENERATION APPARATUS
- Publication number 20240297024
- Publication date Sep 5, 2024
- TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- Ren ARITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE FIXING ASSEMBLY AND DRY ETCHING DEVICE
- Publication number 20240186120
- Publication date Jun 6, 2024
- Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Zhiyuan LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lattice Based Voltage Standoff
- Publication number 20240177960
- Publication date May 30, 2024
- Applied Materials, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR SUBSTRATE TRANSPORT IN VACUUM PROCESSING SYSTEMS
- Publication number 20230402266
- Publication date Dec 14, 2023
- VON ARDENNE Asset GmbH & Co. KG
- Falk MILDE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230402258
- Publication date Dec 14, 2023
- Samsung Electronics Co., Ltd.
- Yunhwan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND PLA...
- Publication number 20230207265
- Publication date Jun 29, 2023
- SEMES CO., LTD.
- Shant ARAKELYAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS GAS SUPPLYING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDI...
- Publication number 20230197415
- Publication date Jun 22, 2023
- SEMES CO., LTD.
- In Seong LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CATHODE MECHANISM OF ELECTRON EMISSION SOURCE, AND METHOD FOR MANUF...
- Publication number 20230132046
- Publication date Apr 27, 2023
- NuFlare Technology, Inc.
- Ryoei KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimization of Radiofrequency Signal Ground Return in Plasma Proce...
- Publication number 20230059495
- Publication date Feb 23, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERLOCKING FASTENING UPPER ELECTRODE ASSEMBLY HAVING IMPROVED FAS...
- Publication number 20230032767
- Publication date Feb 2, 2023
- TEM CO., LTD.
- Jin Kyung PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORKPIECE SUPPORT SYSTEM FOR PLASMA TREATMENT AND METHOD OF USING T...
- Publication number 20230018842
- Publication date Jan 19, 2023
- Nordson Corporation
- Zhao JIANGANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTOR AND METHOD OF ALIGNING ABERRATION CORRECTOR
- Publication number 20220375713
- Publication date Nov 24, 2022
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Matthias Firnkes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20220115215
- Publication date Apr 14, 2022
- KELK LTD.
- Atsushi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREAD PROFILES FOR SEMICONDUCTOR PROCESS CHAMBER COMPONENTS
- Publication number 20220102117
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Reyn Tetsuro WAKABAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multistage-Connected Multipole, Multistage Multipole Unit, and Char...
- Publication number 20220037113
- Publication date Feb 3, 2022
- Hitachi High-Tech Corporation
- Hideto DOHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS, SYSTEM, AND METHOD FOR IMPEDANCE ADJUSTMENT OF PROCESSIN...
- Publication number 20210398779
- Publication date Dec 23, 2021
- PIOTECH INC.
- Giyoul Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20210383941
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Height Measuring Device, Charged Particle Beam Apparatus, and Heigh...
- Publication number 20210207945
- Publication date Jul 8, 2021
- JEOL Ltd.
- Yukinori Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200328064
- Publication date Oct 15, 2020
- TOKYO ELECTRON LIMITED
- Mohd Fairuz BIN BUDIMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Lithography System
- Publication number 20200227235
- Publication date Jul 16, 2020
- Tzu-Yi Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20200194141
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
RADIATION DETECTOR AND RADIATION DETECTION APPARATUS
- Publication number 20200183024
- Publication date Jun 11, 2020
- FONDAZIONE BRUNO KESSLER
- Antonino PICCIOTTO
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190148119
- Publication date May 16, 2019
- Samsung Electronics Co., Ltd.
- Jung-mo SUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD
- Publication number 20190074158
- Publication date Mar 7, 2019
- Toshiba Memory Corporation
- Tsuyoshi Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COIL FILAMENT FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SOURCE
- Publication number 20170365448
- Publication date Dec 21, 2017
- SEAGATE TECHNOLOGY LLC
- Romulo Ata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Mounting or supporting

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate processing apparatus

Device and method for substrate transport in vacuum processing systems

Cathode mechanism of electron emission source, and method for manuf...

Interlocking fastening upper electrode assembly having improved fas...

Vacuum chamber arrangement for charged particle beam generator

Multistage-connected multipole, multistage multipole unit, and char...

Height measuring device, charged particle beam apparatus, and heigh...

Vacuum chamber arrangement for charged particle beam generator

Charged particle beam lithography system

Aberration corrector and method of aligning aberration corrector

Radiation detector and radiation detection apparatus

Detecting method and detecting equipment therefor

Vacuum chamber arrangement for charged particle beam generator

Anode, and x-ray generating tube, x-ray generating apparatus, and r...

Cleaning method and plasma processing apparatus

Charged particle device, structure manufacturing method, and struct...

Vacuum chamber arrangement for charged particle beam generator

Electron-beam spot optimization

Shielded, transmission-target, x-ray tube

Ion implantation apparatus and ion implantation method

X-ray tube including support for latitude supply wires

Inspection device

X-ray tube including hybrid electron emission source

X-ray generation device having multiple metal target members

Coil filament for plasma enhanced chemical vapor deposition source

Filament holder for hot cathode PECVD source

Cathode filament assembly

Multi-electrode electron optics

Extraction electrode

X-ray tube

Patents Applicationslast 30 patents

ORIENTATION TOOL FOR ELECTRON BACKSCATTER DIFFRACTION

AFE (ACTIVE FAR EDGE) HEATER/BIPOLAR ESC WITH SIMPLIFIED AND OPTIMI...

UNIFORM PLASMA PROCESSING WITH A LINEAR PLASMA SOURCE

LIQUID METAL ION SOURCE DEVICE FOR USING BISMUTH AND ALLOY OF BISMUTH

ACTIVE GAS GENERATION APPARATUS

ELECTRODE FIXING ASSEMBLY AND DRY ETCHING DEVICE

Lattice Based Voltage Standoff

DEVICE AND METHOD FOR SUBSTRATE TRANSPORT IN VACUUM PROCESSING SYSTEMS

PLASMA PROCESSING APPARATUS

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND PLA...

PROCESS GAS SUPPLYING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDI...

CATHODE MECHANISM OF ELECTRON EMISSION SOURCE, AND METHOD FOR MANUF...

Optimization of Radiofrequency Signal Ground Return in Plasma Proce...

INTERLOCKING FASTENING UPPER ELECTRODE ASSEMBLY HAVING IMPROVED FAS...

WORKPIECE SUPPORT SYSTEM FOR PLASMA TREATMENT AND METHOD OF USING T...

ABERRATION CORRECTOR AND METHOD OF ALIGNING ABERRATION CORRECTOR

SUBSTRATE PROCESSING APPARATUS

THREAD PROFILES FOR SEMICONDUCTOR PROCESS CHAMBER COMPONENTS

Multistage-Connected Multipole, Multistage Multipole Unit, and Char...

APPARATUS, SYSTEM, AND METHOD FOR IMPEDANCE ADJUSTMENT OF PROCESSIN...

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

Height Measuring Device, Charged Particle Beam Apparatus, and Heigh...

CLEANING METHOD AND PLASMA PROCESSING APPARATUS

Charged Particle Beam Lithography System

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

RADIATION DETECTOR AND RADIATION DETECTION APPARATUS

PLASMA PROCESSING APPARATUS

ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD

COIL FILAMENT FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SOURCE